公开(公告)号：US12124117B2

公开(公告)日：2024-10-22

申请号：US17293296

申请日：2019-11-18

申请人： Essilor International

发明人： Christophe Valenti ,  Frédéric Guillain ,  William Trottier-Lapointe

IPC分类号： G02C7/10 ,  G02B1/116 ,  G02C7/02 ,  C23C14/08

CPC分类号： G02C7/107 ,  G02B1/116 ,  G02C7/022 ,  G02C7/024 ,  C23C14/081

摘要： The invention relates to an optical lens comprising a substrate having a front main face and a rear main face, at least one main face of which being successively coated with a first high refractive index sheet which does not comprise any Ta2O5 layer, a second low refractive index sheet a third high refractive index sheet, a monolayer sub-layer having a thickness higher than or equal to 100 nm, a multilayer interferential coating comprising a stack of at least one high refractive index layer and at least one low refractive index layer, and a filtering interferential system that selectively reflects or transmits visible light in a narrow range of wavelengths.

公开(公告)号：US12123089B2

公开(公告)日：2024-10-22

申请号：US17108666

申请日：2020-12-01

申请人： ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA

发明人： Jiao Duan ,  Sheng Guo ,  Xiang Sun ,  Xingjian Chen

IPC分类号： C23C14/08 ,  C23C14/06 ,  C23C14/26 ,  C23C14/30 ,  C23C14/46 ,  C23C28/04

CPC分类号： C23C14/083 ,  C23C14/0694 ,  C23C14/26 ,  C23C14/30 ,  C23C14/46 ,  C23C28/042

摘要： Disclosed are a method of forming a plasma coating on a component, an apparatus for forming the coating, a component, and a processing apparatus; the apparatus for forming the coating includes: a vacuum chamber; a first coating material source, a second coating material source, and a component, which are disposed in the vacuum chamber; wherein the first coating material source includes oxygen atoms and yttrium atoms, and the second coating material source includes one of yttrium fluoride, aluminum-oxygen compound, or zirconium-oxygen compound; a first exciting device configured for exciting out the yttrium atoms and oxygen atoms from within the first coating material source; a second exciting device configured for exciting out atoms from within the second coating material source; wherein collision of the yttrium atoms and oxygen atoms excited out of the first coating material source and the atoms excited out of the second coating material source produces a chemical reaction to form on the component a plasma resistant coating including a stable phase of yttrium-based multi-element metal oxide or yttrium-based oxyfluoride. The coating formed using the apparatus has a strong plasma corrosion resistance property.

公开(公告)号：US12116663B2

公开(公告)日：2024-10-15

申请号：US16852142

申请日：2020-04-17

申请人： CubicPV Inc.

发明人： Michael D. Irwin ,  Marissa Higgins ,  David W. Miller

IPC分类号： C23C14/08 ,  C23C14/24 ,  C23C14/32 ,  C23C14/34 ,  C23C14/50

CPC分类号： C23C14/088 ,  C23C14/243 ,  C23C14/325 ,  C23C14/3407 ,  C23C14/50

摘要： A method for solvent-free perovskite deposition. The method comprises loading a lead target and one or more samples adhered to a substrate holder into a deposition chamber, pumping down to a high vacuum pressure, and backfilling the deposition chamber with the vapor of a salt precursor to form a perovskite material.

公开(公告)号：US20240339351A1

公开(公告)日：2024-10-10

申请号：US18745262

申请日：2024-06-17

申请人： TOTO LTD.

