公开(公告)号：US5382423A

公开(公告)日：1995-01-17

申请号：US70293

申请日：1993-06-02

申请人： Tadahiro Ohmi ,  Hiroyuki Harada ,  Nobuhiro Miki ,  Toshiro Fukutome ,  Matagoro Maeno ,  Norio Terasawa ,  Yoshihiro Eto ,  Masahiro Sakata

发明人： Tadahiro Ohmi ,  Hiroyuki Harada ,  Nobuhiro Miki ,  Toshiro Fukutome ,  Matagoro Maeno ,  Norio Terasawa ,  Yoshihiro Eto ,  Masahiro Sakata

IPC分类号： C01F11/22 ,  F28D21/00

CPC分类号： C01F11/22

摘要： Fluorine is recovered as calcium fluoride from a fluoroetchant solution composed mainly of hydrogen fluoride and ammonium fluoride using a sealed reaction tank equipped with a supply port for adding the fluoroetchant solution to the tank, a supply port for adding calcium carbonate to the tank, a vapor supply port for adding steam to heat the solution in the tank, an air supply port for providing air to aerate the contents of the tank, a stirrer for stirring the contents of the tank, an ejector for removing vapors from the tank connected to the tank via a mist separator for separating mist from the vapors being removed from the tank, and an exhaust port for removing calcium fluoride from the tank.

摘要翻译： 使用装有用于将氟提取溶液添加到罐的供给口的密封反应槽，用于向罐中添加碳酸钙的供给口，蒸气中的氟化物，从主要由氟化氢和氟化铵组成的氟捕集剂溶液中回收氟 用于加入蒸汽以加热罐中的溶液的供应口，用于提供空气以使罐的内容物充气的空气供应口，用于搅拌罐的内容物的搅拌器，用于从连接到罐的罐中除去蒸气的喷射器 通过雾气分离器分离出从罐中除去的蒸汽的雾，以及用于从罐中除去氟化钙的排气口。

公开(公告)号：US5362461A

公开(公告)日：1994-11-08

申请号：US953960

申请日：1992-10-01

申请人： Tadahiro Ohmi ,  Hiroyuki Harada ,  Nobuhiro Miki ,  Toshiro Fukutome ,  Matagoro Maeno ,  Norio Terasawa ,  Yoshihiro Eto ,  Masahiro Sakata

发明人： Tadahiro Ohmi ,  Hiroyuki Harada ,  Nobuhiro Miki ,  Toshiro Fukutome ,  Matagoro Maeno ,  Norio Terasawa ,  Yoshihiro Eto ,  Masahiro Sakata

IPC分类号： C01F11/22

CPC分类号： C01F11/22

摘要： Calcium fluoride with high purity of very small content of unreacted calcium carbonate and silica is recovered from an etchant mainly composed of hydrogen fluoride or hydrogen fluoride and ammonium fluoride. The etchant is reacted with calcium carbonate with transfer directions of the etchant and calcium carbonate being controlled within a composition region in which mole equivalent ratio of ammonium fluoride/hydrogen fluoride is specified.

摘要翻译： 从主要由氟化氢或氟化氢和氟化铵组成的蚀刻剂回收具有非常小含量的未反应的碳酸钙和二氧化硅的高纯度的氟化钙。 蚀刻剂与碳酸钙反应，其中蚀刻剂和碳酸钙的转移方向被控制在其中规定了氟化铵/氟化氢的摩尔当量比的组成区域内。

公开(公告)号：US06258411B1

公开(公告)日：2001-07-10

申请号：US09300773

申请日：1999-04-27

申请人： Tadahiro Ohmi ,  Kazuo Chiba ,  Yutaka Mikasa ,  Kenji Ishigaki ,  Nobuhiro Miki ,  Matagoro Maeno ,  Hirohisa Kikuyama

发明人： Tadahiro Ohmi ,  Kazuo Chiba ,  Yutaka Mikasa ,  Kenji Ishigaki ,  Nobuhiro Miki ,  Matagoro Maeno ,  Hirohisa Kikuyama

