Boron-silicon-hydrogen alloy films
    6.
    发明授权
    Boron-silicon-hydrogen alloy films 失效
    硼 - 硅 - 氢合金膜

    公开(公告)号:US4810532A

    公开(公告)日:1989-03-07

    申请号:US200214

    申请日:1988-05-31

    摘要: Hydrogenated boron-silicon alloy films having unexpected properties permitting in one embodiment the bonding together of metal and ceramic substrates by coating the surfaces to be bonded with the film mating the surfaces and heat treating the mated surfaces to expell hydrogen therefrom and to react to resulting boron-silicon alloy film with the substrates to form a liquid reaction product which forms a surface bond with the substrates or is at least partially absorbed in the substrates. In another embodiment, at least one surface of an intermetallic compound formed from elements selected from groups III and V of the periodic table is sealed against structural degradation by forming on the surface a solid boron-silicon-hydrogen alloy film. In still another embodiment, metal and organic resin substrates are protected against attack by water vapor, dissociated oxygen and molecular oxygen by forming a solid boron-silicon-hydrogen alloy film on the substrates. The metal substrates are further protected against deterioration by the effects of the recombination of dissociated oxygen and nitrogen by converting the solid boron-silicon-hydrogen alloy film to solid boron-silicon oxide film.

    摘要翻译: 氢化硼硅合金薄膜具有出人意料的特性,在一个实施方案中允许金属和陶瓷基体通过涂覆与待表面接合的薄膜粘合在一起的表面并热处理配合表面以从其中排出氢并与所得的硼反应 硅基合金膜与基底形成液体反应产物,其与基底形成表面结合或至少部分地被吸收在基底中。 在另一个实施方案中,通过在表面上形成固体硼 - 硅 - 氢合金膜,将选自元素周期表第III族和第Ⅴ族的元素形成的金属间化合物的至少一个表面密封。 在另一个实施方案中,通过在基材上形成固体硼 - 硅 - 氢合金膜来保护金属和有机树脂基材免受水蒸汽,离解的氧和分子氧的侵蚀。 通过将固体硼 - 硅 - 氢合金膜转变为固体氧化硼 - 氧化物膜,可以进一步防止金属衬底受到解离的氧和氮的复合的影响的劣化。