Abstract:
Forming of a microelectronic device including a substrate containing at least one conductive pad, the pad being provided with a bottom surface resting on the substrate and an upper surface opposite the bottom surface. The upper surface of the pad has a stack applied thereto formed of a conductive layer and a protective dielectric layer including an opening called first opening facing the pad and exposing the conductive layer. At least one insulating block is arranged on a peripheral region of the upper surface of the pad, the insulating block having a cross-section forming a closed contour and having an opening called second opening. A conductive pillar is located in the center of the contour in the second opening.
Abstract:
The invention concerns the forming of a microelectronic device comprising a substrate containing at least one conductive pad, the said pad being provided with a bottom surface resting on the substrate and an upper surface opposite said bottom surface, the said upper surface of said pad having a stack applied thereto formed of a conductive layer and a protective dielectric layer comprising an opening called first opening facing said pad and exposing the said conductive layer, at least one insulating block (120a, 120b) being arranged on a peripheral region of said upper surface of said pad, the said insulating block (120a, 120b) having a cross-section forming a closed contour and comprising an opening called second opening, a conductive pillar (130a, 130b) being located in the centre of said contour in the said second opening.
Abstract:
Method for producing a microelectronic device formed from a stack of supports (W) each provided with one or more electronic components (C) and comprising a conductive structure (170, 470) formed from a first blind conductive via (171b, 472) and a second blind conductive via (171a, 473) with a greater height, the first via and the second via being connected together.