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    Device for measuring quantities of heat while simultaneously measuring the evaporation kinetics and/or condensation kinetics of the most minute amounts of liquid in order to determine thermodynamic parameters
    1.
    发明申请
    Device for measuring quantities of heat while simultaneously measuring the evaporation kinetics and/or condensation kinetics of the most minute amounts of liquid in order to determine thermodynamic parameters 有权
    用于测量热量的装置，同时测量最少量液体的蒸发动力学和/或冷凝动力学，以确定热力学参数

    公开(公告)号：US20050141587A1

    公开(公告)日：2005-06-30

    申请号：US10504359

    申请日：2003-02-11

    申请人： Peter Muhlig ,  Thomas Klupsch ,  Rolf Hilgenfeld ,  Hans-Jurgen Kiel ,  Axel Walter

    发明人： Peter Muhlig ,  Thomas Klupsch ,  Rolf Hilgenfeld ,  Hans-Jurgen Kiel ,  Axel Walter

    IPC分类号： G01K17/00 ,  G01N25/02 ,  G01N25/20 ,  G01N25/48 ,  G01N25/00 ,  G01J5/00

    CPC分类号： G01N25/02 ,  G01K17/006 ,  G01N25/4846

    摘要： The invention relates to a device for measuring quantities of heat while simultaneously measuring the evaporation kinetics and/or condensation kinetics of the most minute amounts of liquid in order to determine thermodynamic parameters. The aim of the invention is to determine low thermal outputs, which are absorbed or released by the sample, as well as small differences between thermal outputs with regard to a reference measurement of the same magnitude. To this end, a most minute amount of liquid is located inside a measuring chamber having a constant temperature and air humidity. At least one thermal sensor is provided for repeatedly measuring the thermal radiation emitted from the most minute amount of liquid. A measuring means serves to determine the time-dependent change in the most minute amount of liquid. A computer is assigned to the measuring chamber in order to register, display, evaluate and/or subsequently process the measured values.

    摘要翻译： 本发明涉及一种用于测量热量的装置，同时测量最微量的液体的蒸发动力学和/或冷凝动力学，以便确定热力学参数。 本发明的目的是确定由样品吸收或释放的低热输出以及相对于相同量值的参考测量的热输出之间的小差异。 为此，最小量的液体位于具有恒定温度和空气湿度的测量室内。 提供至少一个热传感器用于重复测量从最微量的液体发射的热辐射。 测量装置用于确定最微量的液体的时间依赖性变化。 计算机被分配到测量室以便注册，显示，评估和/或随后处理测量值。

    Tear string envelope
    2.
    发明授权
    Tear string envelope 失效
    撕绳信封

    公开(公告)号：US5984170A

    公开(公告)日：1999-11-16

    申请号：US950540

    申请日：1997-10-15

    申请人： Axel Walter Scheuren

    发明人： Axel Walter Scheuren

    IPC分类号： B65D27/38

    CPC分类号： B65D27/38

    摘要： A tear string envelope with the envelope made of an integral blank of sheet material and formed such that the front and rear portion of the envelope is interconnected by side flaps folded inwardly so that side edges and a lower and an upper folding edge are formed under leaving an upper insertion opening which can be closed by a gummed closing flap. The tear string extends at the inner side of an edge, with the tear string adhered at an edge different from that of the closing flap.

    摘要翻译： 具有由片材的整体坯料制成的封套的撕裂线包络，并且形成为使得封套的前部和后部通过向内折叠的侧翼互连，使得在留下时形成侧边缘和下折叠边缘和上折叠边缘 可以由胶合的封闭盖封闭的上部插入开口。 撕裂线在边缘的内侧延伸，其中撕裂线粘附在与封闭舌片的边缘不同的边缘处。

    High-density plasma etching of carbon-based low-k materials in a integrated circuit
    5.
    发明授权
    High-density plasma etching of carbon-based low-k materials in a integrated circuit 失效
    集成电路中碳基低k材料的高密度等离子体蚀刻

