公开(公告)号：US11976366B2

公开(公告)日：2024-05-07

申请号：US17264414

申请日：2019-06-13

申请人： NISSAN MOTOR CO., LTD. ,  FUKUDA METAL FOIL & POWDER CO., LTD.

发明人： Yoshinori Izawa ,  Junichi Arai ,  Katsunori Otobe ,  Shinichi Nishimura

IPC分类号： F16C3/12 ,  B22F1/08 ,  B22F3/24 ,  B22F5/00 ,  B22F5/10 ,  B22F7/06 ,  B22F7/08 ,  B32B15/01 ,  B32B15/04 ,  B32B15/16 ,  B32B15/18 ,  B32B15/20 ,  C22C1/04 ,  C22C9/00 ,  C23C24/00 ,  C23C24/08 ,  C23C28/00 ,  C23C28/02 ,  C23C30/00 ,  F01L3/02 ,  F01L3/04 ,  F16C33/10 ,  F16C33/12 ,  F16C33/14 ,  B22F1/05 ,  C22C9/06 ,  C23C24/04

CPC分类号： C23C28/02 ,  B22F1/08 ,  B22F3/24 ,  B22F5/008 ,  B22F5/106 ,  B22F7/062 ,  B22F7/08 ,  B32B15/01 ,  B32B15/015 ,  B32B15/04 ,  B32B15/043 ,  B32B15/16 ,  B32B15/18 ,  B32B15/20 ,  C22C1/0425 ,  C22C9/00 ,  C23C24/00 ,  C23C24/08 ,  C23C24/082 ,  C23C28/021 ,  C23C28/023 ,  C23C28/026 ,  C23C28/027 ,  C23C28/44 ,  C23C30/00 ,  C23C30/005 ,  F01L3/02 ,  F01L3/04 ,  F16C33/1095 ,  F16C33/121 ,  F16C33/14 ,  B22F1/05 ,  B22F2003/242 ,  B22F2301/10 ,  B22F2304/10 ,  B22F2999/00 ,  C22C9/06 ,  C23C24/04 ,  F01L2303/00 ,  F01L2820/01 ,  F16C2202/04 ,  F16C2223/42 ,  F16C2240/06 ,  F16C2360/22 ,  Y10T428/12882 ,  Y10T428/12903 ,  Y10T428/1291 ,  Y10T428/12917 ,  Y10T428/12924 ,  Y10T428/12993 ,  Y10T428/2495 ,  Y10T428/24967 ,  Y10T428/265 ,  B22F2999/00 ,  B22F2003/242 ,  B22F1/09 ,  C22C1/0425 ,  B22F2999/00 ,  B22F2003/242 ,  B22F1/09 ,  B22F1/08 ,  C22C1/0425 ,  B22F2999/00 ,  B22F5/106 ,  B22F5/008 ,  B22F2003/242

摘要： A sliding member of the present invention includes a base material and a coating layer that is formed on the base material. The coating layer includes a particle aggregate, and the particle aggregate contains two or more kinds of precipitation hardened copper alloy particles that have different compositions. The sliding member has high coating strength and superior wear resistance.

公开(公告)号：US20240003041A1

公开(公告)日：2024-01-04

申请号：US18135660

申请日：2023-04-17

申请人： Atlas Magnetics Inc.

发明人： John Othniel McDonald ,  Zach Zimits

IPC分类号： C25D17/12 ,  H01B1/16 ,  C23C28/00

CPC分类号： C25D17/12 ,  H01B1/16 ,  C23C28/345 ,  C23C28/44 ,  C23C28/32 ,  C23C28/42

摘要： A hybrid conductive material comprising at least one conductive material having at least one internal porous insulative layer; and wherein, at least one of the conductive materials fills the voids of the internal porous insulative layer. The hybrid material blends conductive metals and porous insulation layers in a manner so that the resulting material operates as a single layer material with its own unique conductivity and skin depth; and a unique and strong directional impedance. By using a porous insulation layer, metal layers may be bonded together through insulation layers, and this allows rapid low-cost formation of the hybrid material. The hybrid material may be used to form thin wires or traces capable of handling high frequency applications.

