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公开(公告)号:US20180277744A1
公开(公告)日:2018-09-27
申请号:US15702403
申请日:2017-09-12
Applicant: TOSHIBA MEMORY CORPORATION
Inventor: Masaru TOKO , Keiji HOSOTANI , Hisanori AIKAWA , Tatsuya KISHI
CPC classification number: H01L43/02 , H01L27/228 , H01L43/08 , H01L43/10 , H01L43/12
Abstract: According to one embodiment, a magnetic memory device includes a first magnetic layer having a variable magnetization direction, a first non-magnetic layer provided on the first magnetic layer, and a second magnetic layer provided on the first magnetic layer and having a fixed magnetization direction and provided on the first magnetic layer. The second magnetic layer includes a non-magnetic metal including at least one of Mo (molybdenum), Ta (tantalum), W (tungsten), Hf (hafnium), Nb (niobium) and Ti (titanium).
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公开(公告)号:US20180277183A1
公开(公告)日:2018-09-27
申请号:US15702430
申请日:2017-09-12
Applicant: TOSHIBA MEMORY CORPORATION
Inventor: Keiji HOSOTANI , Tatsuya KISHI , Akira KATAYAMA
CPC classification number: G11C11/161 , G11C11/1673 , H01L27/228 , H01L43/08 , H01L43/10
Abstract: According to one embodiment, a memory includes a first MTJ element having a first area along a first plane; and second MTJ elements each having a second area along the first plane. The second area is larger than or equal to twice the first area and smaller than or equal to five times the first area. Each of the second MTJ elements includes a first ferromagnet, a second ferromagnet, and a first nonmagnet. Respective magnetizations of respective first ferromagnets of the second MTJ elements are oriented along a first direction. Respective magnetizations of respective second ferromagnets of the second MTJ elements are oriented along a second direction. One of the second MTJ elements is coupled to another one of the second MTJ elements in series or in parallel.
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公开(公告)号:US20200176033A1
公开(公告)日:2020-06-04
申请号:US16562372
申请日:2019-09-05
Applicant: TOSHIBA MEMORY CORPORATION
Inventor: Keiji HOSOTANI , Fumitaka ARAI , Keisuke NAKATSUKA
IPC: G11C5/06 , H01L23/48 , H01L27/1157 , H01L27/11582 , H01L27/11565 , H01L27/11519 , H01L27/11524 , H01L27/11556 , G11C16/08 , G11C16/16 , G11C16/24 , G11C16/26 , G11C16/30
Abstract: According to one embodiment, a semiconductor memory device includes: a conductive layer including a first portion and a second portion electrically coupled to the first portion; a first contact plug electrically coupled to the first portion; a first semiconductor layer; a first insulating layer between the second portion and the first semiconductor layer, and between the first portion and the first semiconductor layer; a second contact plug coupled to the first semiconductor layer in a region in which the first insulating layer is formed; a first interconnect; and a first memory cell apart from the second portion in the second direction and storing information between the first semiconductor layer and the first interconnect.
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公开(公告)号:US20180102156A1
公开(公告)日:2018-04-12
申请号:US15835988
申请日:2017-12-08
Applicant: TOSHIBA MEMORY CORPORATION , SK HYNIX INC.
Inventor: Hisanori AIKAWA , Tatsuya KISHI , Keisuke NAKATSUKA , Satoshi INABA , Masaru TOKO , Keiji HOSOTANI , Jae Yun YI , Hong Ju SUH , Se Dong KIM
CPC classification number: G11C11/1673 , G11C5/063 , G11C8/08 , G11C8/12 , G11C11/161 , G11C11/1653 , G11C11/1655 , G11C11/1657 , G11C13/0023 , G11C13/0026 , G11C13/0028 , G11C2213/79 , G11C2213/82 , H01L27/228 , H01L27/2436 , H01L27/2463 , H01L43/08 , H01L45/06 , H01L45/1233 , H01L45/16 , H01L45/1675
Abstract: According to an embodiment, a resistance change memory includes a semiconductor substrate, a transistor having a control terminal, a first terminal and a second terminal, the transistor provided on the semiconductor substrate, an insulating layer covering the transistor, a first conductive line connected to the first terminal and provided on the insulating layer, a second conductive line provided on the insulating layer, and a resistance change element connected between the second terminal and the second conductive line. The first conductive line has a width greater than a width of the second conductive line in a direction in which the first and second conductive lines are arranged.
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公开(公告)号:US20200303400A1
公开(公告)日:2020-09-24
申请号:US16502877
申请日:2019-07-03
Applicant: TOSHIBA MEMORY CORPORATION
Inventor: Fumitaka ARAI , Masakazu GOTO , Masaki KONDO , Keiji HOSOTANI , Nobuyuki MOMO
IPC: H01L27/11582 , G11C16/04 , G11C16/26 , G11C16/10 , H01L27/1157 , H01L27/11573
Abstract: According to one embodiment, a semiconductor memory device includes: a first interconnecting layer; a first signal line; a first memory cell that stores first information between the first interconnecting layer and the first signal line; second to fourth interconnecting layers provided above the first interconnecting layer; fifth to seventh interconnecting layers disposed apart from the second to fourth interconnecting layers; a second signal line coupled to the first signal line; a third signal line coupled to the first and second signal lines and the sixth interconnecting layer; and, first to fifth transistors.
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公开(公告)号:US20200286828A1
公开(公告)日:2020-09-10
申请号:US16564584
申请日:2019-09-09
Applicant: TOSHIBA MEMORY CORPORATION
Inventor: Keiji HOSOTANI , Fumitaka ARAI , Keisuke NAKATSUKA , Nobuyuki MOMO , Motohiko FUJIMATSU
IPC: H01L23/528 , H01L27/1157 , H01L27/11582 , H01L27/11565 , H01L27/11519 , H01L27/11524 , H01L27/11556 , H01L23/522
Abstract: According to one embodiment, a semiconductor memory device includes: a first semiconductor layer including first to third portions which are arranged along a first direction and differ in position from one another in a second direction; a conductive layer including a fourth portion extending in the second direction and a fifth portion extending in the first direction; a first insulating layer between the fourth portion and the first semiconductor layer and between the fifth portion and the first semiconductor layer; a first contact plug coupled to the fourth portion; a second contact plug coupled to the first semiconductor layer in a region where the first insulating layer is formed; a first interconnect; and a first memory cell apart from the fifth portion in the first direction and storing information between the semiconductor layer and the first interconnect.
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