{67 -methylene-1-cyclopentene-1-pentanoic acid
    3.
    发明授权
    {67 -methylene-1-cyclopentene-1-pentanoic acid 失效
    {67-乙烯-1-环烯-1-戊醇酸

    公开(公告)号:US3853949A

    公开(公告)日:1974-12-10

    申请号:US30094272

    申请日:1972-10-26

    申请人: MEAD JOHNSON & CO

    CPC分类号: C07C33/025 C07C57/26

    摘要: Dieneoic acid delta -methylene-1-cyclopentene-1-pentanoic acid is obtained by reacting cyclopentanone with one chemical equivalent of methylsulfinylmethide alkali metal salt in dimethyl sulfoxide. Lithium aluminum hydride reduction of the acid provides Epsilon -methylene-1-cyclopentene-1-pentanol. The acid, metal salts thereof, lower alkyl esters, and the alcohol are effective antifungal agents.

    摘要翻译: 二烯酸δ-亚甲基-1-环戊烯-1-戊酸是通过环戊酮与一种化学当量的甲基亚磺酰基甲基碱金属盐在二甲亚砜中反应得到的。 氢化铝锂还原酸提供ε-亚甲基-1-环戊烯-1-戊醇。 其酸金属盐,低级烷基酯和醇是有效的抗真菌剂。

    Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method
    5.
    发明授权
    Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method 有权
    高分子化合物,包含高分子化合物的光致抗蚀剂组合物和抗蚀图案形成方法

    公开(公告)号:US07723007B2

    公开(公告)日:2010-05-25

    申请号:US10589681

    申请日:2005-01-28

    IPC分类号: G03F7/004 C07C61/26 C08F32/08

    摘要: The present invention provides a polymer compound which can constitute a photoresist composition which is capable of having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of a acid generated from an acid generator is weak, and having favorable sensitivity; a photoresist composition including the polymer compound; and a resist pattern formation method using the photoresist composition. The photoresist composition and the resist pattern formation method use the polymer compound including an alkali soluble group (i), wherein the alkali soluble group (i) is at least one substituent group selected from an alcoholic hydroxyl group, a carboxyl group, or a phenolic hydroxyl group, and the substituent group is protected by an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1): —CH2—OCH2nR1  (1) (wherein R1 represents a cycloaliphatic group which contains no more than 20 carbon atoms and may contain an oxygen atom, a nitrogen atom, a sulfur atom, or a halogen atom, and n represents 0 or an integer of 1 to 5).

    摘要翻译: 本发明提供一种高分子化合物,其可以构成光刻胶组合物,其能够具有优异的分辨率,形成具有良好矩形性的精细图案,即使酸产生器产生的酸的酸强弱也能获得良好的抗蚀特性, 并具有良好的灵敏度; 包含该高分子化合物的光致抗蚀剂组合 以及使用光致抗蚀剂组合物的抗蚀剂图案形成方法。 光致抗蚀剂组合物和抗蚀剂图案形成方法使用包含碱溶性基团(i)的高分子化合物,其中碱溶性基团(i)为选自醇羟基,羧基或酚类中的至少一个取代基 羟基,取代基被通过通式(1)表示的酸解离的溶解抑制基团(ⅱ)保护:-CH 2 -OCH 2 n R 1(1)(其中R 1表示含有不多于20个碳的脂环族基团 原子,可以含有氧原子,氮原子,硫原子或卤素原子,n表示0或1〜5的整数。