公开(公告)号：US06866982B2

公开(公告)日：2005-03-15

申请号：US10329456

申请日：2002-12-27

申请人： Hideto Kato ,  Yoshinori Hirano ,  Toshihiko Fujii ,  Hiromasa Yamaguchi

发明人： Hideto Kato ,  Yoshinori Hirano ,  Toshihiko Fujii ,  Hiromasa Yamaguchi

IPC分类号： G03F7/004 ,  G03F7/023 ,  G03F7/039 ,  G03F7/075 ,  G03F7/30

CPC分类号： G03F7/0048 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0755 ,  G03F7/0757

摘要： A resist composition comprising (A) a substantially alkali-insoluble polymer having acidic functional groups protected with acid labile groups, which becomes alkali soluble upon elimination of the acid labile groups, (B) a photoacid generator, and (C) a nonionic fluorinated organosiloxane compound consisting of perfluoroalkyl-containing siloxane bonds and polyoxyethylene type polyether bonds is exposed to UV having a wavelength of at least 150 nm and developed with an alkaline solution to form a pattern without leaving scum.

摘要翻译： 一种抗蚀剂组合物，其包含（A）具有由酸不稳定基团保护的酸性官能团的基本上不溶于碱的聚合物，其在消除酸不稳定基团时变得碱溶性，（B）光酸产生剂，和（C）非离子氟化有机硅氧烷 由包含全氟烷基的硅氧烷键和聚氧乙烯型聚醚键组成的化合物暴露于波长为至少150nm的UV并用碱性溶液显影以形成图案而不留下浮渣。

公开(公告)号：US06899991B2

公开(公告)日：2005-05-31

申请号：US10266566

申请日：2002-10-09

申请人： Hideto Kato ,  Kazumi Noda ,  Toshihiko Fujii ,  Kazuhiro Arai ,  Satoshi Asai

发明人： Hideto Kato ,  Kazumi Noda ,  Toshihiko Fujii ,  Kazuhiro Arai ,  Satoshi Asai

IPC分类号： B05D7/24 ,  C08F2/46 ,  C08G59/62 ,  C08J5/18 ,  C08K5/13 ,  C08K5/5415 ,  C08L83/04 ,  C08L83/14 ,  C09D183/14 ,  G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  G03F7/40 ,  H01L21/027

CPC分类号： G03F7/0757 ,  C09D183/14 ,  G03F7/0382 ,  Y10S430/128 ,  C08L2666/14

摘要： A photo-curable resin composition comprising (A) an organosiloxane-bearing polymer comprising recurring units of formula (1): wherein R1 to R4 are monovalent C1-C8 hydrocarbon, n is an integer of 1-1,000, and X is and having a Mw of 500-200,000, (B) a formalin-modified or formalin-alcohol-modified amino condensate, a phenol compound having on the average at least two methylol or alkoxymethylol radicals, or an epoxy compound having on the average at least two epoxy radicals, (C) a photoacid generator, and (D) a silicon compound of the formula: (R11)mSi(OR12)4−m wherein R11 is monovalent C1-C9 hydrocarbon, R12 is C1-C4 alkyl, m is 0-2, forms cured pattern films having dry etch resistance and improved adhesion to substrates.

摘要翻译： 一种光固化树脂组合物，其包含（A）含有机硅氧烷的聚合物，其包含式（1）的重复单元：其中R 1至R 4为单价C 1〜8个碳原子，n为1-1000的整数，X为Mw为500-200,000，（B）福尔马林改性或福尔马林醇 - 改性氨基缩合物，平均具有至少两个羟甲基或烷氧基羟甲基的苯酚化合物或平均具有至少两个环氧基的环氧化合物，（C）光酸产生剂，和（D）式 （R 11）其中R 11是（OR 12）其中R 11是（OR 12） SUP>是一价C 1 -C 9烃，R 12是C 1 -C 4烃基 烷基，m为0-2，形成具有耐干蚀刻性和改善对基材的粘合性的固化图案膜。

