公开(公告)号：US5134965A

公开(公告)日：1992-08-04

申请号：US538150

申请日：1990-06-14

申请人： Mitsuo Tokuda ,  Junzou Azuma ,  Toru Otsubo ,  Yasuhiro Yamaguchi ,  Ichirou Sasaki

发明人： Mitsuo Tokuda ,  Junzou Azuma ,  Toru Otsubo ,  Yasuhiro Yamaguchi ,  Ichirou Sasaki

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/511 ,  H01J37/32

CPC分类号： C23C16/45502 ,  C23C16/4558 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32247 ,  H01J37/32449 ,  H01J2237/3321

摘要： Disclosed is a plasma CVD apparatus and a method therefor, the apparatus comprising: a microwave generating portion; a coaxial cavity resonator for making a microwave supplied from the microwave generating portion resonate; a plurality of gas leading inlets provided in under portions of an axis of the cavity resonator and in peripheral wall portions of the cavity resonator for leading-in a supplied CVD gas; and a plasma generating chamber in which the CVD gas lead into the plasma generating chamber through the gas leading inlets and made to flow uniformly onto a surface of a substrate is subject to the microwave made intensive through resonance in the cavity resonator and radiated through a coupling plate so that uniform plasma is generated to thereby form a thin film on the surface of the substrate.Further disclosed is a plasma processing apparatus and a method therefor, the apparatus comprising; a plasma chamber for maintaining plasma generated in the inside of the plasma chamber so as to perform plasma processing; a first microwave accumulating and intensifying cavity resonance chamber connected with the plasma chamber through a first slot plate; a second microwave accumulating and intensifying cavity resonance chamber connected with the first cavity resonance chamber through a second slot plate parallel to the first slot plate; and a microwave generator for leading a microwave into the second cavity resonance chamber through a waveguide.

摘要翻译： 公开了一种等离子体CVD装置及其方法，该装置包括：微波产生部分; 用于使从微波产生部供给的微波共振的同轴空腔谐振器; 设置在空腔谐振器的轴的下部的多个气体导入口和用于引入所提供的CVD气体的空腔谐振器的周壁部; 以及等离子体产生室，其中CVD气体通过气体引入入口进入等离子体发生室并使其均匀地流动到衬底的表面上受到微波在空腔谐振器中通过谐振强化并通过耦合辐射 使得产生均匀的等离子体，从而在衬底的表面上形成薄膜。 另外公开了一种等离子体处理装置及其方法，该装置包括： 等离子体室，用于保持等离子体室内部产生的等离子体，以进行等离子体处理; 通过第一槽板与等离子体室连接的第一微波积聚和增强腔共振腔; 第二微波积聚和增强腔谐振室，通过与第一槽板平行的第二槽板与第一空腔共振室连接; 以及微波发生器，用于通过波导将微波引导到第二腔谐振室。

公开(公告)号：US4985109A

公开(公告)日：1991-01-15

申请号：US475889

申请日：1990-02-06

申请人： Toru Otsubo ,  Mitsuo Tokuda ,  Yasuhiro Yamaguchi ,  Ichirou Sasaki ,  Kazuhiro Ohara ,  Hirohisa Usuami ,  Junzou Azuma

发明人： Toru Otsubo ,  Mitsuo Tokuda ,  Yasuhiro Yamaguchi ,  Ichirou Sasaki ,  Kazuhiro Ohara ,  Hirohisa Usuami ,  Junzou Azuma

IPC分类号： C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  H05H1/46

CPC分类号： H01J37/32357

摘要： A plasma processing apparatus including a microwave generator, a waveguide for supplying microwaves generated by the microwave generator, a cavity resonator for resonating the microwaves supplied by the waveguide, and a plasma processing chamber. The plasma processing chamber is coupled to the cavity resonator for receiving resonated microwaves therefrom and for generating a plasma therein. The plasma processing chamber is provided with a stage for holding a substrate for plasma processing, and apparatus for introducing a plasma processing gas to the plasma processing chamber for exhausting gas therefrom. A separation plate separates the cavity resonator and the plasma processing chamber and enables resonated microwaves to be transmitted therethrough from the cavity resonator means to the plasma processing chamber. A slot plate functioning as an antenna is disposed in the cavity resonator in opposition to a surface of the substrate for enabling radiation of the resonated microwaves to the plasma processing chamber through the separation plate, the slot plate including at least one set of circumferentially extending slots for enabling radiation of resonated microwaves.