发明人： Yutaka MOMIYAMA ,  Hitoshi SASAKI

IPC分类号： H01L21/683 ,  B32B7/12 ,  B32B9/00 ,  B32B9/04 ,  B32B15/04 ,  B32B15/08 ,  C23C14/06 ,  C23C14/08

CPC分类号： H01L21/6833 ,  B32B7/12 ,  B32B9/005 ,  B32B9/041 ,  B32B9/045 ,  B32B15/04 ,  B32B15/08 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/08 ,  B32B2307/54 ,  B32B2307/542

摘要： According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a bonding layer provided between the ceramic dielectric substrate and the base plate. At least one of the following first to sixth conditions is satisfied: First condition: An elongation percentage α1 is not less than 120%; Second condition: A ratio α1/α2 of the elongation percentage is not less than 0.60; Third condition: A bonding strength β1 is not less than 0.4 MPa and not more than 10 MPa; Fourth condition: A ratio β1/β2 of the bonding strength is not less than 0.6 and not more than 10; Fifth condition: An elastic modulus γ1 is not less than 0.1 MPa and not more than 10 MPa; Sixth condition: A ratio γ1/γ2 of the elastic modulus is not less than 0.6 and not more than 30.

公开(公告)号：US12104240B2

公开(公告)日：2024-10-01

申请号：US17231125

申请日：2021-04-15

申请人： AGC INC.

发明人： Maemi Iwahashi ,  Yoshihito Tokunaga ,  Hirokazu Kodaira ,  Kenji Ishizeki ,  Daisuke Kobayashi ,  Asako Anazawa ,  Yusuke Tomiyori

IPC分类号： C23C14/08 ,  C01B3/12 ,  C01B33/12 ,  C01B33/20 ,  C01B33/26 ,  C23C14/10 ,  C23C14/46

CPC分类号： C23C14/08 ,  C01B33/12 ,  C01B33/20 ,  C01B33/26 ,  C23C14/10 ,  C23C14/46

摘要： To provide a water/oil repellent layer-provided substrate having a water/oil repellent layer excellent in abrasion resistance, a deposition material and a method for producing a water/oil repellent layer-provided substrate.
The water/oil repellent layer-provided substrate of the present invention is a water/oil repellent layer-provided substrate comprising a substrate, an undercoat layer and a water/oil repellent layer in this order,



wherein the water/oil repellent layer comprises a condensate of a fluorinated compound having a reactive silyl group,
the undercoat layer contains an oxide containing silicon and at least one element selected from the group consisting of titanium, zirconium and aluminum, and
the ratio of the total molar concentration of titanium, zirconium and aluminum in the undercoat layer to the molar concentration of silicon in the undercoat layer is from 0.03 to 0.7.

公开(公告)号：US20240318317A1

公开(公告)日：2024-09-26

申请号：US18575699

申请日：2022-06-29

申请人： SAINT-GOBAIN GLASS FRANCE

发明人： Jean-Thomas FONNE ,  Denis GUIMARD ,  Lorenzo MANCINI ,  Nadia ZENID

IPC分类号： C23C28/04 ,  C23C14/06 ,  C23C14/08 ,  C23C14/18 ,  C23C14/35 ,  C23C14/58 ,  C23C16/26 ,  C23C16/50 ,  C23C16/56 ,  C23C28/00

CPC分类号： C23C28/046 ,  C23C14/0652 ,  C23C14/086 ,  C23C14/185 ,  C23C14/35 ,  C23C14/5806 ,  C23C16/26 ,  C23C16/50 ,  C23C16/56 ,  C23C28/322 ,  C23C28/343

摘要： A substrate coated with a stack of layers includes the following series of layers, starting from the surface of the substrate: a layer of diamond-like carbon DLC; a germanium or germanium oxide layer having a thickness of between 2 and 40 nm, the germanium or germanium oxide layer including less than 20% tin; and optionally, an oxygen barrier layer.

公开(公告)号：US20240294802A1

公开(公告)日：2024-09-05

申请号：US18572476

申请日：2022-07-21

申请人： DEXERIALS CORPORATION

发明人： Tomoya OHIRA

IPC分类号： C09D183/04 ,  C09D7/61 ,  C23C14/02 ,  C23C14/08 ,  C23C14/10 ,  C23C14/34

CPC分类号： C09D183/04 ,  C09D7/61 ,  C23C14/024 ,  C23C14/083 ,  C23C14/10 ,  C23C14/34

摘要： To provide a laminate including a base, a hard coat layer disposed on the base, and a dry film layer disposed on the hard coat layer. The hard coat layer includes a polysilsesquioxane derivative. An abundance ratio [(Si/C)×100] of silicon atoms Si to carbon atoms C existing at a surface of the hard coat layer facing the dry film layer is 30% or greater.

