公开(公告)号：US20080086586A1

公开(公告)日：2008-04-10

申请号：US11866641

申请日：2007-10-03

申请人： Tomoya Ogawa ,  Tomohiro Suzuki ,  Yuji Tamura ,  Tetsuya Ishikawa ,  Hiroyasu Nishimura ,  Fumikage Uchida ,  Nao Moromizato ,  Munetoshi Eguchi ,  Kenji Okuyama

发明人： Tomoya Ogawa ,  Tomohiro Suzuki ,  Yuji Tamura ,  Tetsuya Ishikawa ,  Hiroyasu Nishimura ,  Fumikage Uchida ,  Nao Moromizato ,  Munetoshi Eguchi ,  Kenji Okuyama

IPC分类号： G06F12/16

CPC分类号： G06F11/1441

摘要： An information processing apparatus including: a nonvolatile memory; a volatile system memory in which predetermined data stored in the nonvolatile memory is developed; a control section to save the predetermined data stored in the system memory in the nonvolatile memory when a start of power-off operation is detected; and a storage section that stores a first timing information representing a time point of terminating the operation of saving the predetermined data in the nonvolatile memory, and a second timing information representing a power-off time point, wherein the control section compares the first timing information stored in the storage section with the second timing information, subsequent to the next operation of turning on of the power.

摘要翻译： 一种信息处理设备，包括：非易失性存储器; 其中开发存储在非易失性存储器中的预定数据的易失性系统存储器; 控制部分，当检测到电源关闭操作开始时，将存储在系统存储器中的预定数据保存在非易失性存储器中; 以及存储部，其存储表示将所述预定数据保存在所述非易失性存储器中的操作的终止的时刻的第一定时信息和表示断电时间点的第二定时信息，所述控制部将所述第一定时信息 存储在具有第二定时信息的存储部分中，在接通电源的下一个操作之后。

公开(公告)号：US20080085555A1

公开(公告)日：2008-04-10

申请号：US11885112

申请日：2006-02-22

申请人： Takayuki Asahara ,  Tetsuya Ishikawa

发明人： Takayuki Asahara ,  Tetsuya Ishikawa

IPC分类号： C12N5/06

CPC分类号： C12N5/0647 ,  C12N5/0692 ,  C12N2500/36 ,  C12N2500/90 ,  C12N2501/23

摘要： The present invention provides a method of efficiently expanding non-adhesive adult stem cells in vitro. More specifically, the present invention provides a method of expanding non-adhesive adult stem cells, comprising culturing non-adhesive adult stem cells in the co-presence of adhesive feeder cells and non-adhesive non-stem cells in serum-free medium, wherein the ratio of non-adhesive adult stem cell count to total cell count in the medium is kept low; non-adhesive adult stem cells obtained by the expansion method and differentiated cells thereof, and a composition comprising them; and a serum-free medium comprising a specified factor, and a kit for its preparation and the like.

摘要翻译： 本发明提供了一种在体外有效扩张非粘性成体干细胞的方法。 更具体地，本发明提供了扩展非粘性成体干细胞的方法，包括在无血清培养基中的粘合剂喂养细胞和非粘性非干细胞的共存下培养非粘性成体干细胞，其中 培养基中非粘性成体干细胞计数与总细胞计数的比例保持不变; 通过膨胀法和分化细胞获得的非粘性成体干细胞及其组成; 和包含特定因子的无血清培养基，以及用于其制备的试剂盒等。

公开(公告)号：US20080050679A1

公开(公告)日：2008-02-28

申请号：US11678034

申请日：2007-02-22

申请人： Mohsen Salek ,  Tetsuya Ishikawa ,  Christoper Beaudry ,  Steven Verhaverbeke ,  Helen Armer ,  Harald Herchen ,  Leon Volfovsky

发明人： Mohsen Salek ,  Tetsuya Ishikawa ,  Christoper Beaudry ,  Steven Verhaverbeke ,  Helen Armer ,  Harald Herchen ,  Leon Volfovsky

IPC分类号： G03C5/29 ,  G03B27/58

CPC分类号： G03B27/58 ,  G03F7/70341

摘要： A method of processing a substrate includes forming a coating layer over a front surface of the substrate and exposing the coating layer in an immersion scanner. The coating layer may include a photoresist layer. The method also includes performing one or more immersion processes on the substrate after exposure. As an example, the one or more immersion processes include an immersion post-exposure bake process.

