公开(公告)号：US06919672B2

公开(公告)日：2005-07-19

申请号：US10411024

申请日：2003-04-10

Applicant: John Madocks

Inventor： John Madocks

IPC: F03H1/00 ,  H05H1/54 ,  F03H5/00 ,  H01J37/08 ,  H01J41/12 ,  H05H1/02

CPC classification number: H01J27/143 ,  F03H1/0075 ,  H05H1/54

Abstract: A closed drift ion source which includes a channel having an open end, a closed end, and an input port for an ionizable gas. A first magnetic pole is disposed on the open end of the channel and extends therefrom in a first direction. A second magnetic pole disposed on the open end of the channel and extends therefrom in a second direction, where the first direction is opposite to the second direction. The distal ends of the first magnetic pole and the second magnetic pole define a gap comprising the opening in the first end. An anode is disposed within the channel. A primary magnetic field line is disposed between the first magnetic pole and the second magnetic pole, where that primary magnetic field line has a mirror field greater than 2.

Abstract translation: 闭合漂移离子源，其包括具有开口端，闭合端和用于可电离气体的输入端口的通道。 第一磁极设置在通道的开口端上并沿第一方向从其延伸。 第二磁极，其设置在通道的开口端上，并沿第二方向从第二方向向第二方向延伸。 第一磁极和第二磁极的远端限定包括第一端中的开口的间隙。 阳极设置在通道内。 初级磁场线设置在第一磁极和第二磁极之间，其中初级磁场线具有大于2的反射镜场。

公开(公告)号：US07025833B2

公开(公告)日：2006-04-11

申请号：US10471107

申请日：2002-02-27

Applicant: John Madocks

Inventor： John Madocks

IPC: C23C16/00 ,  C23C16/458 ,  C23C14/24 ,  C23C16/54

CPC classification number: C23C14/562

Abstract: A chill drum (14) is modified to improve heat transfert between the drum and a flexible web substrate (20) disposed around the drum. The drum surface (22) contains a series of passages (44) and distribution holes (46). A working gas is injected into these passages and flows out of the distribution holes into the space between the web and drum. A cover (32) prevents working gas from escaping from frum passages in the area not covered by the web, and supplies the working gas to the passages at the drum cover. Once gas is in the passages, leakage only occurs from the edges of the web. The pressure in the passages remains essentially constant around the drum, producing uniform elevated pressures under the entire web. Elevated pressure behind the web significantly improves overall heat transfert, thereby allowing higher deposition rates and other process advantages.

Abstract translation: 改变冷却鼓（14）以改善滚筒与布置在滚筒周围的柔性幅材基片（20）之间的热传递。 鼓表面（22）包含一系列通道（44）和分配孔（46）。 工作气体注入这些通道并从分配孔流出到卷筒和滚筒之间的空间中。 盖（32）防止工作气体从未被卷筒纸覆盖的区域中的通道中逸出，并将工作气体供应到鼓罩上的通道。 一旦气体在通道中，泄漏只从网的边缘发生。 通道中的压力在鼓周围保持基本恒定，在整个幅材下产生均匀的升高的压力。 幅材后面的高压显着地改善了总体传热，从而允许更高的沉积速率和其它工艺优点。

公开(公告)号：US07023128B2

公开(公告)日：2006-04-04

申请号：US10475547

申请日：2002-04-10

Applicant: John Madocks

Inventor： John Madocks

IPC: H05H1/46 ,  H05H1/54

CPC classification number: H01J27/14 ,  H01J37/08 ,  H01J37/32431

Abstract: A dipole ion source (FIG. 1) includes two cathode surfaces, a substrate (1) and a pole (3); wherein a gap is defined between the substrate and the pole; an unsymmetrical mirror magnetic field including a compressed end, wherein the substrate is positioned in the less compressed end of the magnetic field; and an anode (4) creating an electric field penetrating the magnetic field and confining electrons in a continuous Hall current loop, wherein the unsymmetrical magnetic field serves an ion beam on the substrate.

