公开(公告)号：US20240429101A1

公开(公告)日：2024-12-26

申请号：US18489994

申请日：2023-10-19

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Jen-Chun Liao ,  Chih-Wei Lin ,  Ching-Hua Hsieh ,  Wen-Chih Chiou

IPC: H01L21/78 ,  H01L21/66

Abstract: A method includes forming a database, finding a plurality of dicing marks on a wafer, wherein patterns of the plurality of dicing marks match a pattern in the database, measuring a die pitch of the wafer according to a patch of adjacent two of the plurality of dicing marks, and determining kerf centers of the wafer based on the plurality of dicing marks. The measuring the die pitch and the determining the kerf centers are performed on a same wafer-holding platform. The wafer is diced into a plurality of dies, and the dicing is performed aligning to the kerf centers.

公开(公告)号：US12148792B2

公开(公告)日：2024-11-19

申请号：US18358399

申请日：2023-07-25

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Wei Lin ,  Chih-Lin Wang ,  Kang-Min Kuo

IPC: H01L29/06 ,  H01L21/28 ,  H01L29/66 ,  H01L29/78

Abstract: Structures and formation methods of a semiconductor device structure are provided. The semiconductor device structure includes a semiconductor substrate and a gate stack over the semiconductor substrate. The gate stack includes a gate dielectric layer and a work function layer. The gate dielectric layer is between the semiconductor substrate and the work function layer. The semiconductor device structure also includes a halogen source layer. The gate dielectric layer is between the semiconductor substrate and the halogen source layer.

公开(公告)号：US20230245939A1

公开(公告)日：2023-08-03

申请号：US18297927

申请日：2023-04-10

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tzu-Sung Huang ,  Ming Hung Tseng ,  Yen-Liang Lin ,  Hao-Yi Tsai ,  Chi-Ming Tsai ,  Chung-Shi Liu ,  Chih-Wei Lin ,  Ming-Che Ho

IPC: H01L23/31 ,  H01L23/16 ,  H01L23/522 ,  H01L21/768 ,  H01L21/56 ,  H01L23/528

CPC classification number: H01L23/3157 ,  H01L23/16 ,  H01L23/5226 ,  H01L21/76843 ,  H01L21/56 ,  H01L21/76802 ,  H01L23/528

Abstract: In an embodiment, a device includes: an integrated circuit die; an encapsulant at least partially surrounding the integrated circuit die, the encapsulant including fillers having an average diameter; a through via extending through the encapsulant, the through via having a lower portion of a constant width and an upper portion of a continuously decreasing width, a thickness of the upper portion being greater than the average diameter of the fillers; and a redistribution structure including: a dielectric layer on the through via, the encapsulant, and the integrated circuit die; and a metallization pattern having a via portion extending through the dielectric layer and a line portion extending along the dielectric layer, the metallization pattern being electrically coupled to the through via and the integrated circuit die.

公开(公告)号：US20230191619A1

公开(公告)日：2023-06-22

申请号：US18170962

申请日：2023-02-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Jen-Ti Wang ,  Chih-Wei Lin ,  Fu-Hsien Li ,  Yi-Ming Chen ,  Cheng-Ho Hung

IPC: B25J11/00 ,  G01B11/30 ,  H01L21/67

CPC classification number: B25J11/008 ,  G01B11/306 ,  H01L21/67005 ,  H01L21/0201

Abstract: A system includes a plurality of semiconductor processing tools; a carrier purge station; a carrier repair station; and an overhead transport (OHT) loop for transporting one or more substrate carriers among the plurality of semiconductor processing tools, the carrier purge station, and the carrier repair station. The carrier purge station is configured to receive a substrate carrier from one of the plurality of semiconductor processing tools, purge the substrate carrier with an inert gas, and determine if the substrate carrier needs repair. The carrier repair station is configured to receive a substrate carrier to be repaired and replace one or more parts in the substrate carrier.

公开(公告)号：US11682639B2

公开(公告)日：2023-06-20

申请号：US17383215

申请日：2021-07-22

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Wen-Hao Cheng ,  Yen-Yu Chen ,  Chih-Wei Lin ,  Yi-Ming Dai

IPC: H01L23/00 ,  H01L23/31 ,  H01L21/56 ,  H01L21/768 ,  H01L23/522

CPC classification number: H01L24/03 ,  H01L21/56 ,  H01L21/76802 ,  H01L21/76888 ,  H01L23/3171 ,  H01L23/5226 ,  H01L24/08

Abstract: A device includes an interconnect structure, a barrier multi-layer structure, an oxide layer, a pad metal layer, and a passivation layer. The barrier multi-layer structure is over the interconnect structure, the barrier multi-layer structure includes a first metal nitride layer and a second metal nitride layer over the first metal nitride layer. The oxide layer is over the barrier multi-layer structure, in which the oxide layer is an oxide of the second metal nitride layer of the barrier multi-layer structure. The pad metal layer is over the oxide layer. The passivation layer is in contact with the barrier multi-layer structure, the oxide layer, and the pad metal layer.

