公开(公告)号：US20070211232A1

公开(公告)日：2007-09-13

申请号：US10578752

申请日：2004-11-10

申请人： Alton Phillips ,  Michael Sogard ,  Douglas Watson ,  Keiichi Tanaka

发明人： Alton Phillips ,  Michael Sogard ,  Douglas Watson ,  Keiichi Tanaka

IPC分类号： G03B27/52

CPC分类号： G03F7/70741 ,  G03B27/52 ,  G03F1/82 ,  G03F7/70875 ,  G03F7/70916

摘要： Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected while in storage, through various stages of transportation via a reticle handler (also referred to as an end-effector), to its period of use while attached to a reticle chuck.

摘要翻译： 在光刻系统内进行热电泳以保护掩模版免受污染物（例如浮动颗粒）的影响。 通常，通过将掩模版保持在比周围环境更高的温度下来实现热保护。 在光刻系统中使用的掩模版可以保持热保护。 例如，在通过分划板处理器（也称为末端执行器）的各种运输阶段到存储期间，在将光罩保持在其使用期间，同时附着于标线盘卡盘上，可以对掩模版进行热保护。

公开(公告)号：US20070086727A1

公开(公告)日：2007-04-19

申请号：US10596109

申请日：2005-07-21

申请人： Keiichi Tanaka ,  Hidetaka Ohto ,  Masahiro Oashi

发明人： Keiichi Tanaka ,  Hidetaka Ohto ,  Masahiro Oashi

IPC分类号： H04N7/00

CPC分类号： H04N9/87 ,  G11B27/105 ,  G11B27/11 ,  G11B27/329 ,  G11B2220/2516 ,  G11B2220/2541

摘要： A playback apparatus for playing a digital stream in conjunction with an application includes a package management unit operable to generate package information by merging files recorded on a first recording medium and a second recording medium, in accordance with merge management information, and a selection unit operable to detect a plurality of playable titles from the package information, and select one of the detected titles as a current title. After the application requests the package management unit to update the merge management information, by specifying new merge management information, the package management unit changes a file referenced from the newly specified merge management information to read-only before updating the package information, and at a point at which digital stream playback stops due to a current title change by the selection unit, the package management unit generates new package information by combining files recorded on the first and second recording media, in accordance with the newly specified merge management information.

摘要翻译： 一种用于与应用程序一起播放数字流的播放装置包括一个包管理单元，用于根据合并管理信息合并记录在第一记录介质和第二记录介质上的文件来生成包信息，以及可操作的选择单元 从包信息中检测多个可播放标题，并且将检测到的标题之一选择为当前标题。 在应用程序请求包管理单元更新合并管理信息之后，通过指定新的合并管理信息，包管理单元在更新包信息之前将从新指定的合并管理信息引用的文件改变为只读，并且在 由于选择单元由于当前标题改变而停止数字流播放的点，包管理单元根据新指定的合并管理信息，通过组合记录在第一和第二记录介质上的文件来生成新的包信息。

公开(公告)号：US20060104419A1

公开(公告)日：2006-05-18

申请号：US11066034

申请日：2005-02-25

申请人： Norio Sasayama ,  Keiichi Tanaka

发明人： Norio Sasayama ,  Keiichi Tanaka

IPC分类号： G21K1/00

CPC分类号： G01N23/207 ,  G01N2223/1016 ,  G01N2223/316

摘要： A superconducting X-ray analyzer has an excitation source for irradiating an excitation beam on a surface of a sample. A detector detects X-rays reflected from the surface of the sample irradiated with the excitation beam from the excitation source. Lenses are arranged between the sample and the detector for condensing the X-rays reflected from the surface of the sample on the detector. A refrigerator having a low temperature unit is completely enclosed within a vacuum vessel for cooling the detector.

