公开(公告)号：US09857686B2

公开(公告)日：2018-01-02

申请号：US15178982

申请日：2016-06-10

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Tsutomu Ogihara ,  Daisuke Kori ,  Jun Hatakeyama ,  Naoki Kobayashi

IPC分类号： G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  H01L21/027 ,  H01L21/311 ,  G03F7/16 ,  G03F7/30 ,  G03F7/09 ,  G03F7/36 ,  G03F7/40 ,  C09D161/22 ,  H01L21/033

CPC分类号： G03F7/11 ,  C09D161/22 ,  G03F7/0397 ,  G03F7/0752 ,  G03F7/091 ,  G03F7/094 ,  G03F7/168 ,  G03F7/2053 ,  G03F7/30 ,  G03F7/322 ,  G03F7/36 ,  G03F7/40 ,  H01L21/0276 ,  H01L21/0332 ,  H01L21/31116 ,  H01L21/31138 ,  H01L21/31144

摘要： The present invention provides a composition for forming a resist underlayer film, containing an organic solvent and either or both of a compound shown by the following general formula (1) and a condensate of the compound. There can be provided a composition for forming a resist underlayer film that is capable of forming an underlayer film, especially for use in a three-layer resist process, that can reduce reflectance, has high pattern-bend resistance, and prevents line fall and wiggling after etching of a high aspect line especially thinner than 60 nm, and a patterning process using the same.

公开(公告)号：US20170343907A1

公开(公告)日：2017-11-30

申请号：US15231842

申请日：2016-08-09

申请人： Via Mechanics, Ltd.

发明人： Eriko NAKAJIMA

IPC分类号： G03F9/00 ,  G03F7/20

CPC分类号： G03F9/7046 ,  G03F7/2053 ,  G03F9/00

摘要： A pattern drawing apparatus includes a first image-pickup device for reading an alignment mark and reading a first pattern image for detecting a positional shift, a second image-pickup device for reading the first pattern image and reading a second pattern image for detecting a positional shift drawn by an irradiation light beam from the optical head while carrying out a relative movement between the table and the optical head, and a positional shift detection unit for obtaining a first coordinate difference between a center of a visual field of the first image-pickup device and a center of the first pattern based on a read image by the first image-pickup device and obtaining a second coordinate difference between the center of the first pattern and a specific position of the second pattern based on a read image by the second image-pickup device.

公开(公告)号：US20170329230A1

公开(公告)日：2017-11-16

申请号：US15154712

申请日：2016-05-13

申请人： XEROX CORPORATION

发明人： Wayne A. BUCHAR ,  George A. GIBSON

IPC分类号： G03F7/20 ,  G06K7/10

CPC分类号： G03F7/2053 ,  G03F7/06 ,  G03F7/20 ,  G06K7/10009 ,  G06K19/0672 ,  H05K1/092 ,  H05K1/16 ,  H05K3/02 ,  H05K3/105 ,  H05K2201/10098 ,  H05K2203/0514 ,  H05K2203/0557 ,  H05K2203/056 ,  H05K2203/107 ,  H05K2203/125

摘要： A method for forming a structure for a radio frequency identification device includes dispensing a photosensitive compound onto a substrate. Subsequently, first portions of the photosensitive compound are exposed to a light pattern from a light source, while second portions of the photosensitive compound remain unexposed to the light source. Exposing the photosensitive compound to light reduces the photosensitive compound to a metal layer. The unexposed second portions of the photosensitive compound may be rinsed away to leave the metal layer. Processing may continue to form an RFID circuit from the metal layer, and a completed RFID transponder comprising the RFID circuit.

公开(公告)号：US09798242B2

公开(公告)日：2017-10-24

申请号：US14952539

申请日：2015-11-25

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Jun Hatakeyama ,  Daisuke Kori ,  Tsutomu Ogihara

IPC分类号： G03F7/40 ,  G03F7/039 ,  G03F7/20 ,  G03F7/11 ,  G03F7/32

CPC分类号： G03F7/40 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2053 ,  G03F7/2059 ,  G03F7/325 ,  G03F7/405

摘要： In a resist pattern forming process, a rinse solution comprising (A) a heat/acid-decomposable polymer and (B) an organic solvent is effective. The pattern forming process using the rinse solution is successful in forming fine feature size patterns while minimizing the occurrence of pattern collapse.

公开(公告)号：US20170212424A1

公开(公告)日：2017-07-27

申请号：US15500414

申请日：2014-10-22

申请人： South University of Science and Technology of China

发明人： Xing Cheng ,  Dehu Cui ,  Ziping Li ,  Jing Ming

IPC分类号： G03F7/20

CPC分类号： G03F7/7055 ,  G03F7/0037 ,  G03F7/2053 ,  G03F7/70041 ,  G03F7/70416 ,  G03F7/70641

摘要： Disclosed are a system and method for micro-nano machining by femtosecond laser two-photon polymerization. The system includes: a femtosecond laser, an external light path modulation unit, an image capture apparatus, a focusing lens, a displacement platform, a computer and a monitoring apparatus, where the image capture apparatus is configured to capture cross-section graphs of a three-dimensional micro-nano device layer by layer, so that modulated femtosecond lasers form parallel beams arranged according to all layers of the cross-section graphs.

