公开(公告)号：US20160303653A1

公开(公告)日：2016-10-20

申请号：US14686313

申请日：2015-04-14

Applicant: HONEYWELL INTERNATIONAL INC.

Inventor： Don Mittendorf ,  Vladimir K. Tolpygo

IPC: B22F1/00 ,  B22F1/02 ,  B22F9/16

CPC classification number: B22F1/0081 ,  B22F1/0003 ,  B22F1/0085 ,  B22F1/02 ,  B22F9/04 ,  B22F9/082 ,  B22F9/16 ,  B22F2999/00 ,  C22C1/0425 ,  C22C1/0433 ,  C22C1/056 ,  C22C1/1036 ,  C22C1/1068 ,  C22C1/1084 ,  C22C32/0026 ,  B22F2201/03 ,  B22F2202/15 ,  C22C1/1078

Abstract: Methods of forming dispersoid hardened metallic materials are provided. In an exemplary embodiment, a method of producing dispersoid hardened metallic materials includes forming a starting composition with a base metal component and a dispersoid forming component. The starting composition includes the base metal component in an amount from about 50 to about 99.999 weight percent and the dispersoid forming component in an amount from about 0.001 to about 1 weight percent, based on the total weight of the starting composition. A starting powder is formed from the starting composition, and the starting powder is fluidized with a fluidizing gas for a period of time sufficient to oxidize the dispersoid forming component to form the dispersoid hardened metallic material. The dispersoid forming component is oxidized while the starting powder is a solid.

Abstract translation: 提供了形成分散硬化金属材料的方法。 在一个示例性实施方案中，生产分散硬化的金属材料的方法包括用贱金属组分和分散质形成组分形成起始组合物。 起始组合物包含约50至约99.999重量％的量的贱金属组分和基于起始组合物总重量的约0.001至约1重量％的分散质形成组分。 起始粉末由起始组合物形成，起始粉末用流化气体流化一段足以氧化分散质形成组分的时间以形成分散固化的金属材料。 分散质形成组分被氧化，而起始粉末是固体。

公开(公告)号：US09394615B2

公开(公告)日：2016-07-19

申请号：US13687512

申请日：2012-11-28

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Ren-Guan Duan ,  Hamid Noorbakhsh ,  Junhan Yuh ,  Dmitry Lubomirsky

IPC: C23F1/08 ,  B05D3/00 ,  B23K10/00 ,  H05K1/05 ,  H01J37/32 ,  C04B41/87 ,  C04B5/00 ,  C04B7/32 ,  C04B18/02 ,  C04B28/06 ,  C04B35/44 ,  C22C32/00 ,  C22C29/12 ,  B32B18/00 ,  C04B41/50 ,  C04B41/00

CPC classification number: C23F1/08 ,  B05D3/002 ,  B23K10/00 ,  B32B18/00 ,  C04B5/00 ,  C04B7/32 ,  C04B18/023 ,  C04B28/06 ,  C04B35/44 ,  C04B41/009 ,  C04B41/50 ,  C04B41/5045 ,  C04B41/87 ,  C22C29/12 ,  C22C32/00 ,  C22C32/0015 ,  C22C32/0021 ,  C22C32/0026 ,  H01J37/321 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32467 ,  H01J37/32477 ,  H01J37/32495 ,  H05K1/053

Abstract: To manufacture a ceramic coated article, at least one surface of a conductive article is roughened to a roughness of approximately 100 micro-inches (μin) to approximately 300 μin. The conductive article may then be heated and coated with a ceramic coating comprising a yttrium containing oxide to a thickness of approximately 10-40 mil.

Abstract translation: 为了制造陶瓷涂层制品，将导电制品的至少一个表面粗糙化至约100微英寸（μin）至约300μin的粗糙度。 然后可以将导电制品加热并用包含含钇的氧化物的陶瓷涂层涂覆至约10-40密耳的厚度。

公开(公告)号：US20160181624A1

公开(公告)日：2016-06-23

申请号：US15057546

申请日：2016-03-01

Applicant: PLANSEE SE

Inventor： MARCO BRANDNER ,  MICHAEL O'SULLIVAN ,  THOMAS LEITER ,  OLIVER HIRSCH ,  WOLFGANG KRAUSSLER

IPC: H01M8/0202 ,  B22F3/16 ,  B22F3/24 ,  B22F5/00 ,  H01M8/1246 ,  C22C32/00 ,  C23C8/10 ,  C23C8/02 ,  C23C8/80 ,  B22F1/00 ,  C22C27/06

