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    Robust Electrode With Septum Rod For Biased X-Ray Tube Cathode
    1.
    发明申请
    Robust Electrode With Septum Rod For Biased X-Ray Tube Cathode 审中-公开

    公开(公告)号：US20170250051A1

    公开(公告)日：2017-08-31

    申请号：US15056479

    申请日：2016-02-29

    Applicant: General Electric Company

    Inventor： Sergio Lamaitre

    IPC: H01J35/14 ,  H01J3/18 ,  H01J35/06

    CPC classification number: H01J3/18 ,  H01J3/027 ,  H01J35/06 ,  H01J35/32

    Abstract: In the present invention, a cathode assembly for an X-ray tube is provided including a cathode cup, a pair of emitters disposed within the cup and each configured to emit an electron beam therefrom and an electrode spaced from the pair of emitters and configured to affect the shape and/or intensity of the electron beams emitted by the pair of emitters. The electrode includes a rod extending across a central aperture defined within the electrode that enables the electrode to grid or focus the electron beam or beams emitted from the emitters using a bias voltage between +10 kV and −10 kV.

    Electrostatic lens and charged particle beam apparatus using the same
    3.
    发明授权
    Electrostatic lens and charged particle beam apparatus using the same 有权
    静电透镜及使用其的带电粒子束装置

    公开(公告)号：US09117625B2

    公开(公告)日：2015-08-25

    申请号：US14348559

    申请日：2012-09-27

    Applicant: KYOCERA Corporation

    Inventor： Yukio Noguchi

    IPC: G21K5/04 ,  H01J37/12 ,  H01J37/28 ,  H01J37/317 ,  H01J3/18 ,  H01J37/30 ,  B82Y10/00 ,  B82Y40/00

    CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/1205

    Abstract: To provide an electrostatic lens which improves an irradiation accuracy of an electron beam while satisfying the need for higher throughput. An electrostatic lens according to one embodiment of the present invention includes a substrate which includes an insulating plate in which a plurality of first through holes that allow an electron beam to pass through are formed, a plurality of electrodes that are formed on an inner wall of the plurality of first through holes, and a plurality of wirings that are formed on the insulating plate and are electrically connected to each of the electrodes, wherein the plurality of electrodes are electrically independent from each other.

    Abstract translation: 提供一种提高电子束的照射精度的静电透镜，同时满足更高的生产量。 根据本发明的一个实施例的静电透镜包括：基板，其包括绝缘板，其中形成有允许电子束穿过的多个第一通孔;多个电极，其形成在 多个第一通孔和多个布线，其形成在绝缘板上并与每个电极电连接，其中多个电极彼此电独立。

    Electrode of electrostatic lens and method of manufacturing the same
    4.
    发明授权
    Electrode of electrostatic lens and method of manufacturing the same 有权
    静电透镜电极及其制造方法

    公开(公告)号：US08963099B2

    公开(公告)日：2015-02-24

    申请号：US13862728

    申请日：2013-04-15

    Applicant: Canon Kabushiki Kaisha

    Inventor： Shuji Yamada

    IPC: H01J1/02 ,  H01J3/18 ,  H01J37/317 ,  H01J9/02 ,  H01J37/12 ,  H01J1/46 ,  H01J3/02 ,  H01J9/14

    CPC classification number: H01J1/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/46 ,  H01J3/027 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205

    Abstract: An electrode to be used for an electrostatic lens, wherein the electrode at least includes: a first substrate having a first through-hole and a second substrate having a second through-hole; the first substrate having a thickness smaller than the second substrate; the first through-hole having a diameter smaller than the second through-hole; the second substrate having a specific resistance smaller than the first substrate, wherein the first substrate and the second substrate are superimposed so that the first through-hole and the second through-hole are aligned relative to each other. Notching taking place near any of the through-holes in a dry etching process can be reduced, and thus, the through-holes can be formed accurately.

