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    Apparatus for developing photoresist and method for operating the same
    5.
    发明申请
    Apparatus for developing photoresist and method for operating the same 有权

    公开(公告)号：US20060269877A1

    公开(公告)日：2006-11-30

    申请号：US11204907

    申请日：2005-08-15

    申请人： John Boyd ,  Fritz Redeker ,  David Hemker

    发明人： John Boyd ,  Fritz Redeker ,  David Hemker

    IPC分类号： B08B3/00 ,  G03C5/00

    CPC分类号： G03F7/30 ,  B08B3/04 ,  G03F7/3092 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  Y10S134/902

    摘要： A first proximity head is configured to define a meniscus of a photoresist developer solution on a substrate. The meniscus is to be defined between a bottom of the first proximity head and the substrate. A second proximity head is configured to define a rinsing meniscus on the substrate and remove the rinsing meniscus from the substrate. The second proximity head is positioned to follow the first proximity head relative to a traversal direction of the first and second proximity heads over the substrate. Exposure of the substrate to the meniscus of photoresist developer solution causes previously irradiated photoresist material on the substrate to be developed to render a patterned photoresist layer. The first and second proximity heads enable precise control of a residence time of the photoresist developer solution on the substrate during the development process.

    Controlled ambient system for interface engineering
    7.
    发明申请
    Controlled ambient system for interface engineering 有权
    接口工程控制环境系统

    公开(公告)号：US20080057221A1

    公开(公告)日：2008-03-06

    申请号：US11639752

    申请日：2006-12-15

    申请人： John Boyd ,  Yezdi Dordi ,  Tiruchirapalli Arunagiri ,  Benjamin Mooring ,  John Parks ,  William Thie ,  Fritz Redeker ,  Arthur Howald ,  Alan Schoepp ,  David Hemker

    发明人： John Boyd ,  Yezdi Dordi ,  Tiruchirapalli Arunagiri ,  Benjamin Mooring ,  John Parks ,  William Thie ,  Fritz Redeker ,  Arthur Howald ,  Alan Schoepp ,  David Hemker

    IPC分类号： H05H1/24 ,  C23C16/00

    CPC分类号： H01L21/67225 ,  H01L21/288 ,  H01L21/6704 ,  H01L21/67167 ,  H01L21/67184 ,  H01L21/6723 ,  H01L21/76849

    摘要： A cluster architecture and methods for processing a substrate are disclosed. The cluster architecture includes a lab-ambient controlled transfer module that is coupled to one or more wet substrate processing modules. The lab-ambient controlled transfer module and the one or more wet substrate processing modules are configured to manage a first ambient environment. A vacuum transfer module that is coupled to the lab-ambient controlled transfer module and one or more plasma processing modules is also provided. The vacuum transfer module and the one or more plasma processing modules are configured to manage a second ambient environment. And, a controlled ambient transfer module that is coupled to the vacuum transfer module and one or more ambient processing modules is also included. The controlled ambient transfer module and the one or more ambient processing modules are configured to manage a third ambient environment. The cluster architecture therefore enables controlled processing of the substrate in either the first, second or third ambient environments, as well as during associated transitions.

    摘要翻译： 公开了用于处理衬底的簇结构和方法。 集群架构包括耦合到一个或多个湿式衬底处理模块的实验室环境受控传输模块。 实验室环境控制传递模块和一个或多个湿式衬底处理模块被配置为管理第一环境环境。 还提供耦合到实验室环境受控传输模块和一个或多个等离子体处理模块的真空传输模块。 真空转移模块和一个或多个等离子体处理模块被配置成管理第二周边环境。 并且，还包括耦合到真空传输模块和一个或多个环境处理模块的受控环境转移模块。 受控环境传输模块和一个或多个环境处理模块被配置为管理第三环境环境。 因此，集群架构使得能够在第一，第二或第三环境环境中以及在相关联的转换期间对衬底进行受控处理。

    Materials and gas chemistries for processing systems
    8.
    发明申请
    Materials and gas chemistries for processing systems 审中-公开
    材料和气体化学处理系统

    公开(公告)号：US20060011583A1

    公开(公告)日：2006-01-19

    申请号：US11230689

    申请日：2005-09-19

    申请人： Andrew Bailey ,  Alan Schoepp ,  David Hemker ,  Mark Wilcoxson

    发明人： Andrew Bailey ,  Alan Schoepp ,  David Hemker ,  Mark Wilcoxson

    IPC分类号： G01L21/30 ,  B44C1/22 ,  G01R31/00 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

    CPC分类号： H01J37/32467 ,  B05D1/62 ,  H01J37/32495

    摘要： A plasma processing system for processing a substrate, is disclosed. The plasma processing system includes a single chamber, substantially azimuthally symmetric plasma processing chamber within which a plasma is both ignited and sustained for the processing. The plasma processing chamber has no separate plasma generation chamber. The plasma processing chamber has an upper end and a lower end. The plasma processing chamber includes a material that does not substantially react with the reactive gas chemistries that are delivered into the plasma processing chamber. In addition, the reactant gases that are flown into the plasma processing chamber are disclosed.

    摘要翻译： 公开了一种用于处理衬底的等离子体处理系统。 等离子体处理系统包括单室，基本方位对称的等离子体处理室，其中等离子体都被点燃并持续进行处理。 等离子体处理室没有单独的等离子体产生室。 等离子体处理室具有上端和下端。 等离子体处理室包括与输送到等离子体处理室中的反应性气体化学物质基本上不反应的材料。 此外，公开了流入等离子体处理室的反应气体。

    Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection
    10.
    发明申请
    Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection 有权
    用于过程状态监测和端点检测的斜率到阈值转换的方法和装置

    公开(公告)号：US20050125202A1

    公开(公告)日：2005-06-09

    申请号：US11030374

    申请日：2005-01-05

    申请人： Yehiel Gotkis ,  Vladimir Katz ,  David Hemker ,  Rodney Kistler ,  Nicolas Bright

    发明人： Yehiel Gotkis ,  Vladimir Katz ,  David Hemker ,  Rodney Kistler ,  Nicolas Bright

    IPC分类号： G05B23/02 ,  H01L21/66 ,  H03F1/26 ,  G06F15/00 ,  H04B15/00

    CPC分类号： G05B23/0254 ,  H01L22/26

    摘要： A method for converting a slope based detection task to a threshold based detection task is provided. The method initiates with defining an approximation equation for a set of points corresponding to values of a process being monitored. Then, an expected value at a current point of the process being monitored is predicted. Next, a difference between a measured value at the current point of the process being monitored and the corresponding expected value is calculated. Then, the difference is monitored for successive points to detect a deviation value between the measured value and the expected value. Next, a transition point for the process being monitored is identified based on the detection of the deviation value. A processing system configured to provide real time data for a slope based transition and a computer readable media are also provided.

    摘要翻译： 提供了一种将基于斜率的检测任务转换为基于阈值的检测任务的方法。 该方法通过为对应于被监视的进程的值的一组点定义近似方程来启动。 然后，预测在被监视的处理的当前点的期望值。 接下来，计算被监视处理当前点的测量值与对应的期望值之间的差值。 然后，对连续点监测差异，以检测测量值和预期值之间的偏差值。 接下来，基于偏差值的检测来识别被监视处理的转变点。 还提供了一种处理系统，其被配置为提供用于基于斜率的转换的实时数据和计算机可读介质。