CPC classification number: H01M8/0202 ,  B22F1/0003 ,  B22F3/16 ,  B22F3/24 ,  B22F5/006 ,  B22F9/20 ,  B22F2003/242 ,  B22F2005/005 ,  B22F2201/03 ,  B22F2301/20 ,  B22F2998/10 ,  B22F2999/00 ,  C22C1/045 ,  C22C1/08 ,  C22C1/1078 ,  C22C27/06 ,  C22C32/0026 ,  C23C8/02 ,  C23C8/10 ,  C23C8/80 ,  H01M8/0206 ,  H01M8/0247 ,  H01M8/0258 ,  H01M8/026 ,  H01M8/1246 ,  H01M2008/1293 ,  B22F9/04 ,  B22F3/02 ,  B22F3/1007 ,  B22F2201/013

Abstract: A powder metallurgical molding forms an interconnector or an end plate for an electrochemical cell. The molding has a chromium content of at least 80% by weight, a basic shape of a plate and one or more flow fields with structuring formed on one or both of the main faces of the molding. A ratio of a maximum diameter Dmax of the molding, measured along the main face, to a minimum thickness dmin of a core region of the molding which extends along the flow field or fields and is not affected by the structuring lies in a range of 140≦Dmax/dmin≦350.

Abstract translation: 粉末冶金模制形成用于电化学电池的互连器或端板。 该成型体具有至少80重量％的铬含量，板的基本形状和在成型体的一个或两个主面上形成的结构化的一个或多个流场。 沿着主面测量的模制品的最大直径Dmax与沿着流场或场延伸并且不受结构化影响的模制品的芯区域的最小厚度dmin的比率在140＆lt; 1E ; Dmax / dmin＆nlE; 350。

公开(公告)号：US20160023277A1

公开(公告)日：2016-01-28

申请号：US14121613

申请日：2014-09-24

Applicant: Iowa State University Research Foundation, Inc.

Inventor： Joel R. Rieken ,  Andrew J. Heidloff ,  Iver E. Anderson

IPC: B22F9/08 ,  C22C38/06 ,  C22C38/00 ,  C22C38/22

CPC classification number: B22F9/082 ,  B22F1/02 ,  B22F2009/0892 ,  C22C32/0026 ,  C22C38/002 ,  C22C38/005 ,  C22C38/06 ,  C22C38/22

Abstract: A concentric ring gas atomization nozzle with isolated gas supply manifolds is provided for manipulating the close-coupled atomization gas structure to improve the yield of atomized powders.

Abstract translation: 提供具有隔离气体供应歧管的同心环形气体雾化喷嘴，用于操纵紧密耦合的雾化气体结构，以提高雾化粉末的产率。

公开(公告)号：US20160017464A1

公开(公告)日：2016-01-21

申请号：US14334742

申请日：2014-07-18

Applicant: General Electric Company

Inventor： Shenyan Huang ,  Richard Didomizio ,  Raul Basilio Rebak

IPC: C22C33/02 ,  B22F3/15 ,  C22C38/22 ,  B22F9/04 ,  B22F3/17 ,  B22F3/20 ,  B22F3/14 ,  B22F3/24

CPC classification number: C22C33/0285 ,  B22F3/15 ,  B22F3/17 ,  B22F3/20 ,  B22F3/24 ,  B22F2207/01 ,  B22F2998/10 ,  C22C32/0026 ,  C22C33/0228 ,  C22C38/001 ,  C22C38/005 ,  C22C38/22 ,  C22C38/28 ,  F16C33/121 ,  F16C2204/70 ,  F16C2240/40 ,  F16C2300/42 ,  B22F9/04 ,  B22F3/14 ,  B22F2003/248

Abstract: An article and method of forming the article are disclosed. The article has a surface comprising a nanostructured ferritic alloy. The surface includes a plurality of nanofeatures that include complex oxides of yttrium and titanium disposed in an iron-bearing alloy matrix. The iron-bearing alloy matrix at the surface includes about 5 weight percent to about 30 weight percent of chromium, and about 0.1 weight percent to about 10 weight percent of molybdenum. Further, a concentration of a chi phase or a sigma phase in the nanostructured ferritic alloy at the surface is less than about 5 volume percent. The method generally includes the steps of milling, thermo-mechanically consolidating, annealing, and then cooling at a rate that hinders the formation of chi and sigma phases in the nanostructured ferritic alloy at the surface.

