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    Spin coater
    72.
    发明申请
    Spin coater 审中-公开
    旋涂机

    公开(公告)号：US20030079679A1

    公开(公告)日：2003-05-01

    申请号：US10021317

    申请日：2001-10-30

    Inventor： Toru Ikeda ,  Lily Pang

    IPC: B05C011/02 ,  B05C013/00

    CPC classification number: H01L21/6715

    Abstract: Within a container b 2 of a spin coater 1, a rotatable support table 4 for supporting a wafer W and an arm 6 for dropping a chemical liquid onto the wafer W are arranged. Also, the spin coater 1 comprises a gas introducing path 12 for introducing a laminar flow forming gas into the container 2. The gas introducing path 12 has a glass filter 13 provided in an upper part of the container 2, whereas the laminar flow forming gas is introduced into the container 2 by way of the glass filter 13. The container 2 is provided with a wall portion 15 formed so as to continuously spread like a curve downward from a lower end edge part of the glass filter 13. As a consequence, a downflow of the laminar flow forming gas occurs in the whole horizontal section of the region surrounded by the wall portion 15 within the container 2, thereby reliably preventing turbulent flows from occurring.

    Abstract translation: 在旋转涂布机1的容器b 2中，布置有用于支撑晶片W的可旋转支撑台4和用于将化学液滴落到晶片W上的臂6。 此外，旋转涂布机1包括用于将层流形成气体引入容器2的气体导入路径12.气体导入路径12具有设置在容器2的上部的玻璃过滤器13，而层流形成气体 通过玻璃过滤器13被引入到容器2中。容器2设置有壁部分15，其形成为从玻璃过滤器13的下端边缘部分向下延伸的曲线。因此， 在由容器2内的壁部15包围的区域的整个水平截面中发生层流形成气体的下降，从而可靠地防止发生湍流。

    Apparatus and method for efficiently producing high quality laminating substrates using liquid laminates and a resulting laminated product thereof
    73.
    发明申请
    Apparatus and method for efficiently producing high quality laminating substrates using liquid laminates and a resulting laminated product thereof 审中-公开

    公开(公告)号：US20030017310A1

    公开(公告)日：2003-01-23

    申请号：US09811066

    申请日：2001-03-16

    Inventor： Steve Young

    IPC: B32B015/08 ,  B32B027/00 ,  B32B027/06 ,  B32B027/08 ,  B32B027/10 ,  B32B027/16 ,  B05D001/02 ,  B05D001/30 ,  B05D003/00 ,  B05D003/06 ,  B05C011/00 ,  B05C013/00

    CPC classification number: B29C35/0277 ,  B05D3/067 ,  B29C2035/0827 ,  Y10T428/24802 ,  Y10T428/2495 ,  Y10T428/31678 ,  Y10T428/31786 ,  Y10T428/31855 ,  Y10T428/31993

    Abstract: The present invention comprises a wicket conveyor for conveying a series of wickets through pre-curing, curing and post-curing sections of a curing system. The wicket conveyor forms a continuous loop, having a straight upper track portion, a straight lower track portion and a pair of curved end portions of track that adjoin each end of the straight upper and lower track potions. Each wicket is attached to the wicket conveyor track such that the plane of the wicket is oriented at a predetermined angle. B wicket picks up a horizontally oriented sheet and carries it toward the pre-curing section. The wicket and substrate sheet are reoriented in response to the contour of the conveyor, into a near vertical planar orientation. While in the near vertical orientation, liquid coatings on the surface of the sheet substrate move down the substrate sheet in nullsheet flow,null thereby leaving a smooth coating surface prior to curing. Wickets and the substrate sheets riding the wickets are approximately parallel with one another and closely spaced in straight portions of the conveyor, such as the space during pre- and post-curing sections. Bs a wicket enters the curing section, it follows the contour of the track around the distil end of the conveyor. That wicket falls away from the next wicket on the track, thereby opening a gap between the adjacent wickets. Bt this point, both wickets and sheets are irradiated with UV rays, causing UV curable laminates to be cured on the front, rear and sides of the substrate sheets as well as all parts of the wicket conveyor and wickets. Prior to entering the post-curing section, the wicket and substrate sheet are once again reoriented into a near vertical planar orientation and approximately parallel with other wickets in the post-curing section. In the post-curing section, excess latent heat is disputed from the sheets. The sheets are then unloaded for subsequent processing.

