公开(公告)号：US5192578A

公开(公告)日：1993-03-09

申请号：US613390

申请日：1990-11-14

申请人： Jurgen Ramm ,  Helmut Daxinger ,  Rainer Buhl ,  Erich Bergmann

发明人： Jurgen Ramm ,  Helmut Daxinger ,  Rainer Buhl ,  Erich Bergmann

IPC分类号： C23C14/06 ,  A61L27/00 ,  A61L31/00 ,  B23P15/28 ,  C23C14/08 ,  C23C14/32 ,  C23C14/34

CPC分类号： C23C14/3478 ,  C23C14/325

摘要： For coating workpieces having basic bodies (3), with a ceramic, electrically non-conducting material, during the coating process a pulsating dc voltage is applied to the basic bodies (3) or their holders (36). Preferably the pulse height is changed during vaporization used for the coating process, from high negative values to smaller negative values. A further layer can be applied onto the workpieces coated in this way whereby these work-pieces, due to their excellent corrosion resistance, are suited as pieces of jewelry which can be exposed in particular to ocean water and body perspiration, as rolling bodies in which the use of oil or grease as corrosion protection can be dispensed with, and as separating and cutting tools for organic materials.

摘要翻译： 对于具有基体（3）的具有陶瓷，不导电材料的工件，在涂覆过程期间，将脉动直流电压施加到基体（3）或其保持器（36）。 优选地，在用于涂覆过程的蒸发期间脉冲高度被改变，从高负值到较小的负值。 可以将另一层施加到以这种方式涂覆的工件上，由于这些工件由于其优异的耐腐蚀性而适合作为可以特别暴露于海洋水和身体排汗的首饰的首饰，作为滚动体，其中 可以省去使用油或油脂作为防腐蚀保护，以及作为有机材料的分离和切割工具。

公开(公告)号：US5246787A

公开(公告)日：1993-09-21

申请号：US892622

申请日：1992-06-01

申请人： Hans Schulz ,  Helmut Daxinger ,  Erich Bergmann ,  Jurgen Ramm

发明人： Hans Schulz ,  Helmut Daxinger ,  Erich Bergmann ,  Jurgen Ramm

IPC分类号： A61B17/00 ,  A61C8/00 ,  B26D1/00 ,  B29C33/56 ,  C23C14/06 ,  C23C14/08 ,  C23C14/32

CPC分类号： A61B17/00 ,  A61C8/0012 ,  B26D1/0006 ,  B29C33/56 ,  C23C14/06 ,  C23C14/0641 ,  C23C14/0676 ,  C23C14/081 ,  C23C14/32 ,  B26D2001/002 ,  Y10T428/12542 ,  Y10T428/1259

摘要： A coated tool or instrument has a wear-resistant hard coating (7) which is preferably titanium nitride for working organic material which is disposed on a separating layer (9) applied on a basic body (3). The separating layer (9) comprises a ceramic electrically non-conducting material. Such a material is preferably an oxide, nitride or oxynitride of silicon. The separating layer (9) protects the basic body (3) of the tool or instrument of e.g. a non-corrosion resistant steel. During the coating of the basic body (3) with the ceramic material, a pulsating dc voltage is applied to the basic body (3) or its holders. The pulse height is changed during the vapor deposition from high negative values to low negative values.

摘要翻译： 涂覆的工具或仪器具有耐磨硬涂层（7），其优选为用于加工有机材料的氮化钛，其设置在施加在基体（3）上的分离层（9）上。 分离层（9）包括陶瓷非导电材料。 这种材料优选为硅的氧化物，氮化物或氧氮化物。 分离层（9）保护工具或仪器的基体（3）。 不锈钢。 在用陶瓷材料涂覆基体（3）的过程中，向基体（3）或其支架施加脉动直流电压。 气相沉积期间的脉冲高度由高负值改变为低负值。

公开(公告)号：US08152971B2

公开(公告)日：2012-04-10

申请号：US13248910

申请日：2011-09-29

申请人： Dennis T. Quinto ,  Christian Wohlrab ,  Jurgen Ramm

发明人： Dennis T. Quinto ,  Christian Wohlrab ,  Jurgen Ramm

IPC分类号： C23C16/00

CPC分类号： C23C30/005 ,  C23C28/042 ,  C23C28/044 ,  C23C28/048 ,  C23C28/321 ,  C23C28/322 ,  C23C28/34 ,  C23C28/341 ,  C23C28/345 ,  C23C28/3455 ,  C23C28/347 ,  C23C28/36 ,  Y10T407/27 ,  Y10T428/24942 ,  Y10T428/24983 ,  Y10T428/265

摘要： A method for manufacturing a cutting tool includes the steps of providing a body of cermet or cemented carbide, having a cutting edge with an edge radius Re smaller than 40 μm, a flank a rake face, applying by PVD a single or a multilayer coating to at least a part of the surface of the body, comprising at least a part of the cutting edge and applying by PVD said single or multilayer coating, comprising PVD coating with at least one oxidic layer.