Abstract translation: 偶极离子源（图1）包括两个阴极表面，一个衬底（1）和一个极（3）; 其中在所述基板和所述极之间限定间隙; 包括压缩端的不对称镜面磁场，其中所述衬底位于所述磁场的较小压缩端中; 以及阳极（4），产生穿过磁场的电场并将电子限制在连续的霍尔电流回路中，其中非对称磁场用于衬底上的离子束。

公开(公告)号：US07294283B2

公开(公告)日：2007-11-13

申请号：US10475548

申请日：2002-04-10

Applicant: John Madocks

Inventor： John Madocks

IPC: C23C14/35 ,  C23C16/00

CPC classification number: H01J37/3266 ,  C23C14/351 ,  C23C14/562 ,  C23C16/503 ,  C23C16/509 ,  C23C16/545 ,  H01J37/3277 ,  H01J37/3405 ,  H05H1/50 ,  H05H2001/485

Abstract: The preferred embodiments described herein provide a Penning discharge plasma source. The magnetic and electric field arrangement, similar to a Penning discharge, effectively traps the electron Hall current in a region between two surfaces. When a substrate (10) is positioned proximal to at least one of the electrodes (11, 12) and is moved relative to the plasma, the substrate (10) is plasma treated, coated or otherwise modified depending upon the process gas used and the process pressure. This confinement arrangement produces dramatic results not resembling known prior art. Using this new source, many applications for PECVD, plasma etching, plasma treating, sputtering or other plasma processes will be substantial improved or made possible. In particular, applications using flexible webs (10) are benefited.

Abstract translation: 本文所述的优选实施例提供了Penning放电等离子体源。 与Penning放电类似的磁场和电场布置有效地捕获两个表面之间的区域中的电子霍尔电流。 当衬底（10）位于至少一个电极（11,12）附近并相对于等离子体移动时，根据所使用的工艺气体等离子体处理，涂覆或以其它方式进行改性， 过程压力。 这种限制安排产生了与现有技术相似的戏剧性结果。 使用这种新的来源，PECVD，等离子体蚀刻，等离子体处理，溅射或其他等离子体工艺的许多应用将大大改进或可能。 特别地，使用柔性网（10）的应用受益。

公开(公告)号：US07411352B2

公开(公告)日：2008-08-12

申请号：US11379349

申请日：2006-04-19

Applicant: John E. Madocks

Inventor： John E. Madocks

IPC: H01J7/24

CPC classification number: H05H1/46 ,  C23C14/32 ,  C23C16/513 ,  H01J37/3266

Abstract: A pair of plasma beam sources are connected across an AC power supply to alternatively produce an ion beam for depositing material on a substrate transported past the ion beams. Each plasma beam source includes a discharge cavity having a first width and a nozzle extending outwardly therefrom to emit the ion beam. The aperture or outlet of the nozzle has a second width, which second width is less than the first width. An ionizable gas is introduced to the discharge cavity. At least one electrode connected to the AC power supply, alternatively serving as an anode or a cathode, is capable of supporting at least one magnetron discharge region within the discharge cavity when serving as a cathode electrode. A plurality of magnets generally facing one another, are disposed adjacent each discharge cavity to create a magnetic field null region within the discharge cavity.

Abstract translation: 一对等离子体束源连接在交流电源上，以交替地产生用于在经过离子束传送的衬底上沉积材料的离子束。 每个等离子体束源包括具有第一宽度的排出腔和从其向外延伸以喷射离子束的喷嘴。 喷嘴的孔或出口具有第二宽度，该第二宽度小于第一宽度。 将可电离气体引入到排出腔。 连接到AC电源的替代地用作阳极或阴极的至少一个电极能够在用作阴极时支持放电腔内的至少一个磁控管放电区域。 大体上彼此面对的多个磁体邻近每个排出腔设置，以在排出腔内形成磁场零区域。

公开(公告)号：US07327089B2

公开(公告)日：2008-02-05

申请号：US10528386

申请日：2003-09-19

Applicant: John E. Madocks

Inventor： John E. Madocks

IPC: H01J7/24

CPC classification number: H05H1/46 ,  H01J27/146 ,  H01J37/32009 ,  H01J37/32357 ,  H01J37/3266 ,  H01J2237/0815 ,  H05H1/48