摘要翻译： 超导X射线分析仪具有用于在样品的表面上照射激发光束的激发源。 检测器检测从来自激发源的激发光束照射的样品的表面反射的X射线。 透镜布置在样品和检测器之间，用于将从样品表面反射的X射线聚集在检测器上。 具有低温单元的冰箱完全封闭在真空容器内以冷却检测器。

公开(公告)号：US06991385B2

公开(公告)日：2006-01-31

申请号：US10943840

申请日：2004-09-20

申请人： Kousuke Yoshihara ,  Keiichi Tanaka ,  Taro Yamamoto ,  Hideharu Kyouda ,  Hirofumi Takeguchi ,  Atsushi Ookouchi

发明人： Kousuke Yoshihara ,  Keiichi Tanaka ,  Taro Yamamoto ,  Hideharu Kyouda ,  Hirofumi Takeguchi ,  Atsushi Ookouchi

IPC分类号： G03D5/00 ,  G03D5/04

CPC分类号： H01L21/6715 ,  G03D3/06 ,  G03F7/3021

摘要： In a developing processing of a wafer having a resist film low in the dissolving rate in a developing solution formed thereon and subjected to an exposure treatment, a developing solution of a low concentration is supplied first onto a wafer and the wafer is left to stand for a prescribed time to permit a developing reaction to proceed, followed by further supplying a developing solution having a concentration higher than that of the developing solution supplied first onto the wafer, leaving the substrate to stand and subsequently rinsing the wafer, thereby improving the uniformity of the line width in the central portion and the peripheral portion of the wafer.

公开(公告)号：US20050115352A1

公开(公告)日：2005-06-02

申请号：US11030155

申请日：2005-01-07

申请人： Keiichi Tanaka

发明人： Keiichi Tanaka

IPC分类号： B25J9/04 ,  B25J9/12 ,  B25J18/04 ,  G01N35/04 ,  G03F7/20 ,  H02K7/02 ,  H02K7/04 ,  H02K7/116 ,  H02K7/14 ,  H02K11/00 ,  H02K16/02 ,  H02K21/12 ,  H02K26/00 ,  H02K41/035 ,  H02K5/24 ,  B25J17/02

CPC分类号： B25J9/042 ,  B25J9/126 ,  B25J18/04 ,  B82Y10/00 ,  B82Y40/00 ,  G01N2035/0475 ,  G03F7/7075 ,  G03F7/70766 ,  H01J37/3174 ,  H01J37/32743 ,  H01J2237/204 ,  H02K7/02 ,  H02K7/04 ,  H02K7/116 ,  H02K7/14 ,  H02K11/01 ,  H02K16/02 ,  H02K16/025 ,  H02K21/12 ,  H02K26/00 ,  H02K41/0356 ,  Y02E60/16 ,  Y10T74/20317

摘要： An apparatus that reduces vibration generation and magnetic leakage, wherein the apparatus is a motor, an articulated serial robot that has a motor built in, a substrate loader that includes the articulated robot, and a related exposure apparatus equipped with the substrate loader. The motor includes a drive shaft to drive the motor; a rotor attached with the shaft; and a stator that opposes the rotor and causes an electromagnetic force to act between the rotor and the stator to drive the drive shaft; an RC stator, for reaction force cancellation attached with the stator; an RC rotor for reaction force cancellation, opposing the RC stator; and a counterweight sleeve attached with the RC rotor, wherein the reaction force, which is applied to the stator via the drive shaft when the counterweight sleeve rotates in a direction opposite that of the drive shaft, is cancelled.

摘要翻译： 一种减少振动产生和磁泄漏的装置，其中该装置是电动机，具有内置电动机的铰接串联机器人，包括铰接式机器人的基板装载器以及配备有基板装载器的相关曝光装置。 马达包括驱动马达的驱动轴; 与轴连接的转子; 以及定子，其与所述转子相对并引起电磁力在所述转子和所述定子之间作用以驱动所述驱动轴; RC定子，用于与定子相连的反作用力消除; 用于反作用力抵消的RC转子，与RC定子相对; 以及安装有RC转子的配重套筒，其中当配重套筒沿与驱动轴的方向相反的方向旋转时，通过驱动轴施加到定子的反作用力被取消。

公开(公告)号：US06885430B2

公开(公告)日：2005-04-26

申请号：US10458373

申请日：2003-06-11

申请人： Keiichi Tanaka ,  Mike Binnard ,  Andrew J. Hazelton

发明人： Keiichi Tanaka ,  Mike Binnard ,  Andrew J. Hazelton

IPC分类号： G03B27/62 ,  G03F7/20 ,  G03B27/32 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/707 ,  G03B27/62 ,  G03F7/70708 ,  G03F7/70766 ,  G03F7/709

摘要： A stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. The control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. The timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly.

