Abstract:
The present invention provides a carrier-attached copper foil, wherein an ultrathin copper foil is not peeled from the carrier prior to the lamination to an insulating substrate, but can be peeled from the carrier after the lamination to the insulating substrate. A carrier-attached copper foil comprising a copper foil carrier, an intermediate layer laminated on the copper foil carrier, and an ultrathin copper layer laminated on the intermediate layer, wherein the intermediate foil is configured with a Ni layer in contact with an interface of the copper foil carrier and a Cr layer in contact with an interface of the ultrathin copper layer, said Ni layer containing 1,000-40,000 µg/dm 2 of Ni and said Cr layer containing 10-100 µg/dm 2 of Cr is provided.
Abstract:
[Object] To provide a circuit board which has good long-term reliability. [Solution] A circuit board of the present invention includes a ceramic board and a metal plate on the ceramic board via a metal layer. The metal layer includes a first metal portion which is in contact with the ceramic board, a second metal portion which is in contact with the metal plate, and a third metal portion between the first metal portion and the second metal portion. A part of the first metal portion extends toward a direction of the second metal portion such that the part of the first metal portion penetrates the third metal portion, and spreads out in a lateral direction along the second metal portion.
Abstract:
The present invention provides a carrier-attached copper foil, wherein an ultrathin copper foil is not peeled from the carrier prior to the lamination to an insulating substrate, but can be peeled from the carrier after the lamination to the insulating substrate. A carrier-attached copper foil comprising a copper foil carrier, an intermediate layer laminated on the copper foil carrier, and an ultrathin copper layer laminated on the intermediate layer, wherein the intermediate foil is configured with a Ni layer in contact with an interface of the copper foil carrier and a Cr layer in contact with an interface of the ultrathin copper layer, said Ni layer containing 1,000-40,000 µg/dm 2 of Ni and said Cr layer containing 10-100 µg/dm 2 of Cr is provided.
Abstract:
The invention relates to a metal-contacted substrate (1), in which at least one surface of the substrate is entirely or partially provided with a metal contact (2, 3). For mechanical stabilisation, the metal contact is provided with a matrix material (5). The invention also relates to a method for producing such a substrate.
Abstract:
The invention provides processes for the manufacture of conductive transparent films and electronic or optoelectronic devices comprising same.
Abstract:
A bus bar system includes a non-conductive substrate having a major surface. At least one conductive bus bar is formed over at least a portion of the major surface. A conductive coating is formed over at least a portion of the bus bar and the major surface. An electrically conductive adhesive, such as an isotropically conductive tape or film, is applied over at least a portion of the film/bus bar junction. The system can optionally include a conductive metallic foil adhered to the isotropically conductive adhesive.
Abstract:
A conducting film or device electrode includes a substrate and two transparent or semitransparent conductive layers separated by a transparent or semitransparent intervening layer. The intervening layer includes electrically conductive pathways between the first and second conductive layers to help reduce interfacial reflections occurring between particular layers in devices incorporating the conducting film or electrode.