公开(公告)号：US09540519B2

公开(公告)日：2017-01-10

申请号：US13634713

申请日：2011-03-28

申请人： Wataru Iwaya ,  Takeshi Kondo

发明人： Wataru Iwaya ,  Takeshi Kondo

IPC分类号： C23C14/48 ,  C09D1/00 ,  C08K3/34 ,  C09D183/16 ,  C08J7/04 ,  C08G77/62 ,  G02F1/1333

CPC分类号： C09D1/00 ,  C08G77/62 ,  C08J7/04 ,  C08J2367/02 ,  C08J2483/16 ,  C08K3/346 ,  C08K2201/008 ,  C09D183/16 ,  C23C14/48 ,  G02F1/133305

摘要： Provided a formed article comprising a layer that includes a polysilazane compound and a clay mineral, and having a water vapor transmission rate at a temperature of 40° C. and a relative humidity of 90% of 6.0 g/m2/day or less. Also provided are a method for producing the formed article, an electronic device member including the formed article, and an electronic device including the electronic device member. The formed article exhibiting an excellent gas barrier capability, excellent transparency, and excellent bending resistance, a method for producing the formed article, and an electronic device member, or the like, comprising the formed article are provided.

摘要翻译： 提供一种成型体，其包括含有聚硅氮烷化合物和粘土矿物的层，并且在40℃的温度和90％的相对湿度为6.0g / m 2 /天以下的水蒸气透过率。 还提供了一种用于生产成型物品的方法，包括成形物品的电子设备构件和包括该电子设备构件的电子设备。 提供了具有优异的阻气性，优异的透明性和优异的抗弯曲性的成型体，成型体的制造方法以及电子器件部件等。

公开(公告)号：US20160186009A1

公开(公告)日：2016-06-30

申请号：US14908869

申请日：2014-08-04

申请人： KONICA MINOLTA, INC.

发明人： Yoshitaka GOTO

IPC分类号： C09D183/16 ,  C08J7/04 ,  H01L51/52 ,  B05D7/00 ,  B05D3/06 ,  H01L51/00 ,  H01L51/50

CPC分类号： C09D183/16 ,  B05D3/065 ,  B05D7/58 ,  C08G77/62 ,  C08J7/042 ,  C08J7/08 ,  C08J7/123 ,  C08J2367/02 ,  C08J2483/16 ,  H01L51/0034 ,  H01L51/0072 ,  H01L51/0073 ,  H01L51/0085 ,  H01L51/5056 ,  H01L51/5253 ,  H01L2251/558

摘要： [Object] Provided is a gas barrier film that is substantially uniformly modified in the film thickness direction and exhibits excellent interlayer adhesive force and bending resistance even after being stored under a high temperature and high humidity condition.[Solving Means] Disclosed is a gas barrier film including a plurality of gas barrier layers, the gas barrier film being obtained by coating a coating liquid containing a polysilazane compound on a substrate by simultaneous multilayer coating and drying it to form a plurality of coating layers and then irradiating the plurality of coating layers with vacuum ultraviolet rays from the side of the farthest coating layer from the substrate to conduct a modification treatment, in which at least one layer of the gas barrier layers contains at least one kind of element (however, silicon and carbon are excluded) selected from the group consisting of elements of group 2, group 13, and group 14 in the long form of the periodic table.

摘要翻译： 本发明提供一种在膜厚方向上基本上均匀地改性的阻气膜，即使在高温高湿条件下储存之后也具有优异的层间粘合力和耐弯曲性。 本发明公开了一种阻气膜，其特征在于，具有多个阻气层，所述阻气膜是通过同时进行多层涂布并干燥而在基材上涂布含有聚硅氮烷化合物的涂布液而形成的，形成多个涂布层 然后从最靠近的涂层一侧的真空紫外线从基板向多个涂层照射进行改性处理，其中至少一层阻气层含有至少一种元素（然而， 硅和碳被排除），其选自周期表的长形式的组2，组13和组14的元素。

公开(公告)号：US20160017230A1

公开(公告)日：2016-01-21

申请号：US14773165

申请日：2014-02-27

申请人： CLARIANT INTERNATIONAL LTD.

