公开(公告)号：US08310042B2

公开(公告)日：2012-11-13

申请号：US11424183

申请日：2006-06-14

Applicant: Alexander J. Elliott ,  L. M. Mahalingam ,  William M. Strom

Inventor： Alexander J. Elliott ,  L. M. Mahalingam ,  William M. Strom

IPC: H01L23/10 ,  H01L23/34

CPC classification number: H01L21/4842 ,  H01L21/4878 ,  H01L23/4334 ,  H01L2924/0002 ,  Y10T29/49121 ,  H01L2924/00

Abstract: A system of mold locks (28, 30) is formed on a heatsink (2) of a packaged semiconductor to prevent/mitigate delamination. The mold locks (4, 12) anchor a plastic mold compound (34) that forms the protective cover for the packaged semiconductor die. The mold locks (4, 12) are miniaturized to allow the positioning of them within the flag portion of the heatsink (2) and leadframe (24) such that a semiconductor die can be anchored above the mold locks (4, 12) formed within the flag portion of the heatsink/lead frame (2, 24). The miniaturized size of the said moldlocks (4, 12 do not detract from the purpose of the die attach solder (36).

Abstract translation: 在封装半导体的散热器（2）上形成模具锁（28,30）的系统，以防止/减轻分层。 模具锁（4,12）锚固形成用于封装的半导体管芯的保护盖的塑料模具化合物（34）。 模具锁（4,12）被小型化以允许它们定位在散热器（2）和引线框架（24）的标志部分内，使得半导体管芯可以锚固在形成在其内的模具锁（4,12）的上方 散热器/引线框架的标志部分（2,24）。 所述模具锁（4,12）的小型化尺寸不会降低芯片附着焊料（36）的目的。

公开(公告)号：US07701074B2

公开(公告)日：2010-04-20

申请号：US12204500

申请日：2008-09-04

Applicant: Brian W. Condie ,  L. M. Mahalingam ,  Mahesh K. Shah

Inventor： Brian W. Condie ,  L. M. Mahalingam ,  Mahesh K. Shah

IPC: H01L23/29

CPC classification number: H01L23/3135 ,  H01L23/295 ,  H01L23/4334 ,  H01L24/48 ,  H01L2224/05553 ,  H01L2224/48247 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/01021 ,  H01L2924/09701 ,  H01L2924/10161 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/3025 ,  H01L2224/85 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: An embodiment of a semiconductor device includes a supporting member, a semiconductor die mounted on a portion of the supporting member, a buffer region, and a plastic encapsulation. The buffer region covers a portion of the die, and includes a resin and filler particles packed within the resin. The filler particles have a mix of filler sizes and are tightly packed within the resin. The buffer region has a first dielectric constant and a first loss tangent. The plastic encapsulation encloses at least part of the supporting member and the die. The plastic encapsulation includes a plastic material of a second dielectric constant and a second loss tangent, where the second dielectric constant is larger than the first dielectric constant and the second loss tangent is larger than the first loss tangent.

Abstract translation: 半导体器件的实施例包括支撑构件，安装在支撑构件的一部分上的半导体管芯，缓冲区域和塑料封装。 缓冲区域覆盖模具的一部分，并且包括填充在树脂内的树脂和填料颗粒。 填料颗粒具有填料尺寸的混合物并且紧密地包装在树脂内。 缓冲区具有第一介电常数和第一损耗角正切。 塑料封装包围支撑构件和模具的至少一部分。 塑料封装包括第二介电常数和第二损耗角正切的塑料材料，其中第二介电常数大于第一介电常数，第二损耗角正切大于第一损耗角正切。

公开(公告)号：US20150294921A1

公开(公告)日：2015-10-15

申请号：US14249538

申请日：2014-04-10

Applicant: LAKSHMINARAYAN VISWANATHAN ,  Bruce M. Green ,  Darrell G. Hill ,  L. M. Mahalingam

Inventor： LAKSHMINARAYAN VISWANATHAN ,  Bruce M. Green ,  Darrell G. Hill ,  L. M. Mahalingam

