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    CHEMICAL MECHANICAL POLISHING APPARATUS FOR POLISHING WORKPIECE
    2.
    发明申请
    CHEMICAL MECHANICAL POLISHING APPARATUS FOR POLISHING WORKPIECE 审中-公开

    公开(公告)号：US20190262968A1

    公开(公告)日：2019-08-29

    申请号：US16412562

    申请日：2019-05-15

    申请人： EBARA CORPORATION ,  FUJIMI INCORPORATED

    发明人： Yu ISHII ,  Kenya ITO ,  Hitoshi MORINAGA ,  Kazusei TAMAI ,  Shingo OHTSUKI ,  Hiroshi ASANO

    IPC分类号： B24B37/04 ,  B24B37/30 ,  B24B37/005 ,  B24B37/10 ,  B24B37/24

    摘要： The present invention relates to a chemical mechanical polishing (CMP) apparatus for polishing a workpiece, such as a metal body, to a mirror finish. The chemical mechanical polishing apparatus includes: a polishing pad (2) having an annular polishing surface (2a) which has a curved vertical cross-section; a workpiece holder (11) for holding a workpiece (W) having a polygonal shape; a rotating device (15) configured to rotate the workpiece holder (11) about an axis of the workpiece (W); a pressing device (14) configured to press a periphery of the workpiece (W) against the annular polishing surface (2a); and an operation controller (25) configured to change a speed at which the rotating device (15) rotates the workpiece (W) according to a rotation angle of the workpiece (W). The pressing device (14) is disposed more inwardly than the workpiece holder (11) in a radial direction of the polishing table (3).

    ABRASIVES, POLISHING COMPOSITION, AND POLISHING METHOD
    3.
    发明申请
    ABRASIVES, POLISHING COMPOSITION, AND POLISHING METHOD 审中-公开

    公开(公告)号：US20170260436A1

    公开(公告)日：2017-09-14

    申请号：US15504779

    申请日：2015-09-10

    申请人： FUJIMI INCORPORATED

    发明人： Eiichi YAMADA ,  Kazusei TAMAI

    IPC分类号： C09K3/14 ,  B24B37/00

    摘要： Abrasives, a polishing composition, and a polishing method that can reduce undulation of an outer surface of a resin coating by polishing with reduced occurrence of polishing flaws. The polishing composition includes abrasives of aluminium oxide particles having a specific surface area of 5 m2/g or more and 50 m2/g or less and an average secondary particle diameter of 0.05 μm or more and 4.8 μm or less. This polishing composition can be used for polishing an outer surface of the resin coating.

    POLISHING COMPOSITION
    5.
    发明申请
    POLISHING COMPOSITION 审中-公开
    抛光组合物

    公开(公告)号：US20150291851A1

    公开(公告)日：2015-10-15

    申请号：US14686285

    申请日：2015-04-14

    申请人： FUJIMI INCORPORATED

    发明人： Hiroshi ASANO ,  Maiko ASAI ,  Hitoshi MORINAGA ,  Kazusei TAMAI

    IPC分类号： C09G1/02 ,  B24B1/00

    CPC分类号： C09G1/02 ,  B24B1/00

    摘要： A polishing composition which is able to decrease a difference in polishing rate between the alloy material and the resin, and to polish both the alloy material and the resin at a high polishing rate when polishing a substrate which contains an alloy material and a resin on the surface and has a ratio of the alloy material area to the total polishing area in a specific range is provided. To provide the polishing composition used to polish a substrate which contains an alloy material and a resin on a surface thereof and has a ratio of an alloy material area to a total polishing area of from 60 to 95%, the polishing composition containing crystalline abrasive grains having a cumulative 50% particle size (D50) based on a volume-based particle size distribution of 5.0 μm or more, an acid or a salt thereof and a water-soluble polymer.