公开(公告)号：US20180143592A1

公开(公告)日：2018-05-24

申请号：US15724540

申请日：2017-10-04

申请人： Seiko Epson Corporation

发明人： Tomohiko SOGO ,  Atsushi KAWAKAMI ,  Yuzuru TSUKAMOTO ,  Hirokazu TAKAHASHI

IPC分类号： G04B37/22

CPC分类号： G04B37/22 ,  C23C14/165 ,  C23C28/321 ,  C23C28/36 ,  C23C28/44 ,  C23C30/00 ,  G04B37/1486

摘要： A timepiece part has a substrate; and a first coating made from a material containing Co and including greater than or equal to 26 wt % and less than or equal to 30 wt % Cr, and greater than or equal to 5 wt % and less than or equal to 7 wt % Mo. The substrate is preferably made from a material including at least one of stainless steel and Ti. A second coating made of a material including at least one of TiC and TiCN is preferably disposed between the substrate and first coating.

公开(公告)号：US20170152602A1

公开(公告)日：2017-06-01

申请号：US15318612

申请日：2015-06-23

申请人： KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)

发明人： Maiko ABE ,  Kenji YAMAMOTO ,  Hiroaki NII

IPC分类号： C23C28/04 ,  C04B41/50 ,  C04B41/52 ,  B23B51/00

CPC分类号： C23C28/044 ,  B23B27/14 ,  B23B51/00 ,  B23C5/16 ,  C04B41/5024 ,  C04B41/5057 ,  C04B41/5062 ,  C04B41/522 ,  C23C14/06 ,  C23C28/042 ,  C23C28/42 ,  C23C28/44 ,  C23C30/005

摘要： A laminated hard coating comprising a layer A and a layer B, wherein the layer A and the layer B differ in composition and are laminated. Layer A contains (MaAlbCrcTad)(BxCyNz) and satisfies 0≦a≦0.35, 0.05≦d≦0.35, 0≦x≦0.15, 0≦y≦0.50, a+b+c+d=1, and x+y+z=1. M is at least one element selected from the group consisting of V, Nb, Mo, and W; a, b, c and d represent the atomic ratios of M, Al, Cr, and Ta, respectively; and x, y, and z represent the atomic ratios of B, C and N, respectively. The layer B comprises (TiαSiβ)(BxCyNz) and satisfies 0.05≦β≦0.35, 0≦x≦0.15, 0≦y≦0.50, α+β=1, and x+y+z=1. α and β represent the atomic ratios of Ti and Si, respectively, and x, y, and z represent the atomic ratios of B, C, and N, respectively. One or more layers of each of these layers have been alternately laminated.

公开(公告)号：US20170113285A1

公开(公告)日：2017-04-27

申请号：US15128365

申请日：2015-03-26

申请人： MITSUBISHI MATERIALS CORPORATION

发明人： Sho TATSUOKA ,  Kenichi SATO ,  Kenji YAMAGUCHI

IPC分类号： B23C5/16 ,  C23C28/00

CPC分类号： B23C5/16 ,  B23B2228/10 ,  B23C2228/10 ,  C23C16/34 ,  C23C16/36 ,  C23C16/45523 ,  C23C16/4581 ,  C23C28/042 ,  C23C28/044 ,  C23C28/42 ,  C23C28/44

摘要： A surface-coated cutting tool of the present invention includes: a cutting tool body; and a hard coating layer provided on a surface of the cutting tool body, in which the hard coating layer includes a complex nitride or carbonitride layer, which is expressed by a composition formula: (Ti1-xAlx)(CyN1-y), the average content ratio Xavg of Al and the average content ratio Yavg of C in the complex nitride or carbonitride layer satisfy 0.60≦Xavg≦0.95 and 0≦Yavg≦0.005, provided that each of Xavg and Yavg is in atomic ratio, the complex nitride or carbonitride layer includes crystal grains with a cubic structure, and in the crystal grains with the cubic structure, a composition of Ti and Al is periodically changed in a direction of the normal line to the surface of the cutting tool body.

公开(公告)号：US20150337459A1

公开(公告)日：2015-11-26

申请号：US14653266

申请日：2013-05-21

申请人： KORLOY INC.