    Abstract translation: 一种用于静电透镜的电极，其中所述电极至少包括：具有第一通孔的第一基板和具有第二通孔的第二基板; 所述第一基板的厚度小于所述第二基板; 所述第一通孔的直径小于所述第二通孔; 所述第二基板具有小于所述第一基板的电阻率，其中所述第一基板和所述第二基板重叠，使得所述第一通孔和所述第二通孔相对于彼此对准。 可以减少在干蚀刻工艺中的任何通孔附近发生的凹陷，因此可以精确地形成通孔。

    Electrostatic lens array
    5.
    发明授权
    Electrostatic lens array 失效
    静电透镜阵列

    公开(公告)号：US08748842B2

    公开(公告)日：2014-06-10

    申请号：US13915834

    申请日：2013-06-12

    Applicant: Canon Kabushiki Kaisha

    Inventor： Yasuo Ohashi

    IPC: G21K1/08

    CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/027 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205 ,  H01J2237/28

    Abstract: Provided is an electrostatic lens array, including multiple substrates arranged with intervals, each of the multiple substrates having an aperture for passing a charged particle beam, in which: in a travelling direction of the charged particle beam, a peripheral contour line formed by any one of surfaces of the multiple substrates other than an upper surface of a most upstream substrate and a lower surface of a most downstream substrate has a protruding portion protruding from a peripheral contour line of one of the upper surface of the most upstream substrate and the lower surface of the most downstream substrate; and a position of the protruding portion is defined by a position regulating member, whereby parallelism is adjustable so that a surface including the protruding portion is parallel to a surface to be irradiated with the charged particle beam after passing through the aperture.

    Abstract translation: 本发明提供一种静电透镜阵列，其包括间隔布置的多个基板，所述多个基板中的每一个具有用于使带电粒子束通过的孔，其中：在带电粒子束的行进方向上，由任何一个形成的周边轮廓线 多个基板的除了最上游基板的上表面和最下游基板的下表面以外的多个基板的表面具有从最上游基板的上表面和下游表面的上表面的周边轮廓线突出的突出部 的最下游底物; 并且突出部的位置由位置限制构件限定，由此平行度是可调节的，使得包括突出部分的表面平行于穿过孔之后被带电粒子束照射的表面。

    ELECTRODE OF ELECTROSTATIC LENS AND METHOD OF MANUFACTURING THE SAME
    6.
    发明申请
    ELECTRODE OF ELECTROSTATIC LENS AND METHOD OF MANUFACTURING THE SAME 有权
    静电镜片的电极及其制造方法

    公开(公告)号：US20130306878A1

    公开(公告)日：2013-11-21

    申请号：US13862728

    申请日：2013-04-15

    Applicant: CANON KABUSHIKI KAISHA

    Inventor： Shuji Yamada

    IPC: H01J1/02 ,  H01J37/317 ,  H01J9/02 ,  H01J3/18

    CPC classification number: H01J1/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/46 ,  H01J3/027 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205

    Abstract: An electrode to be used for an electrostatic lens, wherein the electrode at least includes: a first substrate having a first through-hole and a second substrate having a second through-hole; the first substrate having a thickness smaller than the second substrate; the first through-hole having a diameter smaller than the second through-hole; the second substrate having a specific resistance smaller than the first substrate, wherein the first substrate and the second substrate are superimposed so that the first through-hole and the second through-hole are aligned relative to each other. Notching taking place near any of the through-holes in a dry etching process can be reduced, and thus, the through-holes can be formed accurately.

