High density, separable connector and contact for use therein
    1.
    发明授权
    High density, separable connector and contact for use therein 失效
    高密度,可分离的连接器和接触件用于其中

    公开(公告)号:US5137456A

    公开(公告)日:1992-08-11

    申请号:US787285

    申请日:1991-11-04

    CPC分类号: H01R12/714 H01R12/52

    摘要: An electrical connector for interconnecting a pair of circuit members (e.g., printed circuit boards) wherein the connector includes a plurality of electrical contacts, these contacts including at least one semi-spherical end portion for engaging a respective conductor on one of the circuit members. Significantly, the semi-spherical end portion is capable of moving in two different directions of rotation during such engagement to provide an effective wiping motion against the surfaces of the member's conductor. In one embodiment, the connector includes contacts with opposed, semi-spherical end portions, while in another embodiment, a singular semi-spherical end portion is taught.

    摘要翻译: 一种用于互连一对电路构件(例如印刷电路板)的电连接器,其中连接器包括多个电触点,这些触点包括至少一个半球形端部,用于与一个电路构件上的相应导体接合。 重要的是,半球形端部能够在这种接合期间在两个不同的旋转方向上移动,以对构件导体的表面提供有效的擦拭运动。 在一个实施例中,连接器包括具有相对的半球形端部的触点,而在另一个实施例中,教导了单个半球形端部。

    Cyclic shrinkage of a templated 3D network material
    2.
    发明授权
    Cyclic shrinkage of a templated 3D network material 失效
    模板3D网络材料的循环收缩

    公开(公告)号:US07329377B2

    公开(公告)日:2008-02-12

    申请号:US10799160

    申请日:2004-03-12

    IPC分类号: B29C33/76

    摘要: Methods are provided for producing a shrunken replica or a shrunken inverse replica of a multicontinuous structure. In one embodiment, the method comprises (1) infiltrating a first multicontinuous structure with a first fluid material which can be immobilized and shrunken, wherein the first multicontinuous structure comprises at least a first phase and a second phase which is immiscible with the first phase, and the infiltration displaces the second phase in the first multicontinuous structure to form a second multicontinuous structure which comprises at least the first phase and a third phase which consists of the first fluid material; (2) immobilizing the infiltrated first fluid material in the second multicontinuous structure; (3) removing the first phase from the second multicontinuous structure; and (4) shrinking (e.g., by a pyrolysis process) the third phase of the second multicontinuous structure, to produce an isotropically shrunken inverse replica of the first multicontinuous structure.

    摘要翻译: 提供了用于产生多连续结构的收缩复制品或缩小反向复制品的方法。 在一个实施方案中,该方法包括(1)用可固定和收缩的第一流体材料渗透第一多连续结构,其中第一多连续结构包括与第一相不混溶的至少第一相和第二相, 并且所述渗透置换所述第一多连续结构中的所述第二相以形成第二多连续结构,所述第二相连结构至少包括所述第一相和由所述第一流体材料组成的第三相; (2)将渗透的第一流体材料固定在第二多连续结构中; (3)从第二多连续结构中去除第一相; 和(4)第二多连续结构的第三相收缩(例如,通过热解过程),以产生第一多连续结构的各向同性收缩的反向复制品。

    Method for preparing oriented polymer structures and said structures
    3.
    发明授权
    Method for preparing oriented polymer structures and said structures 失效
    制备取向聚合物结构和所述结构的方法

    公开(公告)号:US6143831A

    公开(公告)日:2000-11-07

    申请号:US608801

    申请日:1996-02-29

    摘要: A system for preparing oriented block copolymer structures includes a copolymer solution, a device capable of providing a flow field and an evaporation device. The device can be at least two cylinders that are parallel and adjacent to one another to form a nip and a driving mechanism to rotate each cylinder. Means for controlling a solvent environment and evaporation are provided. A method for preparing oriented block copolymer structures includes providing at least two cylinders which are parallel and adjacent to one another so as to form at least one nip, rotating each of the cylinders such that at the nip the cylinder surfaces are moving in the same direction with substantially the same or different tangential velocity, introducing a block copolymer solution into one of the nips of the rotating cylinders, thereby subjecting the polymer solution to a flow field and whereby orientation of the solution begins and evaporating the solvent from the block copolymer solution, whereby ordered microphase separation occurs and the oriented block copolymer structure is formed on the surface of at least one cylinder.