摘要翻译： 一种处理衬底的方法包括在衬底的前表面上形成涂层，并在浸没式扫描仪中曝光该涂层。 涂层可以包括光致抗蚀剂层。 该方法还包括在曝光之后在衬底上执行一个或多个浸渍处理。 作为示例，一个或多个浸渍处理包括浸渍曝光后烘烤处理。

公开(公告)号：US20080023143A1

公开(公告)日：2008-01-31

申请号：US11881801

申请日：2007-07-27

申请人： Daniel Hoffman ,  Matthew Miller ,  Jang Yang ,  Heeyeop Chae ,  Michael Barnes ,  Tetsuya Ishikawa ,  Yan Ye

发明人： Daniel Hoffman ,  Matthew Miller ,  Jang Yang ,  Heeyeop Chae ,  Michael Barnes ,  Tetsuya Ishikawa ,  Yan Ye

IPC分类号： H01L21/3065 ,  H01L21/285

CPC分类号： H01J37/32091 ,  H01J37/3244 ,  H01J37/32623 ,  H01J37/3266

摘要： A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry.

摘要翻译： 等离子体反应器包括真空外壳，其包括限定真空室的侧壁和顶板，以及腔室内的工件支撑件，并面向天花板以支撑平面工件，工件支撑件和天花板一起限定了工件之间的加工区域 支持和天花板。 工艺气体入口将工艺气体提供到腔室中。 等离子体源功率电极连接到RF功率发生器，用于将等离子体源功率电容耦合到腔室中，以在腔室内维持等离子体。 反应器还包括至少第一架空螺线管电磁体，靠近天花板，架空螺线管电磁体，天花板，侧壁和工件支撑件沿着共同的对称轴线定位。

公开(公告)号：US20070201781A1

公开(公告)日：2007-08-30

申请号：US11512298

申请日：2006-08-30

申请人： Ken Adachi ,  Youichi Tsuzaki ,  Masaru Deguchi ,  Tetsuya Ishikawa

发明人： Ken Adachi ,  Youichi Tsuzaki ,  Masaru Deguchi ,  Tetsuya Ishikawa

IPC分类号： F16C33/76

CPC分类号： F16J15/3456 ,  B60B27/00 ,  F16C19/386 ,  F16C33/7886 ,  F16C33/7896 ,  F16C2326/02

摘要： A rolling bearing assembly includes: an outer ring member; an inner ring member; a hub wheel formed with a flange at one axial end thereof; and a seal member for sealing a space between one axial end of the outer ring member and an inside surface of the flange, which axially opposes the one end of the outer ring member. The seal member includes: a cylindrical core fitted on the one axial end of the outer ring member and axially extended from the one end toward the flange; and an annular lip portion secured to the core and formed from an elastic material as axially extended from the core to the inside surface of the flange.

摘要翻译： 滚动轴承组件包括：外圈构件; 内圈构件; 在其一个轴向端部形成有凸缘的轮毂轮; 以及密封构件，用于密封外圈构件的一个轴向端部与轴向相对于外圈构件的一端的凸缘的内表面之间的空间。 密封构件包括：安装在外圈构件的一个轴向端部并且从一端朝向凸缘轴向延伸的圆柱形芯; 以及固定到所述芯部并由弹性材料形成的环形唇部，所述弹性材料从所述芯部到所述凸缘的内表面轴向延伸。

公开(公告)号：US20070029046A1

公开(公告)日：2007-02-08

申请号：US11196850

申请日：2005-08-04

申请人： Shijian Li ,  Siqing Lu ,  Irene Chou ,  Young Lee ,  Tetsuya Ishikawa

发明人： Shijian Li ,  Siqing Lu ,  Irene Chou ,  Young Lee ,  Tetsuya Ishikawa

IPC分类号： C23F1/00 ,  H01L21/20 ,  C23C16/00

CPC分类号： C23C16/4581 ,  C23C16/505 ,  H01J37/321 ,  H01J37/32706 ,  H01J2237/2001 ,  H01J2237/3321 ,  H01L21/67069 ,  H01L21/67248 ,  H01L21/68742 ,  H01L21/6875 ,  H01L21/68757