    Abstract translation: 一种用于静电透镜的电极，其中所述电极至少包括：具有第一通孔的第一基板和具有第二通孔的第二基板; 所述第一基板的厚度小于所述第二基板; 所述第一通孔的直径小于所述第二通孔; 所述第二基板具有小于所述第一基板的电阻率，其中所述第一基板和所述第二基板重叠，使得所述第一通孔和所述第二通孔相对于彼此对准。 可以减少在干蚀刻工艺中的任何通孔附近发生的凹陷，因此可以精确地形成通孔。

    Multiple Device Shaping Uniform Distribution of Current Density in Electro-Static Focusing Systems
    7.
    发明申请
    Multiple Device Shaping Uniform Distribution of Current Density in Electro-Static Focusing Systems 有权
    多器件形成电静态聚焦系统中电流密度的均匀分布

    公开(公告)号：US20100277053A1

    公开(公告)日：2010-11-04

    申请号：US12769393

    申请日：2010-04-28

    Applicant: Artush A. Abgaryan ,  Eli Levi

    Inventor： Artush A. Abgaryan ,  Eli Levi

    IPC: H01J29/46

    CPC classification number: H01J29/62 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J35/14 ,  H01J37/063 ,  H01J37/065 ,  H01J37/3174 ,  H01J2237/0492 ,  H01J2237/0656 ,  H01J2237/28

    Abstract: System that focuses electron beams in an electro-static area to a laminar flow of electrons with uniform distribution of current density and extraordinary demagnification includes a body that defines a boundary for an electric field, a field-forming cathode electrode system, a focusing electrode system, and at least one anode electrode system in the electro-static section and a second electric field-free section including an adjustable screen system arranged in an interior of the body. The field-forming near-cathode electrode system includes a cathode electrically connected to a flat part and a curvilinear part electrically connected to a cylindrical part. The anode electrode system includes an opening part, an anode electrically connected to a flat part and a curvilinear part electrically connected to a cylindrical part which is similar or identical to and symmetrical with the cathode electrode system. The system parameters are calculated and created due to the CGMR conceptual method.

    Abstract translation: 将静电区域中的电子束聚焦到具有均匀分布的电流密度和非常缩小的电子层流的系统包括限定电场边界的体，场形成阴极电极系统，聚焦电极系统 以及电静电部分中的至少一个阳极电极系统和包括布置在主体内部的可调节屏幕系统的第二无电场部分。 场形成阴极电极系统包括电连接到平坦部分的阴极和与圆筒部分电连接的曲线部分。 阳极电极系统包括开口部分，电连接到平坦部分的阳极和电连接到与阴极电极系统相似或相似的圆柱形部分的曲线部分。 由于CGMR的概念方法，系统参数被计算和创建。

    Emitter device with focusing columns
    10.
    发明申请
    Emitter device with focusing columns 有权
    具有聚焦柱的发射器装置

    公开(公告)号：US20040065843A1

    公开(公告)日：2004-04-08

    申请号：US10264599

    申请日：2002-10-03

    Inventor： David Schut ,  Alexander Govyadinov ,  Xioofeng Yang

    IPC: H01J003/06 ,  H01J003/14

    CPC classification number: H01J3/02 ,  H01J3/022 ,  H01J3/18 ,  H01J29/481 ,  H01J29/62 ,  H01J2237/3175

    Abstract: An emitter device including a focusing array with plural focusing columns to focus emissions from one or more emitters onto a target medium. Relative movement between the target medium and the focused emissions allows each focusing column to focus emissions over an area of the target medium encompassing the movement range. In a preferred embodiment, separate emitter, focusing array and target medium substrates are used. The focusing array may be moveable, or in a particularly preferred embodiment, is affixed to the emitter substrate, in which case the target medium substrate is movable or the focusing array includes beam direction control.

    Abstract translation: 一种发射器件，其包括具有多个聚焦列的聚焦阵列，以将来自一个或多个发射器的发射聚焦到目标介质上。 目标介质和聚焦放射体之间的相对移动允许每个聚焦列聚焦在包围移动范围的目标介质的区域上。 在优选实施例中，使用单独的发射器，聚焦阵列和靶介质衬底。 聚焦阵列可以是可移动的，或者在特别优选的实施例中，固定到发射器基板，在这种情况下，目标介质基板是可移动的或聚焦阵列包括光束方向控制。

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