Abstract translation: 公开了形成物品的制品和方法。 该制品具有包括纳米结构的铁素体合金的表面。 表面包括多个纳米尺度，其包括设置在含铁合金基体中的钇和钛的复合氧化物。 表面上的含铁合金基质包括约5重量％至约30重量％的铬和约0.1重量％至约10重量％的钼。 此外，纳米结构的铁素体合金在表面处的chi相或σ相的浓度小于约5体积％。 该方法通常包括以阻止在表面的纳米结构的铁素体合金中形成i相和σ相的速率铣削，热机械固结，退火，然后冷却的步骤。

公开(公告)号：US20150198052A1

公开(公告)日：2015-07-16

申请号：US14592182

申请日：2015-01-08

Applicant: ALSTOM Technology Ltd

Inventor： Mikhail PAVLOV ,  Matthias HOEBEL ,  Felix ROERIG ,  Julius SCHURB

IPC: F01D5/28 ,  B23K26/34 ,  F01D25/00 ,  B28B1/00

CPC classification number: F01D5/284 ,  B22F3/1055 ,  B22F5/009 ,  B22F5/04 ,  B22F2003/1057 ,  B23K26/082 ,  B23K26/32 ,  B23K26/342 ,  B23K2101/001 ,  B23K2103/02 ,  B23K2103/26 ,  B23K2103/50 ,  B23K2103/52 ,  B28B1/001 ,  B33Y10/00 ,  B33Y80/00 ,  C04B35/64 ,  C04B35/653 ,  C04B2235/665 ,  C22C32/0026 ,  F01D25/005 ,  F05D2230/31 ,  F23R3/002 ,  F23R2900/00018 ,  Y02P10/295

Abstract: The invention refers to a method for selective laser melting additive manufacturing a three-dimensional metallic or ceramic article/component entirely or partly. The method includes successively building up said article/component layer by layer directly from a powder bed of a metallic or ceramic base material by means of remelting the layers with a high energy laser beam, moving repetitively across the areas, which are to be solidified. The movement of the laser beam is made of a superposition of a continuous linear movement and at least one superimposed oscillation with a determined frequency and amplitude. The oscillation is created by a beam deflection device and the same beam deflection device is also used for linear positioning movement.

Abstract translation: 本发明涉及一种完全或部分制造三维金属或陶瓷制品/部件的选择性激光熔融添加剂的方法。 该方法包括通过用高能量激光束重新熔化层，直接从金属或陶瓷基材的粉末床层逐层地建立所述制品/部件，重复地移动穿过待固化的区域。 激光束的移动由连续线性运动和至少一个具有确定的频率和幅度的重叠振荡的叠加构成。 振荡由光束偏转装置产生，同样的光束偏转装置也用于线性定位运动。

公开(公告)号：US20140087325A1

公开(公告)日：2014-03-27

申请号：US14088937

申请日：2013-11-25

Applicant: TERUMO KABUSHIKI KAISHA

Inventor： Ryoichi SOBA

IPC: A61F2/01 ,  A61F2/82 ,  A61M25/09 ,  A61B17/12 ,  A61C7/20

CPC classification number: A61F2/013 ,  A61B17/12113 ,  A61C7/20 ,  A61F2/82 ,  A61L31/124 ,  A61L31/14 ,  A61L2400/16 ,  A61L2430/36 ,  A61M25/09 ,  B22F3/20 ,  B22F2998/10 ,  C22C1/10 ,  C22C32/001 ,  C22C32/0021 ,  C22C32/0026 ,  C22C32/0031 ,  B22F9/04 ,  C22C1/05 ,  B22F3/10

Abstract: A composite material for medical devices includes a superelastic shape memory alloy configured or constituting a matrix and a metal oxide which is dispersed in the matrix.

Abstract translation: 用于医疗装置的复合材料包括配置或构成基质的超弹性形状记忆合金和分散在基质中的金属氧化物。

公开(公告)号：US20130248362A1

公开(公告)日：2013-09-26

申请号：US13990109

申请日：2011-10-19

Applicant: Shin-ichi Ogino ,  Atsushi Nara ,  Hideo Takami

Inventor： Shin-ichi Ogino ,  Atsushi Nara ,  Hideo Takami

IPC: C23C14/34 ,  B22F3/14

CPC classification number: C23C14/3414 ,  B22F3/14 ,  C22C5/04 ,  C22C19/07 ,  C22C32/0026 ,  C22C33/0292 ,  C22C2202/02 ,  G11B5/851 ,  H01F41/183

Abstract: A sputtering target for a magnetic recording film containing SiO2, wherein a peak strength ratio of a (011) plane of quartz relative to a background strength (i.e. quartz peak strength/background strength) in an X-ray diffraction is 1.40 or more. An object of this invention is to obtain a sputtering target for a magnetic recording film capable of inhibiting the formation of cristobalites in the target which cause the generation of particles during sputtering, shortening the burn-in time, magnetically and finely separating the single-domain particles after deposition, and improving the recording density.