    摘要翻译: 用于制备取向嵌段共聚物结构的体系包括共聚物溶液,能提供流场的装置和蒸发装置。 该装置可以是至少两个彼此平行并相邻的气缸,以形成压区和驱动机构来旋转每个气缸。 提供了控制溶剂环境和蒸发的方法。 制备取向嵌段共聚物结构的方法包括提供至少两个彼此平行和相邻的圆柱体,以便形成至少一个压区,使每个气缸旋转,使得在压区处,气缸表面沿相同方向移动 以大致相同或不同的切向速度,将嵌段共聚物溶液引入旋转圆筒的一个夹头中,从而使聚合物溶液进行流场,并且由此开始溶液的取向并从溶胶中蒸发溶剂, 由此发生有序的微相分离,并且在至少一个气缸的表面上形成取向的嵌段共聚物结构。

    Broad wavelength range chemically-tunable photonic materials
    4.
    发明授权
    Broad wavelength range chemically-tunable photonic materials 有权
    宽波长范围的化学可调光子材料

    公开(公告)号:US09360604B2

    公开(公告)日:2016-06-07

    申请号:US13495684

    申请日:2012-06-13

    摘要: The present invention provides polymeric materials arranged as photonic crystals, or portions of photonic crystals, having properties which can be easily tuned over a large range of wavelengths upon exposure to an external stimulus. In some embodiments, the photonic crystals comprise at least one portion which can undergo a change in a physical, chemical, dielectric, or other property upon exposure to an altering stimulus, resulting in a change in a diffracted wavelength of electromagnetic radiation (e.g, light) by the photonic crystal. Embodiments of the invention may advantageously exhibit large stop band tunability and rapid response times. Photonic crystals of the invention may be useful in a wide variety of applications, such as colorimetric sensors, active components of simple display devices, electrically controlled tunable optically pumped laser, photonic switches, multiband filters, and the like.

    摘要翻译: 本发明提供了布置为光子晶体或光子晶体的部分的聚合材料,其具有在暴露于外部刺激时可以在大范围的波长下容易地调谐的特性。 在一些实施例中,光子晶体包括至少一部分,其在暴露于改变刺激时可以经历物理,化学,电介质或其他性质的变化,导致电磁辐射的衍射波长的变化(例如,光 )由光子晶体。 本发明的实施例可以有利地表现出大的阻带可调性和快速响应时间。 本发明的光子晶体可用于各种应用中,例如比色传感器,简单显示装置的有源部件,电控可调谐的光泵浦激光器,光子开关,多频带滤波器等。

    Stop Flow Interference Lithography System
    5.
    发明申请
    Stop Flow Interference Lithography System 有权
    停止流动干涉光刻系统

    公开(公告)号:US20100099048A1

    公开(公告)日:2010-04-22

    申请号:US12503935

    申请日:2009-07-16

    IPC分类号: G03F7/20 G03B27/54 G03B27/72

    摘要: Stop flow interference lithography system for high throughput synthesis of 3-dimensionally patterned polymer particles. The system includes a microfluidic channel containing a stationary oligomer film and a phase mask located adjacent to the microfluidic channel. A source of collimated light is provided for passing the collimated light through the phase mask and into the microfluidic channel for interaction with the oligomer. The passage of the collimated light through the phase mask generates a 3-dimensional distribution of light intensity to induce crosslinking of the oligomer in high intensity regions thereby forming 3-dimensional structures.

    摘要翻译: 停止流动干涉光刻系统,用于三维图案化聚合物颗粒的高通量合成。 该系统包括含有固定低聚物膜的微流体通道和位于微流体通道附近的相位掩模。 提供准直光源以使准直光通过相位掩模并进入微流体通道以与低聚物相互作用。 准直光穿过相位掩模产生光强度的3维分布,以诱导高强度区域中的低聚物的交联,由此形成3维结构。

    Polymeric photonic band gap materials
    6.
    发明授权
    Polymeric photonic band gap materials 有权
    聚合光子带隙材料

