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    BALL SUPPORTED SHADOW FRAME
    1.
    发明申请
    BALL SUPPORTED SHADOW FRAME 审中-公开
    球支撑阴影框架

    公开(公告)号：US20100122655A1

    公开(公告)日：2010-05-20

    申请号：US12614479

    申请日：2009-11-09

    申请人： Robin L. Tiner ,  John M. White ,  Kyung-Tae Kim

    发明人： Robin L. Tiner ,  John M. White ,  Kyung-Tae Kim

    IPC分类号： B05C11/00 ,  B23P11/00

    CPC分类号： C23C16/4585 ,  C23C16/042 ,  Y10T29/49895

    摘要： Embodiments disclosed herein generally include an alignment assembly for aligning a shadow frame on a susceptor. For producing large area flat panel displays or solar panels, the shadow frame that protects the areas of the susceptor not covered by the substrate from deposition may be so large that the shadow frame bends and doesn't properly align. By utilizing an alignment assembly having one or more ball bearings, the shadow frame may roll on the susceptor to a proper alignment position. Thus, the shadow frame may be prevented from bending and also align on the susceptor.

    摘要翻译： 本文公开的实施例通常包括用于对准基座上的阴影框架的对准组件。 为了制造大面积平板显示器或太阳能电池板，保护未被基板覆盖的基座的区域沉积的阴影框架可能太大，使得阴影框架弯曲并且不能正确对准。 通过利用具有一个或多个球轴承的对准组件，阴影框架可以在基座上滚动到适当的对准位置。 因此，可以防止阴影框架弯曲并且在基座上对准。

    RF Bus and RF Return Bus for Plasma Chamber Electrode
    3.
    发明申请
    RF Bus and RF Return Bus for Plasma Chamber Electrode 有权
    射频总线和等离子腔室电极的RF返回总线

    公开(公告)号：US20100206483A1

    公开(公告)日：2010-08-19

    申请号：US12705600

    申请日：2010-02-13

    申请人： Carl A. Sorensen ,  Jozef Kudela ,  Robin L. Tiner ,  Suhail Anwar ,  John M. White

    发明人： Carl A. Sorensen ,  Jozef Kudela ,  Robin L. Tiner ,  Suhail Anwar ,  John M. White

    IPC分类号： C23F1/08 ,  C23C16/00 ,  C23C16/50

    CPC分类号： H01J37/32174 ,  H01J37/32091

    摘要： For coupling RF power from an RF input of a plasma chamber to the interior of a plasma chamber, an RF bus conductor is connected between the RF input and a plasma chamber electrode. In one embodiment, an RF return bus conductor is connected to an electrically grounded wall of the chamber, and the RF bus conductor and the RF return bus conductor have respective surfaces that are parallel and face each other. In another embodiment, the RF bus conductor has a transverse cross section having a longest dimension oriented perpendicular to the surface of the plasma chamber electrode that is closest to the RF bus conductor.

    摘要翻译： 为了将来自等离子体室的RF输入的RF功率耦合到等离子体室的内部，RF总线导体连接在RF输入端和等离子体室电极之间。 在一个实施例中，RF返回总线导体连接到室的电接地壁，并且RF总线导体和RF返回总线导体具有彼此平行并相对的相应表面。 在另一个实施例中，RF总线导体具有垂直于等离子体室电极表面的最长尺寸的横截面，其最接近RF总线导体。

    ROBUST OUTLET PLUMBING FOR HIGH POWER FLOW REMOTE PLASMA SOURCE
    4.
    发明申请
    ROBUST OUTLET PLUMBING FOR HIGH POWER FLOW REMOTE PLASMA SOURCE 审中-公开
    大功率流量远程等离子体源的稳健出口

    公开(公告)号：US20090283039A1

    公开(公告)日：2009-11-19

    申请号：US12467477

    申请日：2009-05-18

    申请人： JOHN M. WHITE ,  Soo Young Choi ,  Beom Soo Park ,  Gaku Furuta ,  Young Jin Choi ,  Robin L. Tiner

    发明人： JOHN M. WHITE ,  Soo Young Choi ,  Beom Soo Park ,  Gaku Furuta ,  Young Jin Choi ,  Robin L. Tiner

