Abstract:
A semiconductor chip is mounted on a first surface of an interconnect substrate, and has a multilayer interconnect layer. A first inductor is formed over the multilayer interconnect layer, and a wiring axis direction thereof is directed in a horizontal direction to the interconnect substrate. A second inductor is formed on the multilayer interconnect layer, and a wiring axis direction thereof is directed in the horizontal direction to the interconnect substrate. The second inductor is opposite to the first inductor. A sealing resin seals at least the first surface of the interconnect substrate and the semiconductor chip. A groove is formed over the whole area of a portion that is positioned between the at least first inductor and the second inductor of a boundary surface of the multilayer interconnect layer and the sealing resin.
Abstract:
A semiconductor device includes a substrate having a main surface and a back surface opposite to the main surface, a first semiconductor chip having an upper surface and a lower surface opposite to the first surface with a side surface provided therebetween, the first semiconductor chip being mounted on the main surface of the substrate, a plurality of bumps provided between the main surface of the substrate and the lower surface of the first semiconductor chip, a second semiconductor chip having an upper surface and a lower surface opposite to the first surface with a side surface provided therebetween, the second semiconductor chip being mounted on the upper surface of the first semiconductor chip such that the side surface of the second semiconductor chip is positioned outward from the side surface of the first semiconductor chip.
Abstract:
A semiconductor chip is mounted on a first surface of an interconnect substrate, and has a multilayer interconnect layer. A first inductor is formed over the multilayer interconnect layer, and a wiring axis direction thereof is directed in a horizontal direction to the interconnect substrate. A second inductor is formed on the multilayer interconnect layer, and a wiring axis direction thereof is directed in the horizontal direction to the interconnect substrate. The second inductor is opposite to the first inductor. A sealing resin seals at least the first surface of the interconnect substrate and the semiconductor chip. A groove is formed over the whole area of a portion that is positioned between the at least first inductor and the second inductor of a boundary surface of the multilayer interconnect layer and the sealing resin.