    摘要翻译： 一种抛光组合物，其能够降低合金材料和树脂之间的抛光速度差异，并且在研磨含有合金材料和树脂的基材时，以高抛光速率对合金材料和树脂进行抛光 并且具有在特定范围内的合金材料面积与总抛光面积的比率。 为了提供用于研磨在其表面上含有合金材料和树脂的基材的抛光组合物，并且其合金材料面积与总抛光面积的比例为60-95％，所述抛光组合物含有结晶磨料颗粒 基于体积基于5.0μm以上的粒径分布的累积50％粒径（D50），酸或其盐和水溶性聚合物。

    COMPOSITION FOR POLISHING TITANIUM ALLOY MATERIAL
    6.
    发明申请
    COMPOSITION FOR POLISHING TITANIUM ALLOY MATERIAL 审中-公开

    公开(公告)号：US20170216993A1

    公开(公告)日：2017-08-03

    申请号：US15501530

    申请日：2015-05-01

    申请人： FUJIMI INCORPORATED

    发明人： Maiko ASAI ,  Kazusei TAMAI ,  Hitoshi MORINAGA ,  Hiroshi ASANO

    IPC分类号： B24B37/24 ,  C09G1/02

    CPC分类号： B24B37/24 ,  B24B37/00 ,  B24B37/044 ,  C09G1/02 ,  C09K3/1463

    摘要： Provided is a composition for polishing a titanium alloy material, which enables polishing of a titanium alloy material at a high polishing speed and can provide a polished titanium alloy material having excellent surface smoothness and having a highly glossy surface after polishing.The composition for polishing a titanium alloy material is a composition that is intended for polishing a titanium alloy material and comprises a compound having a function of dissolving at least one metal element other than titanium, which exists at a content of more than 0.5% by mass with respect to the total mass of the titanium alloy material, at a higher degree of solubility than that of titanium; and abrasive grains.

    ABRASIVE, POLISHING COMPOSITION, AND POLISHING METHOD
    8.
    发明申请
    ABRASIVE, POLISHING COMPOSITION, AND POLISHING METHOD 审中-公开

    公开(公告)号：US20190153263A1

    公开(公告)日：2019-05-23

    申请号：US16096290

    申请日：2017-01-27

    申请人： FUJIMI INCORPORATED

    发明人： Hitoshi MORINAGA ,  Kazusei TAMAI ,  Maiko ASAI ,  Yuuichi ITO ,  Kyosuke TENKO ,  Toru KAMADA

    IPC分类号： C09G1/02 ,  C09K3/14

    摘要： Provided are an abrasive, a polishing composition, and a polishing method capable of polishing the surface of an alloy or metal oxide at a sufficient polishing removal rate and providing a high-quality mirror surface. The abrasive contains alumina having an α-conversion rate of 80% or more and having a 50% particle diameter, in a volume-based cumulative particle diameter distribution, of 0.15 μm or more to 0.35 μm or less. The polishing composition contains this abrasive and has a pH of 7 or less. These abrasive and polishing composition are used for polishing polishing objects containing at least one of an alloy and a metal oxide.

    ARTICLE HAVING METAL OXIDE COATING
    10.
    发明申请
    ARTICLE HAVING METAL OXIDE COATING 审中-公开
    具有金属氧化物涂层的物品

    公开(公告)号：US20160355930A1

    公开(公告)日：2016-12-08

    申请号：US15103020

    申请日：2014-12-04

    申请人： FUJIMI INCORPORATED

    发明人： Kazusei TAMAI ,  Hitoshi MORINAGA ,  Hiroshi ASANO ,  Maiko ASAI ,  Ryo WAKABAYASHI

    IPC分类号： C23C30/00

    CPC分类号： C23C30/00 ,  C23C24/02

    摘要： Provided is an article having a metal oxide coating employing a novel configuration exhibiting both color and metallic luster. The article having a metal oxide coating disclosed herein is provided with a base material including a metal material and a metal oxide coating including a metal oxide coated onto the surface of the base material. The metal oxide coating is formed by polishing the surface of the base material, using particles composed of the metal oxide.

    摘要翻译： 提供一种具有金属氧化物涂层的制品，其采用呈现颜色和金属光泽的新颖构型。 本文公开的具有金属氧化物涂层的制品设置有包括金属材料和金属氧化物涂层的基材，该金属氧化物涂层包括涂覆在基材表面上的金属氧化物。 通过使用由金属氧化物构成的粒子研磨基材的表面而形成金属氧化物被膜。