IPC: H01L23/367 ,  H01L21/762 ,  H01L29/778 ,  H01L21/04 ,  H01L21/28 ,  H01L29/06 ,  H01L21/3205

CPC classification number: H01L23/373 ,  H01L21/042 ,  H01L21/0475 ,  H01L21/28 ,  H01L21/32051 ,  H01L21/762 ,  H01L23/367 ,  H01L23/3677 ,  H01L23/481 ,  H01L24/05 ,  H01L24/29 ,  H01L29/2003 ,  H01L29/205 ,  H01L29/4175 ,  H01L29/66462 ,  H01L29/7786 ,  H01L29/7787 ,  H01L2224/04026 ,  H01L2224/29026 ,  H01L2224/29111 ,  H01L2224/29116 ,  H01L2224/29139 ,  H01L2224/29144 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An embodiment of a semiconductor device includes a semiconductor substrate that includes a host substrate and an upper surface, an active area, a substrate opening in the semiconductor substrate that is partially defined by a recessed surface, and a thermally conductive layer disposed over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate within the active area. A method for fabricating the semiconductor device includes defining an active area, forming a gate electrode over a channel in the active area, forming a source electrode and a drain electrode in the active area on opposite sides of the gate electrode, etching a substrate opening in the semiconductor substrate that is partially defined by the recessed surface, and depositing a thermally conductive layer over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate over the channel.

Abstract translation: 半导体器件的实施例包括半导体衬底，其包括主体衬底和上表面，有源区域，半导体衬底中的由凹陷表面局部限定的衬底开口，以及设置在半导体衬底上的导热层 其在有源区域内在凹入表面和半导体衬底的一部分之间延伸。 制造半导体器件的方法包括限定有源区域，在有源区域中的沟道上形成栅电极，在栅电极的相对侧上的有源区域中形成源电极和漏电极，蚀刻栅电极的衬底开口 所述半导体衬底由所述凹陷表面部分地限定，并且在所述半导体衬底上沉积导热层，所述导热层在所述沟道上在所述凹陷表面和所述半导体衬底的一部分之间延伸。

公开(公告)号：US09099567B2

公开(公告)日：2015-08-04

申请号：US14089744

申请日：2013-11-25

Applicant: Lakshminarayan Viswanathan ,  L. M. Mahalingam ,  David F. Abdo ,  Jaynal A. Molla

Inventor： Lakshminarayan Viswanathan ,  L. M. Mahalingam ,  David F. Abdo ,  Jaynal A. Molla

IPC: H01L21/50 ,  H01L21/48 ,  H01L21/44 ,  H01L23/00 ,  H05K1/14 ,  B23K20/02 ,  B23K35/02 ,  B23K20/24 ,  B23K20/16 ,  B23K20/10 ,  B23K20/00

CPC classification number: H01L24/73 ,  B23K20/002 ,  B23K20/023 ,  B23K20/10 ,  B23K20/16 ,  B23K20/24 ,  B23K35/0244 ,  H01L23/3107 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/49 ,  H01L24/75 ,  H01L24/83 ,  H01L24/95 ,  H01L2224/05611 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/29139 ,  H01L2224/29144 ,  H01L2224/29147 ,  H01L2224/29155 ,  H01L2224/29164 ,  H01L2224/29339 ,  H01L2224/29344 ,  H01L2224/29347 ,  H01L2224/29355 ,  H01L2224/29364 ,  H01L2224/32225 ,  H01L2224/32238 ,  H01L2224/32245 ,  H01L2224/32258 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48137 ,  H01L2224/48227 ,  H01L2224/48247 ,  H01L2224/73265 ,  H01L2224/75315 ,  H01L2224/75317 ,  H01L2224/83192 ,  H01L2224/83203 ,  H01L2224/83365 ,  H01L2224/83385 ,  H01L2224/83439 ,  H01L2224/83444 ,  H01L2224/83447 ,  H01L2224/83455 ,  H01L2224/8348 ,  H01L2224/83484 ,  H01L2224/8384 ,  H01L2224/92247 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01322 ,  H01L2924/04541 ,  H01L2924/04642 ,  H01L2924/0503 ,  H01L2924/1306 ,  H01L2924/15724 ,  H01L2924/15747 ,  H01L2924/15786 ,  H01L2924/15793 ,  H01L2924/181 ,  H05K3/284 ,  H05K2201/09872 ,  H05K2201/2072 ,  H05K2203/1322 ,  H01L2924/00 ,  H01L2224/45099 ,  H01L2924/00012 ,  H01L2224/45015 ,  H01L2924/207 ,  H01L2224/05599

