JET MILL
    1.
    发明申请
    JET MILL 有权
    喷气机

    公开(公告)号:US20130186993A1

    公开(公告)日:2013-07-25

    申请号:US13812638

    申请日:2011-07-28

    IPC分类号: B02C19/06

    摘要: Disposed is a jet mill that has a cylindrical pulverization chamber (10) and a classification chamber (6) that connects to the pulverization chamber (10). A fine-powder discharge port (4a) and a classification rotor (7) are provided in the classification chamber (6). A feedstock supply port (5) and at least one gas emission nozzle (11) are provided in the pulverization chamber (10). The shape of the classification chamber (6) is a cone that starts on the inner wall of the pulverization chamber (10), and is angled towards the classification rotor (7). This configuration gives the jet mill high efficiency of pulverization and reduces the amount of powders left in the chamber when the jet mill has finished running.

    摘要翻译: 设置有具有连接到粉碎室(10)的圆柱形粉碎室(10)和分级室(6)的喷射式粉碎机。 在分级室(6)中设置有细粉末排出口(4a)和分级转子(7)。 原料供给口(5)和至少一个排气喷嘴(11)设置在粉碎室(10)中。 分级室(6)的形状是从粉碎室(10)的内壁开始朝向分级转子(7)倾斜的锥体。 这种配置给喷射磨机提供了高效率的粉碎,并且当喷射磨机运行完毕时,减少了腔室中留下的粉末的量。

    Jet mill
    2.
    发明授权
    Jet mill 有权
    喷射磨

    公开(公告)号:US09555416B2

    公开(公告)日:2017-01-31

    申请号:US13812638

    申请日:2011-07-28

    摘要: Disposed is a jet mill that has a cylindrical pulverization chamber (10) and a classification chamber (6) that connects to the pulverization chamber (10). A fine-powder discharge port (4a) and a classification rotor (7) are provided in the classification chamber (6). A feedstock supply port (5) and at least one gas emission nozzle (11) are provided in the pulverization chamber (10). The shape of the classification chamber (6) is a cone that starts on the inner wall of the pulverization chamber (10), and is angled towards the classification rotor (7). This configuration gives the jet mill high efficiency of pulverization and reduces the amount of powders left in the chamber when the jet mill has finished running.

    摘要翻译: 设置有具有连接到粉碎室(10)的圆柱形粉碎室(10)和分级室(6)的喷射式粉碎机。 在分级室(6)中设置有细粉末排出口(4a)和分级转子(7)。 原料供给口(5)和至少一个排气喷嘴(11)设置在粉碎室(10)中。 分级室(6)的形状是从粉碎室(10)的内壁开始朝向分级转子(7)倾斜的锥体。 这种配置给喷射磨机提供了高效率的粉碎,并且当喷射磨机运行完毕时,减少了腔室中留下的粉末的量。

    PULVERIZING APPARATUS
    3.
    发明申请

    公开(公告)号:US20130105607A1

    公开(公告)日:2013-05-02

    申请号:US13696101

    申请日:2011-04-28

    IPC分类号: B02C13/288

    摘要: A pulverizing apparatus for processing a powder material that can be readily melted by friction heat generated between the pulverizing apparatus and the material. The pulverizing apparatus includes a casing (2) having a cylindrical inner face, a rotor (10) driven to rotate about the axis X of the casing and having a rugged portion (10G) in its outer periphery, a gas source providing a gas flow for conveying the powder material from a feed opening (3) provided at an end of the casing along the an axial direction to a discharge opening (4) provided at the other axial end of the casing, a coolant source providing coolant to flow in a coolant passage (15) formed inside the rotor. The rugged portion is divided along the axial direction by an annular cutout portion (11) extending along the peripheral direction of the rotor.

    摘要翻译: 一种用于加工粉碎材料的粉碎装置,其可以通过在粉碎装置和材料之间产生的摩擦热容易地熔化。 粉碎装置包括具有圆筒形内表面的壳体(2),被驱动为围绕壳体的轴线X旋转并且在其外周具有凹凸部分(10G)的转子(10),提供气流 用于将设置在壳体的端部处的进料口(3)沿轴向方向输送到设置在壳体的另一轴向端部处的排出口(4),冷却剂源提供冷却剂以在 冷却剂通道(15)形成在转子内部。 凹凸部沿着轴向沿着沿着转子的圆周方向延伸的环形切口部分(11)分开。

