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公开(公告)号:US09835944B2
公开(公告)日:2017-12-05
申请号:US14651193
申请日:2014-12-10
Applicant: GOO CHEMICAL CO., LTD.
Inventor: Yoshio Sakai , Nobuhito Hamada , Michiya Higuchi , Tokuzan Miyake
CPC classification number: G03F7/031 , G03F7/0042 , G03F7/0043 , G03F7/029 , G03F7/038 , G03F7/0385 , G03F7/0388 , G03F7/20 , G03F7/2006 , G03F7/26 , G03F7/322 , H05K1/02 , H05K1/0274 , H05K1/0353 , H05K3/282 , H05K3/287 , H05K3/3452 , H05K2201/0166 , H05K2201/068
Abstract: A liquid solder resist composition contains a carboxyl group-containing resin, a photopolymerizable compound containing at least one compound selected from a group consisting of a photopolymerizable monomer and a photopolymerizable prepolymer, a photopolymerization initiator, and a titanium dioxide. The photopolymerization initiator contains a bisacylphosphine oxide-based photopolymerization initiator, a first α-hydroxyalkyl phenone-based photopolymerization initiator that is a liquid at 25° C., and a second α-hydroxyalkyl phenone-based photopolymerization initiator that is a solid at 25° C.
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公开(公告)号:US20170336708A1
公开(公告)日:2017-11-23
申请号:US15532978
申请日:2015-08-17
Applicant: GOO CHEMICAL CO., LTD.
Inventor: Yoshio Sakai , Michiya Higuchi
IPC: G03F7/031 , H05K3/28 , H05K1/03 , G03F7/004 , G03F7/038 , G03F7/20 , G03F7/029 , G03F7/32 , H05K1/02
CPC classification number: G03F7/031 , G03F7/0042 , G03F7/0043 , G03F7/029 , G03F7/038 , G03F7/0385 , G03F7/0388 , G03F7/20 , G03F7/2006 , G03F7/26 , G03F7/322 , H05K1/02 , H05K1/0274 , H05K1/0353 , H05K3/282 , H05K3/287 , H05K3/3452 , H05K2201/0166 , H05K2201/068
Abstract: A solder resist composition includes: (A) a carboxyl group-containing resin; (B) an epoxy compound; (C) titanium dioxide; (D) a photopolymerization initiator; and (E) an antioxidant. The component (B) contains a hydroquinone epoxy compound represented by following formula (1). The component (D) contains (D1) a bisacylphosphine oxide-based photopolymerization initiator and (D2) an α-hydroxy alkylphenone-based photopolymerization initiator.
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公开(公告)号:US20170303396A1
公开(公告)日:2017-10-19
申请号:US15487560
申请日:2017-04-14
Applicant: IBIDEN CO., LTD.
Inventor: Hiroyuki Nishioka , Shinsuke Ishikawa
IPC: H05K1/11 , H05K3/28 , H05K3/00 , H05K1/03 , G03F7/40 , G03F7/038 , G03F7/031 , G03F7/16 , G03F7/09 , G03F7/039 , G03F7/20 , G03F7/32
CPC classification number: H05K1/113 , G03F7/028 , G03F7/031 , G03F7/038 , G03F7/039 , G03F7/094 , G03F7/095 , G03F7/16 , G03F7/168 , G03F7/2004 , G03F7/32 , G03F7/40 , H05K1/0313 , H05K1/111 , H05K1/112 , H05K3/0055 , H05K3/282 , H05K3/287 , H05K3/3452 , H05K2201/0195 , H05K2201/0269 , H05K2203/0776
Abstract: A printed wiring board includes a laminated base material including an insulating layer and a conductor layer formed on the insulating layer, and a solder resist layer laminated on the laminated material and including photosensitive resin. The resist layer has surface portion and portion in contact with the laminated material, the conductor layer has pattern including conductor pads in contact with the resist layer such that the pads are positioned in openings in the resist layer, and the resist layer satisfies a first condition that a chemical species derived from a photopolymerization initiator has concentration higher in the portion in contact with the laminated material than concentration in the surface portion and/or a second condition that the chemical species derived from the initiator in the portion in contact with the laminated material has photopolymerization initiating ability higher than a chemical species derived from a photopolymerization initiator in the surface portion.