IPC分类号： B05D304

CPC分类号： H01L21/6835 ,  C23C28/021 ,  C23C28/027 ,  H01S3/0305 ,  H01S3/225 ,  Y10S428/936 ,  Y10S428/938

摘要： An industrial material such as metal, ceramics or plastics whose surface has a film passivated by fluoridation and a process of manufacturing the above industrial material. The industrial material comprises a substrate, a nickel alloy film formed on the substrate and containing nickel, semimetal and/or other metal whose fluoride becomes a volatile compound, and a fluorine passivated film formed at least on a surface of the nickel alloy film in such a manner that the fluorine passivated film contains nickel and does not contain said other metal or the semimetal, and satisfies stoichiometric ratio. The process of manufacturing an industrial material comprises the steps of performing grounding treatment of a surface of a substrate, forming a nickel alloy film, on the surface of the substrate, containing nickel, semimetal and/or other metal, and forming a fluorine passivated film on the nickel alloy film.

摘要翻译： 一种工业材料，例如金属，陶瓷或塑料，其表面具有通过氟化钝化的膜和制造上述工​​业材料的工艺。 工业材料包括基板，形成在基板上的含有镍，半金属和/或其他金属的镍合金膜，其中氟化物成为挥发性化合物，以及至少在镍合金膜的表面上形成的氟钝化膜 氟钝化膜含有镍并且不含有所述其他金属或半金属，并且满足化学计量比的方式。 制造工业材料的方法包括以下步骤：在包含镍，半金属和/或其它金属的基板的表面上进行基板的表面的接地处理，形成镍合金膜，并形成氟钝化膜 在镍合金膜上。

公开(公告)号：US5318706A

公开(公告)日：1994-06-07

申请号：US846233

申请日：1992-03-06

申请人： Tadahiro Ohmi ,  Nobuhiro Miki ,  Matagoro Maeno ,  Ryozi Hirayama

发明人： Tadahiro Ohmi ,  Nobuhiro Miki ,  Matagoro Maeno ,  Ryozi Hirayama

IPC分类号： B01D11/04 ,  C01B7/19 ,  H01L21/304 ,  H01L21/308 ,  B01D61/00

CPC分类号： B01D11/0415 ,  C01B7/191 ,  C01B7/195

摘要： A method of preparing hydrofluoric acid of high purity at the point of use by causing molecular diffusion of hydrogen fluoride into ultrapure water through a resin membrane. The high-purity acid is available at the site of use free of contamination that would occur during transport from a site of preparation.

摘要翻译： 通过使氟化氢通过树脂膜分散扩散到超纯水中，在使用时制备高纯度氢氟酸的方法。 高纯度酸可在使用现场使用，不会在从制备地点运输过程中发生污染。

公开(公告)号：US06325081B1

公开(公告)日：2001-12-04

申请号：US09214240

申请日：1999-05-17

申请人： Nobuhiro Miki ,  Takahisa Nitta ,  Yasuyuki Harada ,  Tadahiro Ohmi

发明人： Nobuhiro Miki ,  Takahisa Nitta ,  Yasuyuki Harada ,  Tadahiro Ohmi

IPC分类号： B08B302

CPC分类号： H01L21/02052 ,  B08B3/02 ,  B08B2203/0288 ,  H01L21/67051

摘要： A washing apparatus and a washing method, which further improve a washing effect and enable highly clean washing with a small amount of chemical. Also, it is an object of the invention to provide a washing apparatus of high throughput involving rapid switching of various chemicals of high responsibility and capable of performing a series of washing operations at high speed. The washing apparatus comprises undiluted cleaning liquid injection means for injecting an undiluted solution or undiluted gas of a cleaning liquid into a ultrapure water channel to make a cleaning liquid of a desired concentration, cleaning liquid supplying means connected to the super demineralized water channel for simultaneously supplying front and rear surface of a substrate with a cleaning liquid adjusted to a desired concentration or a ultrapure water, means for superposing ultrasonic wave or high frequency sound waves of 0.5 MHz or more on the substrate through the cleaning liquid, and means for rotating the substrate or means for moving either of the substrate and the cleaning liquid supplying means in one direction, whereby injection of the undiluted solution or undiluted gas into the ultrapure water channel is controlled to continuously perform washing of the substrate by the cleaning liquid and washing by the ultrapure water.

