公开(公告)号：US20130193593A1

公开(公告)日：2013-08-01

申请号：US13362913

申请日：2012-01-31

Applicant: Jing-Cheng LIN ,  Cheng-Lin HUANG

Inventor： Jing-Cheng LIN ,  Cheng-Lin HUANG

IPC: H01L23/498 ,  H01L21/56

CPC classification number: H01L24/16 ,  H01L21/56 ,  H01L21/563 ,  H01L23/3171 ,  H01L23/3192 ,  H01L23/49816 ,  H01L23/49894 ,  H01L24/02 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/81 ,  H01L24/83 ,  H01L2224/0239 ,  H01L2224/0401 ,  H01L2224/05008 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05187 ,  H01L2224/05572 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/11849 ,  H01L2224/13005 ,  H01L2224/13012 ,  H01L2224/13023 ,  H01L2224/13024 ,  H01L2224/13082 ,  H01L2224/13083 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1601 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/16238 ,  H01L2224/73204 ,  H01L2224/81011 ,  H01L2224/81193 ,  H01L2224/81801 ,  H01L2224/81815 ,  H01L2224/8191 ,  H01L2224/81911 ,  H01L2224/83104 ,  H01L2224/83855 ,  H01L2924/381 ,  H01L2924/3841 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01079 ,  H01L2924/01028 ,  H01L2924/01074 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00014

Abstract: The mechanisms for forming bump structures enable forming bump structures between a chip and a substrate eliminating or reducing the risk of solder shorting, flux residue and voids in underfill. A lower limit can be established for a cc ratio, defined by dividing the total height of copper posts in a bonded bump structure divided by the standoff of the bonded bump structure, to avoid shorting. A lower limit may also be established for standoff the chip package to avoid flux residue and underfill void formation. Further, aspect ratio of a copper post bump has a lower limit to avoid insufficient standoff and a higher limit due to manufacturing process limitation. By following proper bump design and process guidelines, yield and reliability of chip packages may be increases.

Abstract translation: 用于形成凸块结构的机构能够在芯片和基板之间形成凸块结构，消除或降低焊料短路，焊剂残留物和底部填充物中的空隙的风险。 可以通过将结合的凸块结构中的铜柱的总高度除以接合的凸块结构的间距来限定的cc比率来限定下限，以避免短路。 也可以建立一个下限以排除芯片封装以避免焊剂残留和底部填充空隙形成。 此外，由于制造工艺限制，铜柱凸起的纵横比具有下限以避免不足的间隙和更高的极限。 通过遵循适当的凸块设计和工艺指南，芯片封装的产量和可靠性可能会增加。

公开(公告)号：US20130026620A1

公开(公告)日：2013-01-31

申请号：US13192756

申请日：2011-07-28

Applicant: Cheng-Lin HUANG ,  I-Ting CHEN ,  Ying Ching SHIH ,  Po-Hao TSAI ,  Szu Wei LU ,  Jing-Cheng LIN ,  Shin-Puu JENG ,  Chen-Hua YU

Inventor： Cheng-Lin HUANG ,  I-Ting CHEN ,  Ying Ching SHIH ,  Po-Hao TSAI ,  Szu Wei LU ,  Jing-Cheng LIN ,  Shin-Puu JENG ,  Chen-Hua YU

IPC: H01L23/498 ,  H01L21/60

CPC classification number: H01L24/14 ,  H01L23/49811 ,  H01L24/11 ,  H01L24/13 ,  H01L24/17 ,  H01L24/81 ,  H01L2224/0346 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/1146 ,  H01L2224/11462 ,  H01L2224/11472 ,  H01L2224/1161 ,  H01L2224/11622 ,  H01L2224/13011 ,  H01L2224/13014 ,  H01L2224/13078 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/1403 ,  H01L2224/1405 ,  H01L2224/14051 ,  H01L2224/145 ,  H01L2224/16238 ,  H01L2224/17107 ,  H01L2224/81141 ,  H01L2224/81193 ,  H01L2224/81815 ,  H01L2224/81897 ,  H01L2924/1305 ,  H01L2924/1306 ,  H01L2924/00014 ,  H01L2924/01047 ,  H01L2924/01082 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01083 ,  H01L2924/01053 ,  H01L2924/01079 ,  H01L2924/01051 ,  H01L2924/014 ,  H01L2924/00012 ,  H01L2924/00

Abstract: The disclosure relates to a conductive bump structure of a semiconductor device. An exemplary structure for a semiconductor device comprises a substrate comprising a major surface and conductive bumps distributed over the major surface of the substrate. Each of a first subset of the conductive bumps comprise a regular body, and each of a second subset of the conductive bumps comprise a ring-shaped body.

Abstract translation: 本发明涉及半导体器件的导电凸块结构。 半导体器件的示例性结构包括包括主表面的衬底和分布在衬底的主表面上的导电凸块。 导电凸块的第一子集中的每一个包括规则体，并且导电凸块的第二子集中的每一个包括环形体。

公开(公告)号：US20110006429A1

公开(公告)日：2011-01-13

申请号：US12832790

申请日：2010-07-08

Applicant: Nai-Wei LIU ,  Zhen-Cheng WU ,  Cheng-Lin HUANG ,  Po-Hsiang HUANG ,  Yung-Chih WANG ,  Shu-Hui SU ,  Dian-Hau CHEN ,  Yuh-Jier MII

Inventor： Nai-Wei LIU ,  Zhen-Cheng WU ,  Cheng-Lin HUANG ,  Po-Hsiang HUANG ,  Yung-Chih WANG ,  Shu-Hui SU ,  Dian-Hau CHEN ,  Yuh-Jier MII

IPC: H01L23/532

CPC classification number: H01L21/76846 ,  H01L21/76831 ,  H01L21/76864 ,  H01L21/76867 ,  H01L21/76873 ,  H01L23/53238 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A copper interconnect includes a copper layer formed in a dielectric layer, having a first portion and a second portion. A first barrier layer is formed between the first portion of the copper layer and the dielectric layer. A second barrier layer is formed at the boundary between the second portion of the copper layer and the dielectric layer. The first barrier layer is a dielectric layer, and the second barrier layer is a metal oxide layer.

Abstract translation: 铜互连包括形成在电介质层中的铜层，具有第一部分和第二部分。 在铜层的第一部分和电介质层之间形成第一阻挡层。 在铜层的第二部分和电介质层之间的边界处形成第二阻挡层。 第一阻挡层是电介质层，第二阻挡层是金属氧化物层。