Abstract translation: 用于含有SiO 2的磁记录膜的溅射靶，其中，在X射线衍射中，石英相对于背景强度（即石英峰强度/背景强度）的（011）面的峰强度比为1.40以上。 本发明的目的是获得能够抑制溅射中产生颗粒的目标中形成方英石的磁记录膜的溅射靶，缩短烧结时间，磁性和细分离单畴 沉积后的颗粒，并提高记录密度。

公开(公告)号：US20130202792A1

公开(公告)日：2013-08-08

申请号：US13366048

申请日：2012-02-03

Applicant: Arunkumar Shamrao WATWE ,  Yuk-Chiu Lau

Inventor： Arunkumar Shamrao WATWE ,  Yuk-Chiu Lau

IPC: B05D3/12 ,  C09D1/00

CPC classification number: C22C1/1084 ,  B22F5/04 ,  B23C2222/61 ,  C01P2004/80 ,  C01P2004/90 ,  C22C32/0026 ,  C22C33/02 ,  C23C4/067 ,  C23C4/073 ,  C23C24/04 ,  Y10T428/12028 ,  Y10T428/12056 ,  Y10T428/12139

Abstract: Provided is bond coating powder and method of making. The method includes providing a powder including a plurality of parent particles. The method includes providing a plurality of dispersoids. The method includes mechanically alloying the powder and the plurality of dispersoids at ambient temperature. The mechanical alloying operable to provide a selective occupation of the plurality of dispersoids in a grain boundary area of the plurality of parent particles providing the bond coating powder. The plurality of dispersoids occupy about 18 percent to about 30 percent of the grain boundary area of the bond coating powder.

Abstract translation: 提供粘结涂层粉末和制造方法。 该方法包括提供包含多个母体颗粒的粉末。 该方法包括提供多个分散体。 该方法包括在环境温度下将粉末和多种分散体机械合金化。 所述机械合金化可操作以在提供所述粘结涂层粉末的多个母体颗粒的晶界区域中提供对所述多个分散体的选择性占据。 多个分散体占粘结涂层粉末的晶界面积的约18％至约30％。

公开(公告)号：US20130134038A1

公开(公告)日：2013-05-30

申请号：US13814776

申请日：2011-01-28

Applicant: Atsushi Sato ,  Hideo Takami

Inventor： Atsushi Sato ,  Hideo Takami

IPC: C23C14/34

CPC classification number: C23C14/3414 ,  B22F1/0059 ,  B22F3/14 ,  B22F2999/00 ,  C22C19/07 ,  C22C32/0026 ,  G11B5/851 ,  H01F1/068 ,  H01F41/183 ,  B22F9/04

Abstract: A ferromagnetic material sputtering target which is a sintered compact sputtering target made of a metal having Co as its main component, and nonmetallic inorganic material particles, wherein a plurality of metal phases having different saturated magnetization exist, and the nonmetallic inorganic material particles are dispersed in the respective metal phases. By increasing the pass-through flux of the sputtering target, it is possible to obtain a stable discharge. Moreover, it is also possible to obtain a ferromagnetic material sputtering target capable of obtaining a stable discharge in a magnetron sputtering device and which has a low generation of particles during sputtering. Thus, this invention aims to provide a ferromagnetic material sputtering target for use in the deposition of a magnetic thin film of a magnetic recording medium, and particularly of a magnetic recording layer of a hard disk adopting the perpendicular magnetic recording system.

Abstract translation: 作为以Co为主要成分的金属制烧结体型溅射靶的铁磁材料溅射靶以及存在不饱和磁化的多个金属相的非金属无机材料粒子，将非金属无机材料粒子分散在 相应的金属相。 通过增加溅射靶的通过通量，可以获得稳定的放电。 此外，还可以获得能够在磁控溅射装置中获得稳定放电并且在溅射期间具有低产生颗粒的铁磁材料溅射靶。 因此，本发明的目的在于提供一种用于沉积磁记录介质的磁性薄膜的铁磁材料溅射靶，特别是采用垂直磁记录系统的硬盘的磁记录层。