Abstract: A plasma source which includes a discharge cavity having a first width, where that discharge cavity includes a top portion, a wall portion, and a nozzle disposed on the top portion and extending outwardly therefrom, where the nozzle is formed to include an aperture extending through the top portion and into the discharge cavity, wherein the aperture has a second width, where the second width is less than the first width. The plasma source further includes a power supply, a conduit disposed in the discharge cavity for introducing an ionizable gas therein, and at least one cathode electrode connected to the power supply, where that cathode electrode is capable of supporting at least one magnetron discharge region within the discharge cavity. The plasma source further includes a plurality of magnets disposed adjacent the wall portion, where that plurality of magnets create a null magnetic field point within the discharge cavity.

Abstract translation: 一种等离子体源，其包括具有第一宽度的排出腔，其中所述排出腔包括顶部，壁部分和设置在顶部上并从其向外延伸的喷嘴，其中所述喷嘴形成为包括延伸穿过的孔 顶部并进入排出腔，其中孔具有第二宽度，其中第二宽度小于第一宽度。 等离子体源还包括电源，设置在放电腔中的用于在其中引入可电离气体的导管和连接到电源的至少一个阴极，其中阴极能够支撑至少一个磁控管放电区域 放电腔。 等离子体源还包括邻近壁部设置的多个磁体，其中多个磁体在放电腔内形成零磁场点。

公开(公告)号：US07259378B2

公开(公告)日：2007-08-21

申请号：US11177984

申请日：2005-07-08

Applicant: John Madocks

Inventor： John Madocks

IPC: H01J27/00 ,  H05H1/00 ,  H05H1/54

CPC classification number: F03H1/0075 ,  H01J27/143 ,  H05H1/54

Abstract: A closed drift ion source which includes a channel having an open end, a closed end, and an input port for an ionizable gas. A first magnetic pole is disposed on the open end of the channel and extends therefrom in a first direction. A second magnetic pole disposed on the open end of the channel and extends therefrom in a second direction, where the first direction is opposite to the second direction. The distal ends of the first magnetic pole and the second magnetic pole define a gap comprising the opening in the first end. An anode is disposed within the channel. A primary magnetic field line is disposed between the first magnetic pole and the second magnetic pole, where that primary magnetic field line has a mirror field greater than 2.

Abstract translation: 闭合漂移离子源，其包括具有开口端，闭合端和用于可电离气体的输入端口的通道。 第一磁极设置在通道的开口端上并沿第一方向从其延伸。 第二磁极，其设置在通道的开口端上，并沿第二方向从第二方向向第二方向延伸。 第一磁极和第二磁极的远端限定包括第一端中的开口的间隙。 阳极设置在通道内。 初级磁场线设置在第一磁极和第二磁极之间，其中初级磁场线具有大于2的反射镜场。

公开(公告)号：US20070026161A1

公开(公告)日：2007-02-01

申请号：US10571214

申请日：2004-09-13

Applicant: John Madocks

Inventor： John Madocks

IPC: H05H1/24 ,  C23C14/32 ,  C23C14/00

CPC classification number: H05H1/14 ,  C23C8/36 ,  C23C14/35 ,  H01J37/3266 ,  H01J37/3402

Abstract: A magnetic mirror plasma (77) source comprises two surfaces separated by a gap wherein one of the surfaces is a wafer (76) and the other surface is a cathode. The apparatus comprises a cover (72), target (83), shunt (74, 81), non-magnetic stage (75), magnet array (80), bias supply (82), and power supply (70). A mirror magnetic field (12) extends between the surfaces through the gap, wherein the magnetic field (78) lines at the substrate surface are at least two times as strong as those field lines entering the cathode. An anode is disposed such that a closed loop electron Hall current containment region is formed within the magnetic field, where with sufficient gas pressure and voltage between the cathode and anode, plasma is formed in the containment region. The result is a novel plasma source that has unique and important advantages enabling advancements in PECVD, etching, sputtering and plasma treatment processes.

