公开(公告)号：US20080073557A1

公开(公告)日：2008-03-27

申请号：US11493703

申请日：2006-07-26

Applicant: John German ,  Klaus Hartig ,  John E. Madocks

Inventor： John German ,  Klaus Hartig ,  John E. Madocks

IPC: H01J27/00

CPC classification number: H01J27/143 ,  C23C14/221 ,  C23C14/225 ,  C23C14/562 ,  C23C14/564 ,  H01J37/08 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/3151

Abstract: A method and apparatus for directing an ion beam toward a surface of a substrate is disclosed. Certain embodiments of the invention relate generally to ion beam sources adapted to direct ion beams toward a surface of a substrate at an oblique angle of incidence relative to the surface. Certain embodiments of the invention are adapted to direct two ion beam portions toward a substrate surface, the ion beam portions having substantially equal throw distances. Preferred embodiments of the invention may be useful in etching applications, where the angle of incidence and throw distance of two ion beam portions are well suited for etching the surface of a substrate.

Abstract translation: 公开了一种用于将离子束朝向衬底的表面引导的方法和装置。 本发明的某些实施例一般涉及适于将离子束以相对于表面的入射角倾斜地朝向衬底表面的离子束源。 本发明的某些实施例适于将两个离子束部分引向衬底表面，离子束部分具有基本相等的投射距离。 本发明的优选实施例可用于蚀刻应用，其中两个离子束部分的入射角和投射距离非常适合蚀刻衬底的表面。

公开(公告)号：US20120097526A1

公开(公告)日：2012-04-26

申请号：US13262724

申请日：2010-04-05

Applicant: John E. Madocks ,  Jeffrey F. Vogler

Inventor： John E. Madocks ,  Jeffrey F. Vogler

IPC: C23C14/35 ,  C23F4/04

CPC classification number: C23C14/3407 ,  H01J37/3402 ,  H01J37/3435 ,  H01J37/3497

Abstract: A rotary magnetron is provided with an end block for rotatably supporting a target on an axis of rotation. An elongate magnetic bar assembly is disposed within the target. A stator shaft is affixed in the end block; one end of the stator shaft is coupled to the elongate magnetic bar assembly to support the elongate magnetic bar assembly. The target has a target shaft extending over the stator shaft and rotatable thereon around the axis of rotation. The rotary magnetron is characterized by a rotating coolant seal disposed inside the target shaft proximate the one end of the stator shaft and proximate to the elongate magnetic bar assembly.

Abstract translation: 旋转磁控管设置有用于在旋转轴线上可旋转地支撑目标的端块。 细长的磁棒组件设置在靶内。 定子轴固定在端块中; 定子轴的一端连接到细长磁棒组件以支撑细长磁棒组件。 目标具有在定子轴上延伸并围绕旋转轴线可转动的目标轴。 旋转磁控管的特征在于设置在目标轴内部的旋转冷却剂密封件，靠近定子轴的一端并且靠近细长的磁棒组件。

公开(公告)号：US07993496B2

公开(公告)日：2011-08-09

申请号：US11171054

申请日：2005-06-30

Applicant: Klaus Hartig ,  Steve E. Smith ,  John E. Madocks

Inventor： Klaus Hartig ,  Steve E. Smith ,  John E. Madocks

IPC: C23C14/00

CPC classification number: H01J37/3455 ,  H01J37/3405 ,  H01J37/3423 ,  H01J37/3497

Abstract: In some embodiments, the invention includes a cylindrical cathode target assembly for use in sputtering target material onto a substrate that comprises a generally cylindrical target, means for rotating the target about its axis during a sputtering operation, an elongated magnet carried within the target for generation of a plasma-containing magnetic field exterior to but adjacent the target, a framework for supporting the magnet against rotation within the target, and a power train for causing the magnet to oscillate within and axially of the target in a substantially asynchronous manner to promote generally uniform target utilization along its length, as well as its method of use. In some embodiments, the magnet is oscillated in response to rotation of the target.

Abstract translation: 在一些实施例中，本发明包括用于将目标材料溅射到基板上的圆柱形阴极靶组件，该基板包括大致圆柱形的靶，用于在溅射操作期间使靶围绕其轴旋转的装置，用于产生的靶内的细长磁体 位于目标外部但邻近目标的等离子体磁场，用于支撑磁体以防止目标内的旋转的框架和用于使磁体以基本上异步的方式在目标内部和轴向振荡的传动系，以促进一般 沿其长度的均匀目标利用率及其使用方法。 在一些实施例中，磁体响应于目标的旋转而振荡。

公开(公告)号：US4850806A

公开(公告)日：1989-07-25

申请号：US197937

申请日：1988-05-24

Applicant: Steven V. Morgan ,  John E. Madocks

Inventor： Steven V. Morgan ,  John E. Madocks

IPC: F04B39/00 ,  F04B37/14 ,  F04B49/06

CPC classification number: F04B37/14

Abstract: A method and apparatus for evacuating an enclosed chamber which utilizes a tandem connection of a booster pump and a mechanical pump in a manner to maximize the rate of evacuation of the chamber but without exceeding the rating of the booster pump and damaging it. A gas bypass around the booster pump is provided with a proportional valve that is operated to start an evacuation of the chamber with the bypass path fully opened but the gradually closing that path in a manner to maintain a differential pressure across the booster pump at a predetermined level, until the bypass path has been fully closed.

