Cleaning member for semiconductor apparatus and process for producing the same
    1.
    发明申请
    Cleaning member for semiconductor apparatus and process for producing the same 审中-公开
    半导体装置用清洁构件及其制造方法

    公开(公告)号:US20070163621A1

    公开(公告)日:2007-07-19

    申请号:US10591330

    申请日:2005-03-07

    IPC分类号: B08B9/00

    CPC分类号: H01L21/6715 H01L21/6708

    摘要: An object is to provide a cleaning member for semiconductor apparatus which can easily remove, without fail, foreign matters adherent to inner parts of a semiconductor apparatus, can bear a clearly readable mark for lot management, and can be prevented from generating particles upon contact with the holding part of a wafer case. A cleaning member for semiconductor apparatus, characterized in that the cleaning member comprises a wafer 1 and formed on at least one side thereof a cleaning layer 2 made of a heat-resistant resin formed by thermally curing a poly(amic acid), and that the cleaning layer 2 has a part 12 where a wafer surface is exposed; and in particular a cleaning member for semiconductor apparatus having the constitution described above wherein that part 12 in the cleaning layer 2 in which a wafer surface is exposed is a part where the cleaning layer has been removed throughout the whole circular area having a given width ranging from the peripheral edge of the wafer toward the center thereof.

    摘要翻译: 本发明的目的是提供一种用于半导体装置的清洁部件,其能够容易地去除附着于半导体装置的内部部件的异物,从而能够为批次管理提供清晰可读的标记,并且可以防止在接触时产生颗粒 晶片盒的保持部分。 一种用于半导体装置的清洁部件,其特征在于,所述清洁部件包括晶片1,并且在其至少一侧上形成由通过热固化聚(酰胺酸)形成的耐热树脂制成的清洁层2, 清洁层2具有暴露晶片表面的部分12; 特别是具有上述结构的半导体装置用清洁部件,其中,露出晶片表面的清洁层2中的部分12是在具有给定宽度范围的整个圆形区域中已经清除了清洁层的部分 从晶片的周缘朝向其中心。