摘要翻译： 舞台组件包括舞台基座，舞台，舞台动子组件，反作用组件，反作用动力组件和控制系统。 平台移动器组件相对于舞台底座移动舞台。 反应物料组件减少由载物台组件产生的反应力，这些反作用力被传递到载物台底部。 反应动子组件调整反应物料组件相对于载物台的位置。 控制系统以最小化由反应动子组件产生在舞台组件上的扰动的影响的方式来控制和引导电流到反应动子组件。 改变来自引导到反应动子组件的控制系统的时间和/或电流量，以最小化由反应动子组件产生在舞台组件上的干扰的影响。

公开(公告)号：US06838808B2

公开(公告)日：2005-01-04

申请号：US10360886

申请日：2003-02-07

申请人： Keiichi Tanaka

发明人： Keiichi Tanaka

IPC分类号： G03F9/00 ,  G03F7/20 ,  H01J37/20 ,  H01L21/027 ,  H01L21/68 ,  H01L41/09 ,  H02N2/00 ,  H01L41/08

CPC分类号： H02N2/021 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  H01J37/20 ,  H01J2237/20264 ,  H01L41/0913 ,  H02N2/028

摘要： Stage devices are disclosed having especial utility in certain types of microlithography systems. The stage devices impart controlled motion to a stage or platform without generating fluctuating electromagnetic fields. The stage devices include stage-actuators that do not rely on electromagnetics for operation. Multiple stage-actuators achieve motion of a slider relative to a guide bar. Each stage-actuator includes at least two actuator-portions that collectively provide an “inchworm” walking manner of motion of the slider relative to the guide bar. Each actuator-portion includes a respective pressure-application member. The pressure-application members are selectively actuated so as to engage a respective guide bar in a coordinated manner that serves to “push” the slider along the guide bar. Each actuator-portion includes a respective first piezoelectric element that urges the respective pressure-application member against the guide bar and retracts the pressure-application member from the guide bar, and a respective second piezoelectric element that moves the respective pressure-application member in the longitudinal direction of the guide bar.

摘要翻译： 公开了在某些类型的微光刻系统中具有特别实用性的舞台装置。 舞台装置将控制的运动传递到舞台或平台，而不产生波动的电磁场。 舞台装置包括不依靠电磁学操作的舞台致动器。 多级致动器实现滑块相对于导杆的运动。 每个级致动器包括至少两个致动器部分，其共同地提供滑块相对于引导杆的“蚯蚓”行走方式的运动。 每个致动器部分包括相应的压力施加构件。 压力施加构件被选择性地致动以便以协调的方式接合相应的导杆，用于沿着导杆“推动”滑块。 每个致动器部分包括相应的第一压电元件，所述第一压电元件将相应的压力施加部件推压在引导杆上并使压力施加部件从引导杆缩回，并且相应的第二压电元件使相应的压力施加部件移动到 导杆的纵向。

公开(公告)号：US06721041B2

公开(公告)日：2004-04-13

申请号：US10314140

申请日：2002-12-09

申请人： Keiichi Tanaka

发明人： Keiichi Tanaka

IPC分类号： G03B2758

CPC分类号： G03F7/70733 ,  G03F7/70716 ,  G03F7/70758

摘要： A stage device includes a first stationary member, a second stationary member, a moving member and positioning devices. The first stationary member extends in a first direction. The second stationary member extends in the first direction and is spaced apart from the first stationary member in a second direction perpendicular to the first direction. The moving member can cooperate with the first stationary member and with the second stationary member. The positioning devices selectively position the moving member into cooperation with one of the first and second stationary members without physically contacting the moving member with the first and second stationary members. In addition, a stage device provided with a moving member that can move within a two-dimensional plane having a first direction and a second direction perpendicular to the first direction includes a first stationary member and a second stationary member. The first stationary member extends in the first direction and is supported at a first position in a third direction that is perpendicular to the two-dimensional plane. The second stationary member extends in the first direction and is supported at a second position in the third direction, different from the first position. The moving member has a first part that can cooperate with the first stationary member, and a second part that can cooperate with the second stationary member. When two stages are replaced, generation of a positional shift on an object on the stages is prevented, and separate processing can be performed simultaneously with respect to objects on the stages.

