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公开(公告)号：US07945572B2
公开(公告)日：2011-05-17
申请号：US12053224
申请日：2008-03-21
Applicant: Brett D. Lapin , David W. Porter
Inventor： Brett D. Lapin , David W. Porter
IPC: G06F17/30
CPC classification number: G06F17/30539 , Y10S707/99936 , Y10S707/99937
Abstract: The present invention provides systems and methods for automatically mining massive intelligence databases to discover sequential patterns therein using a novel combination of forward and reverse temporal processing techniques as an enhancement to well known pattern discovery algorithms.
Abstract translation: 本发明提供用于使用前向和反向时间处理技术的新颖组合作为对众所周知的模式发现算法的增强来自动挖掘大量智能数据库以发现其中的顺序模式的系统和方法。
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公开(公告)号：US20090228443A1
公开(公告)日：2009-09-10
申请号：US12053224
申请日：2008-03-21
Applicant: Brett D. Lapin , David W. Porter
Inventor： Brett D. Lapin , David W. Porter
CPC classification number: G06F17/30539 , Y10S707/99936 , Y10S707/99937
Abstract: The present invention provides systems and methods for automatically mining massive intelligence databases to discover sequential patterns therein using a novel combination of forward and reverse temporal processing techniques as an enhancement to well known pattern discovery algorithms.
Abstract translation: 本发明提供用于使用前向和反向时间处理技术的新颖组合作为对众所周知的模式发现算法的增强来自动挖掘大量智能数据库以发现其中的顺序模式的系统和方法。
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公开(公告)号：US09296154B1
公开(公告)日：2016-03-29
申请号：US12221838
申请日：2008-08-07
Applicant: David W. Porter
Inventor： David W. Porter
CPC classification number: B29C65/7841 , B29C65/20 , B29C65/305 , B29C66/0042 , B29C66/1142 , B29C66/3472 , B29C66/5221 , B29C66/71 , B29C66/8122 , B29C66/8167 , B29C66/81831 , B29C66/8414 , B29C66/91212 , B29C66/91213 , B29C66/91231 , B29C66/91421 , B29C66/91651 , H05B3/40 , B29K2023/00 , B29K2827/18
Abstract: A heater plate for butt fusion of polyolefin pipe has concentric rings, each with an array of radial bores containing cartridge heaters, and a concentric cavity between the rings to carry wiring from the cartridge heaters. The inner ring components are symmetrical to provide a foundation for uniform surface temperature distribution across the entire area of the inner ring. The outer ring components are coordinated to counterbalance the heat sinks resulting from their asymmetrical configuration so as to increase the likelihood that the uniform surface temperature distribution foundation established for the entire area of the inner ring can be maintained and so that the total diameter of the heater plate, including the outer ring, can be used in fusing pipe.
Abstract translation: 用于聚烯烃管的对接熔化的加热器板具有同心环，每个具有包含筒式加热器的径向孔阵列，以及环之间的同心腔，以承载来自筒式加热器的布线。 内环组件是对称的，为内环整个区域的均匀表面温度分布提供基础。 外圈部件被配置以平衡由它们的不对称构造产生的散热器，从而增加了为内圈的整个区域建立的均匀的表面温度分布基础的可能性，并且使得加热器的总直径 板，包括外圈，可用于熔接管。
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公开(公告)号：US5729451A
公开(公告)日：1998-03-17
申请号：US566353
申请日：1995-12-01
Applicant: Bruce P. Gibbs , David W. Porter , William E. Yancey
Inventor： Bruce P. Gibbs , David W. Porter , William E. Yancey
IPC: G06F17/17
CPC classification number: G06F17/17
Abstract: A data fusion workstation apparatus and method utilizes algorithms and can be used for applications such as, e.g., hydrogeological modeling, steady-state hydrological flow modeling, transport uncertainty determination, flow/transport fusion, oil reserve management, water supply development, geo-technical engineering projects, and management decision optimization. The invention uses a spatial continuity model which is extended to 3D and equations are provided for computation of the spatial AR coefficients from a desired covariance function. The data fusion workstation provides more robust optimization iterations by use of an algorithm that includes Trust Region or Step Halving methods to limit the Gauss Newton step in solving non-linear least squares problems. Measurement biases and error parameters, and parameters which define a hydrological flow model can be included in the common set of estimated states. An LSQR or other iterative algorithm is used to reduce the computation time for each step of a nonlinear optimization, thereby allowing computation of problems having a very large number of states. The invention preferably provides transport uncertainty calculations in a fusion post-processing step. The invention allows contaminant measurements to be used with hydraulic head and conductivity measurements for better calibration of flow and transport models.