摘要翻译： 一种用于制造切削工具的方法包括以下步骤：提供金属陶瓷或硬质合金体，其具有边缘半径Re小于40μm的切削刃，前刀面的侧面，通过PVD将单个或多层涂层施加到 所述主体的表面的至少一部分包括所述切割边缘的至少一部分，并且通过PVD施加所述单层或多层涂层，所述涂层包含至少一层氧化层的PVD涂层。

公开(公告)号：US20110278157A1

公开(公告)日：2011-11-17

申请号：US13130050

申请日：2009-10-27

申请人： Helmut Rudigier ,  Jurgen Ramm ,  Beno Widrig ,  Troy Vom Braucke

发明人： Helmut Rudigier ,  Jurgen Ramm ,  Beno Widrig ,  Troy Vom Braucke

IPC分类号： C23C14/34

CPC分类号： C23C14/325 ,  C23C14/022 ,  C23C14/025 ,  H01J37/32055 ,  H01J37/32064

摘要： The invention relates to a method for surface treatment of work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source; by means of the first electrode, an arc is operated with an arc current and vaporizes material from the target that is deposited at least partially and intermittently onto the work pieces and having a second electrode that is embodied as a work piece holder and, together with the work pieces, constitutes a bias electrode; by means of a voltage supply, a bias voltage is applied to the bias electrode, with the bias voltage applied so that it is matched to the arc current such that essentially, no net material buildup on the surface occurs.

摘要翻译： 本发明涉及一种真空处理系统中表面处理工件的方法，该真空处理系统具有实施为靶的第一电极，该第一电极是电弧蒸发源的一部分; 借助于第一电极，电弧通过电弧电流工作并将来自目标的材料从至少部分地和间歇地沉积到工件上并具有被实施为工件保持器的第二电极，并与 工件构成偏置电极; 通过电压源，偏置电压被施加到偏置电极，施加偏置电压使得其与电弧电流匹配，使得基本上不发生表面上的净材料堆积。

公开(公告)号：US20110183084A1

公开(公告)日：2011-07-28

申请号：US13080779

申请日：2011-04-06

申请人： Jurgen Ramm ,  Beno Widrig ,  Michael Ante ,  Christian Wohlrab

发明人： Jurgen Ramm ,  Beno Widrig ,  Michael Ante ,  Christian Wohlrab

IPC分类号： H01T14/00

CPC分类号： C23C14/027 ,  B29C33/38 ,  B29C33/56 ,  B29K2907/04 ,  C23C14/0021 ,  C23C14/022 ,  C23C14/08 ,  Y10T428/12611 ,  Y10T428/12618 ,  Y10T428/12632 ,  Y10T428/12667

摘要： A PVD layer system for the coating of workpieces encompasses at least one mixed-crystal layer of a multi-oxide having the following composition: (Me11-xMe2x)2O3, where Me1 and Me2 each represent at least one of the elements Al, Cr, Fe, Li, Mg, Mn, Nb, Ti, Sb or V. The elements of Me1 and Me2 differ from one another. The crystal lattice of the mixed-crystal layer in the PVD layer system has a corundum structure which in an x-ray diffractometrically analyzed spectrum of the mixed-crystal layer is characterized by at least three of the lines associated with the corundum structure. Also disclosed is a vacuum coating method for producing a mixed-crystal layer of a multi-oxide, as well as correspondingly coated tools and components.

