Package structure and manufacturing method thereof
    1.
    发明授权
    Package structure and manufacturing method thereof 有权
    包装结构及其制造方法

    公开(公告)号:US08058102B2

    公开(公告)日:2011-11-15

    申请号:US12615682

    申请日:2009-11-10

    IPC分类号: H01L21/48

    摘要: The present invention discloses a semiconductor device package structure with redistribution layer (RDL) and through silicon via (TSV) techniques. The package structure comprises an electronic element which includes a dielectric layer on a backside surface of the electronic element, a plurality of first conductive through vias across through the electronic element and the dielectric layer, and a plurality of conductive pads accompanying the first conductive through vias on an active surface of the electronic element; a filler material disposed adjacent to the electronic element; a first redistribution layer disposed over the dielectric layer and the filler material, and connected to the first conductive through vias; a first protective layer disposed over the active surface of the electronic element, the conductive pads, and the filler material; and a second protective layer disposed over the redistribution layer, the dielectric layer, and the filler material.

    摘要翻译: 本发明公开了一种具有再分配层(RDL)和硅通孔(TSV)技术的半导体器件封装结构。 封装结构包括电子元件,该电子元件包括在电子元件的背面上的电介质层,穿过电子元件和电介质层的多个第一导电通孔以及伴随第一导电通孔的多个导电垫 在电子元件的有效表面上; 设置在电子元件附近的填充材料; 设置在电介质层和填充材料之上并连接到第一导电通孔的第一再分配层; 设置在电子元件的有源表面上的第一保护层,导电焊盘和填充材料; 以及设置在再分布层,电介质层和填充材料之上的第二保护层。

    PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF
    3.
    发明申请
    PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF 有权
    包装结构及其制造方法

    公开(公告)号:US20110108977A1

    公开(公告)日:2011-05-12

    申请号:US12615682

    申请日:2009-11-10

    IPC分类号: H01L23/48 H01L21/60

    摘要: The present invention discloses a semiconductor device package structure with redistribution layer (RDL) and through silicon via (TSV) techniques. The package structure comprises an electronic element which includes a dielectric layer on a backside surface of the electronic element, a plurality of first conductive through vias across through the electronic element and the dielectric layer, and a plurality of conductive pads accompanying the first conductive through vias on an active surface of the electronic element; a filler material disposed adjacent to the electronic element; a first redistribution layer disposed over the dielectric layer and the filler material, and connected to the first conductive through vias; a first protective layer disposed over the active surface of the electronic element, the conductive pads, and the filler material; and a second protective layer disposed over the redistribution layer, the dielectric layer, and the filler material.

    摘要翻译: 本发明公开了一种具有再分配层(RDL)和硅通孔(TSV)技术的半导体器件封装结构。 封装结构包括电子元件,该电子元件包括在电子元件的背面上的电介质层,穿过电子元件和电介质层的多个第一导电通孔以及伴随第一导电通孔的多个导电垫 在电子元件的有效表面上; 设置在电子元件附近的填充材料; 设置在电介质层和填充材料之上并连接到第一导电通孔的第一再分配层; 设置在电子元件的有源表面上的第一保护层,导电焊盘和填充材料; 以及设置在再分布层,电介质层和填充材料之上的第二保护层。

    Package structure
    5.
    发明授权
    Package structure 有权
    包装结构

    公开(公告)号:US08749048B2

    公开(公告)日:2014-06-10

    申请号:US13091484

    申请日:2011-04-21

    IPC分类号: H01L23/48

    摘要: The present invention discloses a semiconductor device package structure with redistribution layer (RDL) and through silicon via (TSV) techniques. The package structure comprises an electronic element which includes an dielectric layer on a backside surface of the electronic element, a plurality of first conductive through vias across through the electronic element and the dielectric layer, and a plurality of conductive pads accompanying with the first conductive through vias on an active surface of the electronic element; a filler material disposed adjacent to the electronic element; a first redistribution layer disposed over the dielectric layer and the filler material, and connected to the first conductive through vias; a first protective layer disposed over the active surface of the electronic element, the conductive pads, and the filler material; and a second protective layer disposed over the redistribution layer, the dielectric layer, and the filler material.

    摘要翻译: 本发明公开了一种具有再分配层(RDL)和硅通孔(TSV)技术的半导体器件封装结构。 封装结构包括电子元件,该电子元件包括在电子元件的背面上的电介质层,穿过电子元件和电介质层的多个第一导电通孔,和与第一导电通孔 电子元件的活性表面上的通孔; 设置在电子元件附近的填充材料; 设置在电介质层和填充材料之上并连接到第一导电通孔的第一再分配层; 设置在电子元件的有源表面上的第一保护层,导电焊盘和填充材料; 以及设置在再分布层,电介质层和填充材料之上的第二保护层。