发明人： Seung-Su AHN ,  Je-Hun PARK ,  Sung-Gu LEE ,  Sun-Yong AHN

IPC分类号： C30B29/38 ,  C30B29/68 ,  C30B25/10

CPC分类号： C30B29/38 ,  C23C14/0641 ,  C23C14/46 ,  C23C28/042 ,  C23C28/044 ,  C23C28/44 ,  C30B25/105 ,  C30B29/68 ,  Y10T428/24942 ,  Y10T428/24975

摘要： Provided is a multilayer thin film for a cutting tool, in which unit thin films each of which is formed of a total of four thin layers are stacked more than once, the multilayer thin film being capable of realizing improved physical properties compared with conventional one by adjusting an elastic period and a lattice period between the four thin layers. The multilayer thin film for a cutting tool according to the present disclosure is a multilayer thin film for a cutting tool, in which unit thin films each of which is sequentially stacked with thin layers A, B, C, and D are stacked more than once, wherein elastic modulus k between the thin layers satisfies relationships of kA, kC>kB, kD or kB, kD>kC, kA, and lattice parameter L between the thin layers satisfies relationships of LA>LB, LD>LC or LC>LB, LD>LA.

摘要翻译： 提供了一种用于切削工具的多层薄膜，其中由总共四个薄层形成的单位薄膜不止一次地堆叠，该多层薄膜与常规的薄膜相比可以实现比常规的更好的物理性能 调整四个薄层之间的弹性周期和晶格周期。 根据本公开的用于切削工具的多层薄膜是用于切削工具的多层薄膜，其中依次层叠有薄层A，B，C和D的单元薄膜不止一次地堆叠 其中，薄层之间的弹性模量k满足kA，kC> kB，kD或kB，kD> kC，kA，薄层之间的晶格参数L的关系满足LA> LB，LD> LC或LC> LB的关系 ，LD> LA。

公开(公告)号：US20140363648A1

公开(公告)日：2014-12-11

申请号：US14365436

申请日：2012-12-14

申请人： KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.) ,  ISCAR LTD.

发明人： Kenji Yamamoto ,  Albir A. Layyous

IPC分类号： C23C14/06 ,  C23C14/32 ,  C23C14/34

CPC分类号： C23C14/0664 ,  C23C14/06 ,  C23C14/325 ,  C23C14/34 ,  C23C28/042 ,  C23C28/044 ,  C23C28/42 ,  C23C28/44 ,  Y10T428/24975

摘要： Provided is a multilayer hard film capable of elongating a lifetime of a member. A multilayer hard film (1) is formed by alternately stacking a layer A (11) made of Ti1-xSix(BpCqNr) [where 0.05≦x≦0.4, p≧0, q≧0, r>0, p+q+r=1], and a layer B (12) made of at least one selected from the group of Ti1-a-g-bBaCgNb [where 0.05≦a≦0.5, 0.25≦b≦0.6, 0≦g≦0.5], Si1-c-dCcNd [where 0.2≦c≦0.5, 0.25≦d≦0.5], B1-e-fCeNf [where 0.03≦e≦0.25, 0.3≦f≦0.55], TiB2, SiC and B4C, one another over the surface of the substrate (2).

摘要翻译： 提供能够延长构件的寿命的多层硬膜。 通过交替层叠由Ti1-xSix（BpCqNr）[其中0.05＆nlE; x＆lt; ll; 0.4，p≥0，q≥0，r> 0，p + q的层A（11）形成的多层硬膜（1） + r = 1]，和由选自Ti1-ag-bBaCgNb [其中0.05和n1E; a＆nlE; 0.5,0.25＆nlE; b＆nlE; 0.6,0＆amp; nlE; g＆nlE; 0.5]中的至少一种制成的层B（12） ，Si1-c-dCcNd [其中0.2＆nlE; c＆nlE; 0.5,0.25＆nlE; d＆nlE; 0.5]，B1-e-fCeNf [其中0.03和nlE; e＆nlE; 0.25,0.3和nlE; f＆nlE; 0.55]，TiB2，SiC和B4C ，在衬底（2）的表面上彼此。