公开(公告)号：US06867325B2

公开(公告)日：2005-03-15

申请号：US10212253

申请日：2002-08-06

申请人： Hideto Kato ,  Satoshi Asai ,  Toshihiko Fujii

发明人： Hideto Kato ,  Satoshi Asai ,  Toshihiko Fujii

IPC分类号： G03F7/075 ,  B05D3/06 ,  C07F7/02 ,  C07F7/08 ,  C07F7/10 ,  C08F230/08 ,  C08G77/04 ,  C08G77/14 ,  C08G77/52 ,  H01L21/027 ,  H01L21/312

CPC分类号： C09D183/04

摘要： An organosiloxane polymer comprising recurring units of the general formula (1) and having a weight average molecular weight of 1,000-500,000 is novel. R1 to R4 are monovalent hydrocarbon groups, n is an integer of 1-2,000, X has a structure of the formula: and R5 is an acrylic functional organic group of the formula: wherein R′ is H or methyl and R″ is a divalent hydrocarbon group. A photo-curable resin composition comprising the organosiloxane polymer and a sensitizer can be cured with a wide wavelength range of light.

摘要翻译： 包含通式（1）的重复单元并且具有1,000-500,000重均分子量的有机硅氧烷聚合物是新颖的.R 1至R 4是一价烃基，n是1-2,000的整数， X具有下式的结构：R 5是具有下式的丙烯酸官能的有机基团：其中R'是H或甲基，R“是二价烃基。 包含有机硅氧烷聚合物和敏化剂的光固化树脂组合物可以在宽的波长范围的光下固化。

公开(公告)号：US06440646B1

公开(公告)日：2002-08-27

申请号：US09782189

申请日：2001-02-14

申请人： Takafumi Ueda ,  Hideto Kato ,  Toshihiko Fujii ,  Miki Kobayashi

发明人： Takafumi Ueda ,  Hideto Kato ,  Toshihiko Fujii ,  Miki Kobayashi

IPC分类号： G03F730

摘要： A positive resist composition contains (A) a novolak resin having a weight average molecular weight calculated as polystyrene of 2,000-20,000 wherein 2.5-27 mol % of the hydrogen atom of a hydroxyl group is replaced by a 1,2-naphthoquinonediazidosulfonyl group and (B) a low molecular aromatic compound having phenolic hydroxyl groups and 2-20 benzene rings wherein the ratio of the number of phenolic hydroxyl groups to the number of benzene rings is between 0.5 and 2.5. By forming a resist layer on a substrate from the positive resist composition and baking the resist layer at 90-130° C., followed by exposure and development, there is formed a resist pattern having an undercut of desired configuration. Owing to high resolution and improved dimensional control, heat resistance and film retention, the resist pattern lends itself to a lift-off technique.

公开(公告)号：US06210855B1

公开(公告)日：2001-04-03

申请号：US09459876

申请日：1999-12-14

申请人： Takafumi Ueda ,  Hideto Kato ,  Toshihiko Fujii ,  Miki Kobayashi

发明人： Takafumi Ueda ,  Hideto Kato ,  Toshihiko Fujii ,  Miki Kobayashi

IPC分类号： G03F7023

CPC分类号： G03F7/0226 ,  G03F7/0233

摘要： A positive resist composition contains (A) a novolak resin having a weight average molecular weight calculated as polystyrene of 2,000-20,000 wherein 2.5-27 mol % of the hydrogen atom of a hydroxyl group is replaced by a 1,2-naphthoquinonediazidosulfonyl group and (B) a low molecular aromatic compound having phenolic hydroxyl groups and 2-20 benzene rings wherein the ratio of the number of phenolic hydroxyl groups to the number of benzene rings is between 0.5 and 2.5. By forming a resist layer on a substrate from the positive resist composition and baking the resist layer at 90-130° C., followed by exposure and development, there is formed a resist pattern having an undercut of desired configuration. Owing to high resolution and improved dimensional control, heat resistance and film retention, the resist pattern lends itself to a lift-off technique.