Abstract: An embodiment of a method of attaching a semiconductor die to a substrate includes placing a bottom surface of the die over a top surface of the substrate with an intervening die attach material. The method further includes contacting a top surface of the semiconductor die and the top surface of the substrate with a conformal structure that includes a non-solid, pressure transmissive material, and applying a pressure to the conformal structure. The pressure is transmitted by the non-solid, pressure transmissive material to the top surface of the semiconductor die. The method further includes, while applying the pressure, exposing the assembly to a temperature that is sufficient to cause the die attach material to sinter. Before placing the die over the substrate, conductive mechanical lock features may be formed on the top surface of the substrate, and/or on the bottom surface of the semiconductor die.

Abstract translation: 将半导体管芯附接到衬底的方法的实施例包括使用插入的管芯附着材料将管芯的底表面放置在衬底的顶表面上。 该方法还包括使半导体管芯的顶表面和衬底的顶表面与保形结构接触，该保形结构包括非固体，压力传递材料，并向保形结构施加压力。 压力通过非固体的压力传递材料传递到半导体管芯的顶表面。 该方法还包括在施加压力的同时，将组件暴露于足以使管芯附着材料烧结的温度。 在将管芯置于衬底上之前，可以在衬底的顶表面和/或半导体管芯的底表面上形成导电的机械锁定特征。

公开(公告)号：US09362198B2

公开(公告)日：2016-06-07

申请号：US14249538

申请日：2014-04-10

Applicant: Lakshminarayan Viswanathan ,  Bruce M. Green ,  Darrell G. Hill ,  L M Mahalingam

Inventor： Lakshminarayan Viswanathan ,  Bruce M. Green ,  Darrell G. Hill ,  L M Mahalingam

IPC: H01L31/102 ,  H01L23/367 ,  H01L21/762 ,  H01L21/3205 ,  H01L21/04 ,  H01L21/28 ,  H01L29/778 ,  H01L29/66 ,  H01L29/417 ,  H01L29/20

CPC classification number: H01L23/373 ,  H01L21/042 ,  H01L21/0475 ,  H01L21/28 ,  H01L21/32051 ,  H01L21/762 ,  H01L23/367 ,  H01L23/3677 ,  H01L23/481 ,  H01L24/05 ,  H01L24/29 ,  H01L29/2003 ,  H01L29/205 ,  H01L29/4175 ,  H01L29/66462 ,  H01L29/7786 ,  H01L29/7787 ,  H01L2224/04026 ,  H01L2224/29026 ,  H01L2224/29111 ,  H01L2224/29116 ,  H01L2224/29139 ,  H01L2224/29144 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An embodiment of a semiconductor device includes a semiconductor substrate that includes a host substrate and an upper surface, an active area, a substrate opening in the semiconductor substrate that is partially defined by a recessed surface, and a thermally conductive layer disposed over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate within the active area. A method for fabricating the semiconductor device includes defining an active area, forming a gate electrode over a channel in the active area, forming a source electrode and a drain electrode in the active area on opposite sides of the gate electrode, etching a substrate opening in the semiconductor substrate that is partially defined by the recessed surface, and depositing a thermally conductive layer over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate over the channel.

Abstract translation: 半导体器件的实施例包括半导体衬底，其包括主体衬底和上表面，有源区域，半导体衬底中的由凹陷表面局部限定的衬底开口，以及设置在半导体衬底上的导热层 其在有源区域内在凹入表面和半导体衬底的一部分之间延伸。 制造半导体器件的方法包括限定有源区域，在有源区域中的沟道上形成栅电极，在栅电极的相对侧上的有源区域中形成源电极和漏电极，蚀刻栅电极的衬底开口 所述半导体衬底由所述凹陷表面部分地限定，并且在所述半导体衬底上沉积导热层，所述导热层在所述沟道上在所述凹陷表面和所述半导体衬底的一部分之间延伸。