公开(公告)号：US20220315717A1

公开(公告)日：2022-10-06

申请号：US17625367

申请日：2020-07-08

申请人： SOLVAY SPECIALTY POLYMERS USA, LLC ,  CYTEC INDUSTRIES INC.

发明人： Chantal LOUIS ,  James Francis PRATTE

IPC分类号： C08J5/24 ,  C08G8/02 ,  C08K7/06 ,  C08K3/04

摘要： The present invention generally relates a composite material containing fibers and a resin matrix that comprises a PEEK-PEoEK copolymer having RPEEK and RPEoEK repeat units in a molar ratio RPEEK/RPEoEK ranging from 95/5 to 5/95 in contact with at least a part of the surface of such fibers. The present invention also relates to methods for making such composite materials, shaped articles made from such composite materials, and methods of making such articles.

公开(公告)号：US10011676B2

公开(公告)日：2018-07-03

申请号：US14897850

申请日：2014-02-21

申请人： DIC Corporation

发明人： Yutaka Satou ,  Ayumi Takahashi

IPC分类号： C08G8/02 ,  C07C39/15 ,  C08G61/02 ,  C08L61/16 ,  H05K1/03 ,  H05K1/09 ,  C08G59/62 ,  C07C39/14 ,  H01L23/29 ,  C08L65/00

CPC分类号： C08G8/02 ,  C07C39/15 ,  C08G59/621 ,  C08G61/02 ,  C08L61/16 ,  C08L65/00 ,  H01L23/295 ,  H01L2924/0002 ,  H05K1/0373 ,  H05K1/09 ,  H01L2924/00

摘要： There are provided a compound containing a phenolic hydroxyl group, which exhibits excellent heat resistance and excellent flame retardancy in terms of a cured product thereof, a phenolic resin including the same, a curable composition and a cured product thereof, a semiconductor sealing material, and a printed circuit board. The compound containing a phenolic hydroxyl group has a molecular structure represented by the following General Formula (I): wherein X is a structural site represented by the following Structural Formula (x1) or (x2); in Formula (x1) or (x2), k is an integer of 1 to 3, m is 1 or 2, Ar is a structural site represented by the following Structural Formula (Ar1), and in a case where when k or m is 2 or greater, a plurality of Ar's may be the same as or different from each other; wherein p is 1 or 2.

公开(公告)号：US09902798B2

公开(公告)日：2018-02-27

申请号：US14897915

申请日：2014-02-21

申请人： DIC Corporation

发明人： Yutaka Satou ,  Ayumi Takahashi ,  Gensuke Akimoto

IPC分类号： C08G8/20 ,  C08G59/62 ,  H01L23/29 ,  H05K1/03 ,  C07C39/15 ,  C08G8/02 ,  C08G61/02 ,  C08L61/16 ,  C08K3/04 ,  C08K7/18 ,  H05K1/09 ,  C09D163/00 ,  C08L65/00

CPC分类号： C08G8/02 ,  C07C39/15 ,  C08G59/621 ,  C08G61/02 ,  C08K3/04 ,  C08K7/18 ,  C08L61/16 ,  C08L65/00 ,  C08L91/06 ,  C09D163/00 ,  H01L23/295 ,  H01L2924/0002 ,  H05K1/0366 ,  H05K1/09 ,  H01L2924/00

摘要： There are provided a compound containing a phenolic hydroxyl group, which exhibits excellent heat resistance and excellent flame retardancy in terms of a cured product thereof, a phenolic resin including the same, a curable composition and a cured product thereof, a semiconductor sealing material, and a printed circuit board. The phenolic resin contains a binuclear compound (X) represented by the following Structural Formula (I), and a trinuclear compound (Y) represented by the following Structural Formula (II) as essential components: wherein each of j and k is 1 or 2, and at least one of j and k is 2; wherein each of l, m and n is 1 or 2, and at least one of l, m, and n is 2.