Abstract translation: 磁镜等离子体（77）源包括由间隙分开的两个表面，其中一个表面是晶片（76），另一个表面是阴极。 该装置包括盖（72），目标（83），分路（74,81），非磁性台（75），磁体阵列（80），偏置电源（82）和电源（70）。 镜面磁场（12）在穿过间隙的表面之间延伸，其中在衬底表面处的磁场（78）线是至少是进入阴极的那些场线的两倍。 阳极设置成使得在磁场内形成闭环电子霍尔电流容纳区域，其中在阴极和阳极之间具有足够的气体压力和电压，在容纳区域中形成等离子体。 结果是一种新颖的等离子体源，其具有独特且重要的优点，可实现PECVD，蚀刻，溅射和等离子体处理工艺的进步。

公开(公告)号：US20020153103A1

公开(公告)日：2002-10-24

申请号：US10036067

申请日：2001-10-19

Applicant: Applied Process Technologies, Inc.

Inventor： John E. Madocks

IPC: C23F001/00 ,  C23C016/00

CPC classification number: H01J37/32623 ,  C23C14/352 ,  C23C16/503 ,  H01J37/3266

Abstract: Magnetically enhanced glow discharge devices are disclosed for the purpose of PECVD, etching or treating a substrate in a vacuum chamber. Two cathode surfaces are separated by a gap. A mirror magnetic field emanates from the cathode surfaces and passes through the gap. An anode structure forms diverging electric fields from each cathode to the anode, where the electric fields pass through the magnetic field 360 degrees around the dipole magnetic field. A closed loop electron trap is formed by the diverging electric fields and the expanding magnetic field in the gap. With a chamber pressure in the range of 0.1 to 100 mTorr and an applied voltage between the cathode and anode surfaces, a plasma is formed in the electron trap and in the plane of the trap. By shaping the plasma poles and exposing the sides of the cathode surfaces to the substrate, the created Hall current of the plasma can be brought into direct contact with the substrate.

Abstract translation: 公开了用于PECVD，蚀刻或处理真空室中的衬底的磁增强辉光放电装置。 两个阴极表面被间隙隔开。 镜面磁场从阴极表面发出并穿过间隙。 阳极结构形成从每个阴极到阳极的发散电场，其中电场围绕偶极子磁场穿过磁场360度。 通过发散电场和间隙中的扩展磁场形成闭环电子阱。 在腔室压力为0.1至100mTorr的范围内，并且在阴极和阳极表面之间施加的电压，在电子阱中和阱的平面中形成等离子体。 通过使等离子体极成形并将阴极表面的侧面暴露于基板，可以使等离子体产生的霍尔电流与基板直接接触。

公开(公告)号：US07038389B2

公开(公告)日：2006-05-02

申请号：US10835748

申请日：2004-04-30

Applicant: John Madocks

Inventor： John Madocks

IPC: H01J7/24

CPC classification number: H01J37/3405

Abstract: A point projection type flood plasma source implements a magnetron sputter cold cathode electron source in a discharge cavity separated from a process chamber by a narrow conduit and a solenoid magnetic field. The solenoid magnetic field impedes radial electron flow in the nozzle and the process chamber. Process gas flows into the discharge cavity and through the nozzle to the process chamber. This gas is ionized in the nozzle and the process chamber by electrons trapped in the solenoid magnetic field. The result is a dense plasma plume in the process chamber useful for a number of applications. The source has particular advantages for reactive gas processes such as those requiring oxygen.

Abstract translation: 点投影型洪水等离子体源在通过窄导管和螺线管磁场与处理室分离的放电腔中实现磁控溅射冷阴极电子源。 螺线管磁场阻止喷嘴和处理室中的径向电子流。 工艺气体流入排放腔并通过喷嘴流到处理室。 该气体通过被螺线管磁场中的电子俘获在喷嘴和处理室中。 结果是处理室中的致密等离子体羽毛可用于许多应用。 该源对于需要氧的那些反应气体方法具有特别的优点。