公开(公告)号：US12077843B2

公开(公告)日：2024-09-03

申请号：US17286795

申请日：2019-10-17

申请人： Samsung Electronics Co., Ltd.

发明人： Hyejin Bang ,  Hwanju Jeon

IPC分类号： C23C14/08 ,  B32B7/12 ,  B32B17/06 ,  C23C14/28 ,  C23C14/34 ,  H05K5/03

CPC分类号： C23C14/08 ,  B32B7/12 ,  B32B17/06 ,  C23C14/28 ,  C23C14/3407 ,  B32B2255/20 ,  B32B2255/26 ,  B32B2307/412 ,  B32B2457/00 ,  H05K5/03

摘要： A cover member of an electronic device according to various embodiments of the present disclosure may comprise: a substrate film layer; a metal oxide layer disposed on the upper surface of the substrate film layer and formed by sputtering; a transparent member attached/disposed on the upper surface of the metal oxide layer; a primer layer disposed on the lower surface of the substrate film layer and made of a semi-transparent material; and a photocurable resin layer disposed on the lower surface of the primer layer, the photocurable resin layer comprising, on a surface thereof, a pattern structure in a designated stereoscopic shape. Other embodiments are also possible.

公开(公告)号：US12077841B2

公开(公告)日：2024-09-03

申请号：US17516030

申请日：2021-11-01

申请人： Samsung Display Co., Ltd.

发明人： Kwanghyun Kim ,  Heonsik Ha ,  Woo-Seok Jeon

IPC分类号： C23C14/04 ,  B05D1/32 ,  B05D5/06 ,  C23C14/08

CPC分类号： C23C14/042 ,  B05D1/32 ,  B05D5/06 ,  C23C14/08 ,  Y10T29/49826

摘要： A manufacturing method of a mask assembly includes forming a cell mask including masking patterns and a mesh frame including conductive patterns disposed to correspond to the masking patters and disposing the cell mask and the mesh frame on a mask frame. The forming the cell mask and the mesh frame includes forming a polymer layer, a conductive layer, and a hard masking layer, forming a mask pattern layer including etch patterns, and forming the cell mask and the mesh frame using the mask pattern layer.

公开(公告)号：US12074235B2

公开(公告)日：2024-08-27

申请号：US17015428

申请日：2020-09-09

申请人： Wisconsin Alumni Research Foundation

发明人： Paul Gregory Evans ,  Thomas Francis Kuech ,  Donald E. Savage ,  Yajin Chen ,  Samuel Marks

IPC分类号： B32B9/00 ,  C01G31/02 ,  C23C14/08 ,  C23C14/35 ,  C23C14/58 ,  C30B28/02 ,  H01L31/0232 ,  H01L31/08 ,  B82Y30/00 ,  B82Y40/00 ,  C30B29/30

CPC分类号： H01L31/0232 ,  C01G31/02 ,  C23C14/088 ,  C23C14/35 ,  C23C14/5806 ,  C30B28/02 ,  H01L31/085 ,  B82Y30/00 ,  B82Y40/00 ,  C01P2002/34 ,  C30B29/30

摘要： Transparent, electrically conductive vanadium oxide-based perovskite films and methods of making the vanadium oxide-based perovskite films are provided. Transparent conducting vanadate perovskites are made by forming a layer of amorphous vanadate perovskite precursor around a plurality of nanoscale, crystalline, perovskite oxide seeds and heating the layer of amorphous vanadate perovskite precursor at a temperature that favors lateral vanadate perovskite crystal growth from the perovskite oxide seeds over homogeneous crystal nucleation within the layer of amorphous vanadate perovskite precursor material. The crystallization processes can form the desired vanadate perovskite phase directly or via a transformation in a controlled gas environment from an initial crystallized vanadate perovskite phase that has a higher oxidation state.