公开(公告)号：US20180047695A1

公开(公告)日：2018-02-15

申请号：US15797124

申请日：2017-10-30

Applicant: Renesas Electronics Corporation

Inventor： Yoshikazu SHIMOTE ,  Shinji BABA ,  Toshihiro IWASAKI ,  Kazuyuki NAKAGAWA

IPC: H01L23/00 ,  H01L23/50 ,  H01L23/498 ,  H01L21/78 ,  H01L21/56 ,  H01L23/31 ,  H01L21/683 ,  H05K3/34 ,  H05K3/28

CPC classification number: H01L24/17 ,  H01L21/561 ,  H01L21/563 ,  H01L21/6836 ,  H01L21/78 ,  H01L23/3128 ,  H01L23/3142 ,  H01L23/49805 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/49838 ,  H01L23/49894 ,  H01L23/50 ,  H01L23/562 ,  H01L23/564 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/32 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L24/81 ,  H01L24/97 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2224/0401 ,  H01L2224/05009 ,  H01L2224/05022 ,  H01L2224/05124 ,  H01L2224/05572 ,  H01L2224/11 ,  H01L2224/1134 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/13012 ,  H01L2224/13014 ,  H01L2224/13016 ,  H01L2224/13076 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16055 ,  H01L2224/16105 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/16237 ,  H01L2224/1713 ,  H01L2224/32225 ,  H01L2224/45015 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48227 ,  H01L2224/48235 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/81 ,  H01L2224/81191 ,  H01L2224/81385 ,  H01L2224/814 ,  H01L2224/81815 ,  H01L2224/83 ,  H01L2224/83104 ,  H01L2224/85 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/014 ,  H01L2924/05442 ,  H01L2924/0665 ,  H01L2924/10253 ,  H01L2924/15311 ,  H01L2924/15321 ,  H01L2924/181 ,  H01L2924/186 ,  H01L2924/2064 ,  H01L2924/351 ,  H05K3/284 ,  H05K3/3436 ,  H05K2201/068 ,  H05K2201/09427 ,  H05K2201/10704 ,  H05K2201/10977 ,  H05K2203/0465 ,  H01L2924/00012 ,  H01L2924/01047 ,  H01L2224/45099 ,  H01L2924/207

Abstract: In a semiconductor device (SP1) according to an embodiment, a solder resist film (first insulating layer, SR1) which is in contact with the base material layer, and a resin body (second insulating layer, 4) which is in contact with the solder resist film and the semiconductor chip, are laminated in between the base material layer (2CR) of a wiring substrate 2 and a semiconductor chip (3). In addition, a linear expansion coefficient of the solder resist film is equal to or larger than a linear expansion coefficient of the base material layer, and the linear expansion coefficient of the solder resist film is equal to or smaller than a linear expansion coefficient of the resin body. Also, the linear expansion coefficient of the base material layer is smaller than the linear expansion coefficient of the resin body. According to the above-described configuration, damage of the semiconductor device caused by a temperature cyclic load can be suppressed, and thereby reliability can be improved.

公开(公告)号：US20170092614A1

公开(公告)日：2017-03-30

申请号：US15375072

申请日：2016-12-09

Applicant: Renesas Electronics Corporation

Inventor： Toshihiro IWASAKI ,  Takeumi KATO ,  Takanori OKITA ,  Yoshikazu SHIMOTE ,  Shinji BABA ,  Kazuyuki NAKAGAWA ,  Michitaka KIMURA

IPC: H01L23/00 ,  H01L21/56 ,  H01L21/48

CPC classification number: H01L24/81 ,  H01L21/4853 ,  H01L21/563 ,  H01L23/49816 ,  H01L23/49838 ,  H01L24/03 ,  H01L24/04 ,  H01L24/05 ,  H01L24/11 ,  H01L24/14 ,  H01L24/16 ,  H01L24/17 ,  H01L24/32 ,  H01L24/75 ,  H01L24/83 ,  H01L24/94 ,  H01L25/043 ,  H01L25/0657 ,  H01L25/074 ,  H01L25/0756 ,  H01L25/117 ,  H01L2224/0345 ,  H01L2224/0346 ,  H01L2224/0347 ,  H01L2224/0361 ,  H01L2224/03622 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/051 ,  H01L2224/056 ,  H01L2224/1132 ,  H01L2224/1147 ,  H01L2224/1181 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/131 ,  H01L2224/1403 ,  H01L2224/14104 ,  H01L2224/14131 ,  H01L2224/1605 ,  H01L2224/1701 ,  H01L2224/1703 ,  H01L2224/73204 ,  H01L2224/75252 ,  H01L2224/75745 ,  H01L2224/75824 ,  H01L2224/8101 ,  H01L2224/81024 ,  H01L2224/81048 ,  H01L2224/81191 ,  H01L2224/81192 ,  H01L2224/81193 ,  H01L2224/81194 ,  H01L2224/81203 ,  H01L2224/81815 ,  H01L2224/81986 ,  H01L2224/831 ,  H01L2224/8385 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/0105 ,  H01L2924/01075 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/3841 ,  H01L2224/81201 ,  H01L2924/00

