公开(公告)号：US20060109290A1

公开(公告)日：2006-05-25

申请号：US11238637

申请日：2005-09-29

申请人： Bassam Shamoun ,  Eugene Mirro ,  Janusz Jozwiak ,  Quanyuan Shang ,  Shinichi Kurita ,  John White

发明人： Bassam Shamoun ,  Eugene Mirro ,  Janusz Jozwiak ,  Quanyuan Shang ,  Shinichi Kurita ,  John White

IPC分类号： B41J29/38

CPC分类号： B41J3/407 ,  B41J2/04505 ,  B41J2/04541 ,  B41J2/04581 ,  B41J2/04588 ,  B41J2/0459 ,  B41J2/04593 ,  B41J2/125 ,  B41J3/28 ,  B41J3/543 ,  B41J25/001 ,  B41J25/003 ,  B41J25/005 ,  B41J29/15 ,  B41J29/393

摘要： The invention provides methods, systems, and drivers for controlling an inkjet printing system. The driver may include logic including a processor, memory coupled to the logic, and a fire pulse generator circuit coupled to the logic. The fire pulse generator may include a connector to facilitate coupling the driver to a print head. The fire pulse generator circuit may also include a fixed current source circuit adapted to generate a fire pulse with a constant slew rate that facilitates easy adjustment of ink drop size. The logic is adapted to receive an image and to convert the image to an image data file. The image data file is adapted to be used by the driver to trigger the print head to deposit ink into pixel wells on a substrate as the substrate is moved in a print direction. Numerous other aspects are disclosed.

公开(公告)号：US20060092218A1

公开(公告)日：2006-05-04

申请号：US11019929

申请日：2004-12-22

申请人： John White ,  Fan Sze ,  Quanyuan Shang ,  Shinichi Kurita ,  Hongbin Ji ,  Janusz Jozwiak ,  Inchen Huang ,  Emanual Beer

发明人： John White ,  Fan Sze ,  Quanyuan Shang ,  Shinichi Kurita ,  Hongbin Ji ,  Janusz Jozwiak ,  Inchen Huang ,  Emanual Beer

IPC分类号： B41J2/15

CPC分类号： B41J25/003 ,  B41J3/407 ,  B41J3/543 ,  G02F1/1303 ,  G02F1/133516

摘要： In a first aspect, a system is provided for inkjet printing. The system includes (1) at least one apparatus for inkjet printing having (a) a first inkjet print head including a first plurality of nozzles adapted to selectively dispense a first ink; (b) a second inkjet print head including a second plurality of nozzles adapted to selectively dispense a second ink; and (c) a set including the first and second print heads arranged such that the set is adapted to dispense the first and second inks into respective adjacent color wells of a display pixel on a substrate during a printing pass; and (2) a stage adapted to support the substrate and transport the substrate below the at least one apparatus for inkjet printing during the printing pass. Numerous other aspects are provided.

摘要翻译： 在第一方面，提供一种用于喷墨打印的系统。 该系统包括（1）至少一种用于喷墨打印的设备，其具有（a）第一喷墨打印头，其包括适于选择性地分配第一墨的第一多个喷嘴; （b）第二喷墨打印头，包括适于选择性地分配第二墨的第二多个喷嘴; 以及（c）包括第一和第二打印头的组合，其被布置成使得该组适于在打印通过期间将第一和第二墨水分配到基板上的显示像素的相应相邻色阱中; 和（2）适于在印刷过程中支撑基材并将基底输送到用于喷墨印刷的至少一个装置下方的载物台。 提供了许多其他方面。

公开(公告)号：US20060054090A1

公开(公告)日：2006-03-16

申请号：US11202654

申请日：2005-08-12

申请人： Shinichi Kurita ,  Ernst Keller ,  John White

发明人： Shinichi Kurita ,  Ernst Keller ,  John White

IPC分类号： C23C16/00

CPC分类号： H01L21/68778 ,  C23C16/4586 ,  H01L21/68742 ,  H01L21/68792

摘要： An apparatus and method for maintaining or adjusting the orientation of a large area substrate is disclosed by using multiple support plates disposed below a susceptor adapted to support the large area substrate. The multiple support plates are supported by a plurality of support shafts that are coupled to at least one actuator. The apparatus is designed to selectively adjust the horizontal cross-sectional profile of the susceptor to promote even and uniform processing. The horizontal profile may be one of planar, concave, or convex. The apparatus allows any adjustment to be made before, during, or after processing.

