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公开(公告)号：US12032299B2
公开(公告)日：2024-07-09
申请号：US17784566
申请日：2020-12-03
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Igor Matheus Petronella Aarts , Kaustuve Bhattacharyya , Ralph Brinkhof , Leendert Jan Karssemeijer , Stefan Carolus Jacobus Antonius Keij , Haico Victor Kok , Simon Gijsbert Josephus Mathijssen , Henricus Johannes Lambertus Megens , Samee Ur Rehman
CPC classification number: G03F7/70633 , G03F7/706837 , G03F9/7034 , G03F9/7092
Abstract: A metrology method relating to measurement of a structure on a substrate, the structure being subject to one or more asymmetric deviation. The method includes obtaining at least one intensity asymmetry value relating to the one or more asymmetric deviations, wherein the at least one intensity asymmetry value includes a metric related to a difference or imbalance between the respective intensities or amplitudes of at least two diffraction orders of radiation diffracted by the structure; determining at least one phase offset value corresponding to the one or more asymmetric deviations based on the at least one intensity asymmetry value; and determining one or more measurement corrections for the one or more asymmetric deviations from the at least one phase offset value.
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公开(公告)号：US09423688B2
公开(公告)日：2016-08-23
申请号：US14301572
申请日：2014-06-11
Applicant: ASML Netherlands B.V.
Inventor： Haico Victor Kok
CPC classification number: G03F7/70141 , G03F7/0002 , G03F7/70258 , G03F7/70308 , G03F7/70358 , G03F7/70783
Abstract: A slit shaped area of a patterning device is illuminated to impart a radiation beam with a pattern in its cross-section. A projection system projects the patterned radiation beam onto a target portion of a substrate. As the radiation beam is scanned across the target portion of the substrate, a configuration of the projection system is adjusted and applies a pattern to the target portion. The adjusting may affect a magnitude of an image magnification component of the projection system, along the length of the slit shaped area, or an image distortion in a scan direction. The adjusting is arranged to compensate an effect on pattern overlay accuracy of a distortion of the patterning device.
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公开(公告)号：US20150286153A1
公开(公告)日：2015-10-08
申请号：US14436046
申请日：2013-09-10
Applicant: ASML Netherlands B.V.
Inventor： Haico Victor Kok , Robbert Jan Voogd
CPC classification number: G03F7/70775 , G01B11/0675 , G01B11/14 , G03F7/70483 , G03F7/70525 , G03F9/7046 , G03F9/7049 , G03F9/7092
Abstract: A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors
Abstract translation: 一种用于测量物理量的传感器系统，所述系统包括具有多个检测器的并行检测装置，以允许在不同空间位置处并行测量，其中所述多个检测器共享噪声源，其中所述传感器系统被配置为使得所述多个检测器 输出作为物理量的函数的信号，并且其中所述传感器系统被配置为使得至少一个检测器响应于来自所述共享噪声源的噪声而不同于所述一个或多个其它检测器
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公开(公告)号：US09690207B2
公开(公告)日：2017-06-27
申请号：US14436046
申请日：2013-09-10
Applicant: ASML Netherlands B.V.
Inventor： Haico Victor Kok , Robbert Jan Voogd
CPC classification number: G03F7/70775 , G01B11/0675 , G01B11/14 , G03F7/70483 , G03F7/70525 , G03F9/7046 , G03F9/7049 , G03F9/7092
Abstract: A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.
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公开(公告)号：US09331117B2
公开(公告)日：2016-05-03
申请号：US14439481
申请日：2013-10-09
Applicant: ASML Netherlands B.V.