公开(公告)号：US20220278031A1

公开(公告)日：2022-09-01

申请号：US17663970

申请日：2022-05-18

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ching-Wen Hsiao ,  Ming-Da Cheng ,  Chih-Wei Lin ,  Chen-Shien Chen ,  Chih-Hua Chen ,  Chen-Cheng Kuo

IPC: H01L23/498 ,  H01L21/683 ,  H01L23/31 ,  H01L25/10

Abstract: A device includes a redistribution line, and a polymer region molded over the redistribution line. The polymer region includes a first flat top surface. A conductive region is disposed in the polymer region and electrically coupled to the redistribution line. The conductive region includes a second flat top surface not higher than the first flat top surface.

公开(公告)号：US11362089B2

公开(公告)日：2022-06-14

申请号：US16730271

申请日：2019-12-30

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Chih-Wei Lin ,  Chih-Lin Wang ,  Kang-Min Kuo ,  Cheng-Wei Lian

IPC: H01L27/092 ,  H01L29/49 ,  H01L29/51 ,  H01L29/40 ,  H01L21/28 ,  H01L29/423 ,  H01L29/66 ,  H01L21/8238

Abstract: Semiconductor structures and method for forming the same are provided. The method for manufacturing the semiconductor structure includes forming a first gate dielectric layer over a substrate and forming a first capping layer over the first gate dielectric layer. The method for manufacturing the semiconductor structure includes oxidizing the first capping layer to form a first capping oxide layer and forming a first work function metal layer over the first capping oxide layer. The method for manufacturing the semiconductor structure includes forming a first gate electrode layer over the first work function metal layer.

公开(公告)号：US11309226B2

公开(公告)日：2022-04-19

申请号：US16719955

申请日：2019-12-18

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chia-Min Lin ,  Ching-Hua Hsieh ,  Chih-Wei Lin ,  Sheng-Hsiang Chiu ,  Sheng-Feng Weng ,  Yao-Tong Lai

IPC: H01L23/31 ,  H01L25/16 ,  H01L23/498 ,  H01L23/00 ,  H01L21/56

Abstract: Three-dimensional integrated circuit (3DIC) structures and methods of forming the same are provided. A 3DIC structure includes a semiconductor package, a first package substrate, a molded underfill layer and a thermal interface material. The semiconductor package is disposed over and electrically connected to the first package substrate through a plurality of first bumps. The semiconductor package includes at least one semiconductor die and an encapsulation layer aside the semiconductor die. The molded underfill layer surrounds the plurality of first bumps and a sidewall of the semiconductor package, and has a substantially planar top surface. The CTE of the molded underfill layer is different from the CTE of the encapsulation layer of the semiconductor package. The thermal interface material is disposed over the semiconductor package.

公开(公告)号：US11031376B2

公开(公告)日：2021-06-08

申请号：US16513739

申请日：2019-07-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hsaing-Pin Kuan ,  Ching-Hua Hsieh ,  Chih-Wei Lin ,  Ching-Yao Lin ,  Chun-Yen Lan ,  Kai-Ming Chiang

IPC: H01L23/48 ,  H01L29/40 ,  H01L25/065 ,  H01L23/00 ,  H01L23/28 ,  H01L25/00 ,  H01L23/538 ,  H01L23/488

Abstract: A chip package including a first semiconductor die, conductive pillars, a dielectric structure, a second semiconductor die and insulating encapsulant is provided. The first semiconductor die includes a top surface having a first region and a second region. The conductive pillars are disposed over the second region of the first semiconductor die. The dielectric structure includes a first support portion disposed on the first region of the semiconductor die, and a second support portion physically separated from the first semiconductor die. The second semiconductor die is stacked over the first support portion and the second support portion, and is electrically connected to the first semiconductor die through the conductive pillars. The insulating encapsulant encapsulates the first semiconductor die, the second semiconductor die, the dielectric structure and the conductive pillars.

公开(公告)号：US20210159196A1

公开(公告)日：2021-05-27

申请号：US17170624

申请日：2021-02-08

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Shih Wei Bih ,  Sheng-Wei Yeh ,  Yen-Yu Chen ,  Wen-Hao Cheng ,  Chih-Wei Lin ,  Chun-Chih Lin

IPC: H01L23/00 ,  H01L21/02

Abstract: The present disclosure provides an integrated circuit (IC) structure. The IC structure includes a semiconductor substrate; an interconnection structure formed on the semiconductor substrate; and a redistribution layer (RDL) metallic feature formed on the interconnection structure. The RDL metallic feature further includes a barrier layer disposed on the interconnection structure; a diffusion layer disposed on the barrier layer, wherein the diffusion layer includes metal and oxygen; and a metallic layer disposed on the diffusion layer.