公开(公告)号：US5275977A

公开(公告)日：1994-01-04

申请号：US669526

申请日：1991-03-14

申请人： Toru Otsubo ,  Yasuhiro Yamaguchi

发明人： Toru Otsubo ,  Yasuhiro Yamaguchi

IPC分类号： H01L21/3105 ,  H01L21/316 ,  H01L21/768 ,  H01L21/00 ,  H01L21/02 ,  H01L21/302 ,  H01L21/463

CPC分类号： H01L21/02164 ,  H01L21/02274 ,  H01L21/31051 ,  H01L21/76801 ,  H01L21/76819

摘要： Disclosed herein are an insulating film forming method for semiconductor device interconnection and a plasma treatment system for use in the method. The method comprises (i) a step of forming an insulating film free of void, on a substrate having an interconnection pattern, in which a mixed gas of a film forming source gas and an etching gas comprising a fluorine compound is used to perform both deposition of an insulating film by plasma CVD and reactive etching of the insulating film, simultaneously, and (ii) a step of planarizing the surface of the insulating film formed by the step (i) and comprised of, for example, silicon oxide, in which a gas of a material decomposable by a reactive gas capable of decomposing the insulating film is supplied onto the substrate so as to deposit a solid film of the material, e.g. Si(OCH.sub.3).sub.4, on the insulating film on the substrate, the temperature of the substrate is then raised to liquefy the deposited material film, thereby planarizing the surface of the material film, the substrate temperature is again lowered to solidify the planarized liquid material film, and thereafter the insulating film together with the Si(OCH.sub.3).sub. 4 solid film is subjected to plasma etching with, for instance, CF.sub.4 gas as an etching gas. According to the invention, an insulating film which is planar and free of voids can be formed on an interconnection pattern of a substrate, without affecting the characteristics of devices provided on the substrate.

摘要翻译： 这里公开了用于半导体器件互连的绝缘膜形成方法和用于该方法的等离子体处理系统。 该方法包括（i）在具有互连图案的基板上形成无空隙的绝缘膜的步骤，其中使用成膜源气体和包含氟化合物的蚀刻气体的混合气体进行沉积 通过等离子体CVD和绝缘膜的反应性蚀刻同时进行绝缘膜的平坦化，以及（ii）使由步骤（i）形成的由例如氧化硅构成的绝缘膜的表面平坦化的步骤，其中， 可以通过能够分解绝缘膜的反应性气体分解的材料的气体被供给到基板上，以沉积材料的固体膜，例如 Si（OCH 3）4在衬底上的绝缘膜上，然后升高衬底的温度以使沉积的材料膜液化，从而使材料膜的表面平坦化，再次降低衬底温度以固化平坦化液体材料 膜，然后将绝缘膜与Si（OCH 3）4固体膜一起用例如作为蚀刻气体的CF 4气体进行等离子体蚀刻。 根据本发明，可以在衬底的互连图案上形成平坦且无空隙的绝缘膜，而不影响设置在衬底上的器件的特性。

公开(公告)号：US4776918A

公开(公告)日：1988-10-11

申请号：US110368

申请日：1987-10-20

申请人： Toru Otsubo ,  Yasuhiro Yamaguchi ,  Takahiko Takeuchi, deceased

发明人： Toru Otsubo ,  Yasuhiro Yamaguchi ,  Takahiko Takeuchi, deceased

IPC分类号： C23C16/517 ,  H01J37/32 ,  B44C1/22 ,  B05D3/06 ,  C03C15/00 ,  C23C14/00

CPC分类号： H01J37/32238 ,  C23C16/517 ,  H01J37/32192 ,  H01J37/32247

摘要： Microwaves supplied from a magnetron through a waveguide are resonated in a cavity resonator to increase their amplitude. The resonated microwaves are emitted into a plasma production chamber through slits and a wall. Then plasma is produced in the plasma production chamber into which plasma processing gas is introduced. The plasma is employed for uniformly processing a substrate.