摘要翻译： 通过使用设置在支撑大面积基板的基座下方的多个支撑板来公开用于维持或调整大面积基板的取向的装置和方法。 多个支撑板由耦合到至少一个致动器的多个支撑轴支撑。 该设备被设计成选择性地调节基座的水平横截面轮廓以促进均匀和均匀的处理。 水平轮廓可以是平面，凹面或凸面之一。 该装置允许在处理之前，期间或之后进行任何调整。

公开(公告)号：US20050179451A1

公开(公告)日：2005-08-18

申请号：US10889695

申请日：2004-07-12

申请人： Matthias Brunner ,  Shinichi Kurita ,  Ralf Schmid ,  Fayez Frank Abboud ,  Benjamin Johnston ,  Paul Bocian ,  Emanuel Beer

发明人： Matthias Brunner ,  Shinichi Kurita ,  Ralf Schmid ,  Fayez Frank Abboud ,  Benjamin Johnston ,  Paul Bocian ,  Emanuel Beer

IPC分类号： G01R31/302 ,  G01R31/26 ,  G01R31/305 ,  G02F1/13 ,  G09G3/00 ,  H01L21/687

CPC分类号： G09G3/006 ,  G01R31/2893 ,  G01R31/305

摘要： An improved prober for an electronic devices test system is provided. The prober is “configurable,” meaning that it can be adapted for different device layouts and substrate sizes. The prober generally includes a frame, at least one prober bar having a first end and a second end, a frame connection mechanism that allows for ready relocation of the prober bar to the frame at selected points along the frame, and a plurality of electrical contact pins along the prober bar for placing selected electronic devices in electrical communication with a system controller during testing. In one embodiment, the prober is be used to test devices such as thin film transistors on a glass substrate. Typically, the glass substrate is square, and the frame is also square. In this way, “x” and “y” axes are defined by the frame.

摘要翻译： 提供了一种用于电子设备测试系统的改进的探测器。 探测器是“可配置的”，这意味着它可以适用于不同的设备布局和基板尺寸。 探测器通常包括框架，至少一个具有第一端和第二端的探测杆，框架连接机构，其允许在沿着框架的选定点准备将探测杆重新定位到框架，以及多个电触点 沿着探测杆的引脚，用于在测试期间将选定的电子设备与系统控制器电连通。 在一个实施例中，探测器用于测试诸如玻璃基板上的薄膜晶体管的器件。 通常，玻璃基板是正方形的，框架也是正方形的。 以这种方式，“x”和“y”轴由框架定义。

公开(公告)号：US06824343B2

公开(公告)日：2004-11-30

申请号：US10084762

申请日：2002-02-22

申请人： Shinichi Kurita ,  Wendell T. Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung T. Nguyen

发明人： Shinichi Kurita ,  Wendell T. Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung T. Nguyen

IPC分类号： B65G4724

CPC分类号： H01L21/68 ,  H01L21/68728 ,  H01L21/68778 ,  H01L21/68792 ,  Y10S414/136 ,  Y10S414/139 ,  Y10S414/141

摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.

摘要翻译： 通常提供用于支撑衬底的方法和装置。 在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。

公开(公告)号：US06585828B1

公开(公告)日：2003-07-01

申请号：US09670481

申请日：2000-09-26

申请人： Shinichi Kurita ,  Wendell T. Blonigan

发明人： Shinichi Kurita ,  Wendell T. Blonigan

IPC分类号： B08B900

CPC分类号： H01L21/687 ,  C23C16/4407 ,  Y10S414/14

摘要： Provided herein is a process chamber lid service system comprising a process chamber lid service cart and a process chamber lid service frame. The lid service frame holds the process chamber lid. The cart and the lid service frame are aligned with guide pin and alignment capture, meanwhile, the cart is aligned at the process chamber with guide frame, which is installed at the base frame of the process chamber. This lid service system may be used for opening/closing a process chamber as well as wet-cleaning the process chamber for semiconductor manufacturing.

摘要翻译： 本文提供的处理室盖服务系统包括处理室盖服务车和处理室盖服务框架。 盖服务框架保持处理室盖。 推车和盖子服务框架与引导销和对准捕获对齐，同时，推车在处理室处与引导框架对齐，该引导框架安装在处理室的基架上。 这种盖子服务系统可用于打开/关闭处理室以及湿式清洁用于半导体制造的处理室。

公开(公告)号：US06517303B1

公开(公告)日：2003-02-11

申请号：US09082484

申请日：1998-05-20

申请人： John M. White ,  Norman L. Turner ,  Robin L. Tiner ,  Ernst Keller ,  Shinichi Kurita ,  Wendell T. Blonigan ,  David E. Berkstresser

发明人： John M. White ,  Norman L. Turner ,  Robin L. Tiner ,  Ernst Keller ,  Shinichi Kurita ,  Wendell T. Blonigan ,  David E. Berkstresser

