公开(公告)号：US12060651B2

公开(公告)日：2024-08-13

申请号：US17317363

申请日：2021-05-11

Applicant: Applied Materials, Inc.

Inventor： Tetsuya Ishikawa ,  Swaminathan T. Srinivasan ,  Kartik Bhupendra Shah ,  Ala Moradian ,  Manjunath Subbanna ,  Matthias Bauer ,  Peter Reimer ,  Michael R. Rice

IPC: C30B25/14 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  C23C16/48 ,  C30B25/08 ,  C30B25/10 ,  C30B25/12 ,  H01L21/67 ,  H01L21/677

CPC classification number: C30B25/14 ,  C23C16/4412 ,  C23C16/455 ,  C23C16/45504 ,  C23C16/4558 ,  C23C16/46 ,  C30B25/08 ,  C30B25/10 ,  C30B25/12 ,  H01L21/67115 ,  H01L21/67742 ,  C23C16/4411 ,  C23C16/4584 ,  C23C16/482 ,  H01L21/67748

Abstract: The present disclosure generally relates to a process chamber for processing of semiconductor substrates. The process chamber includes an upper lamp assembly, a lower lamp assembly, a substrate support, an upper window disposed between the substrate support and the upper lamp assembly, a lower window disposed between the lower lamp assembly and the substrate support, an inject ring, and a base ring. Each of the upper lamp assembly and the lower lamp assembly include vertically oriented lamp apertures for the placement of heating lamps therein. The inject ring includes gas injectors disposed therethrough and the base ring includes a substrate transfer passage, a lower chamber exhaust passage, and one or more upper chamber exhaust passages. The gas injectors are disposed over the substrate transfer passage and across from the lower chamber exhaust passage and the one or more upper chamber exhaust passages.

公开(公告)号：US20230286867A1

公开(公告)日：2023-09-14

申请号：US18139570

申请日：2023-04-26

Applicant: Applied Materials, Inc.

Inventor： Xiaowei Wu ,  Jennifer Y. Sun ,  Michael R. Rice

IPC: C04B35/48 ,  C04B35/50 ,  C04B35/505 ,  C09D1/00 ,  C23C16/455

CPC classification number: C04B35/48 ,  C04B35/50 ,  C04B35/505 ,  C09D1/00 ,  C23C16/45525 ,  C07F7/00

Abstract: Embodiments of the present disclosure relate to articles, coated articles and methods of coating such articles with a rare earth metal containing oxide coating. A method of co-depositing a rare earth metal containing oxide coating on a surface of an article is disclosed. The method includes contacting the article surface with a first or second metal containing precursor to form a partial metal adsorption layer of a first metal or a second metal. The method further includes contacting the partial metal adsorption layer with the first or second metal containing precursor to form a co-adsorption layer of the first metal and the second metal. The method further includes contacting the co-adsorption layer with a reactant to form the rare earth metal containing oxide coating.

公开(公告)号：US20230207354A1

公开(公告)日：2023-06-29

申请号：US18116759

申请日：2023-03-02

Applicant: Applied Materials, Inc.

Inventor： Devendra Channappa Holeyannavar ,  Sandesh Doddamane Ramappa ,  Dean C. Hruzek ,  Michael R. Rice ,  Jeffrey A. Brodine

IPC: H01L21/67 ,  H01L21/673 ,  H01L21/677

CPC classification number: H01L21/67178 ,  H01L21/6719 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67379 ,  H01L21/67389 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67207

Abstract: A platform is of a side storage pod. The platform includes an upper surface and kinematic pins extending from the upper surface within a chamber of the side storage pod to engage a lower surface of a side storage container in the chamber to level the side storage container in the chamber.

公开(公告)号：US11667575B2

公开(公告)日：2023-06-06

申请号：US16039005

申请日：2018-07-18

Applicant: Applied Materials, Inc.

Inventor： Xiaowei Wu ,  Jennifer Y. Sun ,  Michael R. Rice

IPC: C04B35/48 ,  C04B35/505 ,  C09D1/00 ,  C23C16/455 ,  C04B35/50 ,  C07F7/00 ,  C07F5/00

CPC classification number: C04B35/48 ,  C04B35/50 ,  C04B35/505 ,  C09D1/00 ,  C23C16/45525 ,  C04B2235/3225 ,  C04B2235/3248 ,  C07F5/00 ,  C07F7/00

Abstract: Embodiments of the present disclosure relate to articles, coated articles and methods of coating such articles with a rare earth metal containing oxide coating. The coating can contain at least a first metal (e.g., a rare earth metal, tantalum, zirconium, etc.) and a second metal that have been co-deposited onto a surface of the article. The coating can include a homogenous mixture of the first metal and the second metal and does not contain mechanical segregation between layers in the coating.