    公开(公告)号：US06284149B1

    公开(公告)日：2001-09-04

    申请号：US09156956

    申请日：1998-09-18

    申请人： Zongyu Li ,  Karsten Schneider ,  Axel Walter ,  Jian Ding

    发明人： Zongyu Li ,  Karsten Schneider ,  Axel Walter ,  Jian Ding

    IPC分类号： H01L21033

    CPC分类号： H01L21/7681 ,  H01J37/321 ,  H01J37/32706 ,  H01L21/31138 ,  H01L21/76804 ,  H01L21/76807

    摘要： A plasma etching process for etching a carbon-based low-k dielectric layer in a multi-layer inter-level dielectric. The low-k dielectric may be divinyl siloxane-benzocyclobutene (BCB), which contains about 4% silicon, the remainder being carbon, hydrogen, and a little oxygen. The BCB etch uses an etching gas of oxygen, a fluorocarbon, and nitrogen and no argon. An N2/O2 ratio of between 1:1 and 3:1 produces vertical walls in the BCB. In a dual-damascene structure, the inter-level dielectric includes two BCB layers, each underlaid by a respective stop layer. Photolithography with an organic photoresist needs a hard mask of silicon oxide or nitride over the upper BCB layer. After the BCB etch has cleared all the photoresist, the bias power applied to the cathode supporting the wafer needs to be set to a low value while the separately controlled plasma source power is set reasonably high, thereby reducing faceting of the exposed hard mask. Chamber pressures of no more than 5 milliTorr increase the selectivity of BCB over photoresist. Substrate temperatures of less than 0° C. increase the BCB etch rate. A low fluorocarbon flow increases the etch rate, but a minimum amount of fluorocarbon is required for the silicon component of BCB. In a counterbore dual-damascene etch, the lower stop layer is composed of nitride, and the preferred fluorocarbon is difluoroethane (CH2F2). A silicon-free carbon-based low-k dielectric can be etched under similar chamber conditions with a etching gas of oxygen and nitrogen in about equal amounts but including no fluorocarbon nor argon.

    摘要翻译： 一种用于蚀刻多层级间电介质中的碳基低k电介质层的等离子体蚀刻工艺。 低k电介质可以是二乙烯基硅氧烷 - 苯并环丁烯（BCB），其含有约4％的硅，其余是碳，氢和少量的氧。 BCB蚀刻使用氧气，碳氟化合物和氮气的蚀刻气体，而不使用氩气。 在1：1和3：1之间的N2 / O2比率在BCB中产生垂直壁。 在双镶嵌结构中，层间电介质包括两个BCB层，每个BCB层由相应的停止层覆盖。 使用有机光致抗蚀剂的光刻法需要在上BCB层上的氧化硅或氮化物的硬掩模。 在BCB蚀刻已经清除了所有光致抗蚀剂之后，施加到支撑晶片的阴极的偏置功率需要被设置为低值，而单独控制的等离子体源功率被设置得相当高，从而减少了暴露的硬掩模的刻痕。 室压不超过5毫乇可提高BCB对光致抗蚀剂的选择性。 衬底温度小于0℃会增加BCB蚀刻速率。 低碳氟化合物流量增加了蚀刻速率，但BCB的硅组分需要最少量的碳氟化合物。 在沉孔双镶嵌蚀刻中，下停止层由氮化物组成，优选的碳氟化合物是二氟乙烷（CH 2 F 2）。 可以在类似的腔室条件下用大约相等量的氧和氮的蚀刻气体蚀刻无硅碳基低k电介质，但不包括氟碳和氩。

    Device for measuring quantities of heat while simultaneously measuring the evaporation kinetics and/or condensation kinetics of the most minute amounts of liquid in order to determine thermodynamic parameters
    7.
    发明授权
    Device for measuring quantities of heat while simultaneously measuring the evaporation kinetics and/or condensation kinetics of the most minute amounts of liquid in order to determine thermodynamic parameters 有权
    用于测量热量的装置，同时测量最少量液体的蒸发动力学和/或冷凝动力学，以确定热力学参数

    公开(公告)号：US07137734B2

    公开(公告)日：2006-11-21

    申请号：US10504359

    申请日：2003-02-11

    申请人： Peter Muehlig ,  Thomas Klupsch ,  Rolf Hilgenfeld ,  Hans-Juergen Kiel ,  Axel Walter

    发明人： Peter Muehlig ,  Thomas Klupsch ,  Rolf Hilgenfeld ,  Hans-Juergen Kiel ,  Axel Walter

    IPC分类号： G01N25/02

    CPC分类号： G01N25/02 ,  G01K17/006 ,  G01N25/4846

    摘要： The invention relates to a device for measuring quantities of heat while simultaneously measuring the evaporation kinetics and/or condensation kinetics of the most minute amounts of liquid in order to determine thermodynamic parameters. The aim of the invention is to determine low thermal outputs, which are absorbed or released by the sample, as well as small differences between thermal outputs with regard to a reference measurement of the same magnitude. To this end, a most minute amount of liquid is located inside a measuring chamber having a constant temperature and air humidity. At least one thermal sensor is provided for repeatedly measuring the thermal radiation emitted from the most minute amount of liquid. A measuring means serves to determine the time-dependent change in the most minute amount of liquid. A computer is assigned to the measuring chamber in order to register, display, evaluate and/or subsequently process the measured values.

    摘要翻译： 本发明涉及一种用于测量热量的装置，同时测量最少量液体的蒸发动力学和/或冷凝动力学，以便确定热力学参数。 本发明的目的是确定由样品吸收或释放的低热输出以及相对于相同量值的参考测量的热输出之间的小差异。 为此，最小量的液体位于具有恒定温度和空气湿度的测量室内。 提供至少一个热传感器用于重复测量从最微量的液体发射的热辐射。 测量装置用于确定最微量的液体的时间依赖性变化。 计算机被分配到测量室以便注册，显示，评估和/或随后处理测量值。