公开(公告)号：US20170183567A1

公开(公告)日：2017-06-29

申请号：US15311718

申请日：2015-12-22

申请人： BOE TECHNOLOGY GROUP CO., LTD.

发明人： Tingting Zhou ,  Bin Zhang ,  Yonglian Qi

IPC分类号： C09K11/88 ,  H01L27/32 ,  C09K11/02

CPC分类号： C09K11/883 ,  B82Y20/00 ,  B82Y30/00 ,  B82Y40/00 ,  C09K11/025 ,  G02F1/133514 ,  G02F1/133516 ,  G02F1/133617 ,  G02F1/133621 ,  G02F2001/133614 ,  G02F2202/36 ,  G03F7/0007 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/105 ,  G03F7/2053 ,  H01L27/322 ,  H01L2251/5369 ,  Y10S977/774 ,  Y10S977/824 ,  Y10S977/892 ,  Y10S977/896 ,  Y10S977/95

摘要： The embodiments of this disclosure provide a luminescent complex, a luminescent material, a substrate for display and a production method thereof, and a display apparatus. This disclosure relates to the technical field of display. It is possible to increase the dispersibility of the luminescent particles, such as quantum dots or the like in the main material of a color filter to solve problems, such as uneven light emission, low light emission efficiency or the like of a substrate for display comprising the luminescent particles, so as to further reduce the loss of the back light brightness. This luminescent complex comprises a luminescent particle; an organic ligand attached to the surface of the luminescent particle; group A in the structural formula of the organic ligand is a binding group which binds to the luminescent particle; and in the structural formula of the organic ligand, the carbon-carbon double bond which is attached to the X1 group, the X2 group and the X3 group may be subjected to a crosslinking reaction with a photosensitive resin under an exposure condition. This disclosure further provides a luminescent material which is used for the luminescent complex and comprises the luminescent complex, a substrate for display comprising this luminescent material, and a production method of a display apparatus.

公开(公告)号：US09636777B2

公开(公告)日：2017-05-02

申请号：US14930856

申请日：2015-11-03

申请人： Technical Institute of Physics and Chemistry of the Chinese Academy of Sciences

发明人： Xuanming Duan ,  Shu Chen ,  Hongzhong Cao ,  Xianzi Dong ,  Zhensheng Zhao

IPC分类号： H01L21/00 ,  B23K26/0622 ,  B23K26/064 ,  B23K26/06 ,  B23K26/067 ,  B81C1/00 ,  H01L21/02 ,  G03F7/20 ,  B23K26/04

CPC分类号： B23K26/0624 ,  B23K26/048 ,  B23K26/0613 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0676 ,  B81C1/00428 ,  G03F7/2053 ,  G03F7/70375 ,  H01L21/02107

摘要： A laser micro/nano processing system (100, 200, 300, 400) comprises: a laser light source used to provide a first laser beam having a first wavelength and a second laser beam having a second wavelength different from the first wavelength, with the pulse width of the first laser beam being in the range from a nanosecond to a femtosecond; an optical focusing assembly used to focus the first laser beam and the second laser beam to the same focal point; and a micro mobile platform (21) controlled by a computer. Also disclosed are a method for micro/nano-processing photosensitive materials with a laser and a method for fabricating a device with a micro/nano structure using laser two-photon direct writing technology. In the system and methods, spatial and temporal overlapping of two laser beams is utilized, so as to obtain a micro/nano structure with a processing resolution higher than that of a single laser beam, using an average power lower than that of a single laser beam.

公开(公告)号：US20160377975A1

公开(公告)日：2016-12-29

申请号：US15121124

申请日：2014-12-09

申请人： HOYA CORPORATION

发明人： Atsushi MATSUMOTO ,  Hiroaki SHISHIDO ,  Takashi UCHIDA

IPC分类号： G03F1/32 ,  G03F7/20

CPC分类号： G03F1/32 ,  G03F1/58 ,  G03F7/2053

摘要： To provide a phase-shift mask in which the reduction in thickness of a light-shielding film is provided when a transition metal silicide-based material is used for the light-shielding film and by which the problem of ArF light fastness can be solved; and a mask blank for manufacturing the phase-shift mask.A mask blank 10 comprises a phase-shift film 2 and a light-shielding film 4 on a transparent substrate 1, the phase-shift film 2 is made of a material with ArF light fastness, and at least one layer in the light-shielding film 4 is made of a material which contains transition metal, silicon, and nitrogen, and satisfies the conditions of Formula (1) below: CN≦9.0×10−6×RM4−1.65×10−4×RM3−7.718×10−2×RM2+3.611×RM−21.084  Formula (1) wherein RM is a ratio of the content of transition metal to the total content of transition metal and silicon in said one layer, and CN is the content of nitrogen in said one layer.