IPC分类号： B65G133

CPC分类号： H01L21/67748 ,  C03B25/08 ,  C03B29/08 ,  C03B35/142 ,  C03B35/202 ,  C03B2225/02 ,  C03C17/002 ,  F27D3/00 ,  F27D5/00 ,  H01L21/67173 ,  H01L21/67236 ,  Y02P40/57 ,  Y10S414/135 ,  Y10S414/139

摘要： The present invention provides an apparatus and method for substrate transport. In systems according to the invention, at least a first and second chamber are provided. The first chamber may be a load lock and the second chamber a processing chamber. A substrate transfer shuttle is provided and is moveable along a linear path defined by guide rollers between one position in the first chamber and another position in the second chamber. In this way, the substrate may be transferred, in both a forward and a reverse direction, between the first chamber and the second chamber. The substrate transfer shuttle is structured so that a substrate may be removed therefrom by moving a support in one of the chambers from a lowered position to an intermediate position, after which the substrate transfer shuttle may be removed from the chamber.

公开(公告)号：US09691650B2

公开(公告)日：2017-06-27

申请号：US12890281

申请日：2010-09-24

申请人： Shinichi Kurita ,  Takayuki Matsumoto ,  Suhail Anwar ,  Makoto Inagawa

发明人： Shinichi Kurita ,  Takayuki Matsumoto ,  Suhail Anwar ,  Makoto Inagawa

IPC分类号： H01L21/677 ,  H01L21/67

CPC分类号： H01L21/67742 ,  H01L21/67259

摘要： A method and apparatus for a transfer robot that having at least one image sensor disposed thereon is provided. The transfer robot includes a lift assembly having a first drive assembly for moving a first platform relative to a second platform in a first linear direction, an end effector assembly disposed on the second platform and movable in a second linear direction by a second drive assembly, the second linear direction being orthogonal to the first linear direction, at least one image sensor, and a lighting device associated with the at least one image sensor.

公开(公告)号：US09458538B2

公开(公告)日：2016-10-04

申请号：US13349307

申请日：2012-01-12

申请人： Shinichi Kurita ,  Takayuki Matsumoto ,  Robin L. Tiner ,  John M. White ,  Suhail Anwar

发明人： Shinichi Kurita ,  Takayuki Matsumoto ,  Robin L. Tiner ,  John M. White ,  Suhail Anwar

IPC分类号： C23C16/455 ,  C23C16/54

CPC分类号： C23C16/54 ,  C23C16/45517

摘要： A method and apparatus for sealing an opening of a processing chamber are provided. In one embodiment, the invention generally provides a closure member integrated within a wall of a process chamber for sealing an opening within the wall of the chamber. In another embodiment, the invention provides a closure member configured to seal an opening in the wall of a processing chamber from the inside of the chamber.

摘要翻译： 提供一种用于密封处理室的开口的方法和装置。 在一个实施例中，本发明通常提供集成在处理室的壁内的封闭构件，用于密封腔室壁内的开口。 在另一个实施例中，本发明提供了一种封闭构件，其构造成将处理室的壁中的开口与室的内部密封。

公开(公告)号：US09324597B2

公开(公告)日：2016-04-26

申请号：US13098255

申请日：2011-04-29

申请人： Shinichi Kurita ,  Jozef Kudela ,  Suhail Anwar ,  John M. White ,  Dong-Kil Yim ,  Hans Georg Wolf ,  Dennis Zvalo ,  Makoto Inagawa ,  Ikuo Mori

发明人： Shinichi Kurita ,  Jozef Kudela ,  Suhail Anwar ,  John M. White ,  Dong-Kil Yim ,  Hans Georg Wolf ,  Dennis Zvalo ,  Makoto Inagawa ,  Ikuo Mori

IPC分类号： H01J37/32 ,  H01L21/67 ,  C23C16/458 ,  C23C16/46 ,  C23C16/511 ,  C23C16/54 ,  H01L21/677

CPC分类号： H01L21/67712 ,  C23C16/4587 ,  C23C16/46 ,  C23C16/463 ,  C23C16/511 ,  C23C16/54 ,  H01J37/32192 ,  H01J37/3222 ,  H01J37/32513 ,  H01J37/32522 ,  H01J37/32889 ,  H01J37/32899 ,  H01L21/67098 ,  H01L21/67126 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67201

摘要： The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.

摘要翻译： 本发明一般涉及具有能够处理多个基板的处理室的垂直CVD系统。 多个基板设置在处理室内的处理源的相对侧上，但处理环境彼此不隔离。 处理源是水平居中的垂直等离子体发生器，其允许在等离子体发生器的任一侧上同时处理多个基板，但彼此独立。 该系统被布置为双系统，由此两个相同的处理线各自具有它们自己的处理室，彼此相邻布置。 多个机器人用于从处理系统装载和卸载基板。 每个机器人可以访问系统内的两条处理线。