Abstract:
The present invention relates to salts of aryl compounds as discussed below and to methods of manufacture thereof, as well as other subject matter. More particularly, the invention relates to salts useful as intermediates for the synthesis of the cinnamanilide of formula (Y): where Ra is selected from H, OH, C1, C2, C3 or C4 alkyl; and R1 is C1, C2, C3 or C4 alkyl.
Abstract:
A train inspection system by imaging through radiation, having a scanning arm positioned away from the track and supported on a construction base, and vibration damping elements positioned between the scanning arm and the construction base. The system includes a detector bracket with detector arrays mounted thereon, a radiation source, a calibration device, a front collimator, and a rear collimator. The sector-shaped x-rays emitted from the radiation source penetrate through the calibration device, the front collimator, the rear collimator and the train to be inspected sequentially so as to be received by the detector arrays provided on the detector bracket.
Abstract:
Methods and compositions for identifying novel pesticidal gene homologues are provided. Specifically, the methods of the invention comprise systematically designing oligonucleotide primers that are specific for a pesticidal gene of interest and performing successive rounds of PCR amplification of nucleic acid material from a microorganism, particularly a Bacillus thuringiensis strain, to identify novel homologues of known pesticidal genes. Oligonucleotide primers that can be used to practice the present methods are further disclosed.
Abstract:
Improved processes for preparing intermediates useful for preparing antibacterial N-[1-oxo-2-alkyl-3-(N-hydroxyformamido)-propyl}-(carbonylamino-aryl or -heteroaryl)-azacyclo4-7alkanes or thiazacyclo4-7alkanes, which have one or more of the following features: (1) make use of a particular β-lactam intermediate; (2) which make use of a particular resolving agents, enantiomerically pure substituted propionic acids, especially (R)-2-butyl-3-hydroxy-propionic acid; (3) which avoid the use of hydrogen peroxide; and (4) which facilitate selective debenzylation reducing production of waste by-products.
Abstract:
A composition and an associated method for chemical mechanical planarization (or other polishing) are described. The composition includes a stabilizer-metal-vinyl pyridine polymer surface-modified colloidal abrasive (e.g., silica) and an oxidizing agent (e.g., hydrogen peroxide), where the metal is a Fenton's reaction metal. The method includes applying the composition to a substrate to be polished (e.g., chemical-mechanical polishing (CMP)), such as substrates containing tungsten or copper and dielectrics layers that being subjected to tungsten or copper CMP for planarization.
Abstract:
A composition and associated method for chemical mechanical planarization (or other polishing) are described which afford high tantalum to copper selectivity in copper CMP and which are tunable (in relation to polishing performance). The composition comprises an abrasive and an N-acyl-N-hydrocarbonoxyalkyl aspartic acid compound and/or a tolyltriazole derivative.
Abstract:
The present invention discloses a pulling device for a container inspection system including a pulling vehicle (1) arranged inside an inspection passage, a winch (5) and wire tension mechanisms (6,6′). Front and rear ends of the pulling vehicle are connected to a wire rope so as to drive the pulling vehicle to move back and forth inside the inspection passage. The wire rope connected to front and rear ends of the pulling vehicle is wound around a wire tension mechanism arranged at front and rear ends of the inspection passage and is turned around by a swerving pulley (2) which is positioned at the same horizontal plane as that of the wire rope, the pulling vehicle, and the wire tension mechanisms, then the wire rope passes through the vertical pulley block, and finally it is connected to a single winding drum (4) of the winch (5) and wound around the single winding drum (4) respectively. Compared with the prior arts, the present invention is advantageous in reduction in equipment investment and decrease in area occupied by the pulling device. Further, the inspection operation can be carried out more reliably and safely.
Abstract:
A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition comprises an abrasive and a tricine-type or bicine-type compound. The composition possesses high selectivities for removal of copper in relation to tantalum and dielectric materials whilst minimizing local dishing and erosion effects in CMP. The composition may further comprise an oxidizing agent in which case the composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., copper CMP).
Abstract:
The present invention relates to novel Heterocycle-Substituted Tetracyclic Compounds of Formula (I): (I) and pharmaceutically acceptable salts thereof, wherein A, A′, R2 R3 and R5 are as defined herein. The present invention also relates to compositions comprising at least one Heterocycle-Substituted Tetra-cyclic Compound, and methods of using the Heterocycle-Substituted Tetracyclic Compounds for treating or preventing HCV infection in a patient.
Abstract:
The present invention is directed to compounds of Formula I pharmaceutical compositions comprising the same, and their use in the inhibition of HIV protease, the inhibition of HIV replication, the prophylaxis of infection by HIV, the treatment of infection by HIV, and the prophylaxis, treatment, and delay in the onset or progression of AIDS.