    公开(公告)号:US06433931B1

    公开(公告)日:2002-08-13

    申请号:US09367332

    申请日:2000-01-10

    IPC分类号: G02B110

    CPC分类号: B82Y20/00 G02B6/1225

    摘要: A polymeric photonic band gap structure can be defined by a block copolymeric species, a mixture of homopolymers, or a combination optionally with appropriate dielectric contrast enhancing additives. The structure includes periodic, phase-separated microdomains alternating in refractive index, the domains sized to provide a photonic band gap in the UV-visible spectrum. A method of the invention involves creating a defect in a polymeric article including a periodic structure of a plurality occuring separate domains. The defect can be created by inserting into the material a plane of a material different from materials defining the polymeric article. According to another method of the invention, a defect is created in a polymeric article, including a periodic structure of a plurality of periodically occuring separate domains, by altering polymeric material in the article. The polymeric material can be altered by removing polymeric material via radiation, by exposing the material to intersecting beams of radiation, by removing the material via etching or the like. A defect can be created in one embodiment by magnetically guiding a defined by a block copolymeric species, a mixture of homopolymers, or a combination optionally with appropriate dielectric contrast enhancing additives.

    摘要翻译: 聚合物光子带隙结构可以通过嵌段共聚物种,均聚物混合物或任选地与合适的介电对比增强添加剂的组合来定义。 该结构包括折射率交替的周期性,相分离的微区域,其尺寸设计成在UV-可见光谱中提供光子带隙。 本发明的方法涉及在聚合物制品中产生缺陷,所述聚合物制品包括多个发生的分离区域的周期性结构。 可以通过将不同于限定聚合物制品的材料的材料的平面插入到材料中来产生缺陷。 根据本发明的另一种方法,通过改变制品中的聚合物材料,在聚合物制品中产生缺陷,包括多个周期性发生的分开的区域的周期结构。 聚合材料可以通过通过辐射去除聚合材料,通过将材料暴露于相交的辐射束,通过蚀刻等去除材料来改变。 在一个实施方案中可以通过磁性引导由嵌段共聚物种类,均聚物混合物或任选地与合适的介电对比增强添加剂组合来限定的缺陷。

    Structurally chiral materials exhibiting magneto-gyrotropy
    7.
    发明授权
    Structurally chiral materials exhibiting magneto-gyrotropy 失效
    表现出磁回旋的结构手性材料

    公开(公告)号:US07106918B2

    公开(公告)日:2006-09-12

    申请号:US10851587

    申请日:2004-05-21

    IPC分类号: G02F1/295 C04B35/00

    摘要: A structured material is disclosed with magneto-gyrotropic characteristics including at least one continuous structurally-chiral material. The structured material has an electric permittivity and a magnetic permeability at least one of which varies within the structured material along a first direction in a repetitious fashion wherein a repetition unit includes a chiral component and is at least 25 nm in length. The structured material exhibits non-reciprocal electromagnetic wave propagation velocity characteristics along a second direction that includes a non-zero component along the first direction.

    摘要翻译: 公开了一种结构化材料,其具有包括至少一种连续结构手性材料的磁回旋特性。 结构化材料具有介电常数和磁导率,其中至少一种以重复的方式沿着第一方向在结构化材料内变化,其中重复单元包括手性组分并且长度为至少25nm。 结构化材料沿着包括沿着第一方向的非零分量的第二方向表现出不可逆的电磁波传播速度特性。

    METHOD FOR NANOPATTERNING BASED ON SELF ASSEMBLY OF A TRIBLOCK TERPOLYMER
    10.
    发明申请
    METHOD FOR NANOPATTERNING BASED ON SELF ASSEMBLY OF A TRIBLOCK TERPOLYMER 审中-公开
    基于自制组装方法进行纳豆化的方法

    公开(公告)号:US20120070627A1

    公开(公告)日:2012-03-22

    申请号:US12884600

    申请日:2010-09-17

    IPC分类号: B32B3/10 B05D3/00 B82Y30/00

    摘要: Nanolithography and nanoscale device features based on a self-assembled film comprising an ABC triblock terpolymer disposed on a substrate surface are provided. The self-assembled film has a controlled pattern of features over the entire film. Each feature comprises block A, block B, or block C of the ABC triblock terpolymer. One or more blocks (A, B, or C) of the self-assembled film can be transformed by, for example, being removed, to provide a particular pattern geometry for nanolithography.

    摘要翻译: 提供了基于设置在基板表面上的包含ABC三嵌段三元共聚物的自组装膜的纳米光刻和纳米级器件特征。 自组装膜在整个膜上具有受控的特征图案。 每个特征包括ABC三嵌段三元共聚物的嵌段A,嵌段B或嵌段C。 自组装膜的一个或多个嵌段(A,B或C)可以通过例如被去除来转化,以提供用于纳米光刻的特定图案几何形状。