    Door positioning article
    74.
    发明申请
    Door positioning article 失效
    门定位物

    公开(公告)号：US20030015135A1

    公开(公告)日：2003-01-23

    申请号：US09910965

    申请日：2001-07-23

    Inventor： Howard Baisch

    IPC: B05C013/00

    CPC classification number: E05C21/005 ,  B05B13/0292 ,  B05B13/0452 ,  E05B17/0012 ,  E05C17/52

    Abstract: A door positioning article positions a door of a motor vehicle in an ajar position with respect to the motor vehicle during coating steps of manufacture. The door positioning article includes a base. An extension is secured to the base for fastening the door positioning article to the motor vehicle. A retainer extends out from the base and holds the door in the ajar position with respect to the motor vehicle and the door positioning article. A spring extends between the base and the retainer for allowing the door to pass over the retainer and for forcing the retainer through an orifice in the door providing the defined ajar position.

    Abstract translation: 在制造的涂布步骤期间，门定位物将机动车辆的门定位在相对于机动车辆的四边形位置。 门定位件包括底座。 将延伸部固定到基座，用于将门定位物件紧固到机动车辆。 保持架从基座延伸出来并将门保持在相对于机动车辆和门定位物品的四边形位置。 弹簧在基座和保持器之间延伸，以允许门经过保持器并且迫使保持器穿过门中的孔，从而提供限定的空气位置。

    Plasma-assisted processing apparatus
    75.
    发明申请
    Plasma-assisted processing apparatus 失效
    等离子体辅助处理装置

    公开(公告)号：US20020104482A1

    公开(公告)日：2002-08-08

    申请号：US10061168

    申请日：2002-02-04

    Inventor： Hideyuki Kazumi ,  Manabu Edamura ,  Kazuyuki Ikenaga ,  Atsushi Ootake

    IPC: B05C013/00

    CPC classification number: H01J37/32082

    Abstract: A plasma-assisted processing apparatus comprises: a vacuum vessel defining a processing chamber, a gas supply line for carrying gases into the processing chamber, a workpiece support for supporting a workpiece, disposed in the processing chamber and serving as an electrode, a disk antenna for radiating a high-frequency wave of a frequency in the VHF or the UHF band into the processing chamber, a high-frequency waveguide for guiding a high-frequency wave to the disk antenna, and a window of a dielectric material isolating the disk antenna from the processing chamber. A conductive ring is disposed between the disk antenna and the window such that its end surface is in contact with a peripheral part of the disk antenna.

    Abstract translation: 等离子体辅助处理装置包括：定义处理室的真空容器，用于将气体输送到处理室中的气体供给管线，用于支撑工件的工件支撑件，设置在处理室中并用作电极，盘式天线 用于将VHF或UHF频带中的频率的高频波辐射到处理室中，用于将高频波引导到盘形天线的高频波导和隔离盘天线的电介质材料的窗口 从处理室。 导电环设置在盘状天线和窗口之间，使得其端面与盘形天线的周边部分接触。

    Method of fabricating thin magnetic film and electrolytic plating apparatus for fabricating thin magnetic film
    76.
    发明申请
    Method of fabricating thin magnetic film and electrolytic plating apparatus for fabricating thin magnetic film 审中-公开
    制造薄磁膜的方法和用于制造薄磁膜的电解电镀装置

    公开(公告)号：US20020056649A1

    公开(公告)日：2002-05-16

    申请号：US09953877

    申请日：2001-09-18

    Applicant: NEC CORPORATION

    Inventor： Mikiko Saito

    IPC: C25D003/56 ,  B05C011/00 ,  B05C013/00 ,  B05C013/02

    CPC classification number: C25D3/562

    Abstract: A method of fabricating a thin magnetic film composed of ConullNinullFe alloy, includes the step of plating an object with plating solution containing Co ions, Ni ions and Fe ions. The plating solution is kept at 20 degrees centigrade or lower while the object is being plated while the object is being plated.