摘要： A substrate processing system is provided. A housing defines a processing chamber. A plasma-generating system is operatively coupled to the processing chamber. A substrate support member is disposed within the processing chamber and configured to hold a substrate during substrate processing. A ceramic insert is disposed over the substrate support member such that the ceramic insert is disposed between the substrate support member and the substrate during substrate processing. A gas-delivery system is configured to introduce gases into the processing chamber. A controller controls the plasma-generating system and the gas-delivery system.

摘要翻译： 提供了基板处理系统。 壳体限定处理室。 等离子体产生系统可操作地耦合到处理室。 衬底支撑构件设置在处理室内并且构造成在衬底处理期间保持衬底。 陶瓷插入件设置在衬底支撑构件上方，使得陶瓷插入件在衬底处理期间设置在衬底支撑构件和衬底之间。 气体输送系统构造成将气体引入处理室。 控制器控制等离子体产生系统和气体输送系统。

公开(公告)号：US20060286300A1

公开(公告)日：2006-12-21

申请号：US11458667

申请日：2006-07-19

申请人： Tetsuya Ishikawa ,  Rick Roberts ,  Helen Armer ,  Leon Volfovski ,  Jay Pinson ,  Michael Rice ,  David Quach ,  Mohsen Salek ,  Robert Lowrance ,  William Weaver ,  Charles Carlson ,  Chongyang Wang ,  Jeffrey Hudgens ,  Harald Herchen ,  Brian Lue ,  John Backer

发明人： Tetsuya Ishikawa ,  Rick Roberts ,  Helen Armer ,  Leon Volfovski ,  Jay Pinson ,  Michael Rice ,  David Quach ,  Mohsen Salek ,  Robert Lowrance ,  William Weaver ,  Charles Carlson ,  Chongyang Wang ,  Jeffrey Hudgens ,  Harald Herchen ,  Brian Lue ,  John Backer

IPC分类号： B05D1/40 ,  H01L21/677

CPC分类号： H01L21/67225 ,  G03B27/32 ,  G03D13/006 ,  G03F7/40 ,  G05B19/41825 ,  G05B2219/40476 ,  G05B2219/45031 ,  G05B2219/49137 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67754 ,  H01L21/6831 ,  H01L21/6838 ,  H01L21/68707 ,  H01L22/26 ,  Y02P90/087 ,  Y10S414/135 ,  Y10S414/136 ,  Y10T29/53187 ,  Y10T29/5323

摘要： Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, which is then removed in a developing process completed in the cluster tool. In track lithography type cluster tools, since the chamber processing times tend to be rather short, and the number of processing steps required to complete a typical track system process is large, a significant portion of the time it takes to process a substrate is taken up by the processes of transferring the substrates in a cluster tool between the various processing chambers. In one embodiment of the cluster tool, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. In one aspect of the invention, the substrate processing sequence and cluster tool are designed so that the substrate transferring steps performed during the processing sequence are only made to chambers that will perform the next processing step in the processing sequence. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

公开(公告)号：US20060282466A1

公开(公告)日：2006-12-14

申请号：US11254865

申请日：2005-10-21

申请人： Masayuki Yasukaga ,  Tomohiro Suzuki ,  Yuji Tamura ,  Tetsuya Ishikawa ,  Hiroyasu Nishimura ,  Tomoya Ogawa ,  Fumikage Uchida ,  Nao Moromizato ,  Munetoshi Eguchi

发明人： Masayuki Yasukaga ,  Tomohiro Suzuki ,  Yuji Tamura ,  Tetsuya Ishikawa ,  Hiroyasu Nishimura ,  Tomoya Ogawa ,  Fumikage Uchida ,  Nao Moromizato ,  Munetoshi Eguchi

IPC分类号： G06F7/00

CPC分类号： H04N1/32101 ,  G06F21/606 ,  G06F21/608 ,  G06F21/6218 ,  H04N2201/0039 ,  H04N2201/0094 ,  H04N2201/3205 ,  H04N2201/3221 ,  H04N2201/3226 ,  H04N2201/3254 ,  H04N2201/3274 ,  Y10S707/99945 ,  Y10S707/99948

摘要： An image processing apparatus comprises an input section which inputs a user identification information; and a registration section which registers an image data in association with the user identification information.