摘要翻译： 通过波导从磁控管提供的微波在空腔谐振器中共振以增加它们的振幅。 共振的微波通过狭缝和墙壁被排放到等离子体生产室中。 然后在等离子体生产室中产生等离子体，其中引入等离子体处理气体。 等离子体用于均匀地处理基板。

公开(公告)号：US09273382B2

公开(公告)日：2016-03-01

申请号：US13637409

申请日：2011-03-18

申请人： Akito Mizutani ,  Kunio Fukuda ,  Shin Ishikawa ,  Atsutaka Honda ,  Yasuhiro Yamaguchi ,  Yasushi Kato ,  Hiroki Ota ,  Mitsuyuki Fujisawa ,  Takumi Ujiro ,  Hideaki Yamashita

发明人： Akito Mizutani ,  Kunio Fukuda ,  Shin Ishikawa ,  Atsutaka Honda ,  Yasuhiro Yamaguchi ,  Yasushi Kato ,  Hiroki Ota ,  Mitsuyuki Fujisawa ,  Takumi Ujiro ,  Hideaki Yamashita

IPC分类号： C22C38/50 ,  C22C38/44 ,  C22C38/06 ,  C22C38/12 ,  B23K1/00 ,  B23K11/00 ,  B23K20/02 ,  C21D6/00 ,  C22C38/00 ,  C22C38/02 ,  C22C38/04 ,  C22C38/48 ,  C22C38/08 ,  C22C38/16 ,  C22C38/26 ,  C22C38/28 ,  B01J35/04 ,  B01J37/02 ,  F01N3/28

CPC分类号： C22C38/12 ,  B01J35/04 ,  B01J37/0225 ,  B23K1/0014 ,  B23K11/0093 ,  B23K20/023 ,  B23K2101/006 ,  B23K2101/02 ,  C21D6/002 ,  C22C38/001 ,  C22C38/002 ,  C22C38/004 ,  C22C38/005 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/08 ,  C22C38/16 ,  C22C38/26 ,  C22C38/28 ,  C22C38/44 ,  C22C38/48 ,  C22C38/50 ,  F01N3/281 ,  F01N2330/02 ,  F01N2530/04 ,  Y10T428/12431

摘要： A stainless steel foil contains, in percent by mass, 0.05% or less of C, 2.0% or less of Si, 1.0% or less of Mn, 0.003% or less of S, 0.05% or less of P, 25.0% to 35.0% of Cr, 0.05% to 0.30% of Ni, 3.0% to 10.0% of Al, 0.10% or less of N, 0.02% or less of Ti, 0.02% or less of Nb, 0.02% or less of Ta, 0.005% to 0.20% of Zr, 0.02% or less of Ce, 0.03% to 0.20% of REM excluding Ce, 0.5% to 6.0% in total of at least one of Mo and W, and the balance being Fe and incidental impurities.

摘要翻译： 不锈钢箔以C，0.05％以下，Si为2.0％以下，Mn为1.0％以下，S：0.003％以下，P：0.05％以下，25.0％〜35.0质量％ 的Cr，0.05〜0.30％的Ni，3.0〜10.0％的Al，0.10％以下的N，0.02％以下的Ti，0.02％以下的Nb，0.02％以下的Ta，0.005％ 至0.20％的Zr，0.02％以下的Ce，0.03％〜0.20％的除Ce以外的REM，0.5％〜6.0％的Mo和W中的至少一种，余量为Fe和附带的杂质。

公开(公告)号：US08120719B2

公开(公告)日：2012-02-21

申请号：US12749582

申请日：2010-03-30

申请人： Mieko Seki ,  Hiroe Okuyama ,  Yasuhiro Yamaguchi ,  Tomozumi Uesaka ,  Hideo Kobayashi

发明人： Mieko Seki ,  Hiroe Okuyama ,  Yasuhiro Yamaguchi ,  Tomozumi Uesaka ,  Hideo Kobayashi

