公开(公告)号：US20170031250A1

公开(公告)日：2017-02-02

申请号：US15293009

申请日：2016-10-13

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie COX ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martinus Cornelis Maria VERHAGEN ,  Stefan Philip Christiaan BELFROID ,  Johannes Petrus Maria SMEULERS ,  Herman VOGEL

IPC分类号： G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。

公开(公告)号：US09470872B2

公开(公告)日：2016-10-18

申请号：US14528690

申请日：2014-10-30

申请人： Carl Zeiss SMT GmbH

发明人： Boris Bittner ,  Norbert Wabra ,  Sonja Schneider ,  Ricarda Schneider ,  Hendrik Wagner ,  Rumen Iliew ,  Walter Pauls

IPC分类号： G03F9/00 ,  G03F1/52 ,  G02B7/18 ,  G01N21/95 ,  G03F7/20 ,  G03F1/84 ,  G21K1/06

CPC分类号： G02B7/181 ,  G01N21/95 ,  G01N2201/0636 ,  G03F1/52 ,  G03F1/84 ,  G03F7/702 ,  G03F7/70316 ,  G03F7/70891 ,  G03F7/7095 ,  G21K1/062 ,  G21K2201/067

摘要： A reflective optical element for a microlithographic projection exposure apparatus, a mask inspection apparatus or the like. The reflective optical element has an optically effective surface, an element substrate (12, 32, 42, 52), a reflection layer system (14, 34, 44, 54) and at least one deformation reduction layer (15, 35, 45, 55, 58). When the optically effective surface (11, 31, 41, 51) is irradiated with electromagnetic radiation, a maximum deformation level of the reflection layer system is reduced in comparison with a deformation level of an analogously constructed reflective optical element without the deformation reduction layer.

摘要翻译： 用于微光刻投影曝光装置的反射型光学元件，掩模检查装置等。 反射光学元件具有光学有效的表面，元件基底（12,32,42,52），反射层系统（14,34,44,54）和至少一个变形减小层（15,35,45） 55，58）。 当光学有效表面（11,31,41,51）被电磁辐射照射时，与没有变形减少层的类似构造的反射光学元件的变形水平相比，反射层系统的最大变形水平降低。

公开(公告)号：US09418847B2

公开(公告)日：2016-08-16

申请号：US14163287

申请日：2014-01-24

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Ching-Wei Shen ,  Kuan-Wen Lin ,  Chi-Lun Lu ,  Ting-Hao Hsu ,  Sheng-Chi Chin ,  Anthony Yen

IPC分类号： G03F1/62 ,  H01L21/027 ,  G03F1/48 ,  G03F7/20

CPC分类号： H01L21/0274 ,  G03F1/48 ,  G03F1/62 ,  G03F7/70283 ,  G03F7/70916 ,  G03F7/7095

摘要： The present disclosure provides an apparatus in semiconductor manufacturing. The apparatus includes a mask, a pellicle frame attached to the mask, and a pellicle joined to the pellicle frame thereby forming a sealed enclosure bounded by the pellicle, the pellicle frame, and the mask. The apparatus further includes photo-catalyst particles introduced into the sealed enclosure before the sealed enclosure is formed. The photo-catalyst particles prevent haze formation within the enclosure during lithography exposure processes.

摘要翻译： 本公开提供了半导体制造中的装置。 该装置包括掩模，附着于掩模的防护薄膜组件框架和接合到防护薄膜框架上的防护薄膜组件，从而形成由防护薄膜组件，防护薄膜框架和掩模限定的密封外壳。 该装置还包括在密封外壳形成之前引入到密封外壳中的光催化剂颗粒。 在光刻曝光过程中，光催化剂颗粒防止外壳内的雾化形成。

公开(公告)号：US09249501B2

公开(公告)日：2016-02-02

申请号：US13475173

申请日：2012-05-18

申请人： Dirk Heinrich Ehm ,  Franz-Josef Stickel ,  Juergen Mueller

发明人： Dirk Heinrich Ehm ,  Franz-Josef Stickel ,  Juergen Mueller

IPC分类号： G03B27/52 ,  C23C14/48 ,  G03B7/20 ,  G02B26/08 ,  G03F7/20 ,  G21K1/06 ,  G02B17/06

CPC分类号： C23C14/48 ,  G02B17/0657 ,  G02B26/0825 ,  G03B7/20 ,  G03F7/70266 ,  G03F7/70316 ,  G03F7/7095 ,  G21K1/062 ,  G21K2201/067

摘要： A mirror (1) for a microlithography projection exposure apparatus including a substrate (3) and a reflective coating (5). A functional coating (11) between the substrate (3) and the reflective coating (5) has a local form variation (19) for correcting the surface form of the mirror (1), wherein the local form variation (19) is brought about by a local variation in the chemical composition of the functional coating (11) and wherein a thickness of the reflective coating (5) is not changed by the local variation in the chemical composition of the functional coating (11). The local variation in the chemical composition of the functional coating (11) can be brought about by bombardment with particles (15), for example with hydrogen ions.