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公开(公告)号:US09760219B2
公开(公告)日:2017-09-12
申请号:US14499633
申请日:2014-09-29
Applicant: FUJIFILM Corporation
Inventor: Shinichi Yoshinari , Hitoshi Namikawa
CPC classification number: G06F3/044 , C07D251/24 , G03F7/027 , G03F7/031 , G03F7/105 , G03F7/2024 , G03F7/40 , G06F1/1692
Abstract: A black resin film is produced by applying a photosensitive resin composition containing a black pigment, an alkali-soluble polymer compound, an ethylenic unsaturated bond-containing compound and α-aminoalkylphenone or α-hydroxyalkylphenone as a photopolymerization initiator, to a substrate; and subjecting the composition to exposure, development and post-exposure. The post-exposure is performed from both side with 1,300 mJ/cm2 or more in terms of i line.
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95.
公开(公告)号:US09760060B2
公开(公告)日:2017-09-12
申请号:US14826324
申请日:2015-08-14
Applicant: Covestro Deutschland AG
Inventor: Horst Berneth , Thomas Roelle , Friedrich-Karl Bruder , Thomas Fäcke , Marc-Stephan Weiser , Dennis Hönel
IPC: G03H1/02 , G03F7/035 , G03F7/031 , G11B7/24044 , C09B11/12 , C09B17/00 , C09B21/00 , C09B23/08 , C09B55/00 , C09B57/00 , C09B69/06 , G03F7/004 , C09B23/04 , C09B23/06 , C09B23/10 , C09B23/16 , G11B7/245 , C09B49/12 , G03C1/00 , G03H1/00
CPC classification number: G03H1/024 , C09B11/12 , C09B17/00 , C09B21/00 , C09B23/04 , C09B23/06 , C09B23/083 , C09B23/105 , C09B23/166 , C09B49/12 , C09B55/009 , C09B57/00 , C09B69/06 , C09B69/065 , G03C1/00 , G03F7/0045 , G03F7/035 , G03H1/00 , G03H2260/12 , G03H2260/14 , G11B7/24044 , G11B7/245
Abstract: The invention relates to a photopolymer formulation comprising a polyol component, a polyisocyanate component, a writing monomer, and a photoinitiator, containing a coinitiator and a dye having the formula F An, where F stands for a cationic dye and An″ stands for an anion, wherein the dye having the formula F An comprises a water absorption of =5%. The invention further relates to a holographic medium, in particular in the form of a film, containing a photopolymer formulation according to the invention, to the use of such a medium for recording holograms, and to a special dye that can be used in the photopolymer formulation according to the invention.
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96.
公开(公告)号:US09753368B2
公开(公告)日:2017-09-05
申请号:US15270044
申请日:2016-09-20
Applicant: SAMSUNG SDI CO., LTD.
Inventor: Sohyun Kim , Jaeyoung Kwon , Sundae Kim , Jieun Kim , Kwangwon Seo , Seungjib Choi , Eunjeong Choi , Gyuseok Han
IPC: G02B5/23 , G03F7/004 , G03F7/031 , G03F7/033 , G03F7/16 , G03F7/20 , G03F7/26 , G03F7/40 , C09B55/00 , G02F1/1335 , G03F1/00 , C09B67/50
CPC classification number: G03F7/0045 , C09B11/02 , C09B55/009 , G03F7/0007 , G03F7/0048 , G03F7/031 , G03F7/032 , G03F7/033 , G03F7/105 , G03F7/16 , G03F7/20 , G03F7/26 , G03F7/40
Abstract: A photosensitive resin composition, a photosensitive resin film, and a color filter, the composition including a binder resin; a dye consisting of a cation and an anion; a photopolymerizable compound; a photopolymerization initiator, and a solvent, wherein the dye is included in an amount of about 15 wt % to about 40 wt % based on a total weight of a photosensitive resin composition, and wherein the cation is represented by Chemical Formula 1:
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公开(公告)号:US09740099B2
公开(公告)日:2017-08-22
申请号:US14539171
申请日:2014-11-12
Applicant: MacDermid Printing Solutions, LLC
Inventor: Chouaib Boukaftane
Abstract: A method of making a relief image printing element comprising a plurality of relief printing dots. The method includes the steps of: (a) providing at least one photocurable layer disposed on the backing layer, the at least one photocurable layer being capable of being selectively crosslinked and cured upon exposure to actinic radiation, (b) imagewise exposing the at least one photocurable layer to actinic radiation to selectively crosslink and cure portions of the at least one photocurable layer; and (c) developing the relief image printing element to separate and remove uncrosslinked and uncured portions of the at least one photocurable layer to reveal the relief image therein. The at least one photocurable layer comprises (i) an ethylenically unsaturated monomer; (ii) a binder; and (iii) a photoinitiator exhibiting a quantum yield of initiation (Qi) of more than 0.05 at a 365 nm wavelength.