摘要翻译： 舞台装置包括第一固定构件，第二固定构件，移动构件和定位装置。 第一固定构件沿第一方向延伸。 第二固定构件在第一方向上延伸并且在垂直于第一方向的第二方向上与第一固定构件间隔开。 移动构件可以与第一固定构件和第二固定构件配合。 定位装置选择性地将移动构件定位成与第一和第二固定构件中的一个配合，而不使移动构件与第一和第二固定构件物理接触。 此外，设置有能够在具有第一方向和与第一方向垂直的第二方向的二维平面内移动的移动构件的平台装置包括第一固定构件和第二静止构件。 第一固定构件在第一方向上延伸并且被支撑在垂直于二维平面的第三方向上的第一位置处。 第二固定构件在第一方向上延伸并且在与第一位置不同的第三方向上的第二位置被支撑。 移动构件具有可与第一固定构件配合的第一部分和可与第二固定构件配合的第二部分。 当更换两个阶段时，防止在阶段上的对象上的位置偏移的产生，并且可以相对于阶段上的对象同时执行单独的处理。

公开(公告)号：US06693284B2

公开(公告)日：2004-02-17

申请号：US09971506

申请日：2001-10-04

申请人： Keiichi Tanaka

发明人： Keiichi Tanaka

IPC分类号： G21K510

CPC分类号： G03F7/70691 ,  G03B27/42

摘要： Stage apparatus are disclosed that include a table that can be driven with multiple degrees of freedom without disturbing any neighboring magnetic fields. Hence, such stage apparatus can be used in charged-particle-beam microlithography apparatus without compromising accuracy and precision of a lithography process being conducted on the substrate by the charged particle beam. From downstream to upstream, a representative stage assembly comprises a first (“lower”) stage driven by a respective linear motor along the Y-axis, a frame that can be rotated by a piezo actuator in the &thgr;Z direction, a second (upper) stage driven by a respective linear motor along the X-axis, and a table driven by multiple piezo actuators in the &thgr;X, &thgr;Y, and Z directions. A wafer table, on which a substrate can be mounted, is attached to the “upper” surface of the table. The stage assembly allows motion of the wafer table with six degrees of freedom.

摘要翻译： 公开了包括能够以多个自由度驱动而不干扰任何相邻磁场的工作台的平台装置。 因此，这种平台装置可以用于带电粒子束微光刻设备中，而不损害通过带电粒子束在衬底上进行的光刻工艺的精度和精度。 从下游到上游，代表级组件包括由相应的线性电动机沿着Y轴驱动的第一（“下”）级，可以通过压电致动器在θZ方向上旋转的框架，第二（上） 沿着X轴由相应的线性电动机驱动的平台，以及由θX，θY和Z方向上的多个压电致动器驱动的工作台。 可以在其上安装基板的晶片台附接到工作台的“上”表面。 台架组件允许晶片台具有六个自由度的运动。

公开(公告)号：US06648503B2

公开(公告)日：2003-11-18

申请号：US09760030

申请日：2001-01-12

申请人： Keiichi Tanaka ,  Toshimitsu Morooka

发明人： Keiichi Tanaka ,  Toshimitsu Morooka

IPC分类号： G01K1702

CPC分类号： G01K17/006 ,  G01J5/20 ,  G01K17/003 ,  Y10T29/49002

摘要： A colorimeter has an absorber for absorbing radiation energy and converting the radiation energy into thermal energy. A resistor is connected to the absorber for converting thermal energy into an electrical signal. A membrane is connected to the resistor for controlling a thermal discharge from the resistor. A substrate is connected to the membrane and has a tri-layer structure comprised of an etching layer having a preselected thickness, an etching stop layer and a support substrate. The membrane is spaced-apart from a main surface of the etching stop layer by the preselected thickness of the etching layer.

摘要翻译： 色度计具有用于吸收辐射能并将辐射能转换成热能的吸收体。 电阻器连接到吸收器，用于将热能转换成电信号。 膜连接到电阻器，用于控制来自电阻器的热放电。 衬底连接到膜并且具有由具有预选厚度的蚀刻层，蚀刻停止层和支撑衬底组成的三层结构。 膜通过蚀刻层的预选厚度与蚀刻停止层的主表面间隔开。