摘要翻译： 提供：在将过渡金属硅化物材料用于遮光膜的情况下，具有较薄的遮光膜的相移掩模，同时解决了ArF耐光性的问题; 以及用于制造该相移掩模的掩模坯料。 一种在透光基板（1）上具有相移膜（2）和遮光膜（4）的掩模板（10），其中相移膜（2）由具有ArF耐光性的材料形成 并且至少一层遮光膜（4）由含有过渡金属，硅和氮的材料形成，并满足下面的式（1）的条件。 CN≤9.0×10-6×RM 4 - 1.65×10-4×RM 3 - 7.718×10-2×RM 2 + 3.611×RM - 21.084式（1）在这一点上，RM表示过渡金属 含量相对于上述一层中的过渡金属含量和硅含量的总和，CN表示上述一层中的氮含量。

公开(公告)号：US20160299426A1

公开(公告)日：2016-10-13

申请号：US15100552

申请日：2014-12-01

申请人： 3M INNOVATIVE PROPERTIES COMPANY

发明人： Brian J. Gates ,  Robert J. DeVoe ,  Tzu-Chen Lee ,  Bradford B. Wright

IPC分类号： G03F7/00 ,  G02B7/02 ,  G03F7/32 ,  G02B1/04 ,  G02B21/02 ,  G03F7/20 ,  G02B21/33 ,  G02B1/14

CPC分类号： G03F7/0005 ,  G02B1/04 ,  G02B1/14 ,  G02B7/02 ,  G02B21/02 ,  G02B21/33 ,  G02B2207/114 ,  G03F7/2053 ,  G03F7/32 ,  G03F7/70983

摘要： A semi-submersible microscope objective (100) includes a microscope objective having a protective barrel (120) with an optical inlet (122) and optical outlet (124), and a protective element (130) affixed to the microscope objective, sealing the optical outlet (124) but not the optical inlet (122). A transparent portion (132) of the protective element is aligned with the optical exit (124). The protective element is separable from the microscope objective without damaging the microscope objective. Use of the semi-submersible microscope objective in a multiphoton imaging method is also disclosed.

摘要翻译： 半潜式显微镜物镜（100）包括具有带有光学入口（122）和光学出口（124）的保护筒（120）的显微镜物镜和固定到显微物镜的保护元件（130），密封光学 出口（124）而不是光学入口（122）。 保护元件的透明部分（132）与光学出口（124）对齐。 保护元件可与显微镜物镜分离，而不会损坏显微镜物镜。 还公开了在多光子成像方法中使用半潜式显微镜物镜。

公开(公告)号：US09448480B2

公开(公告)日：2016-09-20

申请号：US15023823

申请日：2014-09-22

申请人： NISSAN CHEMICAL INDUSTRIES, LTD.

发明人： Tokio Nishita ,  Ryuji Ohnishi ,  Noriaki Fujitani ,  Rikimaru Sakamoto

IPC分类号： G03F7/11 ,  C08G59/42 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  C09D167/00 ,  H01L21/027

CPC分类号： G03F7/11 ,  C08G59/245 ,  C08G59/26 ,  C08G59/308 ,  C08G59/42 ,  C09D167/00 ,  G03F7/091 ,  G03F7/094 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/2053 ,  G03F7/2059 ,  G03F7/32 ,  H01L21/0276

摘要： The present invention provides a novel resist underlayer film formation composition for lithography. A resist underlayer film formation composition for lithography comprising: a polymer having a structure of Formula (1) at a terminal of a polymer chain; a cross-linking agent; a compound promoting a cross-linking reaction; and an organic solvent; (where R1, R2, and R3 are each independently a hydrogen atom, a linear or branched C1-13 alkyl group, a halogeno group, or a hydroxy group; at least one of R1, R2, and R3 is the alkyl group; Ar is a benzene ring, a naphthalene ring, or an anthracene ring; two carbonyl groups are bonded to respective two adjacent carbon atoms of Ar; and X is a linear or branched C1-6 alkyl group optionally having a C1-3 alkoxy group as a substituent).

摘要翻译： 用于光刻的新型抗蚀剂下层膜形成组合物包括：在聚合物链的末端具有式（1）结构的聚合物; 交联剂; 促进交联反应的化合物; 和有机溶剂（其中R 1，R 2和R 3各自独立地为氢原子，直链或支链C 1-13烷基，卤代基或羟基; R 1，R 2和R 3中的至少一个为 烷基; Ar是苯环，萘环或蒽环;两个羰基与Ar的两个相邻碳原子键合; X是任选具有C1- 3烷氧基作为取代基）。