公开(公告)号：US20140017403A1

公开(公告)日：2014-01-16

申请号：US13934486

申请日：2013-07-03

申请人： Schubert Chu ,  Er-Xuan Ping ,  Yoshihde Senzaki

发明人： Schubert Chu ,  Er-Xuan Ping ,  Yoshihde Senzaki

IPC分类号： C23C16/06

CPC分类号： C23C16/06 ,  C23C16/40 ,  C23C16/45529 ,  C23C28/00 ,  C23C28/042 ,  C23C28/048 ,  C23C28/42 ,  C23C28/44

摘要： Described are methods of depositing an oxygen deficient metal film by chemical reaction of at least one precursor having a predetermined oxygen deficiency on a substrate. An exemplary method includes, during a metal oxide deposition cycle, exposing the substrate to a metal reactant gas comprising a metal and an oxygen reactant gas comprising oxygen to form a layer containing a metal oxide on the substrate. During an oxygen deficient deposition cycle, exposing the substrate to a metal reactant gas comprising a metal and an additional reactant gas excluding oxygen to form a second layer at least one of a metal nitride and a mixed metal on the substrate during a second cycle, the second layer being oxygen deficient relative to the layer containing the metal oxide; and repeating the metal oxide deposition cycle and the oxygen deficient deposition cycle to form the oxygen deficient film having the predetermined oxygen deficiency.

摘要翻译： 描述了通过至少一种具有预定氧缺乏的前体在基底上的化学反应来沉积缺氧金属膜的方法。 一种示例性方法包括在金属氧化物沉积循环期间，将衬底暴露于包含金属的金属反应物气体和包含氧的氧反应气体，以在衬底上形成含有金属氧化物的层。 在缺氧沉积循环期间，将基底暴露于包含金属和除氧之外的附加反应物气体的金属反应物气体，以在第二循环期间在基板上形成第二层金属氮化物和混合金属中的至少一种， 第二层相对于含有金属氧化物的层是缺氧的; 并且重复金属氧化物沉积循环和缺氧沉积循环以形成具有预定缺氧的缺氧膜。

公开(公告)号：US20130224887A1

公开(公告)日：2013-08-29

申请号：US13407352

申请日：2012-02-28

申请人： Dok Won Lee ,  Andrei Papou ,  William French ,  Peter J. Hopper

发明人： Dok Won Lee ,  Andrei Papou ,  William French ,  Peter J. Hopper

IPC分类号： H01L43/12 ,  C25D7/12

CPC分类号： C25D7/123 ,  C23C14/0617 ,  C23C14/185 ,  C23C28/321 ,  C23C28/34 ,  C23C28/42 ,  C23C28/44 ,  C25D7/001 ,  H01F3/00 ,  H01F10/265 ,  H01F27/24 ,  H01F41/046 ,  H01F41/26

摘要： A laminated magnetic core, which has a number of magnetic layers and a number of insulation layers which are arranged so that an insulation layer lies between each vertically adjacent pair of magnetic layers, is formed in a method that forms the magnetic layers with an electroplating process, and the insulation layers with a sputter depositing process.

摘要翻译： 一层叠磁芯，其具有多个磁性层和多个绝缘层，这些绝缘层被布置为使得绝缘层位于每个垂直相邻的一对磁性层之间，以形成具有电镀工艺的磁性层的方法形成 ，以及具有溅射沉积工艺的绝缘层。

公开(公告)号：US07579067B2

公开(公告)日：2009-08-25

申请号：US10996883

申请日：2004-11-24

申请人： Yixing Lin ,  Dajiang Xu ,  Clifford Stow

发明人： Yixing Lin ,  Dajiang Xu ,  Clifford Stow

IPC分类号： B32B5/32 ,  B32B3/02 ,  B32B5/18 ,  C23C14/00

CPC分类号： C23C30/00 ,  C23C4/02 ,  C23C4/131 ,  C23C28/021 ,  C23C28/44 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/1275 ,  Y10T428/12757 ,  Y10T428/12764 ,  Y10T428/24355 ,  Y10T428/24942 ,  Y10T428/24992 ,  Y10T428/249981 ,  Y10T428/249987 ,  Y10T428/31504

摘要： A substrate processing chamber component is capable of being exposed to an energized gas in a process chamber. The component has an underlying structure and first and second coating layers. The first coating layer is formed over the underlying structure, and has a first surface with an average surface roughness of less than about 25 micrometers. The second coating layer is formed over the first coating layer, and has a second surface with an average surface roughness of at least about 50 micrometers. Process residues can adhere to the surface of the second coating layer to reduce the contamination of processed substrates.

摘要翻译： 基板处理室部件能够暴露于处理室中的通电气体。 该组件具有底层结构以及第一和第二涂层。 第一涂层形成在下面的结构之上，并且具有平均表面粗糙度小于约25微米的第一表面。 第二涂层形成在第一涂层上，并且具有至少约50微米的平均表面粗糙度的第二表面。 工艺残留物可以附着到第二涂层的表面，以减少经处理的基材的污染。