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143 条记录 (耗时 0.044 秒)

    Magnetic disk and method of making thereof
    1.
    发明授权
    Magnetic disk and method of making thereof 失效
    磁盘及其制造方法

    公开(公告)号：US06468598B1

    公开(公告)日：2002-10-22

    申请号：US09598454

    申请日：2000-06-22

    申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Kenji Watanabe ,  Kazuo Yamauchi ,  Shinta Kunitomo ,  Tohru Satake ,  Yasushi Tohma ,  Juichi Ishiguro

    发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Kenji Watanabe ,  Kazuo Yamauchi ,  Shinta Kunitomo ,  Tohru Satake ,  Yasushi Tohma ,  Juichi Ishiguro

    IPC分类号： B05D500

    CPC分类号： C23C14/048 ,  C23C16/047 ,  G11B5/82 ,  G11B5/84 ,  G11B5/8404 ,  G11B5/8408

    摘要： It is an object of the present invention to provide a method of making a magnetic disk having a uniform textured structure with micro-waviness of fabrication depth of less than 20 nm, preferably less than 10 nm, and a local depth deviation of less than 5%, in which texture patterns are characterized by the fact that lateral surfaces of the structure are sloped or curved. The object has been achieved in a method for making a magnetic disk, having micro-waviness on a fabrication surface of a substrate for reducing dynamic friction and controlling head float, by rotating and irradiating the fabrication surface with a high energy beam from a beam surface at an inclined angle to the substrate surface. The surface is irradiated through a shielding mask having a specific pattern, so as to produce a transcription pattern on the substrate surface to produce a textured structure with micro-waviness having sloped or curved side surfaces.

    摘要翻译： 本发明的目的是提供一种制造具有均匀纹理结构的磁盘的方法，其制造深度小于20nm，优选小于10nm，局部深度偏差小于5 ％，其中纹理图案的特征在于结构的侧表面是倾斜的或弯曲的。 该目的已经在制造磁盘的方法中实现，其通过用来自梁表面的高能量光束旋转和照射制造表面而在基板的制造表面上具有微波纹以减少动态摩擦和控制磁头浮动 与基板表面成倾斜的角度。 通过具有特定图案的屏蔽掩模照射该表面，以在基板表面上产生转印图案，以产生具有倾斜或弯曲侧表面的微波纹的纹理结构。

    Magnetic recording disk
    4.
    发明授权
    Magnetic recording disk 失效
    磁记录盘

    公开(公告)号：US06194048B1

    公开(公告)日：2001-02-27

    申请号：US09165637

    申请日：1998-10-02

    申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Kenji Watanabe ,  Kazuo Yamauchi ,  Shinta Kunitomo ,  Yasushi Tohma ,  Tohru Satake

    发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Kenji Watanabe ,  Kazuo Yamauchi ,  Shinta Kunitomo ,  Yasushi Tohma ,  Tohru Satake

    IPC分类号： B32B302

    CPC分类号： G11B5/7315 ,  G11B5/7325 ,  G11B5/82 ,  Y10S428/90 ,  Y10T428/12389 ,  Y10T428/12465 ,  Y10T428/12736 ,  Y10T428/12944 ,  Y10T428/12993 ,  Y10T428/266

    摘要： A magnetic recording disk having on its surface a texture structure of fine surface irregularities with reduced variations, which is suitable for high-density magnetic recording, and a method of manufacturing such a magnetic recording disk are provided. The magnetic recording disk has a substrate 11, 12 (16) coated on a surface thereof with a magnetic layer 13, a carbon layer 14, and a lubricating film 15. The substrate has on a surface thereof a texture structure of fine surface irregularities for reducing friction when the substrate is brought into contact with a head and controlling an amount of lift of the head. The fine surface irregularities have a height of 20 nm or less and are formed from a pattern shape or profile of a shield with a high-speed atomic beam emitted from a high-speed atomic beam source.

    摘要翻译： 一种磁记录盘，其表面具有适合于高密度磁记录的具有减小的变化的细小表面凹凸的纹理结构和制造这种磁记录盘的方法。 磁记录盘具有在其表面上涂覆有磁性层13，碳层14和润滑膜15的基板11,12（16）。该基板在其表面上具有细小的表面凹凸的纹理结构，用于 当衬底与头部接触并控制头部的提升量时，减小摩擦。 微细表面凹凸具有20nm以下的高度，并且由具有从高速原子束源发射的高速原子束的屏蔽的图案形状或轮廓形成。

    Beam source
    5.
    发明授权
    Beam source 失效
    光源

    公开(公告)号：US06949735B1

    公开(公告)日：2005-09-27

    申请号：US10030087

    申请日：2000-07-14

    申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Kenji Watanabe ,  Tohru Satake

    发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Kenji Watanabe ,  Tohru Satake

    IPC分类号： G21G4/02 ,  H01J27/16 ,  H01J37/08 ,  H01J37/32 ,  H05H3/00

    CPC分类号： H01J37/32192 ,  H01J27/16 ,  H01J37/08 ,  H01J37/321 ,  H05H3/00

    摘要： An object of the present invention is to provide a beam source capable of efficiently generating a high-density energy beam having good directivity and a relatively large beam diameter. The beam source of the present invention comprises a discharge tube; a gas inlet for introducing gas into the discharge tube; three electrodes mounted in the discharge tube downstream from the gas inlet, wherein the electrode on the upstream end has a plurality of openings through which the gas can pass, the middle electrode is a mesh-shaped electrode, and the electrode on the downstream end is a beam-emitting electrode having a plurality of beam-emitting holes and is disposed in a plane parallel to the middle electrode; plasma-generating means disposed between the two upstream electrodes on the outside of the discharge tube for transforming gas introduced into the discharge tube into plasma; and voltage-applying means for accelerating the beam between the two downstream electrodes and emitting the accelerated beam from the downstream beam-emitting electrode.