IPC分类号： G02F1/135 ,  G09G3/34 ,  G03G5/047 ,  G03G5/147

CPC分类号： G02F1/1354 ,  G02F2001/1355

摘要： A photo-addressable display medium is provided, the photo-addressable display medium including: a pair of electrodes having transparency; a photoconductive layer disposed between the pair of electrodes and having a laminated structure of a first charge generation layer, a charge transport layer and a second charge generation layer in this order from an exposing light irradiation side; and a liquid crystal layer disposed between an electrode of the inverse side to the exposing light irradiation side and the second charge generation layer and having memory performance, wherein the first charge generation layer and the second charge generation layer contain a phthalocyanine compound, and the charge transport layer contains a stilbene compound represented by the following formula (1): wherein, R1 to R4 each independently represents a hydrogen atom, a methyl group or an ethyl group.

摘要翻译： 提供了光寻址显示介质，该光寻址显示介质包括：一对具有透明度的电极; 设置在所述一对电极之间并且从曝光光照射侧依次具有第一电荷产生层，电荷传输层和第二电荷产生层的层叠结构的光电导层; 以及设置在与曝光光照射侧相反的电极和第二电荷产生层之间并具有记忆性能的液晶层，其中第一电荷产生层和第二电荷产生层含有酞菁化合物，并且电荷 传输层含有由下式（1）表示的茋化合物：其中，R 1至R 4各自独立地表示氢原子，甲基或乙基。

公开(公告)号：US07948567B2

公开(公告)日：2011-05-24

申请号：US12251212

申请日：2008-10-14

申请人： Hideo Kobayashi ,  Yasuhiro Yamaguchi ,  Tomozumi Uesaka ,  Mieko Seki ,  Hiroe Okuyama ,  Masaaki Araki

发明人： Hideo Kobayashi ,  Yasuhiro Yamaguchi ,  Tomozumi Uesaka ,  Mieko Seki ,  Hiroe Okuyama ,  Masaaki Araki

IPC分类号： G02F1/135

CPC分类号： G11B7/24

摘要： An optically writable display medium includes an optical switching element and a display element. The optical switching element includes a charge transport layer sandwiched between an upper charge generating layer and a lower charge generating layer. The display element includes a display layer having memory properties and is provided on the optical switching element. The absorption wavelength region of the upper charge generating layer and the absorption wavelength region of the lower charge generating layer are substantially different from each other.

摘要翻译： 光学可写显示介质包括光开关元件和显示元件。 光开关元件包括夹在上电荷产生层和下电荷产生层之间的电荷传输层。 显示元件包括具有存储特性的显示层，并且设置在光开关元件上。 上电荷产生层的吸收波长区域和下电荷产生层的吸收波长区域彼此大不相同。

公开(公告)号：US07817213B2

公开(公告)日：2010-10-19

申请号：US12247863

申请日：2008-10-08

申请人： Haruo Harada ,  Yasunori Okano ,  Chisato Urano ,  Hiroshi Arisawa ,  Makoto Gomyo ,  Taijyu Gan ,  Yasuhiro Yamaguchi ,  Tomozumi Uesaka

发明人： Haruo Harada ,  Yasunori Okano ,  Chisato Urano ,  Hiroshi Arisawa ,  Makoto Gomyo ,  Taijyu Gan ,  Yasuhiro Yamaguchi ,  Tomozumi Uesaka

IPC分类号： G02F1/135 ,  G09G3/36

CPC分类号： G02F1/133362 ,  G02F1/1334 ,  G02F1/13718 ,  G09G3/001 ,  G09G2300/0486 ,  G09G2310/0275

摘要： Sequentially performed are (1) an entire liquid crystal layer is initialized into a focal conic state, (2) an image is written onto the liquid crystal device by scanning with selecting exposure or non-exposure while applying a voltage that does not exceed a threshold value for a state change from the focal conic state to a homeotropic state during the non-exposure but exceeds the threshold value during the exposure and that causes the focal conic state and the homeotropic state to be bi-stable after the exposure, and (3) the application of the voltage is stopped to change a state of a portion, of which the state has changed to the homeotropic state, to the planer state. In (2), an electric field energy applied to an exposure portion of the liquid crystal layer is controlled to gradually increase from a start to an end of the series of scanning actions.