发明人： Daniela MARRWITZ ,  Annemarie STORK

IPC分类号： C09K21/04 ,  C09D183/04 ,  B05D1/02 ,  C08K9/06

CPC分类号： C09K21/04 ,  B05D1/02 ,  C08G77/62 ,  C08K5/0066 ,  C08K9/06 ,  C08K9/08 ,  C09D183/04 ,  C09D183/14 ,  C09D183/16 ,  C09K21/14

摘要： The invention relates to a pulverulent coated flame retardant, characterized in that the flame retardant is phosphorus-containing and/or nitrogen-containing flame retardant and silazanes and/or silazane/organosiloxane mixtures are used as coating agent. The invention also relates to a process for producing such flame retardants and to the use thereof.

摘要翻译： 本发明涉及一种粉末涂料阻燃剂，其特征在于阻燃剂为含磷和/或含氮阻燃剂，硅氮烷和/或硅氮烷/有机硅氧烷混合物用作包衣剂。 本发明还涉及一种生产这种阻燃剂的方法及其用途。

公开(公告)号：US20150274980A1

公开(公告)日：2015-10-01

申请号：US14432401

申请日：2013-08-16

申请人： CHEIL INDUSTRIES INC.

发明人： Hui-Chan Yun ,  Taek-Soo Kwak ,  Mi-Young Kim ,  Sang-Hak Lim ,  Kwen-Woo Han ,  Go-Un Kim ,  Bong-Hwan Kim ,  Sang-Kyun Kim ,  Yoong-Hee Na ,  Eun-Su Park ,  Jin-Hee Bae ,  Hyun-Ji Song ,  Han-Song Lee ,  Seung-Hee Hong

IPC分类号： C09D1/00 ,  H01L21/02 ,  H01B3/02

CPC分类号： C09D1/00 ,  B05D3/02 ,  B05D3/0254 ,  B05D3/0433 ,  C08G77/62 ,  C09D183/14 ,  C09D183/16 ,  H01B3/02 ,  H01B3/303 ,  H01B3/46 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02214 ,  H01L21/02216 ,  H01L21/02219 ,  H01L21/02222 ,  H01L21/02282 ,  H01L21/02326 ,  H01L21/02337

摘要： Disclosed is a composition for a silica-based insulation layer including hydrogenated polysilazane or hydrogenated polysiloxzane, wherein a concentration of a cyclic compound having a weight average molecular weight of less than 400 is less than or equal to 1,200 ppm. The composition for a silica-based insulation layer may reduce a thickness distribution during formation of a silica-based insulation layer, and thereby film defects after chemical mechanical polishing (CMP) during a semiconductor manufacturing process may be reduced.

摘要翻译： 公开了一种包含氢化聚硅氮烷或氢化聚硅氧烷的二氧化硅基绝缘层的组合物，其中重均分子量小于400的环状化合物的浓度小于或等于1,200ppm。 用于二氧化硅基绝缘层的组合物可以在形成二氧化硅基绝缘层期间减小厚度分布，从而可以降低在半导体制造过程中化学机械抛光（CMP）之后的膜缺陷。

公开(公告)号：US08962138B2

公开(公告)日：2015-02-24

申请号：US13377064

申请日：2010-06-10

申请人： Monika Bauer ,  Hans-Juergen Glaesel

发明人： Monika Bauer ,  Hans-Juergen Glaesel

IPC分类号： B32B5/16 ,  C08G77/04 ,  C08G77/06 ,  C08G77/20 ,  C08G77/54 ,  C08G77/62 ,  C08K5/544 ,  C08L33/18

CPC分类号： C08G77/04 ,  C08G77/54 ,  C08G77/62 ,  C08K5/544 ,  C08L33/18 ,  Y10T428/2982 ,  Y10T428/2991 ,  Y10T428/2998 ,  Y10T428/31663 ,  C08L2666/44