公开(公告)号：US09758634B2

公开(公告)日：2017-09-12

申请号：US14888570

申请日：2014-04-30

申请人： BASF SE

发明人： Martin Weber ,  Christian Maletzko ,  Thomas Weiss ,  Joerg Erbes ,  Bastiaan Bram Pieter Staal

IPC分类号： C08G8/02 ,  C08K3/26 ,  C08G65/26 ,  C08G65/334 ,  C08G65/337

CPC分类号： C08K3/26 ,  C08G65/2612 ,  C08G65/3346 ,  C08G65/337 ,  C08K2003/262 ,  C08L2205/05

摘要： The invention relates to a method for preparing polyarylethersulfone-polyalkylene oxide block copolymers (PPC) comprising the polycondensation of a reaction mixture (RG) comprising the components: (A1) at least one aromatic dihalogen compound, (B1) at least one aromatic dihydroxyl compound, (B2) at least one polyalkylene oxide having at least two hydroxyl groups, (C) at least one aprotic polar solvent and (D) at least one metal carbonate, where the reaction mixture (RG) does not comprise any substance which forms an azeotrope with water.

公开(公告)号：US20160365242A1

公开(公告)日：2016-12-15

申请号：US15178597

申请日：2016-06-10

申请人： SK Innovation Co., Ltd. ,  SK Global Chemical Co., Ltd.

发明人： Min Ho Jung ,  Jeong Eop Choi ,  Hye Ryoung Lee

IPC分类号： H01L21/02 ,  G03F7/11 ,  H01L21/027 ,  C08G8/02 ,  C09D161/16

CPC分类号： H01L21/02118 ,  C08G8/02 ,  C08G61/12 ,  C08G65/4012 ,  C08G65/48 ,  C08G2150/00 ,  C08G2261/135 ,  C08G2261/334 ,  C08G2261/3424 ,  C08G2261/344 ,  C08G2261/76 ,  C08G2650/40 ,  C08K5/3445 ,  C09D161/16 ,  C09D171/00 ,  G03F7/094 ,  G03F7/11 ,  H01L21/02282 ,  H01L21/02345 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/31138

摘要： Provided are a polymer for an underlayer film, used in semiconductor and display manufacturing processes, an underlayer film composition for semiconductor and display manufacturing processes, containing the same, and a method for forming an underlayer film for semiconductor and display manufacturing processes using the underlayer film composition. The polymer according to the present invention is a polymer including a repeating unit represented by the following Chemical Formula 1: in Chemical Formula 1, Ar, R1 to R6, L, and R′ and R″ are the same as those in the detailed description of the present invention.

摘要翻译： 在化学式1中，Ar，R 1至R 6，L和R'和R“与本发明的详细说明中相同。

公开(公告)号：US09365680B2

公开(公告)日：2016-06-14

申请号：US14592365

申请日：2015-01-08

申请人： BASF SE

发明人： Martin Weber ,  Christian Maletzko ,  Gerhard Lange ,  Jörg Erbes ,  Matthias Dietrich ,  Nicholas Inchaurrondo

IPC分类号： C08G8/02 ,  C08G75/23 ,  C08L61/02 ,  C08L65/02 ,  C08L79/08 ,  C08L81/06

CPC分类号： C08G75/23 ,  C08L61/02 ,  C08L65/02 ,  C08L79/08 ,  C08L81/06

摘要： The present invention relates to a process for the production of low-chlorine-content polybiphenyl sulfone polymers, to the polybiphenyl sulfone polymers obtainable in this way, to polybiphenyl sulfone polymers with less than 800 ppm content of organically bonded chlorine, to thermoplastic molding compositions and moldings, fibers, films, membranes, or foams comprising the polybiphenyl sulfone polymers mentioned, and also to their use for the production of moldings, of fibers, of films, of membranes, or of foams.

公开(公告)号：US09175136B2

公开(公告)日：2015-11-03

申请号：US13125537

申请日：2009-10-23

申请人： Chantal Louis

发明人： Chantal Louis

IPC分类号： C08G65/40 ,  C07C315/06 ,  C08G8/02 ,  C08G75/23

CPC分类号： C08G65/4012 ,  C01D7/00 ,  C07C45/78 ,  C07C315/06 ,  C08G8/02 ,  C08G65/4087 ,  C08G65/4093 ,  C08G75/23 ,  C08G2261/3444

摘要： Sodium carbonate (Na2CO3) having a certain particle size distribution and its use in preparing poly(aryl ether ketone)s, especially PEEK. Poly(aryl ether ketone)s made using the described sodium carbonate. A method for providing a sodium carbonate having a certain particle size distribution, which is especially well suited for the preparation of poly(aryl ether ketone)s.

