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    Block exposure pattern data extracting system and method for charged particle beam exposure
    51.
    发明授权
    Block exposure pattern data extracting system and method for charged particle beam exposure 失效
    块曝光图案数据提取系统和带电粒子束曝光的方法

    公开(公告)号：US5590048A

    公开(公告)日：1996-12-31

    申请号：US71262

    申请日：1993-06-04

    申请人： Tomohiko Abe ,  Hiroshi Yasuda ,  Kiichi Sakamoto ,  Yoshihisa Oae

    发明人： Tomohiko Abe ,  Hiroshi Yasuda ,  Kiichi Sakamoto ,  Yoshihisa Oae

    IPC分类号： H01J37/302 ,  G06F17/50 ,  G06K9/00

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J2237/0458 ,  H01J2237/31776

    摘要： In a block exposure pattern extracting system applied to a charged-particle beam exposure system having a block mask including a plurality of transparent stats having different shapes, a comparator unit compares first vectors connecting one of apexes of an input exposure pattern to other apexes thereof with second vectors connecting a reference point which is one of apexes of a unit block exposure pattern to other apexes of the unit block exposure pattern. A determining unit determines whether or not the first vectors coincide with the second vectors. An extracting unit extracts the input exposure pattern as the unit block exposure pattern when the determining unit determines that the first vectors coincide with the second vectors.

    摘要翻译： 在应用于具有包括具有不同形状的多个透明统计数据的块掩模的带电粒子束曝光系统的块曝光图案提取系统中，比较器单元将连接输入曝光图案的顶点之一与其他顶点的第一矢量与 将单位块曝光图案的顶点之一的参考点连接到单位块曝光图案的其他顶点的第二矢量。 确定单元确定第一矢量是否与第二矢量一致。 当确定单元确定第一向量与第二向量一致时，提取单元提取输入的曝光图案作为单位块曝光图案。

    Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
    57.
    发明授权
    Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
    用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件

    公开(公告)号：US09384938B2

    公开(公告)日：2016-07-05

    申请号：US13825820

    申请日：2011-09-23

    申请人： Dirk Zeidler ,  Thomas Kemen ,  Pascal Anger ,  Antonio Casares ,  Christof Riedesel

    发明人： Dirk Zeidler ,  Thomas Kemen ,  Pascal Anger ,  Antonio Casares ,  Christof Riedesel

    IPC分类号： H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/317

    CPC分类号： H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

    摘要： The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

    摘要翻译： 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 载体（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

    EXPOSURE APPARATUS FOR FORMING A RETICLE
    58.
    发明申请
    EXPOSURE APPARATUS FOR FORMING A RETICLE 审中-公开
    曝光装置

    公开(公告)号：US20140218710A1

    公开(公告)日：2014-08-07

    申请号：US14249132

    申请日：2014-04-09

    申请人： SAMSUNG ELECTRONICS CO., LTD.

    发明人： Jin CHOI ,  Jin-Ha JEONG ,  Urazaev VLADIMIR ,  Hea-Yun LEE

    IPC分类号： H01J37/06

    CPC分类号： H01J37/06 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/78 ,  G03F7/2063 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0458 ,  H01J2237/31764 ,  H01J2237/31776 ,  Y10S430/143

    摘要： A method of forming a reticle includes: loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first pattern aperture and a second pattern aperture so that the first pattern aperture is directly overlapped by a first aperture of a first aperture plate, the electron beam passing through the first pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the first pattern aperture, to form a first exposure pattern; moving the second aperture plate so that the second pattern aperture is directly overlapped by the first aperture of the first aperture plate, the electron beam passing through the second pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the second pattern aperture, to form a second exposure pattern; and developing the blank reticle having the first and second exposure patterns to form the reticle having first and second patterns.