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公开(公告)号:US20170219923A1
公开(公告)日:2017-08-03
申请号:US15328255
申请日:2015-07-22
Inventor: Emiko OOTA , Masahiko EBIHARA , Yasuharu MURAKAMI , Xuesong JIANG
CPC classification number: G03F7/031 , B32B27/00 , B32B27/08 , B32B27/32 , B32B27/36 , B32B37/0053 , B32B37/203 , B32B38/10 , B32B2250/24 , B32B2250/244 , B32B2255/10 , B32B2255/205 , B32B2255/26 , B32B2307/202 , B32B2310/0831 , B32B2323/04 , B32B2367/00 , B32B2457/202 , C08F2/50 , G03F7/11
Abstract: A photosensitive resin composition, comprising a binder polymer, a photopolymerizable compound, and a photopolymerization initiator, wherein the photopolymerization initiator contains a compound represented by the following general formula (1): [In the formula (1), R1, R2, R3 and R4 each independently represent an alkyl group, an aryl group, an aralkyl group, —OR5, —COOR6 or —OCOR7; and R5, R6 and R7 each independently represent an alkyl group, an aryl group or an aralkyl group.]
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99.
公开(公告)号:US09683103B2
公开(公告)日:2017-06-20
申请号:US14570065
申请日:2014-12-15
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Yangyang Xin , Chen Liu , Jianchao Lun
IPC: G02B5/20 , G03F7/004 , C09B69/10 , G03F7/038 , G02B1/04 , G02B5/23 , G02B5/22 , G03F7/00 , G03F7/027 , G03F7/031 , G03F7/033 , G03F7/105
CPC classification number: C09B69/10 , C09B69/103 , C09B69/106 , G02B1/04 , G02B5/223 , G02B5/23 , G03F7/0007 , G03F7/027 , G03F7/031 , G03F7/033 , G03F7/0388 , G03F7/105
Abstract: A polymeric dye compound, photosensitive resin composition comprising the same and use thereof are disclosed. The polymeric dye compound comprises three kinds of monomeric units. The photosensitive resin composition comprises a colorant, an alkali-soluble resin, a polymerizable monomer and a polymerization initiator, wherein the colorant comprises the polymeric dye compound and a pigment. The polymeric dye compound is prepared by copolymerization of styrenic monomer and other monomers, such that a colored layer having excellent heat resistance, light resistance and high transmittance can be formed.
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公开(公告)号:US20170166575A1
公开(公告)日:2017-06-15
申请号:US15129630
申请日:2015-03-30
Applicant: ADEKA CORPORATION
Inventor: Yoko KOMIYAMA , Takeo OISHI , Tomoyuki ARIYOSHI , Tomoya TAMACHI , Takayuki IKAGA , Naomi SATO
IPC: C07D487/06 , C07D401/04 , C07D409/04 , G03F7/031 , C07D471/04 , C07D209/60 , C07D409/10 , C07D209/14 , C07D405/04
CPC classification number: C07D487/06 , C07D209/14 , C07D209/56 , C07D209/60 , C07D401/04 , C07D405/04 , C07D409/04 , C07D409/10 , C07D471/04 , C08F2/50 , G03F7/031 , G03F7/032 , G03F7/0388
Abstract: The present invention provides oxime ester compounds represented by general formula (I), a photopolymerization initiator using said compound, and a photosensitive composition, alkali-developable photosensitive resin composition, and colored alkali-developable photosensitive resin composition containing same, and cured products thereof. The compounds of the present invention have excellent stability and low sublimability, and are useful as highly sensitive photopolymerization initiators that are activated by efficiently absorbing near ultraviolet light of 365 nm, etc. (I) (See the Specification for the definitions of R1-R8 in the formula. n represents 0 or 1.)
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