Package structure and manufacturing method thereof
    2.
    发明授权
    Package structure and manufacturing method thereof 有权
    包装结构及其制造方法

    公开(公告)号:US08058102B2

    公开(公告)日:2011-11-15

    申请号:US12615682

    申请日:2009-11-10

    Abstract: The present invention discloses a semiconductor device package structure with redistribution layer (RDL) and through silicon via (TSV) techniques. The package structure comprises an electronic element which includes a dielectric layer on a backside surface of the electronic element, a plurality of first conductive through vias across through the electronic element and the dielectric layer, and a plurality of conductive pads accompanying the first conductive through vias on an active surface of the electronic element; a filler material disposed adjacent to the electronic element; a first redistribution layer disposed over the dielectric layer and the filler material, and connected to the first conductive through vias; a first protective layer disposed over the active surface of the electronic element, the conductive pads, and the filler material; and a second protective layer disposed over the redistribution layer, the dielectric layer, and the filler material.

    Abstract translation: 本发明公开了一种具有再分配层(RDL)和硅通孔(TSV)技术的半导体器件封装结构。 封装结构包括电子元件,该电子元件包括在电子元件的背面上的电介质层,穿过电子元件和电介质层的多个第一导电通孔以及伴随第一导电通孔的多个导电垫 在电子元件的有效表面上; 设置在电子元件附近的填充材料; 设置在电介质层和填充材料之上并连接到第一导电通孔的第一再分配层; 设置在电子元件的有源表面上的第一保护层,导电焊盘和填充材料; 以及设置在再分布层,电介质层和填充材料之上的第二保护层。

    PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF
    4.
    发明申请
    PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF 有权
    包装结构及其制造方法

    公开(公告)号:US20110108977A1

    公开(公告)日:2011-05-12

    申请号:US12615682

    申请日:2009-11-10

    Abstract: The present invention discloses a semiconductor device package structure with redistribution layer (RDL) and through silicon via (TSV) techniques. The package structure comprises an electronic element which includes a dielectric layer on a backside surface of the electronic element, a plurality of first conductive through vias across through the electronic element and the dielectric layer, and a plurality of conductive pads accompanying the first conductive through vias on an active surface of the electronic element; a filler material disposed adjacent to the electronic element; a first redistribution layer disposed over the dielectric layer and the filler material, and connected to the first conductive through vias; a first protective layer disposed over the active surface of the electronic element, the conductive pads, and the filler material; and a second protective layer disposed over the redistribution layer, the dielectric layer, and the filler material.

    Abstract translation: 本发明公开了一种具有再分配层(RDL)和硅通孔(TSV)技术的半导体器件封装结构。 封装结构包括电子元件,该电子元件包括在电子元件的背面上的电介质层,穿过电子元件和电介质层的多个第一导电通孔以及伴随第一导电通孔的多个导电垫 在电子元件的有效表面上; 设置在电子元件附近的填充材料; 设置在电介质层和填充材料之上并连接到第一导电通孔的第一再分配层; 设置在电子元件的有源表面上的第一保护层,导电焊盘和填充材料; 以及设置在再分布层,电介质层和填充材料之上的第二保护层。

    Image sensor module
    8.
    发明授权
    Image sensor module 有权
    图像传感器模块

    公开(公告)号:US07566854B2

    公开(公告)日:2009-07-28

    申请号:US11608254

    申请日:2006-12-08

    Abstract: The present invention provides an image sensor module. The image sensor module has a die formed on a substrate, the die having a micro lens area, a lens holder formed on the substrate and over the die, a lens formed in the lens holder. A filter is formed within the lens holder and between the lens and the die, and at least one passive device formed on the substrate and covered within the lens holder. Conductive bumps or LGA (leadless grid array) are formed on the bottom surface of the substrate.

    Abstract translation: 本发明提供一种图像传感器模块。 图像传感器模块具有形成在基板上的模具,模具具有微透镜区域,形成在基板上并且在模具上的透镜保持器,形成在透镜保持器中的透镜。 滤镜形成在透镜保持器内并且在透镜和模具之间,以及形成在基板上并被覆盖在透镜保持器内的至少一个无源器件。 导电凸块或LGA(无引线栅格阵列)形成在基板的底表面上。

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