公开(公告)号：US08338078B2

公开(公告)日：2012-12-25

申请号：US12581625

申请日：2009-10-19

申请人： Jun Hatakeyama ,  Toshihiko Fujii ,  Takeru Watanabe ,  Youichi Ohsawa

发明人： Jun Hatakeyama ,  Toshihiko Fujii ,  Takeru Watanabe ,  Youichi Ohsawa

IPC分类号： G03F7/09 ,  G03F7/20 ,  G03F7/30 ,  G03F7/36 ,  G03C1/76

CPC分类号： G03F7/091 ,  C08G61/02 ,  C09D161/04 ,  G03F7/40

摘要： A material comprising a novolac resin having a C6-C30 aromatic hydrocarbon group substituted with a sulfo group or an amine salt thereof is useful in forming a photoresist undercoat. The undercoat-forming material has an extinction coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm, and a high etching resistance as demonstrated by slow etching rates with CF4/CHF3 gas for substrate processing.

摘要翻译： 包含具有被磺基取代的C6-C30芳族烃基的酚醛清漆树脂或其胺盐的材料可用于形成光致抗蚀剂底涂层。 底涂层材料的消光系数足以在至少200nm的厚度下提供抗反射效果，并且具有高的耐蚀刻性，如通过用于基板处理的CF 4 / CHF 3气体的缓慢蚀刻速率所证明的。

公开(公告)号：US07308999B2

公开(公告)日：2007-12-18

申请号：US10739211

申请日：2003-12-19

申请人： Toshihiko Fujii ,  Takashi Ohta ,  Shinichi Sugiura ,  Toshimasa Akamatsu ,  Katsufumi Morimune

发明人： Toshihiko Fujii ,  Takashi Ohta ,  Shinichi Sugiura ,  Toshimasa Akamatsu ,  Katsufumi Morimune

IPC分类号： B23K37/04

CPC分类号： H01L24/83 ,  B23K1/0016 ,  B23K2101/40 ,  H01L24/32 ,  H01L2224/29111 ,  H01L2224/32245 ,  H01L2224/8319 ,  H01L2224/83447 ,  H01L2224/83801 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01042 ,  H01L2924/0105 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/014 ,  H01L2924/15747 ,  H01L2924/1576 ,  H01L2924/15763 ,  H01L2924/351 ,  H01L2924/00014 ,  H01L2924/00

摘要： A die bonding apparatus for die bonding at least two members, which are heated in a heat treatment furnace, comprising a first member having a surface to be die bonded on which solder is disposed and a second member disposed to face the first member in a state in which the solder disposed on the surface of the first member to be die bonded is interposed therebetween, and a base portion for mounting the first member thereon in a predetermined position, wherein the base portion has a temperature distribution so that a temperature of a vicinity of a central portion in a predetermined direction of the base portion is higher than that of a vicinity of an end portion of the base portion in a state in which heating is effected in the heat treatment furnace to, so that it is possible to suppress the occurrence of bubbles in the solder.

摘要翻译： 一种芯片接合装置，用于在至少两个在热处理炉中加热的构件进行芯片接合的模具接合装置，包括：第一构件，其具有待焊接的表面，焊料放置在其上;以及第二构件，其以状态设置为面对第一构件 其中设置在待接合的第一构件的表面上的焊料插入其间，并且用于将第一构件安装在预定位置的基部，其中基部具有使得附近的温度的温度分布 在热处理炉中进行加热的状态下，在基部的预定方向上的中心部分的高度大于基部的端部附近的中心部分，从而可以抑制 在焊料中发生气泡。

公开(公告)号：US5739970A

公开(公告)日：1998-04-14

申请号：US503200

申请日：1995-07-17

申请人： Masayoshi Kobayashi ,  Keisuke Hoshino ,  Masaru Ohshita ,  Akira Takano ,  Makoto Sasaki ,  Makoto Matsuda ,  Toshihiko Fujii

发明人： Masayoshi Kobayashi ,  Keisuke Hoshino ,  Masaru Ohshita ,  Akira Takano ,  Makoto Sasaki ,  Makoto Matsuda ,  Toshihiko Fujii

IPC分类号： G11B15/20 ,  G11B15/48 ,  G11B15/62 ,  G11B15/67 ,  G11B33/14 ,  G11B15/18 ,  G11B15/43

CPC分类号： G11B15/48 ,  G11B15/20 ,  G11B15/62 ,  G11B15/67 ,  G11B33/144

摘要： Disclosed herein is a magnetic tape unit having a magnetic head for reading and writing data from and onto a magnetic tape. The magnetic tape is traveled in contact with the magnetic head during a read/write operation of the magnetic head. During a rest period where the read/write operation of the magnetic head is not performed, a reciprocating motion of the magnetic tape by a small distance is performed with a predetermined period. A temperature in the vicinity of the magnetic head is detected by a temperature sensor. The predetermined period is changed according to the temperature detected by the temperature sensor. Accordingly, the adhesion of the magnetic tape to the magnetic head can be well prevented irrespective of the temperature inside the tape unit.