    IPC分类号： C23C16/54 ,  F28D7/00

    CPC分类号： F28D7/00 ,  C23C16/4405 ,  F28D2021/0078 ,  F28F9/26

    摘要： The present invention generally includes a coupling between components. When igniting a plasma remote from a processing chamber, the reactive gas ions may travel to the processing chamber through numerous components. The reactive gas ions may be quite hot and cause the various components to become very hot and thus, the seals between apparatus components may fail. Therefore, it may be beneficial to cool any metallic components through which the reactive gas ions may travel. However, at the interface between the cooled metallic component and a ceramic component, the ceramic component may experience a temperature gradient sufficient to crack the ceramic material due to the heat of the reactive gas ions and the coolness of the metallic component. Therefore, extending a flange of the metallic component into the ceramic component may lessen the temperature gradient at the interface and reduce cracking of the ceramic component.

    摘要翻译： 本发明通常包括组件之间的联接。 当点燃离开处理室的等离子体时，反应气体离子可通过许多部件行进到处理室。 反应气体离子可能相当热，并导致各种部件变得非常热，因此，装置部件之间的密封可能失效。 因此，冷却反应气体离子可以通过其移动的任何金属组分可能是有益的。 然而，在冷却的金属组分和陶瓷组分之间的界面处，由于反应气体离子的热量和金属组分的冷却，陶瓷组分可能经历足以破坏陶瓷材料的温度梯度。 因此，将金属部件的凸缘延伸到陶瓷部件中可以减小界面处的温度梯度并减少陶瓷部件的开裂。

    COOLED BACKING PLATE
    5.
    发明申请
    COOLED BACKING PLATE 审中-公开
    冷却背板

    公开(公告)号：US20090071406A1

    公开(公告)日：2009-03-19

    申请号：US11858020

    申请日：2007-09-19

    申请人： SOO YOUNG CHOI ,  Robin L. Tiner ,  John M. White

    发明人： SOO YOUNG CHOI ,  Robin L. Tiner ,  John M. White

    IPC分类号： C23C16/00

    CPC分类号： C23C16/45572 ,  C03C17/002 ,  C03C17/02 ,  C03C17/245 ,  C03C2217/213 ,  C03C2218/153 ,  C23C16/4411 ,  C23C16/505

    摘要： A plasma enhanced chemical vapor deposition chamber (PECVD) which includes a backing plate that provides support to a diffuser. The backing plate includes a plurality of fluid conduits adapted for circulation of a cooling fluid therethrough to remove excess heat generated in the chamber by the plasma to thereby maintain the backing plate in a stable condition thereby maintaining the diffuser in a stable position during the deposition of material from the plasma.

    摘要翻译： 等离子体增强化学气相沉积室（PECVD），其包括提供对扩散器的支撑的背板。 背板包括适于使冷却流体循环通过其中的多个流体导管，以通过等离子体去除腔室中产生的多余热量，从而将背板保持在稳定状态，从而在沉积期间将扩散器保持在稳定的位置 来自等离子体的材料

    DIFFUSER GRAVITY SUPPORT
    6.
    发明申请
    DIFFUSER GRAVITY SUPPORT 有权
    DIFFUSER GRAVITY支持

    公开(公告)号：US20090007846A1

    公开(公告)日：2009-01-08

    申请号：US12234359

    申请日：2008-09-19

    申请人： ERNST KELLER ,  John M. White ,  Robin L. Tiner ,  Jiri Kucera ,  Soo Young Choi ,  Beom Soo Park ,  Michael Starr

    发明人： ERNST KELLER ,  John M. White ,  Robin L. Tiner ,  Jiri Kucera ,  Soo Young Choi ,  Beom Soo Park ,  Michael Starr

    IPC分类号： C23C16/00

    CPC分类号： H01J37/3244 ,  C23C16/45565

    摘要： An apparatus and method for supporting a substantial center portion of a gas distribution plate is disclosed. At least one support member is capable of engaging and disengaging the diffuser with a mating connection without prohibiting flow of a gas or gases through the diffuser and is designed to provide vertical suspension to a diffuser that is supported at its perimeter, or capable of supporting the diffuser without a perimeter support. In one aspect, the at least one support member is a portion of a gas delivery conduit and in another embodiment is a plurality of support members separated from the gas delivery conduit. The at least one support member is capable of translating vertical lift, or vertical compression to a center area of the diffuser. A method and apparatus for controlling gas flow from the gas delivery conduit to the gas distribution plate is also disclosed.