摘要翻译： 具有一定粒度分布的碳酸钠（Na 2 CO 3）及其在制备聚（芳基醚酮），特别是PEEK中的用途。 使用所述碳酸钠制备的聚（芳基醚酮）。 提供具有一定粒度分布的碳酸钠的方法，其特别适用于制备聚（芳基醚酮）。

公开(公告)号：US09120062B2

公开(公告)日：2015-09-01

申请号：US13866498

申请日：2013-04-19

申请人： BASF SE ,  National University of Singapore

发明人： Martin Weber ,  Christian Maletzko ,  Bernd Trotte ,  Peishan Zhong ,  Tai-Shung Chung

IPC分类号： C08G8/02 ,  B01D71/68 ,  B01D67/00 ,  B01D69/12 ,  B01D71/78 ,  B01D61/02

CPC分类号： B01D71/68 ,  B01D61/027 ,  B01D67/009 ,  B01D67/0093 ,  B01D69/125 ,  B01D71/78 ,  B01D2323/345 ,  B01D2323/385 ,  B01D2325/16

摘要： The present invention is directed to positively charged nanofiltration (NF) membranes comprising a substrate layer (S) based on a sulfonated polymer and a positively charged film layer (F) on top of said substrate, and to a method for their preparation. Furthermore, the present invention is directed to nanofiltration processes making use of said composite membrane.

摘要翻译： 本发明涉及带正电荷的纳滤（NF）膜，其包括基于磺化聚合物的基底层（S）和位于所述基底顶部的带正电荷的膜层（F）及其制备方法。 此外，本发明涉及使用所述复合膜的纳滤方法。

公开(公告)号：US20150240021A1

公开(公告)日：2015-08-27

申请号：US14189047

申请日：2014-02-25

申请人： Peter Hesse ,  Tillmann Paul ,  Richard Weiss

发明人： Peter Hesse ,  Tillmann Paul ,  Richard Weiss

IPC分类号： C08G8/02 ,  B02C23/08 ,  B02C7/00

CPC分类号： B02C23/08 ,  B02C7/005 ,  C08G65/46 ,  C08G2650/40 ,  C08J3/122 ,  C08J2371/00 ,  C08J2377/02 ,  C08L71/00

摘要： The invention describes powders for use in the production of spatial structures, i.e. molded bodies, using layer build-up methods, as well as methods for their efficient production. The powders have the special feature that they have good flow behavior, for one thing, and at the same time, have such a composition that the molded body that can be produced with the powder, using rapid prototyping, has significantly improved mechanical and/or thermal properties. According to a particularly advantageous embodiment, the powder has a first component that is present in the form of essentially spherical powder particles, which is formed by a matrix material, and at least one further component in the form of stiffening and/or reinforcing fibers, which are preferably embedded in the matrix material.

摘要翻译： 本发明描述了用于生产空间结构的粉末，即使用层积聚方法的成型体，以及它们有效生产的方法。 这些粉末具有特别的特征，它们具有良好的流动性能，一方面，同时具有使用快速成型可以用粉末生产的成型体具有显着改善的机械和/或 热性能。 根据特别有利的实施方案，粉末具有第一组分，其以由基质材料形成的基本上为球形的粉末颗粒的形式存在，以及至少一种加强和/或增强纤维形式的其它组分， 其优选地嵌入基质材料中。

公开(公告)号：US20150183918A1

公开(公告)日：2015-07-02

申请号：US14415950

申请日：2013-07-18

申请人： Arkema France

发明人： Guillaume Le ,  Julien Jouanneau ,  Jérome Amstutz

IPC分类号： C08G8/02 ,  B29C67/00

CPC分类号： C08G8/02 ,  B29C64/153 ,  B29K2061/00 ,  B29K2261/00 ,  B29K2461/00 ,  B29K2661/00 ,  B29K2861/00 ,  C08G61/127 ,  C08G2261/3442 ,  C08G2261/45

摘要： The invention relates to a process for synthesizing polyaryl ether ketones with low contents of residual materials, whether they are residual monomers or solvents of the synthetic process.

摘要翻译： 本发明涉及一种合成低残留物质的聚芳醚酮的方法，无论是残留单体还是合成方法的溶剂。