公开(公告)号：US4080549A

公开(公告)日：1978-03-21

申请号：US702521

申请日：1976-07-06

Applicant: John M. Creedon ,  Sidney D. Putnam ,  Ian D. Smith

Inventor： John M. Creedon ,  Sidney D. Putnam ,  Ian D. Smith

IPC: H01J17/38 ,  H01J27/06 ,  H05H1/22 ,  H05B39/00 ,  H05B41/14

CPC classification number: H05H1/22 ,  H01J17/38 ,  H01J27/06

Abstract: A high energy discharge apparatus uses a generally electron transparent thin foil anode of various configuration which is arranged parallel to and spaced apart between a pair of cathodes, and energized to create a potential difference between the anodes and cathodes causing electrons to be reflected back and forth through the foil anode with the concurrent discharge of ions being accelerated to the cathode.

Abstract translation: 高能量放电装置使用一般电子透明的薄片状阳极，其各向同性地布置成平行并间隔开一对阴极，并且被激励以产生阳极和阴极之间的电位差，导致电子反射回来 通过箔阳极与同时放电的离子被加速到阴极。

公开(公告)号：US3614440A

公开(公告)日：1971-10-19

申请号：US3614440D

申请日：1968-06-24

Applicant: KAMAN SCIENCES CORP ,  ELISABETH HELEN CARR

Inventor： CARR BARNEY J

IPC: F03H1/00 ,  H01J27/02 ,  H01J27/06 ,  H01J41/00 ,  H01J41/06 ,  H01J41/18 ,  H05H3/06 ,  G21G3/04

CPC classification number: F03H1/00 ,  H01J27/02 ,  H01J27/06 ,  H01J41/00 ,  H01J41/06 ,  H01J41/18 ,  H05H3/06

Abstract: Apparatus for ionizing gases at very low pressures comprising inner and outer electrodes wherein the inner electrode is substantially circular in cross section and the outer electrode surrounding the inner electrode may be other than a figure of revolution or may be eccentrically positioned with respect to the inner electrode which inner electrode is less in length than two times the length of the surrounding outer electrode and is spaced therefrom a distance which is greater than the diameter of the inner electrode for a distance of not less than two-thirds the length of the surrounding outer electrode.

公开(公告)号：US2990616A

公开(公告)日：1961-07-04

申请号：US49292455

申请日：1955-03-08

Applicant: CAVITRON CORP

Inventor： LEWIS BALAMUTH ,  ARTHUR KURIS

IPC: A61C1/07 ,  A61C3/03 ,  B24B1/04 ,  B26D7/08 ,  B29C65/08 ,  H01J27/06

CPC classification number: B29C66/861 ,  A61C1/07 ,  A61C3/03 ,  B24B1/04 ,  B26D7/086 ,  B29C65/08 ,  B29C66/8167 ,  B29C66/9512 ,  B29C66/9513 ,  B29C66/9516 ,  H01J27/06 ,  Y10S83/956

公开(公告)号：US07655928B2

公开(公告)日：2010-02-02

申请号：US11693237

申请日：2007-03-29

Applicant: Kasegn D. Tekletsadik

Inventor： Kasegn D. Tekletsadik

IPC: H01J27/00 ,  H01J37/317 ,  H01J27/06 ,  H01J27/10 ,  G21F3/00 ,  A61N5/00

CPC classification number: H01J37/3171 ,  H01J5/46 ,  H01J37/248 ,  H01R13/53

Abstract: Ion accelerating devices including connection mechanisms with integrated shielding electrode and related methods are disclosed. According to an embodiment, an ion accelerating device of an ion implantation system comprises: a first element; a first connection system within the first element, the first connection system including a first connector and a first encapsulated shielding electrode around the first connector; and a second connection system within a second element other than the first element, the second connection system being coupled to the first connector; wherein the first encapsulated shielding electrode includes a first shielding portion adjacent to a first interface surface of the first element where the second connection system interfaces with the first element, in a cross-sectional view, the first shielding portion being substantially U-shaped.

Abstract translation: 公开了包括具有集成屏蔽电极的连接机构和相关方法的离子加速装置。 根据实施例，离子注入系统的离子加速装置包括：第一元件; 所述第一连接系统包括第一连接器和围绕所述第一连接器的第一封装屏蔽电极; 以及除了所述第一元件之外的第二元件内的第二连接系统，所述第二连接系统联接到所述第一连接器; 其中所述第一封装屏蔽电极包括与所述第一元件的第一接口表面相邻的第一屏蔽部分，其中所述第二连接系统与所述第一元件接合，在横截面图中，所述第一屏蔽部分基本上为U形。

公开(公告)号：US3566185A

公开(公告)日：1971-02-23

申请号：US3566185D

申请日：1969-03-12

Applicant: ATOMIC ENERGY COMMISSION

Inventor： GAVIN BASIL F

IPC: H01J27/06 ,  H05B31/26

CPC classification number: H01J27/06 ,  Y10S422/906

Abstract: An ion source in which ions of normally solid materials are easily produced. A plasma is generated in a gas adjacent the solid material from which ions are to be produced. The solid is negatively charged and the gas plasma ions bombard the solid, sputtering off ions of the solid. This is accomplished through the use of a Penning discharge with a cold cathode-type source and a centrally positioned and negatively charged dynode upon which the solid material is mounted, the dynode being electrically connected to the cathode and provided with an exit slit through which the metallic ions are extracted from plasma potential.