摘要翻译： 一种洗涤装置和洗涤方法，其进一步改善洗涤效果并且能够用少量化学品进行高度清洁的洗涤。 另外，本发明的目的是提供一种高产量的洗涤装置，涉及快速切换各种高度责任的化学品，能够高速地进行一系列洗涤操作。洗涤装置包括未稀释的清洗液注入装置， 将未稀释的溶液或清洁液体的未稀释气体输送到超纯水通道中以制备所需浓度的清洗液体，连接到超级软化水通道的清洗液供应装置，用于同时向基材的前表面和后表面提供清洁液体 调节到期望浓度或超纯水的装置，用于通过清洁液体在衬底上叠加超声波或0.5MHz以上的高频声波的装置，以及用于旋转衬底或用于移动衬底和清洁装置的装置的装置 液体供应装置在一个方向上，由此注射未稀释的 控制溶液或未稀释气体进入超纯水通道，以通过清洗液体连续地进行基材清洗，并通过超纯水进行洗涤。

公开(公告)号：US5149378A

公开(公告)日：1992-09-22

申请号：US613730

申请日：1990-11-21

申请人： Tadahiro Ohmi ,  Nobuhiro Miki ,  Matagoroh Maeno ,  Hirohisa Kikuyama

发明人： Tadahiro Ohmi ,  Nobuhiro Miki ,  Matagoroh Maeno ,  Hirohisa Kikuyama

IPC分类号： C23C16/02 ,  C23C16/14 ,  C23C16/44 ,  H01L21/28 ,  H01L21/285

CPC分类号： H01L21/28556 ,  C23C16/14 ,  C23C16/4402 ,  C23C16/4404

摘要： A tungsten film forming apparatus includes a reaction chamber, means for introducing WF.sub.6 into said reaction chamber, and means for introducing H.sub.2 gas into said reaction chamber, wherein at least the portion of at least said reaction chamber is made of the metal material whose surface is covered with the fluorinated paasivation film mainly consisting of the almost stoichiometric metal fluoride. It becomes possible to form a high quality tungsten film at a low substrate temperature by use of said tungsten film forming apparatus.

公开(公告)号：US4795582A

公开(公告)日：1989-01-03

申请号：US99463

申请日：1987-09-21

申请人： Tadahiro Ohmi ,  Nobuhiro Miki ,  Hirohisa Kikuyama

发明人： Tadahiro Ohmi ,  Nobuhiro Miki ,  Hirohisa Kikuyama

IPC分类号： C09K13/08 ,  H01L21/306 ,  H01L21/308 ,  H01L21/311

CPC分类号： H01L21/31105 ,  C09K13/08

摘要： A surface treating composition for micro processing which comprises a mixture of hydrofluoric acid, ammonium fluoride solution and water, and at least one compound selected from the group of surfactants consisting of aliphatic carboxylic acids, salts of aliphatic carboxylic acids, aliphatic amines and aliphatic alcohols.

摘要翻译： 一种用于微加工的表面处理组合物，其包含氢氟酸，氟化铵溶液和水的混合物，以及至少一种选自脂族羧酸，脂族羧酸盐，脂族胺和脂族醇的表面活性剂组成的化合物。

公开(公告)号：US06129098A

公开(公告)日：2000-10-10

申请号：US139500

申请日：1998-08-25

申请人： Nobuhiro Miki ,  Takahisa Nitta ,  Tadahiro Ohmi ,  Nobukazu Ikeda ,  Naofumi Yasumoto

发明人： Nobuhiro Miki ,  Takahisa Nitta ,  Tadahiro Ohmi ,  Nobukazu Ikeda ,  Naofumi Yasumoto