公开(公告)号：US20060241813A1

公开(公告)日：2006-10-26

申请号：US11338323

申请日：2006-01-23

申请人： Venkatesh Babu ,  Russell Kaplan ,  Tetsuya Ishikawa

发明人： Venkatesh Babu ,  Russell Kaplan ,  Tetsuya Ishikawa

IPC分类号： G05B19/04

CPC分类号： G05B19/41825 ,  G03B27/32 ,  G03D13/006 ,  G03F7/40 ,  G05B2219/40476 ,  G05B2219/45031 ,  G05B2219/49137 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67754 ,  H01L21/6831 ,  H01L21/6838 ,  H01L21/68707 ,  H01L22/26 ,  Y02P90/087

摘要： The present invention relates to apparatus and method of collision avoidance in a cluster tool having a plurality of processing stations and at least two robots. In one embodiment of the invention, the system is configured such that each of the processing stations is accessible by only one of the at least two robots. For each of the at least two robots, a set of trajectories is determined so that each robot is capable of transferring substrates among the corresponding processing stations, wherein the envelope formed by the set of trajectories of each robot does not overlap.

摘要翻译： 本发明涉及具有多个处理站和至少两个机器人的群集工具中的防碰撞装置和方法。 在本发明的一个实施例中，系统被配置为使得每个处理站仅由至少两个机器人中的一个可访问。 对于至少两个机器人中的每一个，确定一组轨迹，使得每个机器人能够在相应的处理站之间传送基板，其中由每个机器人的一组轨迹形成的包络不重叠。

公开(公告)号：US06929700B2

公开(公告)日：2005-08-16

申请号：US10397678

申请日：2003-03-25

申请人： Zhengquan Tan ,  Dongqing Li ,  Walter Zygmunt ,  Tetsuya Ishikawa

发明人： Zhengquan Tan ,  Dongqing Li ,  Walter Zygmunt ,  Tetsuya Ishikawa

IPC分类号： C23C16/40 ,  H01L21/316 ,  H01L21/762 ,  H01L21/768 ,  C23C16/00

CPC分类号： H01L21/02164 ,  C23C16/401 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/31612 ,  H01L21/76229 ,  H01L21/76837

摘要： A substrate processing apparatus comprising a substrate processing chamber, a gas distribution system operatively coupled to the chamber, a high density plasma power source, a controller operatively coupled to the gas distribution system and the high density plasma power source and a memory coupled to the controller. The memory includes computer instructions embodied in a computer-readable format. The computer instructions comprise (i) instructions that control the gas distribution system to flow a process gas comprising a silane gas, an oxygen-containing source, an inert gas and a hydrogen-containing source that is either molecular hydrogen or a hydride gas that does not include silicon, boron or phosphorus and (ii) instructions that control the high density plasma source to form a plasma having an ion density of at least 1×1011 ions/cm3 from the process gas to deposit the silicon oxide layer over the substrate.

摘要翻译： 一种衬底处理设备，包括衬底处理室，可操作地耦合到腔室的气体分配系统，高密度等离子体电源，可操作地耦合到气体分配系统和高密度等离子体电源的控制器以及耦合到控制器的存储器 。 存储器包括以计算机可读格式体现的计算机指令。 计算机指令包括（i）控制气体分配系统以使包含硅烷气体，含氧源，惰性气体和含氢源（其为分子氢或氢化物气体）的工艺气体流动的指令 不包括硅，硼或磷和（ii）控制高密度等离子体源以形成离子密度为至少1×10 11个/ cm 3的等离子体的说明书 从工艺气体将氧化硅层沉积在衬底上。