公开(公告)号：US4242172A

公开(公告)日：1980-12-30

申请号：US941741

申请日：1978-09-12

申请人： Toshihiko Fujii

发明人： Toshihiko Fujii

IPC分类号： B31F1/00 ,  B32B3/28 ,  B60R13/02 ,  B32B31/00

CPC分类号： B32B3/28 ,  B31F1/0077 ,  B60R13/0225 ,  Y10T156/1048 ,  Y10T156/1749 ,  Y10T156/1761

摘要： In a method of press-forming a planer board of corrugated paperboard into a curved board which serves as the substrate of, for example, an automobile roof trim board by utilizing a thermoplastic adhesive in the production of the corrugated paperboard and applying heat to the planer board through dies in a hot-press, the liners of the corrugated paperboard are prevented from wrinkling by preheating the planer board so as to soften the thermoplastic adhesive therein immediately before placement between the dies. An apparatus to perform this method comprises a board carrier which has heaters and can carry the planer board into the hot-press with continued heating of the board.

摘要翻译： 在将瓦楞纸板的平面板压制成弯曲板的方法中，所述弯曲板用作例如汽车车顶装饰板的基板，在制造瓦楞纸板中使用热塑性粘合剂并向刨床施加热量 通过热压机中的模具板，通过预热刨床来防止瓦楞纸板的衬垫起皱，以便在放置在模具之前立即软化其中的热塑性粘合剂。 执行该方法的装置包括具有加热器的板载体，并且可以在板的持续加热的情况下将刨床携带到热压机中。

公开(公告)号：US4143587A

公开(公告)日：1979-03-13

申请号：US817434

申请日：1977-07-20

申请人： Toshihiko Fujii

发明人： Toshihiko Fujii

IPC分类号： B30B9/00 ,  B29C33/00 ,  B29C43/00 ,  B29C43/02 ,  B29C43/32 ,  B29C43/36 ,  B29C43/58 ,  B29C51/00 ,  B29C51/26 ,  B31F1/00 ,  B32B3/28 ,  E04C2/32 ,  B30B15/34 ,  B31B43/00

CPC分类号： B29C51/262 ,  B29C51/006 ,  B31F1/00 ,  B32B3/28 ,  E04C2/328 ,  B29C43/203 ,  B29K2995/0002 ,  Y10S425/11

摘要： Apparatus for inelastically deforming an initially flat blank of a corrugated fiberboard, comprising two die blocks movable relative to each other and having complementarily convex and concave pressing surfaces and blank retaining means adapted to clamp opposite marginal portions of a blank of a corrugated fiberboard being warped between the die blocks with the marginal portions urged sidewise inboardly of the die blocks, the blank retaining means being operative to restrain the blank from being moved in a direction parallel with the marginal portions but to allow the marginal portion of the blank to move the marginal portions of the blank sidewise inboardly of the die blocks in a direction perpendicular to the marginal portions so that not only production of creases in curved portions of the blank but production of fissures as would be caused if the blank is excessively stretched between the opposite marginal portions of the blank are precluded.

摘要翻译： 用于使瓦楞纤维板的初始平坦的坯料非弹性变形的装置，包括两个可相对于彼此移动并具有互补的凸形和凹形的压制表面的模块，以及用于夹紧瓦楞纸板的坯料的相对的边缘部分的坯料保持装置， 具有边缘部分的模块被侧向地推压在模具块的内侧，坯料保持装置可操作地限制坯料沿平行于边缘部分的方向移动，但是允许坯料的边缘部分移动边缘部分 在坯料侧面沿垂直于边缘部分的方向的坯料侧面的坯料，使得不仅在坯料的弯曲部分中产生折痕，而且如果坯料在相对的边缘部分之间过度拉伸，则会产生裂缝 空白被排除。