摘要:
Embodiments described herein provide a semiconductor device and methods and apparatuses of forming the same. The semiconductor device includes a substrate having a source and drain region and a gate electrode stack on the substrate between the source and drain regions. The gate electrode stack includes a conductive film layer on a gate dielectric layer, a refractory metal nitride film layer on the conductive film layer, a silicon-containing film layer on the refractory metal nitride film layer, and a tungsten film layer on the silicon-containing film layer. In one embodiment, the method includes positioning a substrate within a processing chamber, wherein the substrate includes a source and drain region, a gate dielectric layer between the source and drain regions, and a conductive film layer on the gate dielectric layer. The method also includes depositing a refractory metal nitride film layer on the conductive film layer, depositing a silicon-containing film layer on the refractory metal nitride film layer, and depositing a tungsten film layer on the silicon-containing film layer.
摘要:
Embodiments described herein provide a semiconductor device and methods and apparatuses of forming the same. The semiconductor device includes a substrate having a source and drain region and a gate electrode stack on the substrate between the source and drain regions. The gate electrode stack includes a conductive film layer on a gate dielectric layer, a refractory metal nitride film layer on the conductive film layer, a silicon-containing film layer on the refractory metal nitride film layer, and a tungsten film layer on the silicon-containing film layer. In one embodiment, the method includes positioning a substrate within a processing chamber, wherein the substrate includes a source and drain region, a gate dielectric layer between the source and drain regions, and a conductive film layer on the gate dielectric layer. The method also includes depositing a refractory metal nitride film layer on the conductive film layer, depositing a silicon-containing film layer on the refractory metal nitride film layer, and depositing a tungsten film layer on the silicon-containing film layer.
摘要:
Methods and apparatus to improve target life and deposition uniformity in PVD chambers are provided herein. In some embodiments, a magnetron assembly includes a shunt plate having a central axis, the shunt plate rotatable about the central axis, a first open loop magnetic pole arc coupled to the shunt plate at a first radius from the central axis, and a second open loop magnetic pole arc coupled the shunt plate at a first distance from the first open loop magnetic pole arc, wherein at least one of the first radius varies along the first open loop magnetic pole arc or the first distance varies along the second open loop magnetic pole arc. In some embodiments, a first polarity of the first open loop magnetic pole arc opposes a second polarity of the second open loop magnetic pole arc.
摘要:
Apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate includes a substrate support that may include a dielectric member having a surface to support a substrate thereon; one or more first conductive members disposed below the dielectric member and having a dielectric member facing surface adjacent to the dielectric member; and a second conductive member disposed about and contacting the one or more first conductive members such that RF energy provided to the substrate by an RF source returns to the RF source by traveling radially outward from the substrate support along the dielectric member facing surface of the one or more first conductive members and along a first surface of the second conductive member disposed substantially parallel to a peripheral edge surface of the one or more first conductive members after travelling along the dielectric layer facing surface.
摘要:
Embodiments of the invention generally relate to a grounding kit for a semiconductor processing chamber, and a semiconductor processing chamber having a grounding kit. More specifically, embodiments described herein relate to a grounding kit which creates an asymmetric grounding path selected to significantly reduce the asymmetries caused by an off center RF power delivery.
摘要:
Embodiments of the invention generally relate to a grounding kit for a semiconductor processing chamber, and a semiconductor processing chamber having a grounding kit. More specifically, embodiments described herein relate to a grounding kit which creates an asymmetric grounding path selected to significantly reduce the asymmetries caused by an off center RF power delivery.
摘要:
Method and apparatus for making measurements on fluids related to their complex permeability are disclosed. A microwave probe is provided for exposure to the fluids. The probe can be non-intrusive or can also be positioned at the location where measurements are to be made. The impedance of the probe is determined, in part, by the complex dielectric constant of the fluids at the probe. A radio frequency signal is transmitted to the probe and the reflected signal is phase and amplitude detected at a rapid rate for the purpose of identifying the fluids. Multiple probes may be selectively positioned to monitor the behavior of the fluids including their flow rate. Fluids may be identified as between two or more different fluids as well as multiple phases of the same fluid based on differences between their complex permittivities.
摘要:
Method and apparatus for making measurements on fluids are disclosed, including the use of a capacitive probe for measuring the flow volume of a material within a flow stream. The capacitance probe has at least two elongate electrodes and, in a specific embodiment of the invention, has three parallel elongate electrodes with the center electrode being an extension of the center conductor of a co-axial cable. A conductance probe is also provided to provide more accurate flow volume data in response to conductivity of the material within the flow stream. A preferred embodiment of the present invention provides for a gas flow stream through a micro-gravity environment that allows for monitoring a flow volume of a fluid sample, such as a urine sample, that is entrained within the gas flow stream.
摘要:
An apparatus for removing a tattoo includes a control unit having one or more power sources; a head unit coupled to the control unit, wherein the head unit includes a body and a plurality of needles protruding from the body, wherein the plurality of needles includes at least one supply needle and at least one return needle; and a flexible tube coupling the head unit to the control unit, wherein the one or more power sources are electrically coupled to the plurality of needles through the flexible tube, wherein the control unit is configured to deliver power to the at least one supply needle such that power flows from the at least one supply needle to the at least one return needle during use.