    摘要翻译： 本发明的目的是提供一种能够有效地产生具有良好方向性和较大光束直径的高密度能量束的束源。 本发明的光束源包括放电管; 用于将气体引入放电管的气体入口; 三个电极安装在放气管的气体入口下游，其中上游端的电极具有多个开口，气体可以通过该开口，中间电极是网状电极，下游端的电极是 具有多个光束发射孔并且布置在与中间电极平行的平面中的光束发射电极; 等离子体产生装置，设置在放电管外侧的两个上游电极之间，用于将引入放电管的气体转化为等离子体; 以及用于加速两个下游电极之间的光束并从下游光束发射电极发射加速光束的电压施加装置。

    Microfabrication of pattern imprinting
    6.
    发明授权
    Microfabrication of pattern imprinting 失效
    图案压印的微加工

    公开(公告)号：US06671034B1

    公开(公告)日：2003-12-30

    申请号：US09301311

    申请日：1999-04-29

    申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Tohru Satake ,  Yotaro Hatamura ,  Masayuki Nakao

    发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Tohru Satake ,  Yotaro Hatamura ,  Masayuki Nakao

    IPC分类号： G03B2754

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/50 ,  G03F7/0002 ,  G03F7/2014

    摘要： The object of the present invention IS to provide an optical imprinting apparatus and method for producing a two-dimensional pattern, having line widths less than the wavelength of an exposure light. The evarnescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises: a container in which light is enclosed therein; an exposure-mask having a proximity field exposure pattern firmly fixed to a section of said container for exposing said exposure pattern on a photo-sensitive material through an evanescent field by said light enclosed therein; and a light source for supplying said light in said container.

    摘要翻译： 本发明的目的是提供一种用于产生具有小于曝光光的波长的线宽的二维图案的光学压印装置和方法。 采用实现（邻近）场效应实现装置和方法。 一种光学压印设备包括：容纳在其中的光; 曝光掩模，其具有牢固地固定在所述容器的一部分上的接近场曝光图案，用于通过所述光包围在所述光敏材料上的所述光衰弱场曝光所述曝光图案; 以及用于将所述光提供在所述容器中的光源。

    Microfabrication of pattern imprinting
    7.
    发明授权
    Microfabrication of pattern imprinting 失效
    图案压印的微加工

    公开(公告)号：US07115354B2

    公开(公告)日：2006-10-03

    申请号：US10699873

    申请日：2003-11-04

    申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Tohru Satake ,  Yotaro Hatamura ,  Masayuki Nakao

    发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Tohru Satake ,  Yotaro Hatamura ,  Masayuki Nakao

    IPC分类号： G01F9/00 ,  G03C5/00

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/50 ,  G03F7/0002 ,  G03F7/2014

    摘要： An optical imprinting apparatus, and a method for producing a two-dimensional pattern, have line widths less than the wavelength of an exposure light. The evanescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises a container in which light is enclosed, an exposure-mask having a proximity field exposure pattern firmly fixed to a section of the container for exposing the exposure pattern on a photo-sensitive material through an evanescent field by the light enclosed therein; and a light source for supplying the light in the container.

    摘要翻译： 光学压印装置和二维图案的制造方法的线宽小于曝光光的波长。 采用ev逝（邻近）场效应实现装置和方法。 一种光学压印装置包括一个封闭光的容器，曝光掩模具有牢固地固定在容器的一部分上的接近场曝光图案，用于通过光封闭的曝光场曝光在感光材料上的消光场 其中 以及用于将光提供到容器中的光源。

    TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus
    10.
    发明授权
    TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus 有权
    TDI检测装置，馈通装置，使用这些装置和设备的电子束装置，以及使用该电子束装置的半导体装置的制造方法

    公开(公告)号：US07521692B2

    公开(公告)日：2009-04-21

    申请号：US11896519

    申请日：2007-09-04

    申请人： Masahiro Hatakeyama ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

    发明人： Masahiro Hatakeyama ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

    IPC分类号： G01K1/08 ,  H01J3/14 ,  H01J3/26

    CPC分类号： H01J37/222 ,  G01N21/956 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/2445 ,  H01J2237/2447 ,  H01R13/2421 ,  H04N5/2253 ,  Y10S439/935

    摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.

    摘要翻译： 电子束装置包括TDI传感器64和馈通装置50.馈通装置具有插座触点54，用于互连连接到凸缘51的引脚52，用于分离不同的环境，而另一个引脚53与 销52，销52，另一销53和插座接触54一起构成连接块，插座触头54具有弹性构件61.因此，即使设置了大量的连接块， 连接力可以保持在如此低的水平，以防止传感器中的破损。 引脚53与TDI传感器64连接，其中像素阵列已经基于图像投影光学系统的光学特性被自适应地配置。 该传感器具有可以将图像投影光学系统的视野尽可能地减小的多个积分级，使得视野内的最大可接受失真可以被设定得更大。 此外，可以确定积分级的数量，使得TDI传感器的数据速率不会降低，但是引脚的数量不会尽可能多地增加。 优选地，行计数的数量可以几乎等于积分级数。