公开(公告)号：US09388490B2

公开(公告)日：2016-07-12

申请号：US13504366

申请日：2010-10-26

Applicant: John E. Madocks ,  Patrick Lawrence Morse ,  Phong Ngo

Inventor： John E. Madocks ,  Patrick Lawrence Morse ,  Phong Ngo

IPC: H01J37/34 ,  C23C14/35 ,  C23C14/34

CPC classification number: C23C14/54 ,  C23C14/3407 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/342 ,  H01J37/3452 ,  H01J37/3482 ,  H01J2237/24585 ,  H01J2237/332

Abstract: An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.

Abstract translation: 提供了一种用于涂覆基板的设备，其包括具有两个直线部分的跑道形等离子体源和连接所述直线部分的至少一个终端周转部分。 由形成涂层组分的目标材料形成的管状目标具有一端。 目标在等离子体源附近用于目标材料的溅射。 目标被固定到管状背衬阴极，两者都可围绕中心轴线旋转。 一组磁体布置在阴极内部，以便当靶被用于将涂层沉积在基底上时，将与端子周转的侵蚀区域朝向靶的端部移动。 目标利用率达到初始目标重量的87％（重量）。

公开(公告)号：US07411352B2

公开(公告)日：2008-08-12

申请号：US11379349

申请日：2006-04-19

Applicant: John E. Madocks

Inventor： John E. Madocks

IPC: H01J7/24

CPC classification number: H05H1/46 ,  C23C14/32 ,  C23C16/513 ,  H01J37/3266

Abstract: A pair of plasma beam sources are connected across an AC power supply to alternatively produce an ion beam for depositing material on a substrate transported past the ion beams. Each plasma beam source includes a discharge cavity having a first width and a nozzle extending outwardly therefrom to emit the ion beam. The aperture or outlet of the nozzle has a second width, which second width is less than the first width. An ionizable gas is introduced to the discharge cavity. At least one electrode connected to the AC power supply, alternatively serving as an anode or a cathode, is capable of supporting at least one magnetron discharge region within the discharge cavity when serving as a cathode electrode. A plurality of magnets generally facing one another, are disposed adjacent each discharge cavity to create a magnetic field null region within the discharge cavity.

Abstract translation: 一对等离子体束源连接在交流电源上，以交替地产生用于在经过离子束传送的衬底上沉积材料的离子束。 每个等离子体束源包括具有第一宽度的排出腔和从其向外延伸以喷射离子束的喷嘴。 喷嘴的孔或出口具有第二宽度，该第二宽度小于第一宽度。 将可电离气体引入到排出腔。 连接到AC电源的替代地用作阳极或阴极的至少一个电极能够在用作阴极时支持放电腔内的至少一个磁控管放电区域。 大体上彼此面对的多个磁体邻近每个排出腔设置，以在排出腔内形成磁场零区域。

公开(公告)号：US07327089B2

公开(公告)日：2008-02-05

申请号：US10528386

申请日：2003-09-19

Applicant: John E. Madocks

Inventor： John E. Madocks

IPC: H01J7/24

CPC classification number: H05H1/46 ,  H01J27/146 ,  H01J37/32009 ,  H01J37/32357 ,  H01J37/3266 ,  H01J2237/0815 ,  H05H1/48

Abstract: A plasma source which includes a discharge cavity having a first width, where that discharge cavity includes a top portion, a wall portion, and a nozzle disposed on the top portion and extending outwardly therefrom, where the nozzle is formed to include an aperture extending through the top portion and into the discharge cavity, wherein the aperture has a second width, where the second width is less than the first width. The plasma source further includes a power supply, a conduit disposed in the discharge cavity for introducing an ionizable gas therein, and at least one cathode electrode connected to the power supply, where that cathode electrode is capable of supporting at least one magnetron discharge region within the discharge cavity. The plasma source further includes a plurality of magnets disposed adjacent the wall portion, where that plurality of magnets create a null magnetic field point within the discharge cavity.