摘要： The present invention relates to polysiloxane nanoparticles having the following properties: an average particle size d50 (measured using REM recordings) in the range of 10-200 nm, a specific surface area Ao of at least 50 m2/g, a pore volume of at least 0.2 cm3/g, an average pore volume d50 of at least 0.8 nm, wherein the particles have groups that contain carbon, which groups are bonded to the silicon at least partially in the form of unsubstituted or substituted alkyl, alkenyl, aryl, arylalkyl, or alkylaryl groups. Said polysiloxane nanoparticles can be produced, among other things, in that either a silazane or a mixture of different silazanes having one or more —[Si(R)(R1)—NR2]— units and/or a silane or a mixture of different silanes having the formula R′x—SiX4-a or an oligosiloxane obtainable by means of hydrolytic condensation of said silane/said silanes or a mixture of such oligosiloxanes are provided in a solvent and brought in contact with a strongly alkaline medium in such a way that the pH is not below 13 after the addition thereof. In specific embodiments, synthesis in acid is also successful.

摘要翻译： 本发明涉及具有以下特性的聚硅氧烷纳米粒子：10-200nm范围内的平均粒径d50（使用REM记录测定），比表面积Ao为至少50m 2 / g，孔体积为 至少0.2cm 3 / g，平均孔体积d50至少为0.8nm，其中所述颗粒具有含有碳的基团，所述基团至少部分地以未取代或取代的烷基，烯基，芳基，芳烷基 ，或烷基芳基。 可以制备所述聚硅氧烷纳米颗粒，其特征在于，硅氮烷或具有一个或多个 - [Si（R）（R 1）-NR 2] - 单元和/或硅烷或不同的混合物的不同硅氮烷的混合物 具有式R'x-SiX4-a的硅烷或通过所述硅烷/所述硅烷或这种低聚硅氧烷的混合物的水解缩合得到的低聚硅氧烷在溶剂中提供，并以这种方式与强碱性介质接触 加入后pH不低于13。 在具体实施方案中，酸中的合成也是成功的。

公开(公告)号：US20150030856A1

公开(公告)日：2015-01-29

申请号：US14377123

申请日：2013-02-07

申请人： Kansas State University Research Foundation

发明人： Gurpreet Singh ,  Romil Bhandavat

IPC分类号： C08G77/62 ,  B05D3/02 ,  B05D7/24 ,  C04B35/589

CPC分类号： C08G77/62 ,  B05D3/0254 ,  B05D7/24 ,  B82Y30/00 ,  C04B24/42 ,  C04B35/58 ,  C04B35/589 ,  C04B35/597 ,  C04B35/62218 ,  C04B35/62222 ,  C04B35/6267 ,  C04B35/6268 ,  C04B35/62857 ,  C04B35/62863 ,  C04B35/62868 ,  C04B35/62871 ,  C04B35/62886 ,  C04B35/806 ,  C04B2235/3409 ,  C04B2235/483 ,  C04B2235/486 ,  C04B2235/5288 ,  C04B2235/665 ,  C04B2235/667 ,  C04B2235/9607 ,  C09D183/16 ,  Y10T428/30 ,  Y10T428/31678

摘要： New methods for synthesizing boron-modified silazanes, their use as polymer-derived ceramic precursors, and polymer-derived ceramics and composites formed therefrom are disclosed. The polymeric ceramic precursors comprise a boron-modified silazane that is a room temperature liquid-phase polymer comprising a backbone having recurring monomeric repeat units comprising boron-nitrogen bonds. Nanocomposites comprising polymer-derived ceramics and carbon nanotubes are also disclosed.

摘要翻译： 公开了用于合成硼改性硅氮烷的新方法，它们作为聚合物衍生的陶瓷前体的用途，以及由其形成的聚合物衍生的陶瓷和复合材料。 聚合物陶瓷前体包括硼改性的硅氮烷，其是包含具有包含硼 - 氮键的重复单体重复单元的骨架的室温液相聚合物。 还公开了包含聚合物衍生的陶瓷和碳纳米管的纳米复合材料。