Abstract translation: 数据融合工作站设备和方法利用算法，可用于水文地质建模，稳态水文流量建模，运输不确定性确定，流量/运输融合，储油管理，供水开发，地质技术 工程项目和管理决策优化。 本发明使用延伸到3D的空间连续性模型，并且提供用于从期望的协方差函数计算空间AR系数的等式。 数据融合工作站通过使用包含Trust Region或Step Halving方法的算法来提供更强大的优化迭代，以限制高斯牛顿步骤求解非线性最小二乘问题。 测量偏差和误差参数以及定义水文流模型的参数可以包含在共同的一组估计状态中。 使用LSQR或其他迭代算法来减少非线性优化的每个步骤的计算时间，从而允许计算具有非常大数量的状态的问题。 本发明优选地在融合后处理步骤中提供运输不确定性计算。 本发明允许污染物测量与液压头和电导率测量一起使用，以更好地校准流动和运输模型。
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公开(公告)号：US5321613A
公开(公告)日：1994-06-14
申请号：US974405
申请日：1992-11-12
Applicant: David W. Porter , James S. Vandergraft , Buddy G. Beck , Bruce P. Gibbs
Inventor： David W. Porter , James S. Vandergraft , Buddy G. Beck , Bruce P. Gibbs
CPC classification number: G06K9/0057 , G01S13/86 , G01V11/00 , G06K9/6289
Abstract: A data fusion workstation provides an apparatus and method for realizing the full potential of geophysical and remote sensing by mathematically integrating sensors with each other. Sensor data from each of a plurality of sensor types are related mathematically to each other through a common site model to produce a fused picture with quantified accuracy. Using the concept of pseudo-data, information in sensor data is made equivalent to data in a statistical correlation model, allowing fusion of model information with sensor data during a data inversion step. The process of data fusion comprises several processing steps, which are executed by various microprocessors in a recursire/distributed/parallel-architecture platform. These steps comprise geophysical inversion, geostatistical Kriging, application of statistical information concepts, implementation of a square root information smoother, and application of likelihood techniques.
Abstract translation: 数据融合工作站提供了一种通过数字地将传感器相互集成来实现地球物理和遥感的全部潜力的装置和方法。 来自多个传感器类型中的每一个的传感器数据通过公共站点模型在数学上相互关联，以产生具有量化精度的融合图像。 使用伪数据的概念，传感器数据中的信息等同于统计相关模型中的数据，允许在数据反转步骤期间将模型信息与传感器数据融合。 数据融合的过程包括由递归/分布式/并行架构平台中的各种微处理器执行的几个处理步骤。 这些步骤包括地球物理反演，地统计克里金，统计信息概念的应用，平方根信息平滑的实现以及可能性技术的应用。
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Patent Agency Ranking
6.发明授权Dynamic current distribution control apparatus and method for wafer electroplating 有权晶圆电镀动态电流分配控制装置及方法公开(公告)号：US09045840B2
公开(公告)日：2015-06-02
申请号：US13306527
申请日：2011-11-29
Applicant: David W. Porter , Jonathan D. Reid , Frederick D. Wilmot
Inventor： David W. Porter , Jonathan D. Reid , Frederick D. Wilmot
CPC classification number: C25D17/001 , C25D17/002 , C25D17/007 , C25D17/06 , C25D17/10 , C25D17/12 , C25D21/12
Abstract: Methods, systems, and apparatus for plating a metal onto a work piece are described. In one aspect, an apparatus includes a plating chamber, a substrate holder, an anode chamber housing an anode, and an ionically resistive ionically permeable element positioned between a substrate and the anode chamber during electroplating. The anode chamber may be movable with respect to the ionically resistive ionically permeable element to vary a distance between the anode chamber and the ionically resistive ionically permeable element during electroplating. The anode chamber may include an insulating shield oriented between the anode and the ionically resistive ionically permeable element, with opening in a central region of the insulating shield.
Abstract translation: 描述了将金属电镀到工件上的方法，系统和装置。 一方面，一种设备包括电镀室，衬底保持器，容纳阳极的阳极室和在电镀期间定位在衬底和阳极室之间的离子电离性离子渗透元件。 阳极室可以相对于离子电离性离子渗透元件移动，以在电镀期间改变阳极室和离子电阻性离子可渗透元件之间的距离。 阳极室可以包括定向在阳极和离子电离性离子渗透元件之间的绝缘屏蔽，其在绝缘屏蔽的中心区域中开口。
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7.发明授权公开(公告)号：US08603305B2
公开(公告)日：2013-12-10
申请号：US13051822
申请日：2011-03-18
Applicant: Robert Rash , Richard Abraham , David W. Porter , Steven T. Mayer
Inventor： Robert Rash , Richard Abraham , David W. Porter , Steven T. Mayer
CPC classification number: C25D5/08 , C25D5/006 , C25D17/00 , C25D17/002 , C25D21/04 , C25D21/06 , C25D21/14 , C25D21/18
Abstract: An electrolyte, and particularly anolyte, may be circulated via an open loop having a pressure regulator, so that the pressure in the plating chamber is maintained at a constant (or substantially constant) value with respect to atmospheric pressure. In these embodiments, a pressure regulator is in fluid communication with the anode chamber.
