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    High resolution gas field ion column with reduced sample load
    1.
    发明授权
    High resolution gas field ion column with reduced sample load 有权
    高分辨率气田离子柱，样品负荷降低

    公开(公告)号：US08735847B2

    公开(公告)日：2014-05-27

    申请号：US12277818

    申请日：2008-11-25

    申请人： Helmut Banzhof ,  Juergen Frosien ,  Dieter Winkler

    发明人： Helmut Banzhof ,  Juergen Frosien ,  Dieter Winkler

    IPC分类号： G21K1/08

    CPC分类号： H01J37/04 ,  H01J37/28 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/0492 ,  H01J2237/08 ,  H01J2237/0807

    摘要： A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.

    摘要翻译： 描述了具有气体场离子源的聚焦离子束装置的操作方法。 根据一些实施例，该方法包括从气体场离子源发射离子束，在离子束列中提供高于最终光束能量的离子束柱离子束能量，使离子束减速以提供最终光束 将离子束撞击在1keV至4keV的样品上的能量，并对样品进行成像。

    Achromatic mass separator
    6.
    发明授权
    Achromatic mass separator 有权
    消色差分离器

    公开(公告)号：US08049180B2

    公开(公告)日：2011-11-01

    申请号：US11925598

    申请日：2007-10-26

    申请人： Juergen Frosien ,  Helmut Banzhof

    发明人： Juergen Frosien ,  Helmut Banzhof

    IPC分类号： B01D59/44

    CPC分类号： H01J49/288 ,  H01J37/05 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/0805 ,  H01J2237/3174 ,  H01J2237/31749

    摘要： An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.

    摘要翻译： 描述了离子束装置。 离子束装置包括用于产生离子束的离子束源，沿着第一轴发射的离子束，适于使离子束成形的孔单元，以及适于使离子束的离子偏转的消色差偏转单元， 预定质量的偏转角。 无彩色偏转单元包括：用于产生电场的电场产生部件和用于产生基本上垂直于电场的磁场的磁场产生部件。 该装置还包括质量分离孔，其适于阻挡具有不同于预定质量的质量的离子，并允许具有预定质量的离子侵入质量分离器，以及具有第二光轴的物镜，其中第二光轴为 相对于第一轴倾斜。

    Charged particle beam apparatus and method for operating a charged particle beam apparatus
    7.
    发明授权
    Charged particle beam apparatus and method for operating a charged particle beam apparatus 有权
    带电粒子束装置和操作带电粒子束装置的方法

    公开(公告)号：US07838830B2

    公开(公告)日：2010-11-23

    申请号：US11923407

    申请日：2007-10-24

    申请人： Juergen Frosien ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

    发明人： Juergen Frosien ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

    IPC分类号： G01N23/00

    CPC分类号： H01J37/1478 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/2448 ,  H01J2237/26 ,  H01J2237/2806 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.

    摘要翻译： 提供带电粒子束装置，其包括用于产生初级带电粒子束的带电粒子束柱; 聚焦组件，例如带电粒子透镜，例如静电透镜，用于将初级带电粒子束聚焦在样本上; 用于检测从样本出现的带电信号颗粒的检测器; 以及用于偏转初级带电粒子束的偏转器装置。 偏转器布置布置在聚焦组件的下游，并且适于允许带电信号颗粒通过其中。 检测器在由后聚焦偏转器布置限定的偏转方向上相对于光轴横向移位。

    Multi-beam scanning electron beam device and methods of using the same
    8.
    发明授权
    Multi-beam scanning electron beam device and methods of using the same 有权
    多光束扫描电子束装置及其使用方法

    公开(公告)号：US09153413B2

    公开(公告)日：2015-10-06

    申请号：US12528307

    申请日：2008-02-22

    申请人： Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

    发明人： Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

    IPC分类号： G21K7/00 ,  H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28

    CPC分类号： H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

    摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

    摘要翻译： 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

    Electrostatic deflection system with low aberrations and vertical beam incidence
    10.
    发明授权
    Electrostatic deflection system with low aberrations and vertical beam incidence 有权
    具有低像差和垂直光束入射的静电偏转系统

    公开(公告)号：US07315029B2

    公开(公告)日：2008-01-01

    申请号：US11241880

    申请日：2005-09-30

    申请人： Dieter Winkler ,  Henry Pearce-Percy ,  Juergen Frosien ,  William J. Devore

    发明人： Dieter Winkler ,  Henry Pearce-Percy ,  Juergen Frosien ,  William J. Devore

    IPC分类号： G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

    CPC分类号： H01J37/1477 ,  H01J2237/1518 ,  H01J2237/28 ,  H01J2237/3175

    摘要： Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.

    摘要翻译： 本发明的实施例可用于改善电子束偏转。 一个实施例提供一种静电偏转系统，其具有最小化像差并且同时实现垂直入射的电极。 通过对偏转方向使用至少两个偏转级，本发明允许偏转的电子束通过物镜的后焦平面，而偏转电容器不跨过后焦平面设置。 结果，偏转电极可以具有120°的角度以最小化像差并且同时实现电子束在靶上的垂直入射，以避免目标或焦点变化的高度变化引起的变形或放大变化。