公开(公告)号：US20230162950A1

公开(公告)日：2023-05-25

申请号：US17532915

申请日：2021-11-22

Applicant: Applied Materials, Inc.

Inventor： Rajinder Dhindsa ,  Kenneth S. Collins ,  Michael R. Rice ,  James D. Carducci

IPC: H01J37/32 ,  H01L21/311 ,  H01L21/32

CPC classification number: H01J37/32449 ,  H01J37/32926 ,  H01L21/31116 ,  H01L21/32 ,  H01L27/11551

Abstract: A plasma treatment chamber comprises one or more sidewalls. A support surface within the one or more sidewalls holds a workpiece. A first gas injector along the one or more sidewalls injects a first gas flow in a first direction generally parallel to and across a surface of the workpiece. A first pump port along the one or more sidewalls generally opposite of the first gas injector pumps out the first gas flow. A second gas injector along the one or more sidewalls injects a second gas flow in a second direction generally parallel to and across the surface of the workpiece. A second pump port along the one or more sidewalls generally opposite of the second gas injector pumps out the second gas flow. Conductance control rings modulate conductance of the pump ports and are located proximate to plasma screens at a top of the pump ports.

公开(公告)号：USD973737S1

公开(公告)日：2022-12-27

申请号：US29758663

申请日：2020-11-17

Applicant: Applied Materials, Inc.

Designer： Michael R. Rice ,  Michael C. Kuchar ,  Travis Morey ,  Adam J. Wyatt ,  Ofer Amir

公开(公告)号：US11332827B2

公开(公告)日：2022-05-17

申请号：US16802293

申请日：2020-02-26

Applicant: Applied Materials, Inc.

Inventor： Sumit Agarwal ,  Sanjeev Baluja ,  Chad Peterson ,  Michael R. Rice

IPC: C23C16/40 ,  C23C16/455 ,  B23K1/00

Abstract: A gas distribution plate for a showerhead assembly of a processing chamber may include at least a first plate and second plate. The first plate may include a first plurality holes each having a diameter of at least about 100 um. The second plate may include a second plurality of holes each having a diameter of at least about 100 um. Further, each of the first plurality of holes is aligned with a respective one of the second plurality of holes forming a plurality of interconnected holes. Each of the interconnected holes is isolated from each other interconnected holes.

公开(公告)号：US11195734B2

公开(公告)日：2021-12-07

申请号：US16933391

申请日：2020-07-20

Applicant: APPLIED MATERIALS, INC.

Inventor： Michael R. Rice

IPC: H01L21/67 ,  H01L21/687 ,  B25J15/06

Abstract: Dual load lock chambers for use in a multi-chamber processing system are disclosed herein. In some embodiments, a dual load lock chamber, includes a first load lock chamber having a first interior volume and a first substrate support, wherein the first substrate support includes a first plurality of support surfaces vertically spaced apart by a first predetermined distance; at least one heat transfer device disposed within the first substrate support to heat or cool the first plurality of substrates; and a second load lock chamber disposed adjacent to the first load lock chamber and having a second interior volume and a second substrate support, wherein the second substrate support includes a second plurality of support surfaces vertically spaced apart by a second predetermined distance that less than the first predetermined distance.

公开(公告)号：US11180847B2

公开(公告)日：2021-11-23

申请号：US16211335

申请日：2018-12-06

Applicant: Applied Materials, Inc.

Inventor： Xiaowei Wu ,  Jennifer Y. Sun ,  Michael R. Rice

IPC: C23C16/40 ,  C23C16/455

Abstract: Certain embodiments of the present disclosure relate to coated articles and methods of coating articles. In one embodiment, a coated article comprises an article adapted for use in a processing chamber, and a coating formed on exterior and interior surfaces of the article. In one embodiment, the coating comprises a rare earth metal-containing ceramic, and the coating is substantially uniform, conformal, and porosity-free.

公开(公告)号：US20210301395A1

公开(公告)日：2021-09-30

申请号：US17344854

申请日：2021-06-10

Applicant: Applied Materials, Inc.

Inventor： Xiaowei Wu ,  Jennifer Y. Sun ,  Michael R. Rice

IPC: C23C16/40 ,  C23C14/08 ,  H01L21/67 ,  H01L21/02 ,  C23C16/455 ,  H01L39/12 ,  H01L23/29

Abstract: A lid or other chamber component for a process chamber comprises a) at least one surface comprising a first ceramic material, wherein the first ceramic material comprises Y3Al5O12 and b) an internal region beneath the at least one surface comprising a second ceramic material, wherein the second ceramic material comprises a combination of Al2O3 and ZrO2.