    摘要翻译： 形成掩模版的方法包括：加载空白掩模版; 投射电子束; 移动具有第一图案孔和第二图案孔的第二孔板，使得第一图案孔与第一孔板的第一孔直接重叠，该电子束在通过第一孔之后通过第一图案孔; 在电子束通过第一图案孔之后，用电子束曝光空白掩模版，形成第一曝光图案; 移动所述第二孔板，使得所述第二图案孔径与所述第一孔板的所述第一孔直接重叠，所述电子束在通过所述第一孔之后通过所述第二图案孔; 在电子束通过第二图案孔之后，用电子束曝光空白掩模版，形成第二曝光图案; 并且显影具有第一和第二曝光图案的空白掩模版，以形成具有第一和第二图案的掩模版。

    Focused ion beam device and focused ion beam processing method
    59.
    发明授权
    Focused ion beam device and focused ion beam processing method 失效
    聚焦离子束装置和聚焦离子束处理方法

    公开(公告)号：US08552397B2

    公开(公告)日：2013-10-08

    申请号：US13513256

    申请日：2010-11-15

    申请人： Yuichi Madokoro ,  Hirokazu Kaneoya ,  Tsuyoshi Onishi ,  Isamu Sekihara

    发明人： Yuichi Madokoro ,  Hirokazu Kaneoya ,  Tsuyoshi Onishi ,  Isamu Sekihara

    IPC分类号： H01J3/28 ,  G21K1/00

    CPC分类号： G21K1/00 ,  H01J37/1478 ,  H01J37/3056 ,  H01J2237/0458 ,  H01J2237/31745

    摘要： Disclosed is an operation for an optical system which achieves observation of focused ion beam processing equivalent to that in a case wherein a sample stage is tilted mechanically. In a focused ion beam optical system, an aperture, a tilting deflector, a beam scanner, and an objective lens are controlled so as to irradiate an ion beam tilted to the optical axis of the optical system, thereby achieving thin film processing and a cross section processing without accompanying adjustment and operation for a sample stage. The thin film processing and the cross section processing with a focused ion beam can be automated, and yield can be improved. For example, by applying the present invention to a cross section monitor to detect an end point, the cross section processing can be easily automated.

    摘要翻译： 公开了一种光学系统的操作，其实现了与样品台机械倾斜的情况相当的聚焦离子束处理的观察。 在聚焦离子束光学系统中，控制孔径，倾斜偏转器，光束扫描器和物镜，以照射倾斜到光学系统的光轴的离子束，由此实现薄膜处理和交叉 部分处理，而不需要对样品台进行调整和操作。 利用聚焦离子束的薄膜处理和横截面加工可以自动化，并且可以提高收率。 例如，通过将本发明应用于截面监视器来检测终点，可以容易地自动化横截面处理。

    FOCUSED ION BEAM APPARATUS AND METHOD OF ADJUSTING ION BEAM OPTICS
    60.
    发明申请
    FOCUSED ION BEAM APPARATUS AND METHOD OF ADJUSTING ION BEAM OPTICS 有权
    聚焦离子束装置和调整离子束光学的方法

    公开(公告)号：US20130240720A1

    公开(公告)日：2013-09-19

    申请号：US13839989

    申请日：2013-03-15

    申请人： HITACHI HIGH-TECH SCIENCE CORPORTION

    发明人： Yasuhiko SUGIYAMA ,  Tatsuya ASAHATA ,  Toshio DOI ,  Hiroshi OBA

    IPC分类号： H01J3/14

    CPC分类号： H01J3/14 ,  H01J37/304 ,  H01J2237/0458 ,  H01J2237/30433 ,  H01J2237/30472 ,  H01J2237/31749

    摘要： Provided is a focused ion beam apparatus including a control portion configured to: store in advance, in a condenser voltage table, a calculation value of a condenser voltage for obtaining a reference beam current for all each of a plurality of apertures; obtain an experimental value of the condenser voltage for obtaining the reference beam current for a reference aperture; obtain a correction value of the condenser voltage by subtracting the calculation value stored for the reference aperture from the experimental value for the reference aperture; obtain setting values of the condenser voltage by adding the correction value to the calculation values stored for each of the plurality of the apertures; and store the obtained setting value in the condenser voltage table.

    摘要翻译： 提供了一种聚焦离子束装置，其包括控制部分，该控制部分被配置为：预先存储在聚光器电压表中的用于获得多个孔中的每一个的参考光束电流的聚光器电压的计算值; 获得用于获得参考光圈的参考光束电流的电容器电压的实验值; 通过从参考孔径的实验值中减去存储在参考孔径上的计算值来获得冷凝器电压的校正值; 通过将所述校正值与对于所述多个孔中的每一个存储的计算值相加来获得所述冷凝器电压的设定值; 并将获得的设定值存储在冷凝器电压表中。