IPC分类号： B01J4/02 ,  B01F3/08 ,  C02F1/68 ,  F04B13/00 ,  F04B53/14 ,  H01L21/00 ,  H01L21/304 ,  B08B3/02

CPC分类号： H01L21/67051 ,  B01F15/00357 ,  B01F3/0865 ,  B01F3/088 ,  C02F1/686 ,  F04B13/00 ,  F04B53/141 ,  C02F2103/04

摘要： An apparatus for injecting constant quantitative chemicals which is capable of injecting a chemical solution into ultra pure water without generating particulate contamination, and furthermore, the injection interval of the chemical solution to the cleaning nozzle is controlled in units of seconds within a range of a few seconds to 10 or more seconds, and the switching of the type of chemical solution and the changeover to ultra pure water cleaning can be conducted in a short period of time of approximately 1 second.The apparatus includes a chemical solution injection system having a chemical solution retaining part for retaining the chemical solution, a control system for pressurization and depressurization for controlling the pressure of the chemical solution in the chemical solution retaining part at regular intervals, an injection control system which operates in concert with the control of the pressure of the chemical solution, and is structured so as to conduct the intermittent injection and instantaneous mixing function of the chemical solution from the chemical solution injection system to the ultra pure water flow path, and the injection stoppage function, and a chemical solution replenishment system which is structured so as to operate in concert with the control of the chemical solution and to be capable of replenishing the chemical solution in the chemical solution retaining part from a chemical solution source.

摘要翻译： 一种用于注入恒定的定量化学品的装置，其能够将化学溶液注入超纯水中而不产生颗粒污染，此外，化学溶液到清洁喷嘴的注射间隔以几秒为单位进行控制 秒至10秒以上，化学溶液的种类和切换为超纯水清洗的时间可以在1秒钟的短时间内进行。 该装置包括具有用于保持化学溶液的化学溶液保留部分的化学溶液注入系统，用于加压和减压的控制系统，用于以规则的间隔控制化学溶液保留部分中的化学溶液的压力;注射控制系统， 与控制化学溶液的压力一致地进行操作，并且构成为将化学溶液从化学溶液注入系统到超纯水流路的间歇注入和瞬时混合功能进行，并且注射停止 功能和化学溶液补充系统，其结构化以便与化学溶液的控制协同工作，并且能够从化学溶液源补充化学溶液保留部分中的化学溶液。

公开(公告)号：US20090202365A1

公开(公告)日：2009-08-13

申请号：US12227801

申请日：2007-07-19

申请人： Yoshiyuki Shimada ,  Tetsuya Yoshino ,  Nobuhiro Miki ,  Yuya Kanenawa ,  Yutaka Yokoyama ,  Takayasu Kitai

发明人： Yoshiyuki Shimada ,  Tetsuya Yoshino ,  Nobuhiro Miki ,  Yuya Kanenawa ,  Yutaka Yokoyama ,  Takayasu Kitai

IPC分类号： F04B49/00

CPC分类号： E02F9/2217 ,  E02F9/2235 ,  E02F9/2285

摘要： The present invention is intended to provide a technology that can utilize the advantages of both a load sensing control and a regeneration circuit without causing any problem.A regeneration circuit is added to a hydraulic circuit provided with a hydraulic pressure signal line for detecting a hydraulic pressure value of a circuit and controlling a volume of hydraulic fluid to a cylinder 1 with reference to the detected value. A pressure reducing valve 6 that outputs a reduced pressure as an operating signal to a pump 2, and subsequently the controlling means 5 causes the pressure reducing valve 6 to output a pressure reduction command to a pump 2 and thus to reduce a discharge rate from the pump 2, when the regeneration circuit is in a regeneration state.

摘要翻译： 本发明旨在提供一种可以利用负载感测控制和再生电路两者的优点而不引起任何问题的技术。 将具有用于检测电路的液压值的液压信号线的液压回路加入到液压回路中，并根据检测值控制液压缸1的液压流体的体积。 将作为操作信号的减压输出到泵2的减压阀6，随后的控制装置5使减压阀6向泵2输出减压指令，从而将排出速度从 泵2，当再生电路处于再生状态时。

公开(公告)号：US07195024B2

公开(公告)日：2007-03-27

申请号：US10849836

申请日：2004-05-21

申请人： Takahisa Nitta ,  Nobuhiro Miki ,  Yoshiaki Yamaguchi

发明人： Takahisa Nitta ,  Nobuhiro Miki ,  Yoshiaki Yamaguchi

IPC分类号： B08B3/08

CPC分类号： B01F15/042 ,  B01F5/0471 ,  B01F5/0475 ,  B01F15/0203 ,  B01F15/024 ,  B01F15/0244 ,  B01F2215/0096 ,  F04B43/0054 ,  F04B43/02 ,  F04B43/046 ,  F04F7/00 ,  F16K7/123 ,  G05D11/138 ,  H01L21/67051

摘要： A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.