Methods and Apparatus for Thin Die Processing
    8.
    发明申请
    Methods and Apparatus for Thin Die Processing 审中-公开
    薄模加工方法与装置

    公开(公告)号:US20120267423A1

    公开(公告)日:2012-10-25

    申请号:US13089977

    申请日:2011-04-19

    IPC分类号: B23K1/20 B25J15/06

    CPC分类号: H01L21/6838 H01L24/75

    摘要: A vacuum tip and methods for processing thin integrated circuit dies. A vacuum tip for attaching to an integrated circuit die is disclosed comprising a vacuum port configured to connect to a vacuum supply on an upper surface and having a bottom surface; and at least one vacuum hole extending through the vacuum tip and exposed at the bottom surface of the vacuum tip; wherein the vacuum tip is configured to physically contact a surface of an integrated circuit die. Methods for processing integrated circuit dies are disclosed.

    摘要翻译: 真空尖端和薄集成电路管芯的处理方法。 公开了一种用于连接到集成电路管芯的真空端头,其包括被构造成连接到上表面上的具有底表面的真空源的真空端口; 以及至少一个真空孔,其延伸穿过真空尖端并暴露在真空尖端的底表面处; 其中所述真空尖端被配置为物理地接触集成电路管芯的表面。 公开了集成电路管芯的处理方法。