    VERTICAL CAVITY SURFACE EMITTING LASER, VERTICAL CAVITY SURFACE EMITTING LASER DEVICE, OPTICAL TRANSMISSION DEVICE, AND INFORMATION PROCESSING APPARATUS
    5.
    发明申请
    VERTICAL CAVITY SURFACE EMITTING LASER, VERTICAL CAVITY SURFACE EMITTING LASER DEVICE, OPTICAL TRANSMISSION DEVICE, AND INFORMATION PROCESSING APPARATUS 审中-公开
    垂直孔表面发射激光,垂直孔表面发射激光装置,光传输装置和信息处理装置

    公开(公告)号:US20110135318A1

    公开(公告)日:2011-06-09

    申请号:US12781175

    申请日:2010-05-17

    摘要: A vertical cavity surface emitting laser that includes: a substrate; a first semiconductor multilayer reflector; an active region; a second semiconductor multilayer reflector; a columnar structure formed from the second semiconductor multilayer reflector to the first semiconductor multilayer reflector; a current narrowing layer formed inside of the columnar structure and having a conductive region surrounded by an oxidization region; a first electrode formed at a top of the columnar structure, electrically connected to the second semiconductor multilayer reflector and defining a beam window; a first insulating film comprised of a material with a first refractive index and formed on the first electrode to cover the beam window; and a second insulating film comprised of a material with a second refractive index and formed on the first insulating film, of which a radius is smaller than a radius of the conductive region.

    摘要翻译: 一种垂直腔表面发射激光器,包括:衬底; 第一半导体多层反射器; 活跃区域 第二半导体多层反射器; 由所述第二半导体多层反射器形成到所述第一半导体多层反射器的柱状结构; 形成在柱状结构内部并具有由氧化区域包围的导电区域的电流变窄层; 形成在所述柱状结构的顶部的第一电极,电连接到所述第二半导体多层反射器并限定光束窗; 第一绝缘膜,由具有第一折射率的材料构成,并形成在第一电极上以覆盖光束窗; 以及第二绝缘膜,其由具有第二折射率的材料构成,并形成在第一绝缘膜上,半导体的半径小于导电区域的半径。

    VCSEL, optical device, light irradiation device, data processing device, light source, free space optical communication device, and optical transmission system
    6.
    发明授权
    VCSEL, optical device, light irradiation device, data processing device, light source, free space optical communication device, and optical transmission system 有权
    VCSEL,光学装置,光照射装置,数据处理装置,光源,自由空间光通信装置和光传输系统

    公开(公告)号:US07724799B2

    公开(公告)日:2010-05-25

    申请号:US12110448

    申请日:2008-04-28

    IPC分类号: H01S5/00

    摘要: A VCSEL includes a first distributed Bragg reflector (DBR) of a first conductivity type formed on a substrate and including at least one semiconductor layer to be oxidized, an active region having a column shaped structure and formed on the first DBR, and a second DBR of a second conductivity type. At least one hole starting from a surface of the first DBR and reaching the at least one semiconductor layer to be oxidized is formed in the first DBR outside of a column shaped structure of the second DBR. An oxidized region is formed in the semiconductor layer to be oxidized by selectively oxidizing from a side surface of the hole. In the first DBR, a first current path is formed by a conductive region surrounded by the oxidized region, and a second current path is formed by a conductive region not surrounded by the oxidized region.

    摘要翻译: VCSEL包括第一导电类型的第一分布布拉格反射器(DBR),其形成在衬底上并且包括至少一个要被氧化的半导体层,形成在第一DBR上的具有柱状结构的有源区和第二DBR 的第二导电类型。 从第一DBR的表面开始并到达要被氧化的至少一个半导体层的至少一个孔形成在第二DBR的列形结构外侧的第一DBR中。 通过从孔的侧面选择性氧化,在半导体层中形成被氧化的氧化区域。 在第一DBR中,第一电流路径由被氧化区域包围的导电区域形成,并且第二电流路径由未被氧化区域包围的导电区域形成。

    Epitaxial silicon wafer and method for manufacturing same
    8.
    发明授权
    Epitaxial silicon wafer and method for manufacturing same 有权
    外延硅晶片及其制造方法

    公开(公告)号:US08659020B2

    公开(公告)日:2014-02-25

    申请号:US13378562

    申请日:2010-05-28

    IPC分类号: H01L29/04 H01L21/336

    摘要: It is an object to provide an epitaxial silicon wafer that is provided with an excellent gettering ability in which a polysilicon layer is formed on the rear face side of a silicon crystal substrate into which phosphorus (P) and germanium (Ge) have been doped. A silicon epitaxial layer is grown by a CVD method on the surface of a silicon crystal substrate into which phosphorus and germanium have been doped at a high concentration. After that, a PBS forming step for growing a polysilicon layer is executed on the rear face side of a silicon crystal substrate. By the above steps, the number of LPDs (caused by an SF) that occur on the surface of the epitaxial silicon wafer due to the SF can be greatly reduced.