公开(公告)号：US20150018448A1

公开(公告)日：2015-01-15

申请号：US13937298

申请日：2013-07-09

申请人： GENERAL ELECTRIC COMPANY

发明人： Peter Kennedy DAVIS ,  Slawomir RUBINSZTAJN

IPC分类号： C08G77/62 ,  B01J19/08 ,  C08G77/60

CPC分类号： C08G77/62 ,  B01J19/085 ,  B01J19/087 ,  B01J2219/0803 ,  B01J2219/0879 ,  B29C35/0866 ,  B29C2035/0877 ,  C04B35/571 ,  C04B35/62281 ,  C08G77/60 ,  C08J3/28 ,  D01D10/00 ,  D01F9/10 ,  D01F11/08 ,  D01F11/16 ,  D06M10/008

摘要： The present disclosure generally provides methods and apparatus for efficiently crosslinking silicon carbide fiber precursor polymers with electron beam radiation. The methods and apparatus utilize a platform containing silicon carbide fiber precursor polymer. The temperature of the platform is regulated while the silicon carbide fiber precursor polymer is irradiated to thereby regulate the temperature of the irradiated silicon carbide fiber precursor polymer thereon. In this way, the temperature of the irradiated silicon carbide fiber precursor polymer is regulated via the platform both during and after it is subjected to radiation. At least one of the platform and the e-beam radiation mechanism may be translated with respect to the other to irradiate different portions of the silicon carbide fiber precursor polymer and, ultimately, the entirety of the silicon carbide fiber precursor polymer contained on the platform.

摘要翻译： 本发明通常提供了用电子束辐射有效交联碳化硅纤维前体聚合物的方法和装置。 该方法和装置利用含有碳化硅纤维前体聚合物的平台。 调节平台的温度，同时照射碳化硅纤维前体聚合物，从而调节照射的碳化硅纤维前体聚合物的温度。 以这种方式，照射的碳化硅纤维前体聚合物的温度在经受辐射之后和之后通过平台调节。 平台和电子束辐射机构中的至少一个可以相对于另一平台和电子束辐射机构平移以照射碳化硅纤维前体聚合物的不同部分，最终照射包含在平台上的整个碳化硅纤维前体聚合物。

公开(公告)号：US20150004421A1

公开(公告)日：2015-01-01

申请号：US14377001

申请日：2013-02-01

申请人： Takashi Fujiwara ,  Ralph Grottenmueller ,  Takashi Kanda ,  Tatsuro Nagahara

发明人： Takashi Fujiwara ,  Ralph Grottenmueller ,  Takashi Kanda ,  Tatsuro Nagahara

IPC分类号： C01B33/08 ,  C09D1/00

CPC分类号： C01B21/087 ,  C01B33/08 ,  C01B33/126 ,  C08G77/62 ,  C09D1/00 ,  C09D183/16 ,  C23C18/1212 ,  C23C18/122 ,  C23C18/1225 ,  H01L21/02164 ,  H01L21/02222 ,  H01L21/02282 ,  H01L21/02323 ,  H01L21/02326 ,  H01L21/02337 ,  Y10T428/31663

摘要： An inorganic polysilazane resin of the present invention has a Si/N ratio (i.e. a ratio of contained silicon atoms to contained nitrogen atoms) of 1.30 or more. The inorganic polysilazane resin having such a high Si content can be produced by, for example, a method in which an inorganic polysilazane compound containing both Si—NH and Si—Cl is heated to react NH with Cl, a method in which a silazane oligomer (polymer) that leaves no Si—Cl bond is synthesized and a dihalosilane is added to the synthesized silazane oligomer (polymer) to perform a thermal reaction, and the like. A siliceous film can be formed by, for example, applying a coating composition containing the inorganic polysilazane resin onto a base plate and then dried and the dried product is then oxidized by bringing the dried product into contact with water vapor or hydrogen peroxide vapor and water vapor under heated conditions.