摘要翻译： 用于涂覆工件的PVD层系统包括具有以下组成的多氧化物的至少一个混晶层：（Me11-xMe2x）2O3，其中Me1和Me2各自表示元素Al，Cr， Fe，Li，Mg，Mn，Nb，Ti，Sb或V.Me1和Me2的元素彼此不同。 PVD层系统中的混晶层的晶格具有刚玉结构，其在混合晶体层的x射线衍射分析光谱中的特征在于与刚玉结构相关联的至少三条线。 还公开了一种用于制备多氧化物的混合层的真空涂覆方法，以及相应地涂覆的工具和组件。

公开(公告)号：US20090269600A1

公开(公告)日：2009-10-29

申请号：US12429252

申请日：2009-04-24

申请人： Jurgen Ramm ,  Beno Widrig

发明人： Jurgen Ramm ,  Beno Widrig

IPC分类号： B32B15/04 ,  C23C14/34

CPC分类号： C23C14/3414 ,  B22F2998/00 ,  C22C1/0416 ,  C23C14/0036 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/325 ,  Y10T428/12028 ,  B22F3/15

摘要： The invention relates to a method for producing oxidic layers by means of PVD (physical vapor deposition), in particular by means of cathodic arc vaporization, wherein a powder-metallurgical target is vaporized and the powder-metallic target is formed of at least two metallic or semi-metallic components, the composition of the metallic or semi-metallic components resp. of the target being chosen in such a manner that during heating in the transition from the room temperature into the liquid phase no phase boundary of purely solid phases, based on the phase diagram of a molten mixture of the at least two metallic or semi-metallic components, is crossed.

摘要翻译： 本发明涉及一种通过PVD（物理气相沉积），特别是通过阴极电弧蒸发来生产氧化层的方法，其中粉末冶金靶被蒸发，粉末 - 金属靶由至少两种金属 或半金属组分，金属或半金属组分的组成。 所述靶的选择方式为：在所述至少两种金属或半金属的熔融混合物的相图中，在从所述室温到所述液相的过渡期间的加热期间，不存在纯固相的相界面 组件，交叉。

公开(公告)号：US09702036B2

公开(公告)日：2017-07-11

申请号：US13080779

申请日：2011-04-06

申请人： Jurgen Ramm ,  Beno Widrig ,  Michael Ante ,  Christian Wohlrab

发明人： Jurgen Ramm ,  Beno Widrig ,  Michael Ante ,  Christian Wohlrab

IPC分类号： H01T14/00 ,  C23C14/02 ,  C23C14/00 ,  C23C14/08 ,  B29C33/56 ,  B29C33/38

CPC分类号： C23C14/027 ,  B29C33/38 ,  B29C33/56 ,  B29K2907/04 ,  C23C14/0021 ,  C23C14/022 ,  C23C14/08 ,  Y10T428/12611 ,  Y10T428/12618 ,  Y10T428/12632 ,  Y10T428/12667

摘要： A PVD layer system for the coating of workpieces encompasses at least one mixed-crystal layer of a multi-oxide having the following composition: (Me11-xMe2x)2O3, where Me1 and Me2 each represent at least one of the elements Al, Cr, Fe, Li, Mg, Mn, Nb, Ti, Sb or V. The elements of Me1 and Me2 differ from one another. The crystal lattice of the mixed-crystal layer in the PVD layer system has a corundum structure which in an x-ray diffractometrically analyzed spectrum of the mixed-crystal layer is characterized by at least three of the lines associated with the corundum structure. Also disclosed is a vacuum coating method for producing a mixed-crystal layer of a multi-oxide, as well as correspondingly coated tools and components.

公开(公告)号：US20080286608A1

公开(公告)日：2008-11-20

申请号：US11749498

申请日：2007-05-16

申请人： Dennis QUINTO ,  Christian Wohlrab ,  Jurgen Ramm

发明人： Dennis QUINTO ,  Christian Wohlrab ,  Jurgen Ramm

IPC分类号： B32B7/02 ,  B23B27/14

CPC分类号： C23C30/005 ,  C23C28/042 ,  C23C28/044 ,  C23C28/048 ,  C23C28/321 ,  C23C28/322 ,  C23C28/34 ,  C23C28/341 ,  C23C28/345 ,  C23C28/3455 ,  C23C28/347 ,  C23C28/36 ,  Y10T407/27 ,  Y10T428/24942 ,  Y10T428/24983 ,  Y10T428/265

摘要： The invention provides a single or a multilayer PVD coated sharp edged cutting tool, which can at the same time exhibit satisfactory wear and thermochemical resistance as well as resistance to edge chipping. The cutting tool comprises a sintered body made of a cemented carbide, a CBN, a cermet or a ceramic material having a cutting edge with an edge radius Re, a flank and a rake face and a multilayer coating consisting of a PVD coating comprising at least one oxidic PVD layer covering at least parts of the surface of the sintered body. In one embodiment the edge radius Re is smaller than 40 μm, preferably smaller than or equal to 30 μm. The covered parts of the surface preferably comprise at least some parts of the sharp edge of the sintered body.