Inventor： Stoyan Nihtianov , Haico Victor Kok , Martijn Gerard Dominique Wehrens
IPC: H01L21/00 , H01L27/146 , G03F7/20 , H01L31/028 , H01L31/0352 , H01L31/18
CPC classification number: H01L27/1464 , G03F7/70558 , G03F7/7085 , H01L27/14609 , H01L27/14643 , H01L27/14689 , H01L31/028 , H01L31/035281 , H01L31/1804
Abstract: A backside illuminated sensor comprising a supporting substrate, a semiconductor layer which comprises a photodiode comprising a region of n-doped semiconductor provided at a first surface of the semiconductor layer, and a region of p-doped semiconductor, wherein a depletion region is formed between the region of n-doped semiconductor and the region of p-doped semiconductor, and a layer of p-doping protective material provided on a second surface of the semiconductor layer, wherein the first surface of the semiconductor layer is fixed to a surface of the supporting substrate.
Abstract translation: 一种背面照明传感器，包括支撑衬底，半导体层，其包括光电二极管，所述光电二极管包括设置在所述半导体层的第一表面处的n掺杂半导体的区域，以及p掺杂半导体的区域， n掺杂半导体的区域和p掺杂半导体的区域，以及设置在半导体层的第二表面上的p掺杂保护材料层，其中半导体层的第一表面固定到 支撑衬底。
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Patent Agency Ranking
6.发明授权公开(公告)号：US10481507B2
公开(公告)日：2019-11-19
申请号：US16328750
申请日：2017-08-18
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Abstract: A method, including printing an apparatus mark onto a structure while the structure is at least partly within a lithographic apparatus. The structure may be part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. The method further includes measuring the apparatus mark using a sensor system within the apparatus.
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7.发明授权Lithographic method to apply a pattern to a substrate and lithographic apparatus 有权将图案应用于基板和光刻设备的平版印刷方法公开(公告)号：US08760620B2
公开(公告)日：2014-06-24
申请号：US13874917
申请日：2013-05-01
Applicant: ASML Netherlands B.V.
Inventor： Haico Victor Kok
CPC classification number: G03F7/70141 , G03F7/0002 , G03F7/70258 , G03F7/70308 , G03F7/70358 , G03F7/70783
Abstract: A slit shaped area of a patterning device is illuminated to impart a radiation beam with a pattern in its cross-section. A projection system projects the patterned radiation beam onto a target portion of a substrate. As the radiation beam is scanned across the target portion of the substrate, a configuration of the projection system is adjusted and applies a pattern to the target portion. The adjusting may affect a magnitude of an image magnification component of the projection system, along the length of the slit shaped area, or an image distortion in a scan direction. The adjusting is arranged to compensate an effect on pattern overlay accuracy of a distortion of the patterning device.
Abstract translation: 照亮图案形成装置的狭缝形区域以在其横截面上赋予具有图案的辐射束。 投影系统将图案化的辐射束投射到基板的目标部分上。 当辐射束被扫描穿过基板的目标部分时，调整投影系统的配置并将图案应用于目标部分。 调整可以沿着狭缝形状区域的长度或扫描方向上的图像失真影响投影系统的图像放大分量的大小。 该调整被布置为补偿对图案形成装置的变形的图案重叠精度的影响。
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公开(公告)号：US11022902B2
公开(公告)日：2021-06-01
申请号：US16623647
申请日：2018-05-14
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey Den Boef , Patricius Aloysius Jacobus Tinnemans , Haico Victor Kok , William Peter Van Drent , Sebastianus Adrianus Goorden
Abstract: The invention relates to a sensor comprising: a radiation source to emit radiation having a coherence length towards a sensor target; and a polarizing beam splitter to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.
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公开(公告)号：US09971254B2
公开(公告)日：2018-05-15
申请号：US15694519
申请日：2017-09-01
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert-Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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公开(公告)号：US09864282B2
公开(公告)日：2018-01-09
申请号：US15486077
申请日：2017-04-12
Applicant: ASML Netherlands B.V.
Inventor： Haico Victor Kok , Robbert Jan Voogd
CPC classification number: G03F7/70775 , G01B11/0675 , G01B11/14 , G03F7/70483 , G03F7/70525 , G03F9/7046 , G03F9/7049 , G03F9/7092
Abstract: A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.
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