Method for growth of indium-containing nitride films
    6.
    发明授权
    Method for growth of indium-containing nitride films 有权
    含铟氮化物膜生长方法

    公开(公告)号:US08482104B2

    公开(公告)日:2013-07-09

    申请号:US13346507

    申请日:2012-01-09

    IPC分类号: H01L29/20

    摘要: A method for growth of indium-containing nitride films is described, particularly a method for fabricating a gallium, indium, and nitrogen containing material. On a substrate having a surface region a material having a first indium-rich concentration is formed, followed by a second thickness of material having a first indium-poor concentration. Then a third thickness of material having a second indium-rich concentration is added to form a sandwiched structure which is thermally processed to cause formation of well-crystallized, relaxed material within a vicinity of a surface region of the sandwich structure.

    摘要翻译: 描述了含铟氮化物膜的生长方法,特别是制造镓,铟和含氮材料的方法。 在具有表面区域的基板上形成具有第一富铟浓度的材料,然后形成具有第一贫铟浓度的第二厚度的材料。 然后加入具有第二富铟浓度的第三厚度的材料以形成夹层结构,其被热处理以在夹层结构的表面区域附近形成良好结晶的松弛材料。

    Method for Growth of Indium-Containing Nitride Films
    7.
    发明申请
    Method for Growth of Indium-Containing Nitride Films 有权
    含铟氮化物膜生长方法

    公开(公告)号:US20120199952A1

    公开(公告)日:2012-08-09

    申请号:US13346507

    申请日:2012-01-09

    IPC分类号: H01L29/20 H01L21/20

    摘要: A method for growth of indium-containing nitride films is described, particularly a method for fabricating a gallium, indium, and nitrogen containing material. On a substrate having a surface region a material having a first indium-rich concentration is formed, followed by a second thickness of material having a first indium-poor concentration. Then a third thickness of material having a second indium-rich concentration is added to form a sandwiched structure which is thermally processed to cause formation of well-crystallized, relaxed material within a vicinity of a surface region of the sandwich structure.

    摘要翻译: 描述了含铟氮化物膜的生长方法,特别是制造镓,铟和含氮材料的方法。 在具有表面区域的基板上形成具有第一富铟浓度的材料,然后形成具有第一贫铟浓度的第二厚度的材料。 然后加入具有第二富铟浓度的第三厚度的材料以形成夹层结构,其被热处理以在夹层结构的表面区域附近形成良好结晶的松弛材料。

    Microcavity light emitting diode method of manufacture
    8.
    发明授权
    Microcavity light emitting diode method of manufacture 有权
    微腔发光二极管制造方法

    公开(公告)号:US08354679B1

    公开(公告)日:2013-01-15

    申请号:US12569337

    申请日:2009-09-29

    摘要: A high efficiency microcavity light emitting diode comprises a stack of AlxInyGa1-x-yN layers, where 0≦x, y, x+y≦1, with each layer having a high crystalline quality. The stack has a uniform thickness less than 6λ/n, with an active layer centered approximately (2i+1)λ/(4n) from a reflective electrical contact, where λ is the peak emission wavelength, n is the index of refraction at the peak emission wavelength, i is an integer, and each layer within the stack has a dislocation density below about 105 cm−2.

    摘要翻译: 高效微腔发光二极管包括一层Al x In y Ga 1-x-y N层,其中0< nlE; x,y,x + y≦̸ 1,每层具有高结晶质量。 堆叠具有小于6λ/ n的均匀厚度,其中有效层从反射电接触中心为大约(2i + 1)λ/(4n),其中λ是峰值发射波长,n是在 峰值发射波长,i是整数,并且堆叠内的每个层具有低于约105cm -2的位错密度。