    摘要翻译: 本发明的目的是提供一种在掺杂有磷(P)和锗(Ge)的硅晶体衬底的背面侧上形成多晶硅层的优异的吸气能力的外延硅晶片。 通过CVD法在硅晶体衬底的表面上以高浓度掺杂有磷和锗的方式生长硅外延层。 之后,在硅晶体基板的背面进行用于生长多晶硅层的PBS形成工序。 通过上述步骤,可以大大减少由于SF而在外延硅晶片的表面上发生的LPD(由SF引起)的数量。

    OPTICAL WAVEGUIDE, LIGHT TRANSMISSION APPARATUS, AND ELECTRONIC EQUIPMENT
    9.
    发明申请
    OPTICAL WAVEGUIDE, LIGHT TRANSMISSION APPARATUS, AND ELECTRONIC EQUIPMENT 审中-公开
    光波导,光传输设备和电子设备

    公开(公告)号:US20100226656A1

    公开(公告)日:2010-09-09

    申请号:US12540572

    申请日:2009-08-13

    IPC分类号: H04B10/12 G02B6/26 H04B10/00

    摘要: An optical waveguide includes a first waveguide region and a second waveguide region. The first waveguide region includes a first core, a first clad provided around the first core, and a light reflecting surface. The light reflecting surface has at least one function of (i) reflecting light from a longitudinal direction of the first core toward a direction crossing the longitudinal direction and (ii) reflecting light from the crossing direction toward the longitudinal direction of the first core. The second waveguide region continues from the first waveguide region. The second waveguide region that includes a second core, and a second clad provided around the second core. The second core of the second waveguide region is thinner than the first core of the first waveguide region. A total thickness of the second core and the second clad is smaller than that of the first core and the first clad.

    摘要翻译: 光波导包括第一波导区域和第二波导区域。 第一波导区域包括第一芯,围绕第一芯设置的第一包层和光反射表面。 光反射面至少具有以下功能:(i)将反射来自第一芯的纵向的光朝向与长度方向交叉的方向反射,以及(ii)将来自交叉方向的光朝向第一芯的长度方向反射。 第二波导区域从第一波导区域继续。 包括第二芯的第二波导区域和围绕第二核心设置的第二覆层。 第二波导区域的第二核心比第一波导区域的第一核心薄。 第二芯和第二包层的总厚度小于第一芯和第一包层的总厚度。

    Vertical-cavity surface-emitting laser, module, optical transmission device, free space optical communication device, optical transmission system, and free space optical communication system
    10.
    发明授权
    Vertical-cavity surface-emitting laser, module, optical transmission device, free space optical communication device, optical transmission system, and free space optical communication system 有权
    垂直腔表面发射激光器,模块,光传输装置,自由空间光通信装置,光传输系统和自由空间光通信系统

    公开(公告)号:US07751459B2

    公开(公告)日:2010-07-06

    申请号:US12330118

    申请日:2008-12-08

    IPC分类号: H01S5/00

    摘要: Provided is a VCSEL that includes: a first semiconductor multilayer film reflective mirror of a first conductivity type formed on a substrate; an active region formed thereon; a current confining layer of a second conductivity type formed thereon; a second semiconductor multilayer film reflective mirror of the second conductivity type formed thereon; and a third semiconductor multilayer film reflective mirror of the second conductivity type formed thereon. The reflective mirrors include a pair of a high refractive index layer and a low refractive index layer. The impurity concentration of the second reflective mirror is higher than that of the third reflective mirror. The band gap energy of the high refractive index layer in the second reflective mirror is greater than the energy of the wavelength of a resonator formed of the first reflective mirror, the active region, the current confining layer, the second reflective mirror, and the third reflective mirror.

    摘要翻译: 提供一种VCSEL,其包括:形成在基板上的第一导电类型的第一半导体多层膜反射镜; 形成在其上的有源区; 形成在其上的第二导电类型的电流限制层; 在其上形成第二导电类型的第二半导体多层膜反射镜; 以及形成在其上的第二导电类型的第三半导体多层膜反射镜。 反射镜包括一对高折射率层和低折射率层。 第二反射镜的杂质浓度高于第三反射镜的杂质浓度。 第二反射镜中的高折射率层的带隙能量大于由第一反射镜,有源区,电流限制层,第二反射镜和第三反射镜形成的谐振器的波长的能量 反光镜。