摘要翻译： 一种用于包括基板（3）和反射涂层（5）的微光刻投影曝光装置的反射镜（1）。 在基板（3）和反射涂层（5）之间的功能性涂层（11）具有用于校正反射镜（1）的表面形状的局部形状变化（19），其中局部形状变化（19）带来 通过功能性涂层（11）的化学组成的局部变化，并且其中反射涂层（5）的厚度不会由于功能涂层（11）的化学组成的局部变化而改变。 功能性涂层（11）的化学组成的局部变化可以通过用颗粒（15）例如用氢离子轰击来实现。

公开(公告)号：US09238590B2

公开(公告)日：2016-01-19

申请号：US14204009

申请日：2014-03-11

申请人： CARL ZEISS SMT GmbH

发明人： Wilfried Clauss

IPC分类号： C03C23/00 ,  C03C17/00 ,  B05D3/06 ,  C03B32/00 ,  C03C17/40 ,  G02B1/12 ,  G02B5/08 ,  G02B7/18 ,  G03F7/20 ,  G21K1/06

CPC分类号： C03C23/0005 ,  C03B32/005 ,  C03B2201/42 ,  C03C17/00 ,  C03C17/40 ,  C03C2218/31 ,  G02B1/12 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70316 ,  G03F7/7095 ,  G21K1/062

摘要： A method for the production of a mirror element (10) that has a reflective coating (10a) for the EUV wavelength range and a substrate (10b). The substrate (10b) is pre-compacted by hot isostatic pressing, and the reflective coating (10a) is applied to the pre-compacted substrate (10b). In the method, either the pre-compacting of the substrate (10b) is performed until a saturation value of the compaction of the substrate (10b) by long-term EUV irradiation is reached, or, for further compaction, the pre-compacted substrate (10b) is irradiated, preferably homogeneously, with ions (16) and/or with electrons in a surface region (15) in which the coating (10a) has been or will be applied. A mirror element (10) for the EUV wavelength range associated with the method has a substrate (10b) pre-compacted by hot isostatic pressing. Such a mirror element (10) is suitable to be provided in an EUV projection exposure system.

摘要翻译： 一种用于生产具有用于EUV波长范围的反射涂层（10a）的反射镜元件（10）的方法和一种基板（10b）。 基板（10b）通过热等静压进行预压实，并将反射涂层（10a）施加到预压实的基板（10b）上。 在该方法中，进行基板（10b）的预压实，直到达到通过长期EUV照射的基板（10b）的压实的饱和值，或者为了进一步压缩，预压实基板 （10b）在涂层（10a）已经或将被施加的表面区域（15）中与离子（16）和/或电子被优选均匀地照射。 用于与该方法相关联的EUV波长范围的镜元件（10）具有通过热等静压预压制的基底（10b）。 这种镜子元件（10）适合于设置在EUV投影曝光系统中。

公开(公告)号：US09097992B2

公开(公告)日：2015-08-04

申请号：US13186123

申请日：2011-07-19

申请人： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederick De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Martinus Hendrukus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelius Maria Verhagen ,  Marco Polizzi ,  Edwin Augustinus Matheus Van Gompel ,  Johannes Petrus Maria Smeulers ,  Stefan Philip Christiaan Belfroid ,  Herman Vogel

发明人： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederick De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Martinus Hendrukus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelius Maria Verhagen ,  Marco Polizzi ,  Edwin Augustinus Matheus Van Gompel ,  Johannes Petrus Maria Smeulers ,  Stefan Philip Christiaan Belfroid ,  Herman Vogel

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20150070666A1

公开(公告)日：2015-03-12

申请号：US14395461

申请日：2013-04-16

申请人： ASML Netherlands B.V.

发明人： Johannes Henricus Wilhelmus Jacobs ,  Jan Steven Christiaan Westerlaken

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/70816 ,  G03F7/70891 ,  G03F7/7095 ,  H01L21/67103

摘要： A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.