Abstract: The joint reliability in flip chip bonding of a semiconductor device is enhanced. Prior to flip chip bonding, flux 9 is applied to the solder bumps 5a for flip chip bonding over a substrate and reflow/cleaning is carried out and then flip chip bonding is carried out. This makes is possible to thin the oxide film over the surfaces of the solder bumps 5a and make the oxide film uniform. As a result, it is possible to suppress the production of local solder protrusions to reduce the production of solder bridges during flip chip bonding and enhance the joint reliability in the flip chip bonding of the semiconductor device.

公开(公告)号：US20160233189A1

公开(公告)日：2016-08-11

申请号：US15023716

申请日：2013-09-27

Applicant: RENESAS ELECTRONICS CORPORATION

Inventor： Yoshikazu SHIMOTE ,  Shinji BABA ,  Toshihiro IWASAKI ,  Kazuyuki NAKAGAWA

IPC: H01L23/00 ,  H01L21/78 ,  H01L21/56 ,  H01L23/498 ,  H01L23/31

CPC classification number: H01L24/17 ,  H01L21/561 ,  H01L21/563 ,  H01L21/6836 ,  H01L21/78 ,  H01L23/3128 ,  H01L23/3142 ,  H01L23/49805 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/49838 ,  H01L23/49894 ,  H01L23/50 ,  H01L23/562 ,  H01L23/564 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/32 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L24/81 ,  H01L24/97 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2224/0401 ,  H01L2224/05009 ,  H01L2224/05022 ,  H01L2224/05124 ,  H01L2224/05572 ,  H01L2224/11 ,  H01L2224/1134 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/13012 ,  H01L2224/13014 ,  H01L2224/13016 ,  H01L2224/13076 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16055 ,  H01L2224/16105 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/16237 ,  H01L2224/1713 ,  H01L2224/32225 ,  H01L2224/45015 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48227 ,  H01L2224/48235 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/81 ,  H01L2224/81191 ,  H01L2224/81385 ,  H01L2224/814 ,  H01L2224/81815 ,  H01L2224/83 ,  H01L2224/83104 ,  H01L2224/85 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/014 ,  H01L2924/05442 ,  H01L2924/0665 ,  H01L2924/10253 ,  H01L2924/15311 ,  H01L2924/15321 ,  H01L2924/181 ,  H01L2924/186 ,  H01L2924/2064 ,  H01L2924/351 ,  H05K3/284 ,  H05K3/3436 ,  H05K2201/068 ,  H05K2201/09427 ,  H05K2201/10704 ,  H05K2201/10977 ,  H05K2203/0465 ,  H01L2924/00012 ,  H01L2924/01047 ,  H01L2224/45099 ,  H01L2924/207

Abstract: In a semiconductor device (SP1) according to an embodiment, a solder resist film (first insulating layer, SR1) which is in contact with the base material layer, and a resin body (second insulating layer, 4) which is in contact with the solder resist film and the semiconductor chip, are laminated in between the base material layer (2CR) of a wiring substrate 2 and a semiconductor chip (3). In addition, a linear expansion coefficient of the solder resist film is equal to or larger than a linear expansion coefficient of the base material layer, and the linear expansion coefficient of the solder resist film is equal to or smaller than a linear expansion coefficient of the resin body. Also, the linear expansion coefficient of the base material layer is smaller than the linear expansion coefficient of the resin body. According to the above-described configuration, damage of the semiconductor device caused by a temperature cyclic load can be suppressed, and thereby reliability can be improved.

Abstract translation: 在根据实施例的半导体器件（SP1）中，与基材层接触的阻焊膜（第一绝缘层SR1）和与该基材层接触的树脂体（第二绝缘层4） 阻焊膜和半导体芯片层叠在布线基板2的基材层（2CR）和半导体芯片（3）之间。 此外，阻焊膜的线膨胀系数等于或大于基材层的线膨胀系数，阻焊膜的线膨胀系数等于或小于 树脂体。 此外，基材层的线膨胀系数小于树脂体的线膨胀系数。 根据上述结构，可以抑制由温度循环负载引起的半导体器件的损坏，从而可以提高可靠性。