    摘要翻译： 公开了一种用于支撑气体分布板的大部分中心部分的装置和方法。 至少一个支撑构件能够通过配合连接件接合和分离扩散器，而不阻止气体或气体流过扩散器，并且被设计成向在其周边支撑的扩散器提供垂直悬架，或者能够支撑 扩散器没有周界支撑。 在一个方面，所述至少一个支撑构件是气体输送导管的一部分，并且在另一个实施例中是与气体输送导管分离的多个支撑构件。 至少一个支撑构件能够将垂直升降或垂直压缩平移到扩散器的中心区域。 还公开了一种用于控制从气体输送管道到气体分配板的气流的方法和装置。

    PREVENTION OF FILM DEPOSITION ON PECVD PROCESS CHAMBER WALL
    7.
    发明申请
    PREVENTION OF FILM DEPOSITION ON PECVD PROCESS CHAMBER WALL 有权
    防止膜电沉积在PECVD工艺室壁上

    公开(公告)号：US20080187682A1

    公开(公告)日：2008-08-07

    申请号：US11955575

    申请日：2007-12-13

    申请人： Beom Soo Park ,  Robin L. Tiner ,  Soo Young Choi ,  John M. White

    发明人： Beom Soo Park ,  Robin L. Tiner ,  Soo Young Choi ,  John M. White

    IPC分类号： C23C16/513 ,  C23C16/00

    CPC分类号： C23C16/4401 ,  C23C16/5096 ,  H01J37/32623 ,  H01J37/32697

    摘要： A method and apparatus for processing a substrate are provided. The chamber body comprises a chamber bottom and a sidewall having a slit valve. A substrate support comprising a support body is disposed in the chamber body. A first end of at least one wide RF ground strap is coupled with the support body and a second end of at least one RF ground strap is coupled with the chamber bottom. At least one extension bar is positioned along a peripheral edge of the support body. The method comprises providing a processing chamber having a slit valve and a substrate support, providing RF power to a distribution plate disposed over the substrate support, flowing gas through the distribution plate, plasma processing a substrate disposed on the substrate support, and reducing the generation of plasma adjacent to the slit valve.

    摘要翻译： 提供了一种用于处理衬底的方法和设备。 腔室主体包括腔室底部和具有狭缝阀的侧壁。 包括支撑体的基板支撑件设置在室主体中。 至少一个宽RF接地带的第一端与支撑体耦合，并且至少一个RF接地带的第二端与腔室底部联接。 至少一个延伸杆沿着支撑体的外围边缘定位。 该方法包括提供具有狭缝阀和衬底支撑件的处理室，向布置在衬底支撑件上方的分配板提供RF功率，使气体流过分布板，等离子体处理设置在衬底支架上的衬底，并减少发电 的等离子体。

    Methods and apparatus for supporting substrates
    10.
    发明授权
    Methods and apparatus for supporting substrates 有权
    用于支撑基材的方法和装置

    公开(公告)号：US08365682B2

    公开(公告)日：2013-02-05

    申请号：US11140777

    申请日：2005-05-31

    申请人： Wendell T. Blonigan ,  Carl Sorensen ,  John M. White ,  Robin L. Tiner

    发明人： Wendell T. Blonigan ,  Carl Sorensen ,  John M. White ,  Robin L. Tiner

    IPC分类号： B65G49/07

    CPC分类号： H01L21/67259 ,  H01L21/68742 ,  H01L21/68778

    摘要： Substrate support methods and apparatus include vertically aligned lift pins that have bearing surfaces that engage friction plates and/or magnetic fields to maintain the vertical orientation of the lift pins during substrate lifting. In some embodiments, a magnetic field and/or weighting may alternatively or additionally be used to control the vertical orientation of the lift pins, limit the angle of the lift pins, and/or prevent the lift pins from unintentionally binding in a susceptor as the susceptor is raised and prevent the resulting uneven support of the substrate.

    摘要翻译： 衬底支撑方法和装置包括垂直对齐的提升销，其具有接合摩擦板和/或磁场的承载表面，以在衬垫提升期间保持提升销的垂直取向。 在一些实施例中，可以替代地或另外地使用磁场和/或加权来控制提升销的垂直定向，限制提升销的角度和/或防止提升销在基座中无意地结合，因为 感受器被升高并且防止由此产生的基板不均匀的支撑。