    Abstract translation: 制造由Co-Ni-Fe合金构成的薄磁性膜的方法包括用含有Co离子，Ni离子和Fe离子的电镀溶液镀覆物体的步骤。 当物体被镀覆时，电镀溶液保持在20摄氏度或更低，同时对象被电镀。

    Chucking device
    77.
    发明申请
    Chucking device 失效
    夹头装置

    公开(公告)号：US20020040681A1

    公开(公告)日：2002-04-11

    申请号：US09970855

    申请日：2001-10-05

    Inventor： Kenji Furuya ,  Akira Ohkawa ,  Shoji Tatejima ,  Yoshihiro Yamaguchi ,  Masayuki Terayama

    IPC: B05C013/00 ,  B05C021/00 ,  B05C011/11

    CPC classification number: B23B31/1176

    Abstract: A chucking device of the present invention includes an annular elastic member sandwiched between an upper and a lower member. A rod is slidable up and down in a bore formed in the upper and lower members and is partly positioned in the elastic member. The rod presses the elastic member radially outward when raised or lowered, thereby causing the chucking device to chuck a hollow, cylindrical base. The elastic member contacts the inner periphery of the base over a minimum of area and surely, closely contacts it for thereby implementing desirable sealing. The chucking device can therefore form a uniform film on the outer periphery of the base.

    Abstract translation: 本发明的夹紧装置包括夹在上部和下部构件之间的环形弹性构件。 杆可以在形成在上部和下部构件中的孔中上下滑动，并且部分地定位在弹性构件中。 杆在升降时径向向外按压弹性部件，由此使夹紧装置卡住中空圆筒状的基部。 弹性构件在最小面积上接触基座的内周，并且可靠地与其接触，从而实现所需的密封。 因此，夹持装置可以在基部的外周上形成均匀的膜。

    Silicon wafer supporting device for supporting a silicon wafer subjected to an evaporation process on its underside
    78.
    发明申请
    Silicon wafer supporting device for supporting a silicon wafer subjected to an evaporation process on its underside 审中-公开
    用于在其下侧支撑经历蒸发处理的硅晶片的硅晶片支撑装置

    公开(公告)号：US20020020360A1

    公开(公告)日：2002-02-21

    申请号：US09826562

    申请日：2001-04-04

    Inventor： Concetto Pocorobba ,  Gianleonardo Grasso

    IPC: B05C013/00 ,  C23C016/00

    CPC classification number: H01L21/687

    Abstract: A silicon wafer supporting device, for supporting a silicon wafer whose underside is subjected to an evaporation process, including a plate-like element (10) and a plurality of bracket-like elements (12). These bracket-like elements (12) are selectively fixed to the plate-like element (10) and adapted to support at least one silicon wafer (2) at the silicon wafer's perimeter. This supporting device has at least one blind seat (11) which is formed at the lower surface of the plate-like element (10) and is adapted to accommodate the at least one silicon wafer (2) whose lower side is subjected to an evaporation process.

    Abstract translation: 一种硅晶片支撑装置，用于支撑下侧进行蒸发处理的硅晶片，包括板状元件（10）和多个支架状元件（12）。 这些托架状元件（12）被选择性地固定到板状元件（10）并且适于在硅晶片的周边支撑至少一个硅晶片（2）。 该支撑装置具有形成在板状元件（10）的下表面处的至少一个盲座（11），并且适于容纳其下侧经受蒸发的至少一个硅晶片（2） 处理。

    System for processing a workpiece
    79.
    发明申请
    System for processing a workpiece 有权
    用于加工工件的系统

    公开(公告)号：US20010053411A1

    公开(公告)日：2001-12-20

    申请号：US09921839

    申请日：2001-08-02

    Inventor： Gary L. Curtis ,  Raymon F. Thompson

    IPC: C23C004/16 ,  B05D001/08 ,  B05C011/02 ,  B05C013/00

    CPC classification number: H01L21/67017 ,  B08B3/04 ,  H01L21/32134 ,  H01L21/6708 ,  Y10S134/902

    Abstract: An apparatus for processing a workpiece in a micro-environment includes a workpiece housing connected to a motor for rotation. The workpiece housing forms a substantially closed processing chamber where processing fluids are distributed across at least one face of the workpiece by centrifugal force generated during rotation of the housing. The housing may also be detached from the motor and moved to another location. The housing consequently serves as a processing chamber, as well as a storage or transport chamber.

    Abstract translation: 用于在微环境中处理工件的装置包括连接到用于旋转的电动机的工件壳体。 工件壳体形成基本封闭的处理室，其中处理流体通过在壳体旋转期间产生的离心力分布在工件的至少一个表面上。 壳体也可以从电动机分离并移动到另一位置。 壳体因此用作处理室，以及存储或运输室。

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