摘要翻译： 一种用于对基材进行热调节的热调节单元，所述热调节单元包括：热调节元件，其在使用中具有面向所述基板的第一层，并且包括具有100W / mK以上的导热率的材料，第二层 和位于第一和第二层之间的传热部件; 以及加热构件，其比所述热调节元件更硬，并且构造成支撑所述热调节元件，以便减小其机械变形，其中所述热调节元件与所述加强构件热隔离。

公开(公告)号：US20150043060A1

公开(公告)日：2015-02-12

申请号：US14525017

申请日：2014-10-27

申请人： Carl Zeiss SMT GmbH

发明人： Peter Huber ,  Oliver Dier

IPC分类号： G02F1/01 ,  G03F7/20 ,  G02B5/08

CPC分类号： G02F1/0128 ,  B82Y10/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B17/06 ,  G02B26/0816 ,  G02B27/0068 ,  G03F7/2008 ,  G03F7/70266 ,  G03F7/70891 ,  G03F7/7095 ,  G03F7/70958 ,  G21K1/062

摘要： An optical element (21) with a substrate (30) and a reflective coating (31). The coating (31) has, in particular for the reflection of EUV radiation, a plurality of layer pairs having alternate layers (33a, 33b) composed of a high refractive index material and a low refractive index material At least one active layer (34) composed of a magnetostrictive material is formed within the reflective coating (31). Also disclosed is an optical element (21) having a substrate (30) and a reflective coating (31). The optical element (21) has at least one first active layer with a material having positive magnetostriction and at least one second active layer with a material having negative magnetostriction. The layer thicknesses and the layer materials of the active layers are such that mechanical stress changes or changes in length of the active layers that are produced by a magnetic field mutually compensate for one another.

摘要翻译： 具有基板（30）和反射涂层（31）的光学元件（21）。 涂层（31）特别是EUV辐射的反射，具有由高折射率材料和低折射率材料组成的交替层（33a，33b）的多个层对。至少一个活性层（34） 在反射涂层（31）内形成由磁致伸缩材料构成的。 还公开了一种具有基板（30）和反射涂层（31）的光学元件（21）。 光学元件（21）具有至少一个具有正磁致伸缩材料的第一有源层和具有负磁致伸缩材料的至少一个第二有源层。 有源层的层厚度和层材料使得由磁场产生的有源层的机械应力变化或长度变化彼此相互补偿。

公开(公告)号：US08928860B2

公开(公告)日：2015-01-06

申请号：US12370741

申请日：2009-02-13

申请人： Peter Paul Hempenius ,  Dirk-Jan Bijvoet ,  Youssef Karel Maria De Vos ,  Ramidin Izair Kamidi

发明人： Peter Paul Hempenius ,  Dirk-Jan Bijvoet ,  Youssef Karel Maria De Vos ,  Ramidin Izair Kamidi

IPC分类号： G03B27/58 ,  G03B27/68 ,  G03F7/20

CPC分类号： G03F7/7095 ,  G03F7/707 ,  G03F7/70783

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck configured to hold and position an object, for example, the patterning device onto the support or the substrate onto the substrate table, the chuck including a base and a constraining layer. A damping layer including a viscoelastic material is provided between the base and the constraining layer.

摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持基板的工作台，被配置为将图案化的辐射束投影到基板的目标部分上的投影系统，配置成将物体（例如，图案形成装置）保持和定位到支撑件或基板上的基板上的卡盘 桌子，卡盘包括基座和约束层。 包括粘弹性材料的阻尼层设置在基部和约束层之间。

公开(公告)号：US20140354967A1

公开(公告)日：2014-12-04

申请号：US14463066

申请日：2014-08-19

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK ,  Andrew J. HAZELTON ,  Michael SOGARD

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel.

摘要翻译： 浸没光刻设备包括（i）包括光学元件的光学组件，并且被配置为通过浸没液体将光束投射到基板上; （ii）围绕梁的路径的容纳构件; 和（iii）保持基板的阶段，台架上的基板移动到容纳构件的底表面下方并与其隔开。 容纳构件包括：（1）喷嘴出口，通过该喷嘴出口释放作为浸没液体的水，（2）回收通道，通过该回收通道从容纳构件与基底和/或载物台之间的间隙中回收浸液， 和（3）流体通道，水被释放到容纳构件与基底和/或载物台之间的间隙，流体通道设置在回收通道的径向内侧。