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公开(公告)号：US08530359B2
公开(公告)日：2013-09-10
申请号：US12462424
申请日：2009-08-04
Applicant: Steven T. Mayer , David W. Porter
Inventor： Steven T. Mayer , David W. Porter
IPC: H01I21/302
CPC classification number: H01L21/6708 , C23F1/08 , C23F1/34 , C25F3/12 , H01L21/32115 , H01L21/32134
Abstract: An apparatus for wet etching metal from a semiconductor wafer comprises a wafer holder for rotating a wafer and a plurality of nozzles for applying separate flow patterns of etching liquid to the surface of the wafer. The flow patterns impact the wafer in distinct band-like impact zones. The flow pattern of etching liquid from at least one nozzle is modulated during a total etching time control the cumulative etching rate in one local etch region relative to the cumulative etching rate in one or more other local etch regions. Some embodiments include a lower etch chamber and an upper rinse chamber separated by a horizontal splash shield. Some embodiments include a retractable vertical splash shield used to prevent splashing of etching liquid onto the inside walls of a treatment container. An etch-liquid delivery system includes a plurality of nozzle flow paths having corresponding nozzle flow resistances, and a plurality of drain flow paths having corresponding drain flow resistances. Nozzle flow resistances and drain flow resistances are matched so that switching the flow from a nozzle to a corresponding drain flow path does not change the flow rate of etching liquid through other nozzles. A non-wafer-contacting measuring device measures a metal thickness on a rotating semiconductor wafer during metal wet etching by immersing a plurality of electrodes in etching liquid in close proximity to the wafer surface of the rotating wafer and determining electrical resistance between a plurality of electrodes.
Abstract translation: 用于从半导体晶片湿式蚀刻金属的设备包括用于旋转晶片的晶片保持器和用于将分离的蚀刻液体的流动图案施加到晶片的表面的多个喷嘴。 流动模式影响晶片在不同的带状冲击区域。 在总腐蚀时间期间，调制来自至少一个喷嘴的蚀刻液体的流动模式，以控制一个局部蚀刻区域中相对于一个或多个其它局部蚀刻区域中的累积蚀刻速率的累积蚀刻速率。 一些实施例包括由水平防溅罩隔开的下蚀刻室和上冲洗室。 一些实施例包括用于防止蚀刻液体溅射到处理容器的内壁上的可伸缩垂直防溅屏蔽。 蚀刻液输送系统包括具有相应的喷嘴流动阻力的多个喷嘴流动路径和具有相应的漏极流动阻力的多个排出流动路径。 喷嘴流阻和排流阻力匹配，使得从喷嘴到相应的排水流路的流动不会改变通过其它喷嘴的蚀刻液的流量。 非晶片接触测量装置通过将多个电极浸入在旋转晶片的晶片表面附近的蚀刻液中来测量金属湿蚀刻期间的旋转半导体晶片上的金属厚度，并且确定多个电极之间的电阻 。
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9.发明申请ELECTROLYTE LOOP WITH PRESSURE REGULATION FOR SEPARATED ANODE CHAMBER OF ELECTROPLATING SYSTEM 有权用于电镀系统分离阳极室的电压调节电解质环路公开(公告)号：US20110226614A1
公开(公告)日：2011-09-22
申请号：US13051822
申请日：2011-03-18
Applicant: Robert Rash , Richard Abraham , David W. Porter , Steven T. Mayer
Inventor： Robert Rash , Richard Abraham , David W. Porter , Steven T. Mayer
CPC classification number: C25D5/08 , C25D5/006 , C25D17/00 , C25D17/002 , C25D21/04 , C25D21/06 , C25D21/14 , C25D21/18
Abstract: An electrolyte, and particularly anolyte, may be circulated via an open loop having a pressure regulator, so that the pressure in the plating chamber is maintained at a constant (or substantially constant) value with respect to atmospheric pressure. In these embodiments, a pressure regulator is in fluid communication with the anode chamber.
Abstract translation: 电解质，特别是阳极电解液可以经由具有压力调节器的开环循环，使得电镀室中的压力相对于大气压维持在恒定（或基本上恒定的）值。 在这些实施例中，压力调节器与阳极室流体连通。
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10.发明申请公开(公告)号：US20100320081A1
公开(公告)日：2010-12-23
申请号：US12684792
申请日：2010-01-08
Applicant: Steven T. Mayer , David W. Porter , Mark J. Willey
Inventor： Steven T. Mayer , David W. Porter , Mark J. Willey
CPC classification number: H01L21/2885 , C25D3/38 , C25D5/003 , C25D5/02 , C25D5/34 , C25D7/123 , C25D17/001 , C25D21/04 , H01L21/76861 , H01L21/76898
Abstract: Disclosed are pre-wetting apparatus designs and methods. These apparatus designs and methods are used to pre-wet a wafer prior to plating a metal on the surface of the wafer. Disclosed compositions of the pre-wetting fluid prevent corrosion of a seed layer on the wafer and also improve the filling rates of features on the wafer.
Abstract translation: 公开了预润湿装置的设计和方法。 这些设备的设计和方法用于在将晶片上的金属镀覆在晶片表面之前预先浸湿晶片。 公开的预润湿流体的组合物防止晶片上种子层的腐蚀，并且还改善晶片上特征的填充率。
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