公开(公告)号：US06885014B2

公开(公告)日：2005-04-26

申请号：US10210124

申请日：2002-07-31

Applicant: Victor M. Benveniste

Inventor： Victor M. Benveniste

IPC: H01J27/16 ,  H01J27/00 ,  H01J27/06 ,  H01J37/04 ,  H01J37/05 ,  H01J37/08 ,  H01J37/317 ,  H01L21/265

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/08 ,  H01J2237/0835 ,  H01J2237/31701

Abstract: Ion implantation systems and beamlines therefor are disclosed, in which a ribbon beam of a relatively large aspect ratio is mass analyzed and collimated to provide a mass analyzed ribbon beam for use in implanting one or more workpieces. The beamline system comprises two similar magnets, where the first magnet mass analyzes the ribbon beam to provide an intermediate mass analyzed ion beam, and the second magnet collimates the intermediate beam to provide a uniform mass analyzed ribbon beam to an end station. The symmetrical system provides equidistant beam trajectories for ions across the elongated beam width so as to mitigate non-linearities in the beam transport through the system, such that the resultant mass analyzed beam is highly uniform.

Abstract translation: 公开了离子注入系统和其束线，其中质量分析和准直以提供质量分析的带状束，用于植入一个或多个工件。 束线系统包括两个类似的磁体，其中第一磁体质量分析带状束以提供中间质量分析离子束，并且第二磁体准直中间光束，以向终端站提供均匀质量分析的带状束。 对称系统为细长波束宽度上的离子提供等距离的波束轨迹，以便减轻通过系统的波束传输中的非线性，使得所得到的质量分析波束高度均匀。

公开(公告)号：US4931698A

公开(公告)日：1990-06-05

申请号：US336934

申请日：1989-04-12

Applicant: Yoshikazu Yoshida

Inventor： Yoshikazu Yoshida

IPC: H01J27/06 ,  H01J27/04 ,  H01J37/08

CPC classification number: H01J27/04

Abstract: An ion source comprising a discharge chamber that has a gas inlet and an ion exit, two pairs of cathodes that are disposed on the side surfaces of said discharge chamber, two pairs of anodes, each anode being disposed in a space between the adjacent cathodes, and a pair of solenoids that are wrapped around one pair of cathodes so as to be mutually repulsive magnetically, wherein there is no magnetic field in the central axis of the other pair of cathodes around which no solenoids are wrapped.

Abstract translation: 一种离子源，包括具有气体入口和离子出口的放电室，设置在所述放电室的侧表面上的两对阴极，两对阳极，每个阳极设置在相邻阴极之间的空间中， 以及一对螺线管，其缠绕在一对阴极周围以便以相互排斥的方式磁化，其中在另一对阴极的中心轴线处没有磁场，在其周围没有螺线管被包裹。

公开(公告)号：US4642522A

公开(公告)日：1987-02-10

申请号：US621420

申请日：1984-06-18

Applicant: Robin J. Harvey ,  Hayden E. Gallagher ,  Robert W. Schumacher

Inventor： Robin J. Harvey ,  Hayden E. Gallagher ,  Robert W. Schumacher

IPC: H01J3/02 ,  H01J17/38 ,  H01J17/44 ,  H01J27/06 ,  H01J37/077 ,  H01S3/097 ,  H01J7/24

CPC classification number: H01J3/021

Abstract: An improved Wire-Ion-Plasma Electron-gun (WIP E-gun) is disclosed, having a very rapid electron beam current interruption capability. An auxiliary grid is employed to provide a potential barrier to the reservoir of plasma ions in the ionization chamber, thereby containing these ions in the chamber after the wire anode is turned "OFF". The E-gun current fall time is reduced to the time required for the plasma potential to fall in the ionization chamber after the wire anode is turned "OFF". The WIP E-gun current fall time is reduced, from greater than fifteen microseconds for devices not employing the invention, to less than two microseconds.

Abstract translation: 公开了一种改进的线离子等离子体电子枪（WIP E-gun），具有非常快的电子束电流中断能力。 辅助栅格用于为电离室中的等离子体离子的储存器提供势垒，从而在电极阳极“断开”之后，在室内容纳这些离子。 电子枪电流下降时间减少到电线阳极转为“关闭”后等离子体电势落入电离室所需的时间。 WIP电子枪电流下降时间从不超过十五微秒用于不使用本发明的器件减少到小于两微秒。