Abstract:
Verfahren und Vorrichtung zum Aufbringen eines Beschichtungswerkstoffes (13) auf ausgewählte Zielbereiche einer Oberfläche eines Trägers (6), wobei die Oberfläche des Trägers (6) die zu beschichtenden Zielbereiche sowie beschichtungswerkstofffrei verbleibende Restbereiche umfasst. Hierbei wird erfindungsgemäß vorgeschlagen, dass eine Druckereinheit (3) für einen fließfähigen und aushärtbaren Trägerwerkstoff zur Anfertigung eines Trägers (6) und/oder einer Tragstruktur (16) auf dem Träger (6) vorgesehen ist, eine Maskierungseinheit (4) zum schichtweisen Aufbau einer Abdeckung (12) aus mehreren Schichten (S) eines Hilfswerkstoffes (9) auf den Restbereichen vorgesehen ist, sowie eine Beschichtungseinheit (5) zur Formung eines gegen die Oberfläche des Trägers (6) gerichteten und den Beschichtungswerkstoff (13) enthaltenden Partikelstromes (10), und eine Entfernungseinheit (15) zur Entfernung des Hilfswerkstoffes (9) unter Verbleib des Trägerwerkstoffes und des Beschichtungswerkstoffes (13), wobei eine Transporteinheit (8) für den Transport des Trägers (6) von der Druckereinheit (3) zur Maskierungseinheit (4), der Beschichtungseinheit (5) und der Entfernungseinheit (15) vorgesehen ist.
Abstract:
A method for fabricating at least one via or hole in a multi-layer printed circuit board comprises separately drilling the board layers (3A, 3B, 3C) stacking and laminating the drilled board layers, and then finish drilling the holes (7A, 7B, 7C). The invention also provides a method for correcting artwork to compensate for lamination distortion. Also described is a process for forming interconnection lines on a printed circuit board. The surface of a circuit board substrate (105) is covered with a photoresist layer (107), and the photoresist layer in turn is covered with a halide emulsion layer (109). The emulsion layer (109) is then exposed to a predetermined pattern of white light, and the image developed. The board is then exposed to UV light through the imaged emulsion layer.
Abstract:
A method for providing a conductive material structure on a carrier comprises the steps of applying (24) a photo sensitive material on the carrier, applying (28) a mask on the photo sensitive material, the mask defining a conductive material structure to be formed on the carrier, irradiating (32) the defined structure on the carrier in order to prepare for metallisation, and metalizing (36) the defined structure for forming the conductive material structure (13).
Abstract:
A methof for patterning a photoresist or insulating layer on a printed wiring board utilizes two photoreactive coatings comprising a photoprocessable ultraviolet (UV) sensitive layer overlaid with a thin, unexposed, undeveloped strip base silver film. A white light x-y plotter, preferably employing an octogonal aperture, is driven directly from a CAD system to expose the film on the board in the desired pattern without affecting the underlying UV sensitive layer. The film is then developed on the board and employed as an in situ mask for the underlying UV layer during exposure of the board to a UV flood lamp. After UV exposure the film is peeled off to allow conventional processing of the selectively polymerized layer. This technique produces high resolution, inspectable onboard masks in full registration using reliable low energy plotters.
Abstract:
An automated method for continuously patterning a tape with a plurality of different interconnection patterns, to which an integrated circuit may be bonded using tape automated bonding, including selectively exposing a portion of a photographic film layer (48) of the tape to computer-directed energy forming an integrated circuit interconnection pattern, and an identifying pattern, and developing the film (48) to provide an image of the interconnection pattern. A photoprocessable layer of the tape is then exposed through the film layer (48) to directed energy and processed in conjunction with a conductive layer (44) in order to provide conductors which correspond to the interconnection pattern being fabricated. Also disclosed is a method of high speed patterning of a tape. Further disclosed is a novel material and apparatus for generating TAB tape.
Abstract:
A CAD (10) driven photoplotter (12) selectively exposes a photographic imaging layer (26) without affecting the underlying UV sensitive resist (24) on a substrate (20) to make a printed wiring board, for example. The image layer (26) is developed on the board and used as an in situ mask (42) for the underlying UV resist (24) during exposure to UV (44). After UV exposure (44), the image layer (26) is peeled off to allow conventional processing of the resist (24). The in situ mask (42) is preferably applied in the form of a baseless, high contrast, high gamma emulsion layer (26) bonded to the protective cover sheet (1) over the uncured resist (24). To facilitate application, the emulsion layer (26) is carried by a release paper (2) which is removed before photoplotting. After UV exposure (44), the cover sheet (1) and emulsion layer (26) are integrally peeled from the resist (24).
Abstract:
The invention relates to a method and device for applying a cover material (13) to a selected target area of a support surface (6), wherein the support surface (6) comprises the target area which is to be covered and areas which remain free of the cover material. According to the invention, the device comprises a print unit (3) for a flowable and hardenable support material for producing a support (6) and/or a support structure (16) on the support (6), in addition to a masking unit (4) for producing a covering (12), layer by layer, consisting of a plurality of layers (S) of an auxiliary material (9) on the remaining areas, a cover unit (5) for forming a flow of particles (10) containing the cover material (13) and oriented counter to the support surface (6), a removal unit (15) for removing the auxiliary material (9) whilst leaving the support material and the cover material (13) and a transport unit (8) for transporting the support (6) from the print unit (3) to the masking unit (4), the coating unit (5) and the removal unit (15).
Abstract:
La technique décrite se rapporte à un support (38) entrant dans la fabrication d'un dispositif électronique, ledit support comprenant au moins un composant à protéger (21) et au moins un élément tridimensionnel (34, 35, 36) de hauteur au moins égale à la hauteur d'un composant électronique, ledit élément tridimensionnel étant disposé latéralement au regard dudit au moins un composant à protéger (21), Selon la technique décrite, ledit élément tridimensionnel (34, 35, 36) est principalement constitué d'un matériau d'assemblage permanent (51).