Abstract translation: 一种等离子体源，其包括具有第一宽度的排出腔，其中所述排出腔包括顶部，壁部分和设置在顶部上并从其向外延伸的喷嘴，其中所述喷嘴形成为包括延伸穿过的孔 顶部并进入排出腔，其中孔具有第二宽度，其中第二宽度小于第一宽度。 等离子体源还包括电源，设置在放电腔中的用于在其中引入可电离气体的导管和连接到电源的至少一个阴极，其中阴极能够支撑至少一个磁控管放电区域 放电腔。 等离子体源还包括邻近壁部设置的多个磁体，其中多个磁体在放电腔内形成零磁场点。

公开(公告)号：US09136086B2

公开(公告)日：2015-09-15

申请号：US13132762

申请日：2009-12-08

Applicant: John E. Madocks

Inventor： John E. Madocks

IPC: C23C14/00 ,  H01J37/08 ,  H01J27/14 ,  H01J37/305 ,  H01J37/317 ,  H01J37/32 ,  H01J37/34

CPC classification number: H01J37/08 ,  H01J27/143 ,  H01J37/3053 ,  H01J37/317 ,  H01J37/32862 ,  H01J37/3405 ,  H01J2237/081

Abstract: A process for modifying a surface of a substrate is provided that includes supplying electrons to an electrically isolated anode electrode of a closed drift ion source. The anode electrode has an anode electrode charge bias that is positive while other components of the closed drift ion source are electrically grounded or support an electrical float voltage. The electrons encounter a closed drift magnetic field that induces ion formation. Anode contamination is prevented by switching the electrode charge bias to negative in the presence of a gas, a plasma is generated proximal to the anode electrode to clean deposited contaminants from the anode electrode. The electrode charge bias is then returned to positive in the presence of a repeat electron source to induce repeat ion formation to again modify the surface of the substrate. An apparatus for modification of a surface of a substrate by this process is provided.

Abstract translation: 提供了一种用于修改衬底表面的方法，其包括向闭合漂移离子源的电隔离的阳极提供电子。 阳极电极具有正极的阳极电极偏压，而闭合漂移离子源的其它部件电接地或支持电浮动电压。 电子遇到诱发离子形成的闭合漂移磁场。 通过在存在气体的情况下将电极充电偏压切换为负来防止阳极污染，在阳极电极附近产生等离子体以清除来自阳极电极的沉积的污染物。 然后在存在重复电子源的情况下将电极充电偏压返回到正值，以引起重复的离子形成，以再次改变衬底的表面。 提供了一种通过该方法修改基板的表面的装置。

公开(公告)号：US20120231246A1

公开(公告)日：2012-09-13

申请号：US13272713

申请日：2011-10-13

Applicant: John E. Madocks ,  Walter Seaman ,  Phong Ngo

Inventor： John E. Madocks ,  Walter Seaman ,  Phong Ngo

IPC: B32B17/00 ,  B05D1/02 ,  B32B7/02 ,  B05D3/00 ,  C23C14/34 ,  C23C16/50 ,  B05D3/12

CPC classification number: C03C17/28 ,  B32B2607/00 ,  C03C2218/355 ,  C03C2218/365 ,  Y10T428/2495

Abstract: A process for producing plasma coated glass substrates free of back side coating (BSC) is provided. A low-E glass coated structure is also provided that uses a BSC as a protective coating that promotes transport and handling of low-E glass that is then subsequently delaminated. A thin film is deposited on the back side of the glass substrate before the top side of the glass is coated. Then, during the sputter down process, BSC occurs as normal and deposits over this back side film (BSF). In a subsequent process, outside the vacuum chamber, the glass back side is washed or otherwise delaminated. The BSF composition is selected to make the BSC easily removed in this wash process or other delamination process.

Abstract translation: 提供了一种不含背面涂层（BSC）的等离子体涂覆的玻璃基板的制造方法。 还提供了低E玻璃涂层结构，其使用BSC作为促进低E玻璃的运输和处理的保护涂层，然后随后分层。 在涂覆玻璃的顶侧之前，在玻璃基板的背面上沉积薄膜。 然后，在溅射过程中，BSC正常发生并沉积在该背面膜（BSF）上。 在随后的过程中，在真空室外，玻璃背面被洗涤或以其他方式分层。 选择BSF组合物以使BSC在该洗涤过程或其它分层过程中容易地除去。

公开(公告)号：US20110236591A1

公开(公告)日：2011-09-29

申请号：US13131649

申请日：2009-11-30

Applicant: John E. Madocks ,  Curtis Charles Camus ,  Patrick Marcus

Inventor： John E. Madocks ,  Curtis Charles Camus ,  Patrick Marcus

IPC: C23C14/35 ,  H02M7/217 ,  H05H1/46

CPC classification number: H02M5/297

Abstract: A process for powering an electrical load includes applying a rectified alternating current waveform across the load for a first time period with only a single power supply for at least two half cycles. At least one half cycle of an alternating current waveform of opposite polarity are then applied relative to the rectified alternating current waveform across the load for a second time period. Rectified alternating current waveform is then again applied across the load for at least two half cycles for a third time period to power the electrical load. The rectified alternating current waveform can be applied a direct current offset. A power supply is provided for provided power across the load according to this process.

Abstract translation: 用于为电负载供电的过程包括在整个负载中将整流的交流电波施加在第一时间段内，仅使用单个电源进行至少两个半周期。 然后相对极化的交流电流波形的至少一个半周期相对于整个负载的整流交流波形施加第二时间段。 然后，整流的交流波形在负载上再次施加至少两个半周期，持续第三时间段以为电负载供电。 整流的交流波形可以直接施加电压偏移。 根据该过程，为负载提供的电力提供电源。