摘要翻译： 本发明的无机聚硅氮烷树脂的Si / N比（即含有硅原子与氮原子的比例）为1.30以上。 可以通过例如将含有Si-NH和Si-Cl两者的无机聚硅氮烷化合物加热以使NH与Cl反应的方法制备具有如此高Si含量的无机聚硅氮烷树脂，其中将硅氮烷低聚物 合成不含Si-Cl键的聚合物（聚合物），向合成硅氮烷低聚物（聚合物）中加入二卤代硅烷进行热反应等。 可以通过例如将含有无机聚硅氮烷树脂的涂料组合物施加到基板上然后干燥而形成硅质膜，然后通过使干燥产物与水蒸汽或过氧化氢蒸汽和水接触来将干燥的产物氧化 蒸汽在加热条件下。

公开(公告)号：US08889229B2

公开(公告)日：2014-11-18

申请号：US12918069

申请日：2009-02-27

申请人： Tatsuro Nagahara ,  Masanobu Hayashi

发明人： Tatsuro Nagahara ,  Masanobu Hayashi

IPC分类号： B05D3/02 ,  H01L21/02 ,  C09D183/16 ,  H01L21/316 ,  H01L21/312 ,  H01L21/762 ,  C08G77/62

CPC分类号： H01L21/3125 ,  C08G77/62 ,  C09D183/16 ,  H01L21/02164 ,  H01L21/02222 ,  H01L21/02282 ,  H01L21/02304 ,  H01L21/02348 ,  H01L21/316 ,  H01L21/76224 ,  Y10T428/24612

摘要： The present invention provides a method for formation of a siliceous film containing nitrogen in a low concentration. The method according to the present invention comprises the steps of: applying a polysilazane composition on an engraved substrate surface, to form a coating layer; hardening the coating layer only in the part adjacent to the substrate surface, to form a covering film along the shape of the engraved substrate; and removing the polysilazane composition of the coating layer in the part not hardened in the above covering film-formation step. According to this method, two or more siliceous films can be formed and layered.

摘要翻译： 本发明提供一种形成含有低浓度氮的硅质膜的方法。 根据本发明的方法包括以下步骤：在雕刻的基材表面上施加聚硅氮烷组合物以形成涂层; 仅在与基板表面相邻的部分中硬化涂层，以沿着雕刻的基板的形状形成覆盖膜; 并且在上述覆盖膜形成步骤中未硬化的部分中除去涂层的聚硅氮烷组合物。 根据该方法，可以形成并层叠两层以上的硅质膜。

公开(公告)号：US20140203323A1

公开(公告)日：2014-07-24

申请号：US14145031

申请日：2013-12-31

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Toshiyuki OZAI

IPC分类号： H01L33/56 ,  H01L23/29

CPC分类号： H01L33/56 ,  C08F230/08 ,  C08G77/12 ,  C08G77/20 ,  C08G77/62 ,  C09D133/12 ,  C09D183/16 ,  H01L2224/48091 ,  C08L83/00 ,  C08L33/00 ,  H01L2924/00014 ,  C08F220/14

摘要： The invention provides a primer composition which adheres a substrate mounting an optical semiconductor device and a cured material of an addition reaction curing silicone composition that encapsulates the optical semiconductor device, includes (A) silazane compound or polysilazane compounds that has one or more silazane bonds in the molecule, (B) acrylic resin containing either one or both of acrylate ester and methacrylate ester that contains one or more SiH groups in the molecule, and (C) solvent. There can be provided a primer composition in which the adhesion between a substrate mounting an optical semiconductor device and a cured material of an addition reaction curing silicone composition that encapsulates the optical semiconductor device can be improved, the corrosion of a metal electrode on the substrate can be prevented, and the heat resistance and flexibility of a primer can be improved.

摘要翻译： 本发明提供一种底漆组合物，其粘合安装光学半导体器件的基板和封装光学半导体器件的加成反应固化硅氧烷组合物的固化材料，包括（A）具有一个或多个硅氮烷键的硅氮烷化合物或聚硅氮烷化合物 分子，（B）含有分子中含有一个或多个SiH基团的丙烯酸酯和甲基丙烯酸酯之一或两者的丙烯酸树脂，和（C）溶剂。 可以提供一种底漆组合物，其中可以改善安装光学半导体器件的衬底与封装光学半导体器件的加成反应固化硅氧烷组合物的固化材料之间的粘附性，底物上的金属电极的腐蚀 可以提高底漆的耐热性和柔软性。