摘要翻译： 本发明提供了一种单层或多层PVD涂层的锐边切割工具，同时可以显示令人满意的耐磨性和耐热化学性以及耐边缘切屑。 该切削工具包括由硬质合金，CBN，金属陶瓷或陶瓷材料制成的烧结体，该烧结体具有边缘半径R e的切削刃，侧面和前刀面以及多层涂层 由包括至少一层氧化PVD层的PVD涂层组成，其覆盖烧结体表面的至少部分。 在一个实施例中，边缘半径R e小于40μm，优选小于或等于30μm。 表面的被覆盖部分优选地包括烧结体的锋利边缘的至少一些部分。

公开(公告)号：US20080143260A1

公开(公告)日：2008-06-19

申请号：US11817443

申请日：2006-03-01

申请人： Gerhard Tuymer ,  Jurgen Ramm ,  Daniel Lendi

发明人： Gerhard Tuymer ,  Jurgen Ramm ,  Daniel Lendi

IPC分类号： H01J37/32

CPC分类号： H01J37/32174 ,  H01J37/32091 ,  H02M7/10

摘要： The invention relates to a vacuum plasma generator for providing a plasma discharge (10) for treating work pieces (5) by way of a pulsed plasma process in a vacuum chamber (2). Said vacuum plasma generator comprises a generator output (9, 9′) having an AC mains supply (6a), an AC/DC mains rectifier system (6) for rectifying the AC mains voltage to a DC voltage, a filter capacitor (6b), a first stage as clocked DC/DC voltage converter (7) with means for adjusting the DC output voltage which produces an intermediate circuit voltage (Uz), comprising a controlled power switch (7a) which feeds the primary winding of a transformer (14) and the secondary winding of which is connected to a rectifier (15) and a downstream intermediate capacitor (12) and configures a floating transformer secondary circuit (23). Said secondary circuit is connected to a downstream second stage which is a pulse output stage (8) and is connected to the generator output (9, 9′). The DC/DC voltage converter (7) has at least two floating transformer secondary circuits (23) and comprises a switch-over device (20) with a switch controller (22) for optionally switching the floating transformer secondary circuits (23) in parallel or in series.

摘要翻译： 本发明涉及一种用于通过脉冲等离子体处理在真空室（2）中提供用于处理工件（5）的等离子体放电（10）的真空等离子体发生器。 所述真空等离子体发生器包括具有AC电源（6a）的发电机输出（9,9'），用于将AC电源电压整流为DC电压的AC / DC电源整流器系统（6），滤波电容器 b），作为时钟的DC / DC电压转换器（7）的第一级，具有用于调节产生中间电路电压（Uz）的DC输出电压的装置，包括受控电源开关（7a），其馈送一个 变压器（14），其次级绕组连接到整流器（15）和下游中间电容器（12），并构成浮动变压器次级电路（23）。 所述次级电路连接到作为脉冲输出级（8）并连接到发电机输出（9,9'）的下游第二级。 DC / DC电压转换器（7）具有至少两个浮动变压器次级电路（23），并且包括具有开关控制器（22）的切换装置（20），用于可选地平行地切换浮动变压器次级电路（23） 或串联。

公开(公告)号：US07153363B2

公开(公告)日：2006-12-26

申请号：US10850741

申请日：2004-05-21

申请人： Jurgen Ramm

发明人： Jurgen Ramm

IPC分类号： C30B25/12 ,  C30B25/14

CPC分类号： C23C16/45525 ,  C23C16/4554 ,  C23C16/45544 ,  C23C16/50

摘要： Substrates are charged with a material by introducing the substrates into an evacuated vacuum container and exposing the surface of the substrates to a reactive gas which is adsorbed on the surface. The exposure is then terminated and the reactive gas adsorbed on the surface is allowed to react. The surface with the adsorbed reactive gas is exposed to a low-energy plasma discharge with ion energy E10 on the surface of the substrate of 0

摘要翻译： 通过将基板引入抽真空的真空容器中并将基板的表面暴露于吸附在表面上的反应性气体，从而将基板装入基材中。 然后曝光被终止，并且允许吸附在表面上的反应性气体发生反应。 具有吸附的反应性气体的表面暴露于基板表面上的离子能量E 10 N的低能量等离子体放电，其中0 <10 <20eV 和e e E e E e e e e e e的电子能量E e。 吸附的反应气体至少与等离子体产生的离子和电子的配合起反应，并且其中将填充在衬底表面上的所得材料的密度控制为具有从分离的原子到形成连续单层的预定密度 。