摘要翻译： 顺序地执行的是（1）整个液晶层被初始化为焦点锥形状态，（2）通过在施加不超过阈值的电压的情况下通过选择曝光或非曝光扫描来将图像写入液晶装置 在曝光期间状态从焦点锥形状态变化到垂直状态的值，并且在曝光期间超过阈值，并且导致焦点锥形状态和垂直状态在曝光之后是双稳态的，并且（3 ）停止施加电压以将其状态已变为垂面状态的部分的状态改变为平面状态。 在（2）中，控制施加到液晶层的曝光部分的电场能量，以从一系列扫描动作的开始到结束逐渐增加。

公开(公告)号：US07670320B2

公开(公告)日：2010-03-02

申请号：US11902442

申请日：2007-09-21

申请人： Yoshiharu Iwase ,  Yasuhiro Yamaguchi

发明人： Yoshiharu Iwase ,  Yasuhiro Yamaguchi

IPC分类号： A61M5/32

CPC分类号： A61M5/158 ,  A61M5/3257 ,  A61M5/3272 ,  A61M25/02 ,  A61M25/0631 ,  A61M25/0637 ,  A61M2005/3247

摘要： An indwelling needle includes a cylindrical main body to be fixed to a fitted body, a cylindrical hub for holding a needle, and a cylindrical protective cover which surround the needle and is provided slidably along the needle. In the usage state, the hub and the needle are advanced to the tip end side with respect to the main body and the protective cover is retreated to the rear end side with respect to the main body to project a cutting edge of the needle. In the housed state, the hub is retreated to the rear end side with respect to the main body, and the protective cover is advanced to the tip end side and the cutting edge of the needle is housed within the protective cover. Erroneous sticking into medical staff is prevented, and the burden on a patient is reduced.

摘要翻译： 留置针包括固定到装配体的圆筒形主体，用于保持针的圆柱形毂和围绕针的圆柱形保护盖，并且沿着针可滑动地设置。 在使用状态下，轮毂和针相对于主体前进到前端侧，保护罩相对于主体后退到后端侧，从而突出针的切削刃。 在收纳状态下，轮毂相对于主体退回到后端侧，保护罩前进到前端侧，针的切削刃容纳在保护罩内。 防止误入医护人员，减轻病人的负担。

公开(公告)号：US07463400B1

公开(公告)日：2008-12-09

申请号：US11502279

申请日：2006-08-10

申请人： Satoshi Tatsuura ,  Yasuhiro Yamaguchi ,  Yasuo Yamamoto

发明人： Satoshi Tatsuura ,  Yasuhiro Yamaguchi ,  Yasuo Yamamoto

IPC分类号： G02F1/153

CPC分类号： G02F1/15 ,  G02F2001/1515

摘要： The invention provides an electrochromic display device having at least a pair of substrate electrodes and an electrolyte solution interposed between the pair of substrate electrodes. One substrate electrode of the pair of substrate electrodes has a porous structure on its surface. A monomolecular film formed of a first molecule that has a functional group that is capable of adsorbing to the porous structure is adsorbed to the porous structure via the functional group of the first molecule. A monomolecular film of a second molecule that has a functional group that is capable of chemically bonding to the first molecule is provided on the monomolecular film formed of the first molecule via a chemical bond between the functional group of the first molecule and the functional group of the second molecule. Further, at least one of the first molecule and the second molecule is an electrochromic dye.

摘要翻译： 本发明提供一种电致变色显示装置，其具有至少一对基板电极和介于一对基板电极之间的电解质溶液。 一对基板电极的一个基板电极在其表面上具有多孔结构。 由具有能够吸附于多孔结构体的官能团的第一分子形成的单分子膜通过第一分子的官能团吸附在多孔结构体上。 通过第一分子的官能团与官能团之间的化学键，在由第一分子形成的单分子膜上提供具有能够与第一分子化学键合的官能团的第二分子的单分子膜 第二分子。 此外，第一分子和第二分子中的至少一个是电致变色染料。